JPS5882406A - Silver or silver alloy coated wire and method of producing same - Google Patents

Silver or silver alloy coated wire and method of producing same

Info

Publication number
JPS5882406A
JPS5882406A JP56164726A JP16472681A JPS5882406A JP S5882406 A JPS5882406 A JP S5882406A JP 56164726 A JP56164726 A JP 56164726A JP 16472681 A JP16472681 A JP 16472681A JP S5882406 A JPS5882406 A JP S5882406A
Authority
JP
Japan
Prior art keywords
alloy
wire
plating
coated
silver
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56164726A
Other languages
Japanese (ja)
Other versions
JPS6246066B2 (en
Inventor
志賀 章二
智 鈴木
木曽 徳義
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP56164726A priority Critical patent/JPS5882406A/en
Publication of JPS5882406A publication Critical patent/JPS5882406A/en
Publication of JPS6246066B2 publication Critical patent/JPS6246066B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L24/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/4554Coating
    • H01L2224/4557Plural coating layers
    • H01L2224/45572Two-layer stack coating

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は耐食性と半田付は性を改善した娠又は銀合金被
覆線とその製造方法にI41Tるものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention is directed to a silver alloy coated wire with improved corrosion resistance and solderability, and a method for manufacturing the same.

銀又は鉛合金被覆線は芯線の特性に加えて銅特有の優れ
た耐食性と箪田付は性を有するため、椅々の用途に用い
られている。
Silver or lead alloy coated wires have the characteristics of core wires, as well as the excellent corrosion resistance and hardness characteristic of copper, so they are used for chair applications.

例えば、CuやCu−Ag、Cu−8n、 Cu−Zu
などの合金線にAgを被覆した線は、芯線の機械的特性
と導電性に加えて銅特有の脩れた耐食性と半田付は性を
有するところから電子部品のリード線や電子機器内゛の
゛導体として広く、利用されており、Ag被覆の厚さは
耐食性、半田付は性や経済的な”dl+から一般には1
〜lO声程度である。このようなAg被覆線をjiIi
温環境に晒すと芯線Cuの拡散によって外観変色を起し
、半田付は性を著しく劣化する。これを避けるため、芯
線とAg被覆との間にNi又はNi合金層を設けたもの
が実用化さJlている。Ni又はNi合金層は拡散バリ
ヤーとなって芯線C1の細被覆層えの拡散進出を抑える
もので、Ag被覆厚さが薄くても表面品質の低下が起ら
ず、経済的であるとされている。
For example, Cu, Cu-Ag, Cu-8n, Cu-Zu
In addition to the mechanical properties and conductivity of the core wire, wires made of alloy wire coated with Ag have excellent corrosion resistance and solderability peculiar to copper, so they are used as lead wires for electronic components and in electronic devices.゛It is widely used as a conductor, and the thickness of the Ag coating is corrosion resistant, and the soldering is generally 1.
~lO voice level. This type of Ag coated wire is
When exposed to a hot environment, the appearance discolors due to the diffusion of the core wire Cu, and the soldering properties deteriorate significantly. In order to avoid this, devices in which a Ni or Ni alloy layer is provided between the core wire and the Ag coating have been put into practical use. The Ni or Ni alloy layer acts as a diffusion barrier and suppresses the diffusion of the thin coating layer of the core wire C1, and is considered to be economical since no deterioration of surface quality occurs even if the Ag coating thickness is thin. There is.

しかしながら、このようなAg被覆線を半田付けし、あ
る程度の半田肉盛りを必要とする場合でも半田の濡れ浸
透が活発で、迅速に薄く濡れ拡がるため半田肉盛り作業
が困難であった。また高温環境に晒丁と、大気中の酸素
がAg層内部に一発に浸透し、その結果Ni又はNi合
金層の表面が酸化してAg鳩が剥離し易くなり、電子機
器回路の電気接続の信頼性を低下するばかりか、半田強
度を1.も低下する。従って、用途によってはへ1又は
Ni合金層の使用を止め、厚い、総被覆を行なったもの
を使用している。
However, even when such Ag-coated wires are soldered and require a certain amount of solder build-up, the solder wetting and penetrating is active and quickly spreads in a thin layer, making the solder build-up work difficult. In addition, when bleached in a high temperature environment, oxygen in the atmosphere penetrates into the Ag layer at once, and as a result, the surface of the Ni or Ni alloy layer oxidizes, making it easy for the Ag layer to peel off, and electrical connections in electronic device circuits. Not only does it reduce the reliability of the solder, but it also reduces the solder strength to 1. also decreases. Therefore, depending on the application, the use of the Helmetal or Ni alloy layer is stopped and a thick, full-coverage layer is used.

本発明はこれに鑑み、種々研究の結果、耐食性と半田付
は性が−優れ、かつ半田内盛りが容易で、高価なAgを
節約し得る銀又4よ銀合金被覆線とその製造方法を開発
したものである。
In view of this, and as a result of various studies, the present invention has developed a silver or silver alloy coated wire that has excellent corrosion resistance and soldering properties, is easy to fill with solder, and can save expensive Ag, and a method for manufacturing the same. It was developed.

本発明鈑又は銀合金被覆線は、芯線の最外周にAg又は
Ag合金層を設けた線において、芯線上に歯、Co又は
これらの合金層と%Zn、 Sn。
The plate or silver alloy coated wire of the present invention is a wire in which an Ag or Ag alloy layer is provided on the outermost periphery of a core wire, and a tooth, a Co or alloy layer thereof and a layer of %Zn, Sn on the core wire.

In、Cd又はこれらの合金層とを順次形成し、その上
にAg又はAg合金層を設けたことを特徴とするもので
ある。
It is characterized by sequentially forming layers of In, Cd, or their alloys, and then providing a layer of Ag or an Ag alloy thereon.

また鍜又は銀合金被覆線の製造方法は、芯線上にNi、
Co又はこれらの合金をメッキした後、Zn、an、 
In、 Cd又はこれらの合金をメッキし、その上にA
gヌはAg合金をメッキすることを特徴とするものであ
る。
In addition, the method for manufacturing a wire coated with a silver alloy or a silver alloy coated wire includes Ni on the core wire,
After plating Co or alloys thereof, Zn, an,
In, Cd or their alloy is plated, and then A
GN is characterized by being plated with Ag alloy.

坤ち、本発明被覆線は第1図に示すように、芯線(1)
の局面にNi、Co又はこれらの合金層(2)を形成し
、その上にZn%8kx%In、Cd又はこれらの合瞼
層(3)を形成し、その上にAg又はAg合金層(4)
を設けたものである。芯線には用途に応じて種々のもの
が用いられる。例えば、前記Cu又はCu合金線の外、
Cu又はCu合金を被覆した線(例えは、銅被覆鋼線や
絢被覆AI線)である。Ni、C。
As shown in Figure 1, the coated wire of the present invention has a core wire (1).
A Ni, Co or alloy layer (2) of these is formed on the surface, a Zn%8kx%In, Cd or a lid layer (3) of these is formed thereon, and an Ag or Ag alloy layer (3) is formed thereon. 4)
It has been established. Various core wires are used depending on the purpose. For example, in addition to the Cu or Cu alloy wire,
It is a wire coated with Cu or a Cu alloy (for example, a copper coated steel wire or a copper coated AI wire). Ni, C.

父はこれらの合金層(以下第1中間層と記載する)とし
てはNi、Coノ外、例えば、N1−co。
These alloy layers (hereinafter referred to as the first intermediate layer) include Ni and Co, for example, N1-co.

へi−P%Ni −B、 Ni−811,Ni−Zn、
 Co−P%Co−5n合金等であり、その厚さは0.
1〜5μ程欅で十分である。
i-P%Ni-B, Ni-811, Ni-Zn,
Co-P%Co-5n alloy, etc., and its thickness is 0.
1 to 5 μm of keyaki is sufficient.

Zn、 8n、 In、 Cd又はこれらの合金層(以
下第2中間−と記載する)としては、Zn、 8n、 
I”%cdノ外、例えハZn−Cu 、 Zn−Cd 
、 8n−In 、 5n−Pb 。
Zn, 8n, In, Cd or an alloy layer thereof (hereinafter referred to as second intermediate layer) includes Zn, 8n,
Other than I”%cd, for example, Zn-Cu, Zn-Cd
, 8n-In, 5n-Pb.

5n−Cu、 an−Zn等であ、す、これら金属又は
合金の白河れか1種又は21a以上を積層してIJ2中
間麺を形成してもよく、その厚さは々又は、軸合金被覆
厚さの1〜1 曲 5とすることが望ましい。また 、軸又はAg合金層としては、幻の外にAg−Cu、A
g−8b合金等があり、その厚さは通常0.5μ以上と
することが望ましい。
5n-Cu, an-Zn, etc., one of these metals or alloys or 21a or more may be laminated to form the IJ2 intermediate noodle, and the thickness may vary or the shaft alloy coating It is desirable to set the thickness to 1 to 5. In addition, as the shaft or Ag alloy layer, Ag-Cu, A
There are G-8B alloys, etc., and the thickness thereof is usually desirably 0.5 μm or more.

本発明被覆線は以上の構成を有し、薄いAg又はAg合
金の被覆でも変色などの外観異常や剥離を起すことなく
、半田付は性も一部することなく、適度の半田濡れ拡が
り性を示し、適度の半田肉盛りが容易である。これ等の
効果は、特にダイオードのリード線に使用テる場合に有
効である。即ち、リード線のへラダー加工された先端部
に8iテツプを高温で半田付けする場合に半田濡れ拡が
り性が適度で、チップ−を保持する半田肉盛りが容易と
なり、その後チップ部を樹脂封止するため、高温で長時
間処理してもリード線p半田付は性は低下しな、い。
The coated wire of the present invention has the above-mentioned structure, and even with a thin Ag or Ag alloy coating, it does not cause any abnormal appearance such as discoloration or peeling, and it does not affect solderability, and has appropriate solder wetting and spreading properties. This makes it easy to apply a suitable amount of solder. These effects are particularly effective when used as lead wires for diodes. In other words, when soldering the 8i tip to the laddered tip of the lead wire at high temperature, the solder wetting and spreading properties are appropriate, making it easy to build up solder to hold the chip, and then sealing the chip with resin. Therefore, even if processed at high temperatures for a long time, the soldering properties of the lead wire P will not deteriorate.

このような効果が得られる理油は必らずしも明確ではな
いが、第2中間層の一部がAg又はAg合金中に拡散し
て合金化、し、大気中の酸素によ、る@1中間鳩の表面
酸化を防止すると共に、半田の濡れ拡がりを適度に抑え
るものと考えられる。しかして、iJ2中間層の厚さが
All又はAg化防止が不充分となり、■を越えると半
田付は性が低下Tるようになる0、 このような、本発明被覆線は次のようにして進られる。
Although it is not always clear which type of oil produces such an effect, it is possible that a part of the second intermediate layer diffuses into Ag or an Ag alloy, alloys it, and is exposed to oxygen in the atmosphere. @1 It is thought that it prevents surface oxidation of the intermediate layer and also moderately suppresses solder wetting and spreading. Therefore, if the thickness of the iJ2 intermediate layer becomes insufficient to prevent All or Ag formation, and exceeds 2, the soldering properties will deteriorate. You can proceed.

即ち、芯線表面を通常の手段により脱脂、活性化した後
、電気メッキ又は化学メッキにより第l中間1層、第2
中間層、Ag又はAg合金被覆鳩を連続して順次形成す
ることにより容具に製造することができるわ 以下、本発明を実施例について詳細に説明する。
That is, after degreasing and activating the surface of the core wire by conventional means, the first intermediate layer, the second intermediate layer, and the second intermediate layer are formed by electroplating or chemical plating.
The container can be manufactured by sequentially forming intermediate layers, Ag or Ag alloy coated layers.The invention will now be described in detail with reference to embodiments.

実施例(1) 直径0.6諺のCu線を連続的に供給し、これを巻取る
ラインに下記処理槽を連続して設け、Cu線に厚さ1,
0声のNiメッキと犀さ0.05μのZnメッキと犀i
1.5μのAgメッキを連続的に行なって、Ag被覆C
u線を製造した。
Example (1) A Cu wire with a diameter of 0.6 mm was continuously supplied, and the following treatment tank was continuously installed on the line that wound the wire, and the Cu wire was coated with a thickness of 1 mm.
0 pitch Ni plating and rhinoceros 0.05μ Zn plating and rhinoceros
Continuously perform 1.5μ Ag plating to obtain Ag coating C.
U-ray was produced.

(]]+カッーF152J旨     NaaH201
/l      lα八へd「−110sec(2)水
洗    清水          55ec(3)酸
洗    H*5O410oV15SeC(4)水洗 
   清水          5sec(51Ni/
ツキNiSO42401/l   1filj440 
”CN1Cb 5077/l  ”Jy’dm” 、5
QsecH*BJs  3011/1 5ec (6)水洗    清水 (7)Znメッキ     ’1rrcR609/l 
  浴mR,TNa04 401/l  IA/dm”
、29secNれI(8011/1 (8)水洗    清水          、5be
g(91Agストライクメッキ Ag(N   31/
l   浴温RTKCN  409/l   IOA/
dm”、  3sec四Agメッキ     AgCN
  5011/It  浴温R,TKCN  1009
/l  aA/dm”、 555ec0υ水洗    
 清水     10sec++21tlL燥 実施例(2) 実施例(11において、(5)のNiメッキと(7)の
Znメッキに代えて下記処理槽を設け、 Cu線に厚さ
025μの釣lO%Co−Ni合金メッキと、厚さ0.
1声の約30%Zn−Cu合金メッキと厚さ1.5声の
Agメッキを連続的に行なってAg被覆Cu線を製造し
た。
(]]+Kaa F152J NaaH201
/l lα8hed"-110sec (2) Water washing Fresh water 55ec (3) Pickling H*5O410oV15SeC (4) Water washing
Shimizu 5sec (51Ni/
Tsuki NiSO42401/l 1filj440
"CN1Cb 5077/l "Jy'dm", 5
QsecH*BJs 3011/1 5ec (6) Water washing Fresh water (7) Zn plating '1rrcR609/l
Bath mR, TNa04 401/l IA/dm”
, 29secNre I (8011/1 (8) Water washing Shimizu, 5be
g(91Ag strike plating Ag(N 31/
l Bath temperature RTKCN 409/l IOA/
dm”, 3sec4Ag plating AgCN
5011/It Bath temperature R, TKCN 1009
/l aA/dm", 555ec0υ water washing
Shimizu 10sec++21tlL Drying Example (2) In Example (11), the following treatment tank was installed in place of the Ni plating in (5) and the Zn plating in (7), and the Cu wire was coated with a balanced 10% Co-Ni coating with a thickness of 025μ. Gold plated and thickness 0.
An Ag-coated Cu wire was manufactured by sequentially plating about 30% Zn--Cu alloy for one tone and Ag plating for a thickness of 1.5 tones.

(!11 Ni−Co合金)ツキ N15Oa   2
401/l   浴!!40’CCoEjOs  15
ジノ 04A/’dm”、30secNiCh  20
17/1 市BO4309/1 (71Ql−Za@;4Uツjt   Cu(N   
 301/l   浴!i40’czn(cN)t l
(1#/A!  041/lm’、30s’e”c”N
a GJ  、5’01/I      ”” ’ ”
”’ ” ”NJI!ωR30ν! 実施例(3) 実施例(2)において、(7)のCu−7,n合金メッ
キに代えて下記処理槽な設け、Cu線に犀さ0.25μ
の約lO%Co−Ni合金メッキと、岸さ0.1μの8
nメツキと犀さ1.5μAgメッキを連続的に行なって
Ag被覆Cu線を製造した。
(!11 Ni-Co alloy) Tsuki N15Oa 2
401/l bath! ! 40'CCoEjOs 15
Gino 04A/'dm", 30secNiCh 20
17/1 City BO4309/1 (71Ql-Za@;4Utsujt Cu(N
301/l bath! i40'czn(cN)t l
(1#/A! 041/lm', 30s'e"c"N
a GJ, 5'01/I ”” ' ”
"'""NJI! ωR30ν! Example (3) In Example (2), the following treatment tank was provided in place of the Cu-7,n alloy plating in (7), and the Cu wire was coated with a thickness of 0.25μ.
Approximately 1O% Co-Ni alloy plating and 8
An Ag-coated Cu wire was manufactured by sequentially carrying out N plating and 1.5 μAg plating.

(7)8u/ツキ   8n80a     100ν
!   浴湯R,TH露804501/l  IA/d
m”、15secβ−ナフトール  1g71! ニカワ      21/11 実施例(4) 実施例(11において(5)のNiメッキと(力のムメ
ツキに代えて下記処理槽を設け、Cu線に犀さlsμの
が15%P−N i合金メッキと犀さ0.5声のInメ
ッキと岸さ15μのAgメッキを連続的に行なってAg
被覆Cu線を製造l、た。
(7) 8u/tsuki 8n80a 100ν
! Bath R, TH Dew 804501/l IA/d
m", 15sec β-naphthol 1g71! Glue 21/11 Example (4) Example (In 11, the following treatment tank was provided in place of the Ni plating of (5) and 15% P-Ni alloy plating, In plating with a thickness of 0.5 μm, and Ag plating with a thickness of 15 μm were performed successively.
Coated Cu wire was manufactured.

(51Ni−P合金メッキ Ni幻4180.9/j 
   浴温45℃NiC1意301b’l   5A/
dxn” g□secH1130m  301/I HsPOs  101/1 +7111’/キ   In (BII’a ) s 
250Vl  浴温R0THsB04151/1.5A
/dm”、20sec!+4 BF’4 5011/7
1 実施例(5) 実施例(4)において、(7)のIn’メッキに代えて
下d(+、処理槽を設け、Cu線に犀さ1.5μの約5
%P−Nム合金メッキと犀さO1声のCdメッキと厚さ
15μのAgメッキな櫂続的に行なってAg被覆Cu線
を製造した。
(51Ni-P alloy plating Ni phantom 4180.9/j
Bath temperature 45℃ NiC1~301b'l 5A/
dxn" g□secH1130m 301/I HsPOs 101/1 +7111'/ki In (BII'a) s
250Vl Bath temperature R0THsB04151/1.5A
/dm", 20sec!+4 BF'4 5011/7
1 Example (5) In Example (4), a lower d(+) treatment tank was provided in place of the In' plating in (7), and the Cu wire was coated with about 5
% P--N alloy plating, Cd plating with a thickness of 15 μm, and Ag plating with a thickness of 15 μm were carried out successively to produce an Ag-coated Cu wire.

+7)Cd/ツ*  CdCN  3511/l  浴
#A30℃NaCN  701/l  25A/das
” 6secNa*COs 401/1 実施例(6) 実施例(41において(7)のlnメッキに代えて下記
の処理槽を設け、Cu線に雛さ15μの約5%P−Ni
合金メッキと犀さO1μの約lO%8u−Cu合金メッ
キと岸さ15−のAgメッキを連続的に行ないAg被覆
Cu線を製造した。
+7) Cd/T* CdCN 3511/l Bath #A30℃NaCN 701/l 25A/das
” 6secNa*COs 401/1 Example (6) In Example (41), the following treatment bath was provided in place of the ln plating in (7), and about 5% P-Ni with a thickness of 15μ was applied to the Cu wire.
An Ag-coated Cu wire was manufactured by sequentially carrying out alloy plating, approximately 10% 8u-Cu alloy plating with a thickness of 1μ, and Ag plating with a thickness of 15μ.

(71Cu−an合金メッキ  Cu(N  301/
l     浴!! 60℃K18nOs351/l 
  5A/dm” 5secK(ト)7011/I K(1(1211/1 0ツシエル塩3CMl/1 実施例(7) 実施例(2)において(5)のNi−Co合金メッキに
代えて下記処理槽な設け、Cu線に厚さ0.3戸のCo
メッキと、厚さ01μの約30%Zn−Cu合金メッキ
と厚さ1.5声のAgメッキを連続的に行なって紹被覆
Cu線を製造した。
(71Cu-an alloy plating Cu(N 301/
l Bath! ! 60℃K18nOs351/l
5A/dm" 5secK (g) 7011/I K (1 (1211/1 0 Tsusiel salt 3CMl/1 Example (7) In Example (2), the following treatment bath was used in place of the Ni-Co alloy plating in (5). A 0.3-thick Co layer is applied to the Cu wire.
Plating, approximately 30% Zn--Cu alloy plating with a thickness of 01 μm, and Ag plating with a thickness of 1.5 tones were performed successively to produce a coated Cu wire.

(51Co J ツ+  Co 8044001/l 
 浴fiR,TNaC1201/l  5A/dm” 
18secH婁BOs  451/1 実施例(8) 実施例(7)においてQlのAgメッキに代えて下記処
理槽を設け、Cu線に犀さ0.3声のCoメッキと、厚
さ0.1μの約3%Zn−Cu合金メッキと厚さ1.5
μの約2%8b−Ag合金メッキを連続的に行なってA
I合金被1lcu線を製造した。
(51Co J tsu+ Co 8044001/l
Bath fiR, TNaC1201/l 5A/dm”
18secH BOs 451/1 Example (8) In Example (7), the following treatment bath was provided in place of the Ag plating of Ql, and the Cu wire was coated with Co plating with a thickness of 0.3 and a thickness of 0.1μ. Approximately 3% Zn-Cu alloy plating and thickness 1.5
Continuously plating 8b-Ag alloy at about 2% of μ
A 1 lcu wire coated with I alloy was manufactured.

(10Ag−8b金金メツ+  AgGJ 121/l
   浴温RTK CN 401/l   4A/””
、JQseC泊石酸アンモ2511/ノ ニカルカリ 油石飯カリ 251/1 ナトリウム KOHlS1/It 比較例(11 実施例(11において(5)のNiメッキと(7)の7
.nメッキを省略し、Cu線上に厚さ1.5μのAgメ
ッキを行ない、Ag被覆Cu線を製造した。
(10Ag-8b gold metal + AgGJ 121/l
Bath temperature RTK CN 401/l 4A/””
, JQseC ammonium acid acid 2511/Nonical potash oil oil potash 251/1 Sodium KOHlS1/It Comparative example (11 Example (11) Ni plating of (5) and 7 of (7)
.. N plating was omitted and Ag plating with a thickness of 1.5 μm was performed on the Cu wire to produce an Ag-coated Cu wire.

比較例(2) 比較例(11においてαりのAgメッキ時間を2倍にし
、Cu線上に雁さ3.0μのAgメッキを行ない、Ag
被eICu線、を製造した。
Comparative Example (2) Comparative Example (in 11, the time for α-wise Ag plating was doubled, and Ag plating with a height of 3.0 μm was performed on the Cu wire.
A covered eICu wire was manufactured.

比較例(3) 実施例(1)において(力のZnメッキを省略し、Cu
線に踪さIDμのNiメッキと犀さ1.5声のAgメッ
キを連続的に行なって細波gCu線−1−’l#flx
 した。
Comparative Example (3) In Example (1) (the Zn plating was omitted and Cu
Ni plating of IDμ and Ag plating of 1.5 tones are performed continuously on the wire to create thin wave gCu wire-1-'l#flx
did.

比較例(4) 比較例13)において囮のAgメッキ時間を2倍にし、
Cu線上に岸さ1.0μのNNメッキと、厚さ3.0μ
のAgメッキを運゛続的に行なってAg被gCu線を製
造した。
Comparative Example (4) In Comparative Example 13), the Ag plating time of the decoy was doubled,
NN plating with a thickness of 1.0μ on the Cu wire and a thickness of 3.0μ
Ag-coated Ag-Cu wire was manufactured by continuously performing Ag plating.

このようにし・て製、造した各柚Ag被覆Cu線につい
て、ダイオード組立工程を模して、H1気流中310℃
の温度で15分間加熱処理した後、大気中250℃の湿
度で10時間加熱処理し、各熱処理後のAg被覆Cu線
を240℃の温度に加熱した共晶半田浴中に2秒間デツ
プし、表面の半田付嵩面積を目視により比較した。また
両熱処理後のAg被覆Cu線をゲージ長さ160■で8
0回捻回し、Ag被覆の剥離状態を比較した。これらの
結果を第1表に示す。
Each YuzuAg-coated Cu wire produced in this way was heated at 310°C in an H1 air flow, simulating the diode assembly process.
After heat treatment for 15 minutes at a temperature of The soldered bulk area on the surface was visually compared. In addition, the Ag-coated Cu wire after both heat treatments was
After twisting 0 times, the peeling state of the Ag coating was compared. These results are shown in Table 1.

H!気流中310℃の温度で15分間処理はSiチップ
の半田付けに相当するもので、第1表から判るように本
発明実施例品は何れも90%前後の適度の半田付看性を
示した。これに対し比較例品1,2は半田付は性が不良
であり、同3,4は半田付は性が過剰で半田肉盛りが困
難である。
H! Processing at a temperature of 310°C for 15 minutes in an air stream corresponds to soldering of Si chips, and as can be seen from Table 1, all of the products of the present invention exhibited moderate solderability of around 90%. . On the other hand, Comparative Example Products 1 and 2 had poor soldering properties, and Comparative Example Products 3 and 4 had excessive soldering properties, making it difficult to build up solder.

また大気中250℃の温度で10時間処理は樹脂封止に
相当し、樹脂封止後の半田付は性に対応するもので、本
発明実施例品・は何れも80%以上で優れている。これ
に対し比較例品は何れも半田付は性が激減している。ま
た大気中250℃の温度で10時間処理後の捻回@離で
は、本発明実施例品はわずかに剥離した程度であるのに
、比較例品では何れも剥離が著しい。特にNi中間層を
設けた比較例品3,4においても剥離が著しいのはNi
鳩の表面が酸化されたためであや。
In addition, treatment in the atmosphere at a temperature of 250°C for 10 hours corresponds to resin sealing, and soldering after resin sealing corresponds to the properties, and the products of the present invention are excellent with a score of 80% or more. . On the other hand, the soldering properties of all the comparative example products are drastically reduced. Further, when twisted at peeling after being treated in the atmosphere at a temperature of 250° C. for 10 hours, the products of the examples of the present invention only slightly peeled, whereas the products of the comparative examples all peeled significantly. In particular, even in Comparative Examples 3 and 4, which had a Ni intermediate layer, the peeling was remarkable because of Ni.
This is due to the oxidation of the surface of the pigeon.

従来のNi中間層を設けた細又は、軸合金被覆Cu線で
は半田付は性が優れていてもチップ半田付けにおける半
田肉盛りが困難であり、更に樹脂封止に耐えるためには
厚さ5μ以上の厚いAg又は結合金被覆が必要であった
Although the conventional thin or axial alloy-coated Cu wire with a Ni intermediate layer has excellent soldering properties, it is difficult to build up solder in chip soldering, and in order to withstand resin sealing, a thickness of 5 μm is required. A thicker Ag or alloy coating was required.

これに対し本発明によれば、はるかに薄いM又はAg合
金被覆によりチップ半田付けが容易で樹脂封止に耐え、
ダイオード組立を容易にし、その生産性を著しく向上し
得るばかりか、省銀の点でも大きな効果な奏するもので
ある。
On the other hand, according to the present invention, the much thinner M or Ag alloy coating makes chip soldering easier and resists resin sealing.
This not only simplifies diode assembly and significantly improves productivity, but also has a significant effect in terms of silver savings.

以上、Ag又はAg合金被覆Cu線について説明したが
これに限るものではなく、種々の紹又はAg合金被覆線
において高温処理後も優れた耐食性と半田付は性を示す
もので、工業上極めて有益なものである。
The above explanation is about Ag or Ag alloy coated Cu wire, but it is not limited to this, and various types of wires or Ag alloy coated wires show excellent corrosion resistance and solderability even after high temperature treatment, and are extremely useful industrially. It is something.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明被覆線の一例を示す1r面図である。 l、芯線 2、第1中間層 3.182中間層 4、  Ag又は細合金層 FIG. 1 is a 1r view showing an example of the coated wire of the present invention. l, core wire 2. First middle layer 3.182 middle class 4. Ag or fine alloy layer

Claims (1)

【特許請求の範囲】 +11  芯線の最外周にAg又はM合金層を設けた線
において、芯線上にNi、Co又はこれらの合金層と、
Zn、an、In、Cd又はこれらの合金層とを順次形
成し、その上にAg又はAg合金層1設けたことを特徴
とする銀又は銀合金被覆線。 (21Zn、 Sn、In、Cd又ハコれらの合金sの
nさをAg又はAg合金層の厚さの1乃至1とする特許
請求の範囲$1項紀載の銀又は銀合金被覆線。 (3)芯線上にNi、Co又はこれらの合金をメッキし
た後、Zn、Sn、 In%Cd又はこれらの合金をメ
ッキし、その上に細又はAg合金をメッキすることを特
徴とする銀又は銀合金被覆線の製造方法。
[Claims] +11 A wire in which an Ag or M alloy layer is provided on the outermost periphery of the core wire, with a layer of Ni, Co or an alloy thereof on the core wire,
A silver or silver alloy coated wire characterized in that Zn, an, In, Cd, or an alloy layer thereof is sequentially formed, and an Ag or Ag alloy layer 1 is provided thereon. (21) The silver or silver alloy coated wire according to claim 1, wherein the thickness of Zn, Sn, In, Cd, or an alloy thereof is 1 to 1 of the thickness of the Ag or Ag alloy layer. (3) After plating Ni, Co or an alloy of these on the core wire, Zn, Sn, In%Cd or an alloy of these is plated, and then a fine or Ag alloy is plated on top of the silver or Method for manufacturing silver alloy coated wire.
JP56164726A 1981-10-15 1981-10-15 Silver or silver alloy coated wire and method of producing same Granted JPS5882406A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56164726A JPS5882406A (en) 1981-10-15 1981-10-15 Silver or silver alloy coated wire and method of producing same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56164726A JPS5882406A (en) 1981-10-15 1981-10-15 Silver or silver alloy coated wire and method of producing same

Publications (2)

Publication Number Publication Date
JPS5882406A true JPS5882406A (en) 1983-05-18
JPS6246066B2 JPS6246066B2 (en) 1987-09-30

Family

ID=15798724

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56164726A Granted JPS5882406A (en) 1981-10-15 1981-10-15 Silver or silver alloy coated wire and method of producing same

Country Status (1)

Country Link
JP (1) JPS5882406A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59228311A (en) * 1983-06-08 1984-12-21 古河電気工業株式会社 Ag-covered electric material and method of producing same
JPS63150950A (en) * 1986-12-15 1988-06-23 Shinko Electric Ind Co Ltd Package for electronic component
JPH0242753A (en) * 1988-03-28 1990-02-13 Texas Instr Inc <Ti> Corrosion-resistant lead frame
JP5275504B1 (en) * 2012-06-15 2013-08-28 Jx日鉱日石金属株式会社 METAL MATERIAL FOR ELECTRONIC COMPONENT AND ITS MANUFACTURING METHOD, CONNECTOR TERMINAL USING THE SAME, CONNECTOR AND ELECTRONIC COMPONENT

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5398072A (en) * 1977-02-08 1978-08-26 Hitachi Cable Ltd Weathering wiring electrical couductor
JPS5433111A (en) * 1977-08-17 1979-03-10 Dainippon Printing Co Ltd Method of copying
JPS5472483A (en) * 1977-11-21 1979-06-09 Hitachi Cable Ltd Manufacture of heat-resistant wiring conductor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5398072A (en) * 1977-02-08 1978-08-26 Hitachi Cable Ltd Weathering wiring electrical couductor
JPS5433111A (en) * 1977-08-17 1979-03-10 Dainippon Printing Co Ltd Method of copying
JPS5472483A (en) * 1977-11-21 1979-06-09 Hitachi Cable Ltd Manufacture of heat-resistant wiring conductor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59228311A (en) * 1983-06-08 1984-12-21 古河電気工業株式会社 Ag-covered electric material and method of producing same
JPS63150950A (en) * 1986-12-15 1988-06-23 Shinko Electric Ind Co Ltd Package for electronic component
JPH0242753A (en) * 1988-03-28 1990-02-13 Texas Instr Inc <Ti> Corrosion-resistant lead frame
JP5275504B1 (en) * 2012-06-15 2013-08-28 Jx日鉱日石金属株式会社 METAL MATERIAL FOR ELECTRONIC COMPONENT AND ITS MANUFACTURING METHOD, CONNECTOR TERMINAL USING THE SAME, CONNECTOR AND ELECTRONIC COMPONENT

Also Published As

Publication number Publication date
JPS6246066B2 (en) 1987-09-30

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