JPS583970U - Resist coating equipment - Google Patents

Resist coating equipment

Info

Publication number
JPS583970U
JPS583970U JP9414681U JP9414681U JPS583970U JP S583970 U JPS583970 U JP S583970U JP 9414681 U JP9414681 U JP 9414681U JP 9414681 U JP9414681 U JP 9414681U JP S583970 U JPS583970 U JP S583970U
Authority
JP
Japan
Prior art keywords
resist
substrate
mounting table
onto
resist coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9414681U
Other languages
Japanese (ja)
Inventor
宮崎 誠二
Original Assignee
三洋電機株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 三洋電機株式会社 filed Critical 三洋電機株式会社
Priority to JP9414681U priority Critical patent/JPS583970U/en
Publication of JPS583970U publication Critical patent/JPS583970U/en
Pending legal-status Critical Current

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  • Coating Apparatus (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本考案しピスト塗布装置の斜視図、第2図は
本考案装置で基板上にレジストを滴下したと柔ろを示す
状態図である。 1・・・中央ノズル、2・・・中央ノズルアーム、3・
・・周辺ノズル、5・・・モータ、6. 6. 6・・
・チューブ。
FIG. 1 is a perspective view of the piston coating device of the present invention, and FIG. 2 is a state diagram showing how the resist is applied onto a substrate by the device of the present invention. 1... Central nozzle, 2... Central nozzle arm, 3...
... Peripheral nozzle, 5... Motor, 6. 6. 6...
·tube.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 一  レジストが塗布される基板を載置して回転する載
置台と、レジストを載置台上の基板の中央部に滴下する
中央ノズルと、基板の周辺部にレジストを滴下する周辺
ノズルと、から成り、レジスト塗布時に、基板の中心部
と周辺部とに夫々レジストを滴下させると共に基板を載
置台と一緒に回転させて各ノズルから滴下されたレジス
トを基板表面に広げ、均一な膜厚のレジスト膜を形成す
る事を特徴としたレジスト塗布装置。
(1) Consisting of a rotating mounting table on which a substrate to be coated with resist is placed, a central nozzle that drips resist onto the center of the substrate on the mounting table, and a peripheral nozzle that drips resist onto the periphery of the substrate. During resist application, resist is dripped onto the center and periphery of the substrate, and the substrate is rotated together with the mounting table to spread the resist dripped from each nozzle over the substrate surface, creating a resist film with a uniform thickness. A resist coating device characterized by forming.
JP9414681U 1981-06-24 1981-06-24 Resist coating equipment Pending JPS583970U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9414681U JPS583970U (en) 1981-06-24 1981-06-24 Resist coating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9414681U JPS583970U (en) 1981-06-24 1981-06-24 Resist coating equipment

Publications (1)

Publication Number Publication Date
JPS583970U true JPS583970U (en) 1983-01-11

Family

ID=29889083

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9414681U Pending JPS583970U (en) 1981-06-24 1981-06-24 Resist coating equipment

Country Status (1)

Country Link
JP (1) JPS583970U (en)

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