JPS5864022A - プラズマ気相装置 - Google Patents

プラズマ気相装置

Info

Publication number
JPS5864022A
JPS5864022A JP56163626A JP16362681A JPS5864022A JP S5864022 A JPS5864022 A JP S5864022A JP 56163626 A JP56163626 A JP 56163626A JP 16362681 A JP16362681 A JP 16362681A JP S5864022 A JPS5864022 A JP S5864022A
Authority
JP
Japan
Prior art keywords
electrodes
reactive gas
reaction
substrates
reaction cylinder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56163626A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0332210B2 (Direct
Inventor
Shunpei Yamazaki
舜平 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP56163626A priority Critical patent/JPS5864022A/ja
Publication of JPS5864022A publication Critical patent/JPS5864022A/ja
Publication of JPH0332210B2 publication Critical patent/JPH0332210B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/3408—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • H10P14/24—
    • H10P14/3411—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Photovoltaic Devices (AREA)
JP56163626A 1981-10-14 1981-10-14 プラズマ気相装置 Granted JPS5864022A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56163626A JPS5864022A (ja) 1981-10-14 1981-10-14 プラズマ気相装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56163626A JPS5864022A (ja) 1981-10-14 1981-10-14 プラズマ気相装置

Publications (2)

Publication Number Publication Date
JPS5864022A true JPS5864022A (ja) 1983-04-16
JPH0332210B2 JPH0332210B2 (Direct) 1991-05-10

Family

ID=15777501

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56163626A Granted JPS5864022A (ja) 1981-10-14 1981-10-14 プラズマ気相装置

Country Status (1)

Country Link
JP (1) JPS5864022A (Direct)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2902457B1 (en) 2012-09-25 2018-11-14 NOK Corporation Coating agent composition

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5580368U (Direct) * 1978-11-30 1980-06-03
JPS55169855U (Direct) * 1979-05-24 1980-12-05

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5580368U (Direct) * 1978-11-30 1980-06-03
JPS55169855U (Direct) * 1979-05-24 1980-12-05

Also Published As

Publication number Publication date
JPH0332210B2 (Direct) 1991-05-10

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