JPS5871741U - exposure equipment - Google Patents
exposure equipmentInfo
- Publication number
- JPS5871741U JPS5871741U JP16795981U JP16795981U JPS5871741U JP S5871741 U JPS5871741 U JP S5871741U JP 16795981 U JP16795981 U JP 16795981U JP 16795981 U JP16795981 U JP 16795981U JP S5871741 U JPS5871741 U JP S5871741U
- Authority
- JP
- Japan
- Prior art keywords
- irradiation
- sample
- micrometers
- light
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Control Of Exposure In Printing And Copying (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は本考案による露光装置の概略図、第2図は試料
及び該試料上のフォトレジストを照射源の移動方向に直
角の方向を断面図示したもの、第3図は本考案の特徴で
ある補正板の開口部の形状を示す図である。
なお図に於1.−>て、1・・・・・・照射源、4・・
・・・・シャッター、7・・・・・・フォトマスク、8
・・・・・・試料、9・・・・・・補正板、10・・・
・・・フォトレジスト、である。Fig. 1 is a schematic diagram of an exposure apparatus according to the present invention, Fig. 2 is a cross-sectional view of a sample and a photoresist on the sample in a direction perpendicular to the moving direction of the irradiation source, and Fig. 3 is a diagram showing the features of the present invention. FIG. 3 is a diagram showing the shape of an opening in a certain correction plate. In addition, in the figure 1. ->te, 1...irradiation source, 4...
...Shutter, 7...Photomask, 8
...Sample, 9...Correction plate, 10...
...Photoresist.
Claims (1)
トを表面に形成した矩形状の試料と透明な硝子板又はプ
ラスチックフィルムの下面に該試料に転写すべきパター
ンを形成したフォトマスクとを密着又は近接した状態で
固定した被照射物と、水銀灯、キセノンランプ等の光源
からの光を平行文は平行に近い光にする光学系とを内部
に備え、該被照射物に紫外線を照射する照射源と、該被
照射物又は該照射源のどちらか一方を移動させる駆動装
置と、該照射源に取り付けられ且つ該照射源又は該被照
射物の移動方向に直角な方向のフォトレジスト厚の変化
に比例させて開口部の該移動方向の長さに変化をもたら
した補正板とを含むことを特−徴とする露光装置。' A rectangular sample on which a photoresist with a thickness of several micrometers to several tens of micrometers is formed on the surface and a photomask on which a pattern to be transferred to the sample is formed on the lower surface of a transparent glass plate or plastic film are brought into close contact or in close proximity. an irradiation source that irradiates ultraviolet rays to the irradiated object, which is internally equipped with an optical system that converts light from a light source such as a mercury lamp or a xenon lamp into nearly parallel light; a driving device that moves either the irradiation object or the irradiation source; and a correction plate that causes a change in the length of the opening in the moving direction.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16795981U JPS5871741U (en) | 1981-11-11 | 1981-11-11 | exposure equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16795981U JPS5871741U (en) | 1981-11-11 | 1981-11-11 | exposure equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5871741U true JPS5871741U (en) | 1983-05-16 |
Family
ID=29960012
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16795981U Pending JPS5871741U (en) | 1981-11-11 | 1981-11-11 | exposure equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5871741U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01132124A (en) * | 1987-08-28 | 1989-05-24 | Teru Kyushu Kk | Exposure method and apparatus thereof |
-
1981
- 1981-11-11 JP JP16795981U patent/JPS5871741U/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01132124A (en) * | 1987-08-28 | 1989-05-24 | Teru Kyushu Kk | Exposure method and apparatus thereof |
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