JPS586800B2 - Insatsu Kairo Youdou Hakuo Hiyou Menshiyo Risuru Hohou - Google Patents

Insatsu Kairo Youdou Hakuo Hiyou Menshiyo Risuru Hohou

Info

Publication number
JPS586800B2
JPS586800B2 JP50147460A JP14746075A JPS586800B2 JP S586800 B2 JPS586800 B2 JP S586800B2 JP 50147460 A JP50147460 A JP 50147460A JP 14746075 A JP14746075 A JP 14746075A JP S586800 B2 JPS586800 B2 JP S586800B2
Authority
JP
Japan
Prior art keywords
copper foil
treatment
youdou
risuru
menshiyo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP50147460A
Other languages
Japanese (ja)
Other versions
JPS5271348A (en
Inventor
高橋光男
川澄良夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP50147460A priority Critical patent/JPS586800B2/en
Publication of JPS5271348A publication Critical patent/JPS5271348A/en
Publication of JPS586800B2 publication Critical patent/JPS586800B2/en
Expired legal-status Critical Current

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  • Electrochemical Coating By Surface Reaction (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Chemical Treatment Of Metals (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】 本発明は、銅箔に印刷回路用途に対して好適な特性を与
える為の表面処理を施すに際して酸性浴を使用しての電
解処理を伴う場合、生成される処理面の均一化をはかる
事を目的とするものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a treated surface produced when surface treatment of copper foil to give properties suitable for printed circuit use involves electrolytic treatment using an acid bath. The purpose is to equalize the

ここで銅箔という用語は銅および銅を基とする合金製の
箔を包括するものである。
The term copper foil here encompasses foils made of copper and copper-based alloys.

銅箔を利用する印刷回路板が電子工業界で広く用いられ
るようになっている。
Printed circuit boards utilizing copper foil have become widely used in the electronics industry.

銅箔を印刷回路用途に供する時には、先ず銅箔を合成樹
脂基板に接着し、必要な回路を印刷した後エッチングに
より不要部が除去される。
When using copper foil for printed circuit applications, the copper foil is first adhered to a synthetic resin substrate, the necessary circuits are printed, and unnecessary parts are removed by etching.

従って、印刷回路用途に使用される銅箔には、接着性、
耐熱性、電気特性、外観等の諸特性が良好なることが要
求される。
Therefore, copper foil used in printed circuit applications has adhesive,
Good properties such as heat resistance, electrical properties, and appearance are required.

昨今の電子工業技術の驚異的な進歩に伴い、印刷回路用
銅箔の品質についての要求はますます厳しいものとなっ
ている。
With the recent amazing progress in electronic industry technology, the quality requirements for copper foil for printed circuits are becoming increasingly strict.

銅箔の印刷回路用向けの表面処理としては多くの場合、
銅箔を陰極とし酸性浴を用いて陰極処理を行って接着性
に秀れた処理面を形成する方法か、或いは陰極処理に先
きだって銅箔を陽極として陽極処理を行うことにより表
面を粗化した後上述の陰極処理を行う方法がとられてい
る。
In many cases, the surface treatment for copper foil printed circuits is
The method is to perform cathodic treatment using an acidic bath using copper foil as a cathode to form a treated surface with excellent adhesion, or to roughen the surface by performing anodization using copper foil as an anode prior to cathodic treatment. A method is used in which the above-mentioned cathode treatment is performed after the oxidation process is completed.

これら電解処理における生成面の均一性は、電解処理前
の銅箔面の状態によって大きく変動する。
The uniformity of the surface produced in these electrolytic treatments varies greatly depending on the condition of the copper foil surface before the electrolytic treatment.

一般に、印刷回路用銅箔は圧延あるいは電解により作製
した銅箔を基にして作られている。
Generally, copper foil for printed circuits is made based on copper foil produced by rolling or electrolysis.

特に銅箔が圧延箔の場合、電解処理前の酸洗、脱脂等の
予備処理において、むらが生じやすくこのため表面の濡
れ性が不均一となるため電解一処理後に均一な面が得ら
れない。
Especially when the copper foil is a rolled foil, unevenness tends to occur during preliminary treatments such as pickling and degreasing before electrolytic treatment, resulting in uneven surface wettability, making it impossible to obtain a uniform surface after electrolytic treatment. .

また、電解銅箔の場合でも、電解処理前に一旦乾燥しそ
して巻取った場合、酸化程度の相違が起因して均一な処
理面が得られない。
Furthermore, even in the case of electrolytic copper foil, if it is once dried and rolled up before electrolytic treatment, a uniform treated surface cannot be obtained due to the difference in the degree of oxidation.

このため接着性を向上させるための陰極処理の場合、部
分的に接着性の悪い面、粉落ち面、色むら面など生じ、
また表面粗化を目的とした陽極処理においても一様な粗
化面が得られない。
For this reason, in the case of cathodic treatment to improve adhesion, some areas may have poor adhesion, powdery surfaces, uneven coloring, etc.
Further, even in anodization for the purpose of surface roughening, a uniformly roughened surface cannot be obtained.

これらの対策として種々の方法が提案されている。Various methods have been proposed as countermeasures against these problems.

しかしながら工業的に十分なものが末だみあたらない。However, there are still no products that are suitable for industrial use.

本発明の目的は、上述の欠点を排除しそして陽陰極処理
を含む電解処理後外観および接着性が均一な電解処理面
を有する銅箔を生成する表面処理方法の提供にある。
The object of the present invention is to provide a surface treatment method which eliminates the above-mentioned drawbacks and which produces a copper foil having an electrolytically treated surface which is uniform in appearance and adhesion after electrolytic treatment, including anodic treatment.

本発明は、処理すべき銅箔をそのまま酸化剤を含むアル
カリ性水溶液と接触せしめてその表面に淡茶褐ないし黒
色の酸化皮膜を生成させそして水洗後そのままあるいは
乾燥した後酸性浴にて電解処理を行うことを特徴とする
方法である。
In the present invention, the copper foil to be treated is directly brought into contact with an alkaline aqueous solution containing an oxidizing agent to form a pale brown to black oxide film on its surface, and after being washed with water, it is electrolytically treated in an acidic bath either as is or after drying. This method is characterized by:

本発明においては、予備処理段階で生成される酸化皮膜
が電解浴中に溶解すると同時にイオンの電着または金属
の溶出が行われ、そして得られる処理面は均一性に秀れ
たものとなる。
In the present invention, the oxide film produced in the pretreatment stage is dissolved in the electrolytic bath, and at the same time, ions are electrodeposited or metals are eluted, and the resulting treated surface has excellent uniformity.

特に、接着性の向上を目的とした陰極処理、例えば限界
電流密度前後或いはそれ以上の高電流密度で処理する所
謂ヤケ鍍金の場合、得られる処理面は外観および接着性
が均一で粉落ちのないものとなる。
In particular, in the case of cathodic treatment for the purpose of improving adhesion, such as so-called tan plating, which is performed at a high current density around or above the critical current density, the resulting treated surface has a uniform appearance and adhesion, and is free of powder drop-off. Become something.

本発明方法において使用される酸化剤としては、過硫酸
塩、過マンガン酸塩、過酸化物等がある。
Oxidizing agents used in the method of the invention include persulfates, permanganates, peroxides, and the like.

アルカリ源としては、苛性ソーダおよび苛性カリ、炭酸
ソーダ等の強アルカリ性のものが好適である。
As the alkali source, strongly alkaline sources such as caustic soda, caustic potash, and soda carbonate are suitable.

それぞれの濃度については、接触時間および浴の混度等
に左右されるので一義的に定められないが、酸化膜が銅
箔表面全体に適当な時間内に形成されるよう適宜選択す
ればよい。
The respective concentrations cannot be unambiguously determined as they depend on the contact time, bath mixture, etc., but may be appropriately selected so that an oxide film is formed over the entire surface of the copper foil within an appropriate time.

また、酸化剤とアルカリ源との特定の組合せによっても
それぞれの濃度が変ってくることは云うまでもない。
It goes without saying that the concentrations of the oxidizing agent and the alkali source vary depending on the specific combination of the oxidizing agent and the alkali source.

例えば、酸化剤として過硫酸カリそしてアルカリ剤とし
て苛性ソーダを用いた場合、最適濃度は過硫酸カリ10
g/l〜2 0g/lおよび苛性ソーダ5 g/l〜1
0g/lであり、そして最適処理条件は浴温度40〜6
0℃および処理時間30〜100秒である。
For example, when using potassium persulfate as the oxidizing agent and caustic soda as the alkaline agent, the optimum concentration is 10% potassium persulfate.
g/l~20g/l and caustic soda5 g/l~1
0 g/l, and the optimum treatment conditions are bath temperature 40-6
0°C and treatment time 30-100 seconds.

以下、本発明の一層の理解のために実施例を示す。Examples are shown below for further understanding of the present invention.

実施例 1 厚さ35μの圧延銅箔を過硫酸カリ20g/lおよび苛
性ソーダ10g/lを含む組成を有する45℃の水溶液
に60秒間浸漬した。
Example 1 A rolled copper foil with a thickness of 35 μm was immersed for 60 seconds in a 45° C. aqueous solution containing 20 g/l of potassium persulfate and 10 g/l of caustic soda.

水洗後、直ちに特公昭40−15327号に記載される
Immediately after washing with water, it is described in Japanese Patent Publication No. 40-15327.

銅イオンを含む酸性銅電鍍浴を用いて限界電流密度以上
の電流で陰極処理を施して、印刷回路用銅箔を得た。
A copper foil for printed circuits was obtained by cathodic treatment using an acidic copper electroplating bath containing copper ions at a current higher than the critical current density.

銅箔面の色むらはなくまた粉落ちもなかった。There was no color unevenness on the copper foil surface, and there was no powder falling off.

尚、粉落ち試験は市販セロテープを圧着しそして引剥し
た後セロテープに付着する粒子の量で判定した。
In addition, in the powder drop test, commercially available cellophane tape was pressed and then peeled off, and then judged based on the amount of particles that adhered to the cellophane tape.

実施例 2 厚さ35μの圧延銅箔を酸化剤として過酸化水素を20
g/lそしてアルカリ剤として苛性ソーダを10g/l
含む水溶液を使用したことを除いて例lと同様の処理を
施すことにより印刷回路用銅箔を得た。
Example 2 Hydrogen peroxide was added to a rolled copper foil with a thickness of 35 μm as an oxidizing agent at 20 μm.
g/l and 10 g/l of caustic soda as an alkali agent.
A copper foil for printed circuits was obtained by carrying out the same treatment as in Example 1 except that an aqueous solution containing the following was used.

銅箔面の色むらはなくまた粉落ちも認められなかった。There was no color unevenness on the copper foil surface, and no powder was observed to fall off.

実施例 3 厚さ35μの電解銅箔に例1と同じ処理を施して印刷回
路用銅箔を得た。
Example 3 An electrolytic copper foil having a thickness of 35 μm was subjected to the same treatment as in Example 1 to obtain a copper foil for printed circuits.

銅箔面の色むらおよび粉落ちはなく、満足すべき外観様
相を示した。
There was no color unevenness or powder falling on the copper foil surface, and a satisfactory appearance was exhibited.

比較試験 本発明方法の効果を確認する目的で、厚さ35μの電解
銅箔及び圧延銅箔を用いて本発明に従う予備処理を施さ
ず、直接特公昭40−15327号記載の方法で印刷回
路用銅箔を作製した。
Comparative Test For the purpose of confirming the effect of the method of the present invention, electrolytic copper foil and rolled copper foil with a thickness of 35 μm were used for printed circuits directly by the method described in Japanese Patent Publication No. 15327/1972 without any pretreatment according to the present invention. Copper foil was produced.

電解銅箔の場合、色むら及び粉落ちが若干認められた。In the case of electrolytic copper foil, some color unevenness and powder falling were observed.

また圧延銅箔の場合には、電解銅箔以上の色むら及び粉
落ちが認められた。
In addition, in the case of rolled copper foil, color unevenness and powder falling more than electrolytic copper foil were observed.

これから、本発明方法に従って作製された銅箔が色むら
及び粉落ちの点で従来方法によるものより遥かに秀れて
いることが確認された。
From this, it was confirmed that the copper foil produced according to the method of the present invention is far superior to the copper foil produced using the conventional method in terms of color unevenness and powder falling.

銅貼フイルムの性能比較試験 本発明方法により作製された銅箔を実際に基板に接着し
そしてエッチングした場合の特性を評価することも肝要
である。
Performance Comparison Test of Copper Laminated Film It is also important to evaluate the characteristics when the copper foil produced by the method of the present invention is actually adhered to a substrate and etched.

そこで、実施例1〜3で得られた銅箔及び比較試験にお
いて作製した銅箔に、ポリイミドフイルム(商品名キャ
プトン)にエポキシ系接着剤を塗布してなる基板フイル
ムを重ねそして加熱圧着することにより印刷回路用鋼貼
フイルムを作製した。
Therefore, a substrate film made of a polyimide film (trade name Capton) coated with an epoxy adhesive was layered on the copper foils obtained in Examples 1 to 3 and the copper foil produced in the comparative test, and then heat-pressed. A steel-clad film for printed circuits was produced.

これら5種類の銅貼フイルムの剥離強度(ビール強度)
及びエッチング後ノ残留物の有無について調べた。
Peel strength (beer strength) of these five types of copper-clad films
The presence or absence of residue after etching was also investigated.

剥離試験は、JISC−6481(180°方向)指定
の方法で10cm間の最大及び最小剥離強度を求めた。
In the peel test, the maximum and minimum peel strengths over 10 cm were determined by the method specified in JISC-6481 (180° direction).

得られた結果を次の表1にまとめて示す。The results obtained are summarized in Table 1 below.

銅貼フイルム作製 W← エッチング後のに使
用した銅箔 残留物実
施例l
無1.55 1.47 u 2 1.50 1.40無 tt 3 1.75 1.70無 比較試験電解箔 1.60 1.30
若干有比較試験圧延箔 1.05
0.75 有この表から、本発明方法
により作られた銅箔を使用した銅貼フイルムが、きわめ
て高水準の剥離強度を示すと共に、もし存在すれば銅貼
フイルムの電気特性に悪影響を及ぼすエッチング後の残
留物も見られないことが明らかである。
Copper-plated film production W← Copper foil used after etching Residue Example 1
No 1.55 1.47 u 2 1.50 1.40 No tt 3 1.75 1.70 No comparison test electrolytic foil 1.60 1.30
Some comparison test rolled foil 1.05
0.75 Yes From this table, it can be seen that the copper-clad film using the copper foil made by the method of the present invention exhibits an extremely high level of peel strength and, if present, has no etching effect that would adversely affect the electrical properties of the copper-clad film. It is clear that no residual residue is observed.

実施例 4 厚さ35μの圧延銅箔を本発明方法に従って処理した。Example 4 A rolled copper foil having a thickness of 35 microns was treated according to the method of the invention.

予備処理は、実施例1に示した電解処理前の本発明の方
法に従って行った。
Pretreatment was carried out according to the method of the present invention as shown in Example 1 before electrolytic treatment.

その後、H2SO4 200g/l及びCuSO4・5
H2O40g/lを含む電解浴を用いて陽極電流密度4
00A/m2及び処理時間60秒の条件下で陽極処理(
陽極エッチング)を行った。
After that, H2SO4 200g/l and CuSO4.5
An anode current density of 4 using an electrolytic bath containing 40 g/l of H2O
Anodizing (
anodic etching).

併せて、比較目的の為に同厚の圧延銅箔に予備処理を行
わずに上記陽極処理のみを行った。
In addition, for comparison purposes, rolled copper foils of the same thickness were subjected to only the above-mentioned anodic treatment without any preliminary treatment.

両者の場合の得られた銅箔面の光沢及び色むらを比較し
た結果を次の表2に示す。
The results of comparing the gloss and color unevenness of the copper foil surfaces obtained in both cases are shown in Table 2 below.

表 2 本発明に従う処理 陽極処理のみを を施した銅箔 行った銅箔 色むら 無 有(斑点状のむらが多い) 光 沢 全面均一なにぶい 一部金属光沢が光沢
ありむらが多い
Table 2 Treatment according to the present invention Copper foil subjected only to anodization Copper foil color unevenness No Yes (many spot-like unevenness) Gloss Uniform dullness over the entire surface Some parts are glossy with metallic luster
There are many irregularities

Claims (1)

【特許請求の範囲】[Claims] 1 銅箔に印刷回路用銅箔としての特性を賦与する為の
電解処理工程に先立って行われる表面処理方法であって
、銅箔面を過硫酸塩、過マンガン酸塩及び過酸化物から
成る群から選択される酸化剤を含むアルカリ性水溶液と
接触させることを特徴とする前記印刷回路用銅箔を表面
処理する方法。
1 A surface treatment method carried out prior to the electrolytic treatment process to impart properties to copper foil as copper foil for printed circuits, in which the surface of the copper foil is treated with persulfate, permanganate, and peroxide. A method for surface treating the copper foil for printed circuits, characterized in that the copper foil for printed circuits is brought into contact with an alkaline aqueous solution containing an oxidizing agent selected from the group consisting of:
JP50147460A 1975-12-12 1975-12-12 Insatsu Kairo Youdou Hakuo Hiyou Menshiyo Risuru Hohou Expired JPS586800B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50147460A JPS586800B2 (en) 1975-12-12 1975-12-12 Insatsu Kairo Youdou Hakuo Hiyou Menshiyo Risuru Hohou

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50147460A JPS586800B2 (en) 1975-12-12 1975-12-12 Insatsu Kairo Youdou Hakuo Hiyou Menshiyo Risuru Hohou

Publications (2)

Publication Number Publication Date
JPS5271348A JPS5271348A (en) 1977-06-14
JPS586800B2 true JPS586800B2 (en) 1983-02-07

Family

ID=15430857

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50147460A Expired JPS586800B2 (en) 1975-12-12 1975-12-12 Insatsu Kairo Youdou Hakuo Hiyou Menshiyo Risuru Hohou

Country Status (1)

Country Link
JP (1) JPS586800B2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0654834B2 (en) * 1989-05-22 1994-07-20 松下電工株式会社 Method for manufacturing multilayer wiring board
CN1865366B (en) * 2005-05-16 2010-12-15 3M创新有限公司 Method and composition for improving adhesion of organic polymer coating to copper surface
KR20220006035A (en) * 2019-05-09 2022-01-14 나믹스 가부시끼가이샤 Composite copper member
JP7409602B2 (en) * 2019-05-09 2024-01-09 ナミックス株式会社 composite copper parts
JP7456578B2 (en) * 2019-05-09 2024-03-27 ナミックス株式会社 Copper surface processing equipment
JP7456579B2 (en) * 2019-05-09 2024-03-27 ナミックス株式会社 Method for manufacturing a metal member having a metal layer
JP7352939B2 (en) * 2019-05-09 2023-09-29 ナミックス株式会社 composite copper parts

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4826587A (en) * 1971-07-21 1973-04-07

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4826587A (en) * 1971-07-21 1973-04-07

Also Published As

Publication number Publication date
JPS5271348A (en) 1977-06-14

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