JPS5875834A - プロキシミティ露光装置 - Google Patents

プロキシミティ露光装置

Info

Publication number
JPS5875834A
JPS5875834A JP56173013A JP17301381A JPS5875834A JP S5875834 A JPS5875834 A JP S5875834A JP 56173013 A JP56173013 A JP 56173013A JP 17301381 A JP17301381 A JP 17301381A JP S5875834 A JPS5875834 A JP S5875834A
Authority
JP
Japan
Prior art keywords
wafer
pattern
mask
optical system
alignment pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56173013A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0311540B2 (enrdf_load_stackoverflow
Inventor
Mitsuyoshi Koizumi
小泉　光義
Nobuyuki Akiyama
秋山　伸幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56173013A priority Critical patent/JPS5875834A/ja
Publication of JPS5875834A publication Critical patent/JPS5875834A/ja
Publication of JPH0311540B2 publication Critical patent/JPH0311540B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP56173013A 1981-10-30 1981-10-30 プロキシミティ露光装置 Granted JPS5875834A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56173013A JPS5875834A (ja) 1981-10-30 1981-10-30 プロキシミティ露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56173013A JPS5875834A (ja) 1981-10-30 1981-10-30 プロキシミティ露光装置

Publications (2)

Publication Number Publication Date
JPS5875834A true JPS5875834A (ja) 1983-05-07
JPH0311540B2 JPH0311540B2 (enrdf_load_stackoverflow) 1991-02-18

Family

ID=15952575

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56173013A Granted JPS5875834A (ja) 1981-10-30 1981-10-30 プロキシミティ露光装置

Country Status (1)

Country Link
JP (1) JPS5875834A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62185318A (ja) * 1986-02-10 1987-08-13 Nippon Kogaku Kk <Nikon> 露光装置
JPS63140546A (ja) * 1986-12-02 1988-06-13 Toshiba Corp 露光装置
JP2008014608A (ja) * 2006-07-10 2008-01-24 Daikin Ind Ltd 床置き空気調和装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51138464A (en) * 1975-05-26 1976-11-30 Hitachi Ltd Device for detecting relative position of plural articles
JPS5243692A (en) * 1975-09-30 1977-04-05 Sumiyoshi Heavy Ind Apparatus for hauling with hauling roller having angle changeable fishing net linkkgethering member
JPS5252579A (en) * 1975-10-27 1977-04-27 Canon Inc Clearance adjusng method
JPS5315078A (en) * 1976-07-23 1978-02-10 Siemens Ag Method of automatically adjusting layer material
JPS5330878A (en) * 1976-09-03 1978-03-23 Fujitsu Ltd Focus adjusting device in projection type exposure apparatus
JPS56130707A (en) * 1980-03-18 1981-10-13 Canon Inc Photo-printing device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51138464A (en) * 1975-05-26 1976-11-30 Hitachi Ltd Device for detecting relative position of plural articles
JPS5243692A (en) * 1975-09-30 1977-04-05 Sumiyoshi Heavy Ind Apparatus for hauling with hauling roller having angle changeable fishing net linkkgethering member
JPS5252579A (en) * 1975-10-27 1977-04-27 Canon Inc Clearance adjusng method
JPS5315078A (en) * 1976-07-23 1978-02-10 Siemens Ag Method of automatically adjusting layer material
JPS5330878A (en) * 1976-09-03 1978-03-23 Fujitsu Ltd Focus adjusting device in projection type exposure apparatus
JPS56130707A (en) * 1980-03-18 1981-10-13 Canon Inc Photo-printing device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62185318A (ja) * 1986-02-10 1987-08-13 Nippon Kogaku Kk <Nikon> 露光装置
JPS63140546A (ja) * 1986-12-02 1988-06-13 Toshiba Corp 露光装置
JP2008014608A (ja) * 2006-07-10 2008-01-24 Daikin Ind Ltd 床置き空気調和装置

Also Published As

Publication number Publication date
JPH0311540B2 (enrdf_load_stackoverflow) 1991-02-18

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