JPS5833850A - Gate device of valve structure for conveying article between atmosphere and vacuum - Google Patents

Gate device of valve structure for conveying article between atmosphere and vacuum

Info

Publication number
JPS5833850A
JPS5833850A JP13148581A JP13148581A JPS5833850A JP S5833850 A JPS5833850 A JP S5833850A JP 13148581 A JP13148581 A JP 13148581A JP 13148581 A JP13148581 A JP 13148581A JP S5833850 A JPS5833850 A JP S5833850A
Authority
JP
Japan
Prior art keywords
article
vacuum
casing
atmosphere
valve body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13148581A
Other languages
Japanese (ja)
Other versions
JPS6142787B2 (en
Inventor
Koyo Tsuchiya
土谷 高陽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Nihon Shinku Gijutsu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc, Nihon Shinku Gijutsu KK filed Critical Ulvac Inc
Priority to JP13148581A priority Critical patent/JPS5833850A/en
Publication of JPS5833850A publication Critical patent/JPS5833850A/en
Publication of JPS6142787B2 publication Critical patent/JPS6142787B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67751Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To enhance the conveying efficiency of a valve structure by evacuating a space surrounded by upper and lower valve bodies in vacuum when the bodies are hermetically sealed to a seat plate and enabling to introduce atmospheric air to the space, thereby shortening the time required to evacuate the space. CONSTITUTION:A lower article vestivule 27 communicates with a vacuum side and an upper article vestivule 28 communicates with an atmosphere side. A lower assembly 14 is disposed at the lowered position. An article is placed on an article support 19. The assembly 14 is raised, a lower valve body 17 is hermetically engaged with a seat plate 4, and the upper surface of the support 19 is let to slightly upper position from a through hole 5. Atmospheric air is led through an exhaust passage 13 to a space of the hole 5 hermetically enclosed by the plate 4, and the upper and lower valve bodies 8 and 17. The valve body 8 is raised and is upwardly isolated from the plate 4. The article is carried out from the support 19 to the atmosphere.

Description

【発明の詳細な説明】 この発明は大気と真空の閲て物品を搬送するための弁構
造のゲート装置に関する。この発明のゲート装置は特に
ウェファなどの平板状の物品すなわち基板の搬送に適す
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a valve structure gate device for conveying articles through atmosphere and vacuum. The gate device of the present invention is particularly suitable for transporting flat articles such as wafers, that is, substrates.

一般に高能率て高品質の真空表面処理をおこなうために
基板を手遅、絖的に真空中に搬入、搬出する方法が採ら
れる。この際真空槽を多室構造とし、第1室及び最終室
を大気−真空の置換を行なう室として形成するととがお
ζなわれる。
Generally, in order to perform high-efficiency and high-quality vacuum surface treatment, a method is used in which the substrate is slowly and slowly brought into and taken out of the vacuum. In this case, the vacuum chamber is formed into a multi-chamber structure, with the first chamber and the final chamber being formed as chambers for replacing air with vacuum.

この大気−真空の置換室では当然に真空ゲートを必要と
し、例えば大気から真空への搬送では物品を真空ゲート
の中へ搬入し、その搬入口を閉じたのちに真空ゲートの
中を真空に排気し、次いで真空槽と真空ゲートの間の連
結口を開いて物品を真空ゲート内から真空槽に搬入する
ような方法が採られ為。
This atmosphere-vacuum exchange chamber naturally requires a vacuum gate. For example, when transporting from the atmosphere to a vacuum, the article is carried into the vacuum gate, and after closing the entrance, the inside of the vacuum gate is evacuated. However, a method is adopted in which the connection port between the vacuum chamber and the vacuum gate is then opened and the article is carried into the vacuum chamber from inside the vacuum gate.

従来のこれら置換室では 1)@級に2個の真空ダートを喪する、2)置換室自身
及びゲートの空間が大きく排気時間が長かくなる、 S)その室内に個有の搬送系を要する、などの欠点が存
する。またこれらを考慮してゲーF弁自身に大気−真空
の置換機能を持たせ九万式も提案されているが、これも
基板の搬送に基板の自重による滑夛動作を利用している
ため、l)送〉動作が基板の条件に微妙に影響し再現性
に乏し−、 2)基板にチッピングや割れの発生の可能性がある1、
In these conventional exchange chambers, 1) two vacuum darts are missing in the @ class, 2) the exchange chamber itself and the gate have a large space, which increases the evacuation time, and S) the chamber requires its own transport system. There are drawbacks such as. In addition, taking these into consideration, the 90,000 type has been proposed, in which the Ge F valve itself has an air-vacuum replacement function, but since this also uses the sliding action of the board's own weight to transport the board, l) The feeding operation subtly affects the conditions of the board, resulting in poor reproducibility, and 2) There is a possibility of chipping or cracking of the board.
.

3)真空槽内の基板o*y渡し機構及び次の機構部への
基板の受は渡し機構が複雑な場合が多く、汎用性に乏し
い、 などの欠点を有する。
3) The transfer mechanism of the substrate o*y in the vacuum chamber and the transfer of the substrate to the next mechanism section is often complicated and has drawbacks such as lack of versatility.

故にこの発明はこのような従来の欠点を除去した大気と
真空の閣で物品を搬送するための装置をこの目的の達成
のため、この発明のゲート装置は、ケーシングの内部O
これと一体の水平な座板、座板の中央部分に形成された
貫通孔、下向き周縁を有しケーシング内で上下運動てき
るようにケーシングに取付社られかつ下降位置において
周縁が貫通孔のまわシで座板の上面に気密係合するよう
になる上方弁体、ケーシング内で上下運動できるように
管状軸によってケーシングに取付けられかつ上昇位置に
おいて貫通孔のまわりで座板の下面に気密係合するよう
になる下方弁体、管状軸の中を貫通する垂直軸によって
ケーシング内で上下運動できるように管状軸に取付けら
れかつ上昇位置において上面が貫通孔よシやや上方に位
置するようになる物品支持体、並びに座板の上方および
下方にかいてケーシングにそれぞれ形成場れた上方およ
び下方の物品出入口を有し、さらに上方弁体および下方
弁体が座仮に気密係合したときにこれらで囲まれる空間
が真空に排気できまたとれに大気が導入できることを特
徴とする。
Therefore, the present invention provides a device for conveying articles in an atmosphere and vacuum chamber which eliminates such conventional drawbacks.
It is attached to the casing so that it can move up and down within the casing, and has a through hole formed in the center of the seat plate and a downwardly directed peripheral edge. an upper valve body which is attached to the casing by a tubular shaft for vertical movement within the casing and which in the raised position comes into air-tight engagement with the bottom surface of the seat plate around the through hole; a lower valve body which is attached to the tubular shaft so as to be movable up and down within the casing by means of a vertical shaft passing through the tubular shaft, and whose upper surface in the raised position is located slightly above the through hole; The support body has upper and lower article entrances formed in the casing above and below the seat plate, respectively, and further enclosed by the upper and lower valve bodies when the seats are in airtight engagement. It is characterized by the fact that the space in which it is placed can be evacuated to a vacuum and the atmosphere can be introduced.

以下図画を参照しながらこの発明の実施例について詳述
する。
Embodiments of the present invention will be described in detail below with reference to the drawings.

第1図から第3図に示される実施例において、弁構造の
II−)装置は水平断面が正方形゛のケーシングlを有
し、このケーシングlの内部にはこれのすべての垂直壁
すなわち−amコ、後壁Jおよび両1111tc一体に
固着された水平延長の比較的厚い座板参が配置される。
In the embodiment shown in FIGS. 1 to 3, the device of valve structure II-) has a casing l of square horizontal cross section, inside which all vertical walls -am A relatively thick horizontally extending seat plate is arranged integrally with the rear wall J and both 1111tc.

座板ダはその中央部分にこれを上下に貫通する円形の貫
通孔5を有する。
The seat plate has a circular through hole 5 in its central portion that passes through it vertically.

ケーシング10上pHの中央を111mに昇降可能に貫
通する上方軸7の下端には、水平円板状の上方弁体tが
固定取付けされ、これは下向き延長の一縁tを有する0
周縁ツの下端mには貫通孔Sよ如直径の太きill状の
パツキン10が取付けられ、従って上方軸りが下降した
ときには周縁デが/ぞツキン10の作用によって貫通孔
Sのまわシで座板ダの上面に気密係合する。上ll基の
上方Wcj?いて上方軸7にk1m!/ピストン−シリ
ンダ系llの円板状ピストン1/&が固定され、これは
上壁6に固定されたシリンダtibの中を上方軸りの軸
線方向にすなわち垂直に移動できる。この構成によれば
シリンダ/2b内の空間にこれに穿設された流体開口/
コaまたはlコ)を介して外部から圧力流体を出入させ
ることによって上方軸りおよび上方弁体lは上下運動で
きる。
A horizontal disc-shaped upper valve body t is fixedly attached to the lower end of the upper shaft 7 which passes through the center of the upper pH of the casing 10 so as to be able to rise and fall to 111 m.
An ill-shaped gasket 10 having a diameter similar to that of the through hole S is attached to the lower end m of the peripheral edge, so that when the upper shaft is lowered, the peripheral edge is rotated around the through hole S by the action of the gasket 10. Airtightly engages the upper surface of the seat plate. Upper Wcj of upper ll group? K1m on the upper axis 7! A disk-shaped piston 1/& of a piston-cylinder system 11 is fixed, which is movable in the axial direction of the upper axis, ie vertically, in a cylinder tib fixed to the upper wall 6. According to this configuration, the fluid opening/
The upper shaft and the upper valve body l can be moved up and down by supplying pressure fluid in and out from the outside via the core (a or l).

上方軸7を貫通し上方弁体Sの下面で開く排気通路13
は後述する目的のため真空ポンプのような真空源(図示
なし)に連結できまえ大気に連結できる。
Exhaust passage 13 that passes through the upper shaft 7 and opens at the lower surface of the upper valve body S
can be connected to a vacuum source (not shown), such as a vacuum pump, and can be connected to atmosphere for purposes described below.

総括的に符号lダで示される下方組立体は、ケーシング
lの下壁/jの中央を昇降可能に垂直に気密貫通する管
状軸14、これの上端に固定され九円板状の下方弁体/
1、管状軸l&の下端に固定された端@/AsL、下方
弁体lクシよび端板/Amの中央を昇降可能に気密貫通
しかつ管状軸14の中を延長する垂直軸it、並びKf
ii−直軸itの上端に固定された円盤状の物品支持体
11をその主11!構成要素とする。
The lower assembly, generally designated by the symbol lda, includes a tubular shaft 14 that vertically and airtightly passes through the center of the lower wall of the casing l in an airtight manner so as to be able to rise and fall; /
1. An end @/AsL fixed to the lower end of the tubular shaft l&, a vertical shaft it passing airtightly through the center of the lower valve body l comb and the end plate/Am in a vertically movable manner and extending inside the tubular shaft 14, and an alignment Kf.
ii--A disk-shaped article support 11 fixed to the upper end of the vertical axis it, its main 11! be a constituent element.

下J!I/jKは第コピストン・シリンダ系コ0のシリ
ンダーθ&が固定され、管状軸16に固定された円板#
OピストンコObはシリンダ201の中で垂I[に移動
できる。よってシリンダコ011LrC設妙られた流体
開口2/aまたはコ/bを介して外部からシリンダ2コ
a内の空間に圧力流体を出入させることによって下方弁
体l?は昇降できる。
Lower J! I/jK is a disk # fixed to the tubular shaft 16 to which the cylinder θ & of the co-piston-cylinder system Co0 is fixed.
The O piston ob can move vertically in the cylinder 201. Therefore, by allowing pressure fluid to enter and exit from the outside into the space inside the cylinder 2 core a through the fluid opening 2/a or 2/b provided in the cylinder core 011LrC, the lower valve body l? can go up and down.

さらにシリンダコQ&の下面には第3ピストン・シリン
ダ系2コのシリンダコ2aが固定され、垂*@Itの下
端に同定された円板状のピストンコubtjシリンダコ
コaの中で垂直に移動できる。
Further, the cylinder 2a of the two third piston/cylinder systems is fixed to the lower surface of the cylinder Q&, and can be vertically moved within the disk-shaped piston ubtj cylinder koko a identified at the lower end of the vertical *@It.

従ってシリンダ22aK設けられた流体開ロコ3aまた
はコ3bを介して外部からシリンダ2コa内の空間に圧
力流体を出入させることによって物品支持体19は昇降
できる0両ピストン−シリンダ系コOおよびコ2は場合
によっては物品支持体lデと下方弁体lりが連動して昇
降するように連携できる。
Therefore, the article support 19 can be moved up and down by introducing and discharging pressure fluid from the outside into the space inside the cylinder 2 core a through the fluid opening loco 3a or 3b provided in the cylinder 22aK. 2 may cooperate so that the article support 1 and the lower valve body 1 move up and down in conjunction with each other.

下方弁体17の上面には貫通孔Sよシ直径の大きい環状
の2ツキンコダが取付けられ、従って下方弁体17は上
昇したときにパッキンコダの作用によって貫通孔Sのま
わシで座板ダの下面に気密保合する。まえ物品支持体/
lが上昇したときにこれの上面が貫通孔Sを通ってこれ
からやや上方に出るように、垂直軸isの行程長をよび
円板状ピストン2コbの位置は決定される。
Two annular seals with a diameter larger than that of the through hole S are attached to the upper surface of the lower valve body 17. Therefore, when the lower valve body 17 rises, the lower valve body 17 is rotated by the through hole S by the action of the packing rod, and is attached to the lower surface of the seat plate. Maintain airtightness. Front article support/
The position of the disc-shaped piston 2b is determined by the stroke length of the vertical axis is so that when l rises, its upper surface passes through the through hole S and comes out slightly above.

下方組立体l参はさらに、垂直軸/1を包囲し物品支持
体lツの下面と下方弁体/7の上7jiJKロー付され
た第1ベロー25.並びに管状軸16を包Hし下方弁体
17の下面と下hisの上面にロー何秒された第2ベロ
ーコロを備える。
The lower assembly further includes a first bellows 25. which surrounds the vertical axis /1 and is soldered to the lower surface of the article support and the upper part of the lower valve body /7. In addition, a second bellows roller is provided which surrounds the tubular shaft 16 and is arranged on the lower surface of the lower valve body 17 and the upper surface of the lower valve body.

ケーシングlのぎり壁二には座板ダの直下に下方物品出
入口コ7が形成され、抜11J KFi座&ダの直上に
上方物品出入口コtが形成される。
A lower article inlet/outlet 7 is formed in the slot wall 2 of the casing 1 just below the seat plate 2, and an upper article inlet/outlet 7 is formed just above the seat 11JKFi seat &da.

円盤状の物品支持体19Fi左右に弓形の上面部分ユタ
および30を残して前後方向に延長する比較的深い$3
/を有する(第3図も参照)、その目的は後段で明らか
にする。
Disc-shaped article support 19Fi Relatively deep $3 extending in the front and back direction leaving arch-shaped upper surface portions 19 and 30 on the left and right sides
/ (see also Figure 3), the purpose of which will be made clear later.

上述したような構成の弁構造のダートは11種に作動で
きる。その例について説明すれば、下方物品出入ローフ
が真空側に連通し上方物品出入口コtが大気側に連通し
ている場合に物品の搬送を行なわな−ときには、上方弁
体lが第1図に示さ/ れるように下降位置に位置して座f4cに密閉係合する
。従って真空鉤と大気@は気相遮断される。
The dart with the valve structure as described above can operate in 11 different ways. To explain this example, when the lower article inlet/outlet loaf communicates with the vacuum side and the upper article inlet/outlet port t communicates with the atmosphere side, when articles are not conveyed, the upper valve body l is As shown, it is in the lowered position and sealingly engages the seat f4c. Therefore, the vacuum hook and the atmosphere are separated from each other in the gas phase.

真空側から大気側へ物品を搬出する場谷には上方弁体t
が側板弘に気密係合した状態で下方組立体lダ(下方弁
体17および物品支持体/?)が第1図に示されるよう
に下降位置にされる1次いで、例えば可動ドリー32お
よびこれに搭載されたベルトコン(ヤ33を有する物品
搬送A、7*の突出端3Sが大気側から下方物品出入口
24!を通って物品支持体/9の溝31の中へ突入させ
られ次いて物品支持A/デが−僅かに上昇されて、よっ
て物品搬送具341Kよって真空側から運ばれた平板状
の物品例えばウェファ36は物品支持体lりの上面部分
コデ、30に載るようになる。この際のウェファ36の
位置は183図に示すようになる0次ぎに物品搬送具3
ダ4IKその突出端3!fが真空側に後退したのちに下
方組立体l#が上昇させられて、第2図に示すように下
方弁体lりが座板ダに気密係合し物品支持体l?の上面
が貫通孔Sからやや上方に出るようになる。この下方組
立体/4Iの上昇は上方弁体tを座板参に気密係合させ
た状態で達成できる0次いで座1/jL亭、上方弁体t
および下方弁体17で気密包囲された貫通孔Sのところ
の空間に排気通路13を介して大気が導入される。大気
導入が完了したのちに上方弁体tが第2図に示されるよ
うに上昇させられて座&ダから上方に離れる。このとき
に下方弁体17が座1fjLダに気密係合しているので
、下方物品出入ロックに連通する真空側の雰囲気が害さ
れることはない8次いでウェファ36を支持する物品支
持体l?が最上方に持上けられたのちに突出棒37のよ
うな物品搬送具3tが大気側から上方物品出入口コgを
通って物品支持体19の溝31の中に突入させられる0
次いで物品支持体lデがやや下降されてこれで支持され
ていた物品36は物品搬送具33に引渡される。次いで
物品搬送具3gを大気翻へ引出すことKよシ物品34F
i大気中に運び去ることができる。
There is an upper valve body t in the place where articles are transported from the vacuum side to the atmosphere side.
The lower assembly (lower valve body 17 and article support/?) is then brought into the lowered position as shown in FIG. The protruding end 3S of the article conveyor A, 7* mounted on the belt conveyor (having a roller 33) is thrust into the groove 31 of the article supporter/9 from the atmosphere side through the lower article entrance/exit 24!, and then the article support A/D is slightly raised, so that a flat article such as a wafer 36 carried from the vacuum side by the article carrier 341K comes to rest on the upper surface portion 30 of the article support 1. At this time, The position of the wafer 36 is as shown in FIG.
Da 4IK its protruding end 3! After the valve f has retreated to the vacuum side, the lower assembly l# is raised, and the lower valve body l# is hermetically engaged with the seat plate da as shown in FIG. The upper surface of the through hole S comes to protrude slightly upward. This raising of the lower assembly/4I can be accomplished with the upper valve body t in airtight engagement with the seat plate.
Atmospheric air is introduced into the space at the through hole S, which is hermetically surrounded by the lower valve body 17, through the exhaust passage 13. After the introduction of the atmosphere is completed, the upper valve body t is raised as shown in FIG. 2 and separated upward from the seat and da. At this time, since the lower valve body 17 is in airtight engagement with the seat 1fjLda, the atmosphere on the vacuum side communicating with the lower article loading/unloading lock is not impaired. After the article is lifted to the uppermost position, an article carrier 3t such as a protruding rod 37 is thrust into the groove 31 of the article support 19 from the atmosphere side through the upper article inlet/outlet g.
Next, the article support 1 is lowered slightly, and the article 36 supported by it is transferred to the article conveyor 33. Next, pull out the article carrier 3g to the atmosphere and move the article 34F.
i can be carried away into the atmosphere.

次ぎにIjJ様の作業を繰返す場合には下方弁体lフを
座@参に気密保合嘔せたままで上方弁体jが座板参に気
密係合させられ、次いで上方弁体11下方弁体17およ
び座[弘で囲まれた空間が排気通路13を介して真空に
排気される。その後に下方組立体l参を第1図の位置に
下降させれば、真空側の真空を全くそζなうことなしに
第1図の位置への戻)作動が達成される。
Next, when repeating the work of Mr. IjJ, the upper valve body j is airtightly engaged with the seat plate with the lower valve body 1 kept in airtight alignment with the seat plate, and then the upper valve body 11 and the lower valve The space surrounded by the body 17 and the seat is evacuated to a vacuum via the exhaust passage 13. If the lower assembly is then lowered to the position shown in FIG. 1, operation back to the position shown in FIG. 1 is accomplished without any loss of vacuum on the vacuum side.

実質上上述したと逆の手順で、上方物品出入口コlを大
気側に連通させ下方物品出入口λ7を真空側に連通させ
て大気側から真空側へ物品を搬送することもできる。こ
の場合にも搬送は真空側の雰囲気をそこなうことなしに
達成できる。
By substantially reversing the procedure described above, it is also possible to convey the article from the atmosphere side to the vacuum side by communicating the upper article inlet/outlet col to the atmosphere side and communicating the lower article inlet/outlet λ7 to the vacuum side. In this case as well, transportation can be achieved without damaging the atmosphere on the vacuum side.

さらに物品J4は真空側の雰囲気をそこなうことなしに
上方物品出入ロコtK連通する真空側から下方物品出入
口コツに連通する大気側へ搬送すること亀できる。その
場合には上114と上方弁体tの間に第Jイロー39が
ロー付けされ、第コベローコ4#i省略できる。
Furthermore, the article J4 can be transported from the vacuum side communicating with the upper article inlet/outlet tK to the atmosphere side communicating with the lower article inlet/outlet tK without damaging the atmosphere on the vacuum side. In that case, the J-th arrow 39 is soldered between the upper valve body t and the upper valve body t, and the J-th arrow 4#i can be omitted.

この発明の弁構造のゲー)は、上述したように構成され
作動するので、物品の自重を利用しないから複雑な送シ
案内機構が必要でなく、物品の搬送が上下運動する物品
支持体lデとこれに関連する物品搬送具3ダ、3Kによ
って達成されるので搬送が確実てあ)、搬送のために排
気を要する空間が座板ダとこれに気密係合する上方弁体
tおよび下方弁体17とで囲まれた極めてせまい空間で
あるので排気に要する時間が短く搬送の効率が高いなど
の長所を有する。
Since the valve structure game of the present invention is constructed and operated as described above, it does not utilize the weight of the article itself, so there is no need for a complicated conveyance guide mechanism, and the article support l device that moves up and down allows the conveyance of the article. The space that needs to be evacuated for transportation is achieved by the associated article conveyance tools 3 and 3K, so that the space that needs to be evacuated is covered by a seat plate, an upper valve body t that airtightly engages therewith, and a lower valve. Since it is an extremely narrow space surrounded by the body 17, it has the advantage that the time required for evacuation is short and the efficiency of conveyance is high.

【図面の簡単な説明】[Brief explanation of drawings]

第1図シよび第2図は2つの相異なる作動段階における
この発明のゲートの実施例の図解的垂直断面図、第3図
は第1図および第2図のゲートに包含される物品支持体
を上方から見た図である。 図面(おいて、lはケーシング、1IFi座板、Sは貫
通孔、tFi上方弁体、13は真空に排気するための通
路、lダは下方組立体、t b i;を管状軸、/7F
i下方弁体、llは垂直軸、/9Fi物品支持体、λり
は下方物品出入口、コlFi上方物品出入口を示す。
1 and 2 are schematic vertical cross-sectional views of an embodiment of the gate of the invention in two different stages of operation, and FIG. 3 shows an article support contained in the gate of FIGS. 1 and 2. It is a view seen from above. In the drawings, l is the casing, 1IFi seat plate, S is the through hole, tFi upper valve body, 13 is the passage for evacuation, lda is the lower assembly, tb i; is the tubular shaft, /7F
i is the lower valve body, 11 is the vertical axis, /9 Fi is the article support, λ is the lower article inlet/outlet, and col is the upper article inlet/outlet.

Claims (1)

【特許請求の範囲】[Claims] ケーシングの内部のこれと一体の水平な座板、座1i0
中央部分に形成された貫通孔、下向き周縁を有しケーシ
ング内で上下運動できるようにケーシングK11l付け
られかつ下降位置において周縁が貫通孔のまわシで座板
の上1iiK気密係合するようになる上方弁体、ケーシ
ング内て上下運動できるように管状軸によってケーシン
グに取付妙られかつ上昇位置に$Pvhて貫通孔のまわ
夛で座板の下面に気密係合するようになる下方弁体、管
状軸の中を貫通する!11I軸によってケーシング内で
上下運動できるよう都管状軸に亀付けられかつ上昇位置
にお−て上面が貫通孔よシやや上方に位置するようにな
る物品支持体、並びに座板の上方および下方においてケ
ーシングにそれぞれ形成された上方および下方の物品出
入口を有し、さらに上方弁体および下方弁体が座板に気
密係合したときにこれらでmすれる9関が真空に排気で
きまたこれに大気が導入できることを特徴とする大気と
真空の間で物品を搬送するための弁構造のゲート装置。
An integrated horizontal seat plate inside the casing, seat 1i0
The casing K11l is attached to a through hole formed in the center part and has a downward peripheral edge so that it can be moved up and down within the casing, and in the lowered position, the peripheral edge is airtightly engaged with the seat plate 1iiK by the rotation of the through hole. The upper valve body is attached to the casing by a tubular shaft so as to be able to move up and down within the casing, and the lower valve body, which is tubular in shape, is brought into airtight engagement with the lower surface of the seat plate by means of a through hole in the raised position. Penetrate through the shaft! The article support is attached to the tubular shaft so as to be able to move up and down within the casing by means of the 11I shaft, and whose upper surface is located slightly above the through hole in the raised position, and above and below the seat plate. The casing has an upper and a lower article inlet/outlet, respectively, and when the upper valve element and the lower valve element are in airtight engagement with the seat plate, the nine valves that come into contact with these can be evacuated to a vacuum, and can be vented to the atmosphere. A gate device having a valve structure for conveying articles between atmosphere and vacuum, characterized in that a gate device can be introduced.
JP13148581A 1981-08-24 1981-08-24 Gate device of valve structure for conveying article between atmosphere and vacuum Granted JPS5833850A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13148581A JPS5833850A (en) 1981-08-24 1981-08-24 Gate device of valve structure for conveying article between atmosphere and vacuum

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13148581A JPS5833850A (en) 1981-08-24 1981-08-24 Gate device of valve structure for conveying article between atmosphere and vacuum

Publications (2)

Publication Number Publication Date
JPS5833850A true JPS5833850A (en) 1983-02-28
JPS6142787B2 JPS6142787B2 (en) 1986-09-24

Family

ID=15059079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13148581A Granted JPS5833850A (en) 1981-08-24 1981-08-24 Gate device of valve structure for conveying article between atmosphere and vacuum

Country Status (1)

Country Link
JP (1) JPS5833850A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51115290A (en) * 1975-03-10 1976-10-09 Signetics Corp Vacuum spattering process and the apparatus thereof

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51115290A (en) * 1975-03-10 1976-10-09 Signetics Corp Vacuum spattering process and the apparatus thereof

Also Published As

Publication number Publication date
JPS6142787B2 (en) 1986-09-24

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