JPS5871391A - Method for electroplating steel wire for welding in copper sulfate bath - Google Patents
Method for electroplating steel wire for welding in copper sulfate bathInfo
- Publication number
- JPS5871391A JPS5871391A JP16912681A JP16912681A JPS5871391A JP S5871391 A JPS5871391 A JP S5871391A JP 16912681 A JP16912681 A JP 16912681A JP 16912681 A JP16912681 A JP 16912681A JP S5871391 A JPS5871391 A JP S5871391A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- bath
- copper
- steel wire
- welding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/40—Making wire or rods for soldering or welding
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、均−電着性及び密着性の良好な銅めつき皮膜
を形成する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming a copper plating film with good uniform electrodeposition and adhesion.
溶接用の鋼ワイヤは通電性や防錆性等の観点から銅めっ
きを施しているが、従来の銅めっきは主としてVアン浴
を利用するものであシ、MA液処埠上の問題が多かった
。これに対し硫酸銅浴めっきでは廃液の毒性が少なく、
環境汚染の観点からは望ましい面があり、又めつき操業
を高能率に行なうことができるという利点がある為、近
年は硫酸銅浴めつきに移り変9つつTo、be Lかし
この方法はめつき皮膜の均一電着性や下地に対する密層
性等においてyアン浴めつきよシ劣るという欠点力;あ
りえ。Steel wires for welding are coated with copper for electrical conductivity and rust prevention, but conventional copper plating mainly utilizes a V annealing bath, and there are many problems with MA liquid treatment terminals. Ta. On the other hand, with copper sulfate bath plating, the waste liquid is less toxic;
In recent years, copper sulfate bath plating has been adopted because it is desirable from the perspective of environmental pollution and also has the advantage of allowing highly efficient plating operations. The drawback is that it is inferior to Y-An bath in terms of uniform electrodeposition and layer density to the base.
本発明はこの様な事情#IcWI目してなされたもので
あり%Vアン浴めっきの場合と同程度の均−電着性及び
密着性を有するめっき皮膜を形成する為の硫酸鋼浴電気
めっき方法を確立せんとするものである。The present invention was made in view of this situation #IcWI, and is a method of sulfuric acid steel bath electroplating for forming a plating film having the same level of uniform electrodeposition and adhesion as that of %V bath plating. The purpose is to establish a method.
しかして本発明の電気めっき方法とは、硫酸銅濃度:1
0〜800g/1.硫酸濃度:10〜100g/l浴温
:56〜80℃の硫酸銅浴中に溶接用鋼ワイヤを浸漬し
、電流密度:150A/dXxP以上で電気めっきする
点に要旨を有するものである。以下これらのめつき条件
を選定した理由について説明する。However, the electroplating method of the present invention has copper sulfate concentration: 1
0-800g/1. The gist is that a steel wire for welding is immersed in a copper sulfate bath with a sulfuric acid concentration of 10 to 100 g/l and a bath temperature of 56 to 80°C, and electroplated at a current density of 150 A/dXxP or more. The reasons for selecting these plating conditions will be explained below.
電気めつきにおいて均一なめつき皮膜を形成する為には
、(1)式で示される均−電流密度投布力(スローイン
グ書パワー)二Tをできる限〕大きくすることが必要で
あると言われて^る。In order to form a uniform plating film in electroplating, it is said that it is necessary to increase the uniform current density throwing force (throwing power) 2T shown by equation (1) as much as possible. te^ru.
スローイング・パワーTを100に近づけるには、11
)式においてRを可及的に小さくシ、カソード分極ΔE
/ΔIを大きくするとと零望まれる。To bring the throwing power T closer to 100, 11
) in the formula, set R as small as possible, and set the cathode polarization ΔE
It is desirable to increase /ΔI.
まず基本的に硫酸銅濃度はある程度以上の濃度でなけれ
ばならないが、最低限10g/lであることが必要であ
る。即ち10g//未満になると鋼イオン濃度が少ない
為に浴抵抗Rが高くな9゜スローイング・パワーTを小
さくする方向に作用する。換言すれば浴抵抗霞高(なっ
て電導度が悪(な)、限界電流密度の低下の為に実用上
満足できるだけのめつき速度が得られない。First, basically, the concentration of copper sulfate must be above a certain level, but it is required to be at least 10 g/l. That is, when it is less than 10 g//, the steel ion concentration is low, so that the bath resistance R increases and the 9° throwing power T decreases. In other words, the bath resistance is high, the conductivity is poor, and the limiting current density is low, making it impossible to obtain a practically satisfactory plating speed.
硫酸鋼浴の電解反応は、銅イオンのカンードヘの拡散が
律速であるから、ワイヤ(カソード)への拡散を容易和
する為には、銅イオン濃度を高めることが必要である。In the electrolytic reaction of a sulfuric acid steel bath, the diffusion of copper ions into the cathode is rate-determining, so it is necessary to increase the copper ion concentration in order to easily reduce the diffusion into the wire (cathode).
しかるに硫酸鋼の室温における飽和濃度は800 g/
lであるから1本発明においても800 g/lを上限
と定めた。尚めつき操業中の温度は後述ゐ如く55〜8
0℃であるから、操業中のことのみ考厘すれば更に高濃
度和することも可能であるが、めっき操業を中断した時
点で温度が低下すると、過剰の硫酸鋼が析出してめっき
装置に悪影響が生じるので、800g//以上の高濃度
和することは好まれない。よって硫酸銅濃度は10〜8
00g//の範囲に定めた。However, the saturation concentration of sulfuric acid steel at room temperature is 800 g/
1. Therefore, in the present invention, 800 g/l is also set as the upper limit. The temperature during the plating operation is 55-8 as described below.
Since the temperature is 0°C, it is possible to achieve an even higher concentration by considering only during operation, but if the temperature drops when plating operation is interrupted, excess sulfuric acid steel will precipitate and cause damage to the plating equipment. High concentrations of more than 800 g// are not preferred because of adverse effects. Therefore, the copper sulfate concentration is 10-8
00g// range.
次に硫酸濃度は下記の理由から10g/1以上と宇めた
。即ちlog//以上の濃度にすると、ツイヤからめつ
き浴中に持ち込まれる伸線潤清剤尋のアルカリ性物質が
中和されるので、めっき浴pHが一定に保持され、均一
なめつき皮膜を形成することが可能となる。又第1図に
示す如く、硫酸濃度が10g/e以上になると、同一電
流密度を得るのに必要な浴電圧が低下する。即ち硫酸濃
度の増大につれて浴抵抗Rが低下するので、スローイン
グ・パワーTが100IC@近し均一なめつき皮膜の形
成が容易になる。しかるに硫酸濃度が100g/lを越
えると、硫酸鋼の溶解度が低下し、めっき操業中に硫酸
鋼の析出を見ることがあるので、100g//を上限と
すべきである。又vg1表に示す様に硫酸濃度が100
g//を越えるとめつき洛中のHgfiが増大してめっ
き金属中に取り込まれ、溶接上好ましくない。Next, the sulfuric acid concentration was determined to be 10 g/1 or more for the following reasons. In other words, when the concentration is higher than log//, the alkaline substances in the wire drawing moisturizer brought into the plating bath from the gloss are neutralized, so the pH of the plating bath is kept constant and a uniform plating film is formed. becomes possible. Furthermore, as shown in FIG. 1, when the sulfuric acid concentration exceeds 10 g/e, the bath voltage required to obtain the same current density decreases. That is, as the sulfuric acid concentration increases, the bath resistance R decreases, so that the throwing power T approaches 100 IC@, making it easier to form a uniform plating film. However, if the sulfuric acid concentration exceeds 100 g/l, the solubility of sulfuric acid steel decreases and precipitation of sulfuric acid steel may occur during plating operations, so the upper limit should be 100 g/l. Also, as shown in the vg1 table, the sulfuric acid concentration is 100
If Hgfi exceeds g//, Hgfi in the plating increases and is incorporated into the plating metal, which is unfavorable for welding.
@1表
丁目
めっき浴の温度については、浴温か高くなるにつれてイ
オンの移動が容易になって浴抵抗Rの減少をもたらすと
共IIc、第2図に示される如くカソード分極が増大す
るので1両面からスローイング・パワーの増大に寄与す
る。ちなみに81℃8図1A)k′i浴温か80℃、g
g図@は浴tjAが55℃の場合におけるめっき鋼の組
織を示す顕Wk鏡写真であるが。@1 Regarding the temperature of the plating bath, as the bath temperature increases, the movement of ions becomes easier and the bath resistance R decreases. This contributes to an increase in throwing power. By the way, 81℃8Figure 1A) k'i bath temperature 80℃, g
Figure g @ is a microscopic photograph showing the structure of plated steel when bath tjA is 55°C.
後者では、粗大化した柱状晶が平滑でしかも均一に電着
されている。両路8図のめつきにおける浴組FllFi
、CuSO4・5HgO:800g//、 H2SO4
:60g/lでTon、ツイヤ速度:250m/分。In the latter, coarse columnar crystals are electrodeposited smooth and uniformly. Bath group FllFi in Ryoji 8 figure metsuki
, CuSO4・5HgO: 800g//, H2SO4
: Ton at 60g/l, wear speed: 250m/min.
電流密度:ff150A/dm”で電気めっきを施した
ものである。f#’lVアン浴めつきで得られる皮膜の
硬度は一般160〜180Hマであるが、硫酸鋼浴めっ
きで得られるめっき皮膜の硬さは、浴温8G℃の場合で
100〜186Hマを示し、浴温55℃では86〜90
Hマであった。即ち硫IIIM浴めっきでは一般に軟質
のめつき層が得られ、めっき皮膜の加工性が良(なるが
、浴温を56℃以上にすれば一層良好と1kn、従来の
シアン浴めつ第2表に示す通v、CuSO4・5H20
及びH2SO4の濃度が本発明の条件を満す場合におい
て、浴温か40℃の場合は電流密度を高めていっても均
−電WI性及び密着性の両面とも改善されなかった。こ
れに対し浴温55〜80℃では、均−電着性は全て良好
であり、密着性については。The hardness of the coating obtained by f#'lV unbath plating is generally 160 to 180H, but the hardness of the coating obtained by sulfuric acid steel bath plating is The hardness is 100-186H at a bath temperature of 8G℃, and 86-90H at a bath temperature of 55℃.
It was H-ma. In other words, in sulfur IIIM bath plating, a soft plated layer is generally obtained, and the workability of the plated film is good (although it is even better if the bath temperature is set to 56°C or higher; As shown in Figure 5, CuSO4・5H20
When the concentration of H2SO4 and H2SO4 satisfies the conditions of the present invention and the bath temperature was 40 DEG C., even if the current density was increased, neither the uniformity of electric current distribution nor the adhesion was improved. On the other hand, when the bath temperature was 55 to 80°C, the uniformity of electrodeposition was good in all cases, and the adhesion was good.
150 A /dm2以上にすると良好であった。伺密
着性の判定は、めっきされたワイヤを同径のワイヤ外周
に巻き付け、その表面を観察することによって行なった
。Good results were obtained at 150 A/dm2 or higher. The adhesion was determined by wrapping a plated wire around the outer periphery of a wire of the same diameter and observing its surface.
本発明の硫#銅浴電気めっきは上述の条件下で行なわれ
るので、シアン浴めっきに劣らない均一1!着性及び密
着性を得ることができる様になった。Since the sulfur #copper bath electroplating of the present invention is carried out under the above-mentioned conditions, it is as uniform as cyan bath plating. It became possible to obtain good adhesion and adhesion.
第1図は電解電圧に及ぼすHgSO4濃度の影響を示す
グラフ、第2図はカソード分極に及はす浴温の影響を示
すグラフ、第8図(2)、@はめつき層断面の組織を示
す顧徽鍵写真(500倍)、@4図は置換メッキ量に及
ぼす電流密度の影響を示すグラフである。
’iTi、流密Jシ ld (A/dm”)゛ 1
1こイet E(VvsSe!’)
”I。Figure 1 is a graph showing the effect of HgSO4 concentration on electrolytic voltage, Figure 2 is a graph showing the effect of bath temperature on cathode polarization, and Figure 8 (2) @ shows the structure of the cross section of the plated layer. Gu Huikey photo (500x), Figure @4 is a graph showing the influence of current density on the amount of displacement plating. 'iTi, flow tight J series ld (A/dm'')゛ 1
1 Koi et E (VvsSe!')
“I.
Claims (1)
a濃度:10〜100 g/1.浴i:65〜80℃の
硫酸銅浴中に溶接鋼用ワイヤを浸漬し、電流密度=15
OA/−以上で電気めっきすることを特徴とする溶接用
鋼ワイヤの硫酸鋼浴電気めっき方法。(t) Copper sulfate mff: 10-800 g/1. sulfur
a concentration: 10-100 g/1. Bath I: A wire for welding steel is immersed in a copper sulfate bath at 65 to 80°C, and the current density is 15.
A method for electroplating a steel wire for welding in a sulfuric acid steel bath, the method comprising electroplating at OA/- or more.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16912681A JPS5871391A (en) | 1981-10-21 | 1981-10-21 | Method for electroplating steel wire for welding in copper sulfate bath |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16912681A JPS5871391A (en) | 1981-10-21 | 1981-10-21 | Method for electroplating steel wire for welding in copper sulfate bath |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5871391A true JPS5871391A (en) | 1983-04-28 |
JPS6233313B2 JPS6233313B2 (en) | 1987-07-20 |
Family
ID=15880757
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16912681A Granted JPS5871391A (en) | 1981-10-21 | 1981-10-21 | Method for electroplating steel wire for welding in copper sulfate bath |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5871391A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102108536A (en) * | 2010-11-30 | 2011-06-29 | 浙江省浦江县百川产业有限公司 | Linear traction and electrodeposition production process of thick copper clad steel wires for grounding wires |
CN102810358A (en) * | 2011-05-31 | 2012-12-05 | 常州市金利特种焊丝有限公司 | Production method of copper covered steel wire for electronic product connecting line |
CN105154944A (en) * | 2015-10-16 | 2015-12-16 | 天津市永昌焊丝有限公司 | Drying unit after CO2-gas-shielded welding wire copper-plating |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0264315U (en) * | 1988-11-04 | 1990-05-15 |
-
1981
- 1981-10-21 JP JP16912681A patent/JPS5871391A/en active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102108536A (en) * | 2010-11-30 | 2011-06-29 | 浙江省浦江县百川产业有限公司 | Linear traction and electrodeposition production process of thick copper clad steel wires for grounding wires |
CN102810358A (en) * | 2011-05-31 | 2012-12-05 | 常州市金利特种焊丝有限公司 | Production method of copper covered steel wire for electronic product connecting line |
CN105154944A (en) * | 2015-10-16 | 2015-12-16 | 天津市永昌焊丝有限公司 | Drying unit after CO2-gas-shielded welding wire copper-plating |
CN105154944B (en) * | 2015-10-16 | 2017-07-28 | 天津市永昌焊丝有限公司 | CO2Drying device after gas shield welding wire copper facing |
Also Published As
Publication number | Publication date |
---|---|
JPS6233313B2 (en) | 1987-07-20 |
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