WO2019138702A1

WO2019138702A1 - Vacuum device

Info

Publication number: WO2019138702A1
Application number: PCT/JP2018/043350
Authority: WO
Inventors: 傑之鈴木; 和博武者; 淳介松崎; 慎太郎田宮; 展史南; 裕利中尾
Original assignee: 株式会社アルバック
Priority date: 2018-01-12
Filing date: 2018-11-26
Publication date: 2019-07-18
Also published as: CN110366774A; CN110366774B; TW201931507A

Abstract

Provided is a vacuum device capable of changing a vacuum atmosphere to an atmospheric-pressure atmosphere in a short time without breaking a substrate. A first straightening plate 5 is disposed between a subject 10 to be processed, and a supply/exhaust port 9 so that a pressure increasing gas blowing from the supply/exhaust port 9 does not collide with the subject 10. A second straightening plate 6 is provided between the subject 10 and a wall surface of a cover member 16, and the pressure increasing gas is introduced between the first straightening plate 5, and a substrate 7 in the subject 10, and between the substrate 7 and a stage 15 from an upper through hole 13 at a position higher than the substrate 7, and a lower through hole 23 at a position lower than the substrate 7 so that the substrate 7 is prevented from floating.

Description

Vacuum device

The present invention relates to a vacuum apparatus using a vacuum atmosphere, and more particularly to a vacuum apparatus that can be changed from a vacuum atmosphere to an atmospheric pressure atmosphere in a short time without cracking or dropping of a substrate.

A substrate loading and unloading chamber is used to move a substrate between the atmosphere and a vacuum atmosphere, the substrate is disposed in the substrate loading and unloading chamber in the air atmosphere, and the substrate loading and unloading chamber is evacuated to evacuate the periphery of the substrate. A vacuum processing chamber in a vacuum atmosphere is connected to a substrate transfer chamber in which a substrate is placed. In addition, the substrate is placed in a substrate loading and unloading chamber placed in a vacuum atmosphere, nitrogen gas and air are introduced into the vacuum atmosphere to make the substrate loading and unloading chamber at atmospheric pressure, and the substrate loading and unloading chamber and the air atmosphere are connected. Is taken out to the atmosphere.

FIG. 8 shows a substrate loading / unloading chamber 102 according to the prior art, which has a stage 115 constituting the bottom surface of the substrate loading / unloading chamber, and a container-like lid member 116 covered on the stage 115.

The stage 115 is provided with a support member 128 formed of a protrusion or a protrusion, and the carrier plate 112 is detachably mounted on the support member 128. A gap 105 is formed between the stage 115 and the carrier plate 112.

One or more substrates 107 are disposed on the transport plate 112.
The lid member 116 is provided with an air supply and exhaust port 109. An evacuation device 124 and a gas supply device 125 are connected to the air supply and exhaust port 109.
A rectifying plate 106 is provided between the air supply and exhaust port 109 and the substrate 107 on the carrier plate 112.

In order to change the internal space 118 of the substrate transfer in / out chamber 102 that has been vacuum atmosphere to the atmospheric pressure atmosphere, the gas supply device 125 is operated to supply a pressurizing gas such as air to the internal space 118 from the air supply / discharge port 109.

The pressurizing gas supplied to the internal space 118 collides with the current plate 106 and flows laterally, passes between the current plate 106 and the wall surface of the lid member 116 to reach the surface of the substrate 107, and then enters the internal space 118 is boosted.
At this time, although the introduced pressurizing gas does not collide with the substrate 107, the flow rate of the pressurizing gas around the substrate 107 may be too high, and the substrate 107 may be damaged if it is thin.

Further, the introduced pressurizing gas passes through the gap 105 around the carrier plate 112 and flows into the space on the back surface side of the substrate 107, so that a strong swirl of the pressurizing gas is formed under the substrate 107. 107 lifts up. When the substrate 107 falls onto the frame of the transfer plate 112 or the like, it may be damaged.

Even when evacuating the internal space 118 in the atmosphere, the substrate 107 may be broken up and broken by the flow of the air filling the internal space 118.
Therefore, in order to prevent the damage of the substrate 107, it is conceivable to reduce the supply rate of the pressure-boosting gas and the evacuation rate.

However, while it is increasingly required to shorten the time taken to carry out the substrate, the processing time becomes longer when the supply speed of the pressure-boosting gas and the evacuation speed are reduced. Therefore, there is a need for a technology that can prevent damage to a substrate without increasing the time required to carry the substrate in and out.

WO 2017/146204

The present invention was created to solve the above-mentioned disadvantages of the prior art, and its object is to provide a technique capable of changing from a vacuum atmosphere to an atmospheric pressure atmosphere in a short time.

In order to solve the above problems, the present invention relates to a vacuum chamber, an insertion hole provided on a ceiling of the vacuum chamber, a closing position for closing the insertion hole, and replacement of the inside of the vacuum chamber below the closing position. A stage on which the object to be conveyed is disposed with a gap in an upwardly directed surface, and a container-shaped configuration facing downward with respect to said stage, said container-shaped being movable between positions A lid member which is hermetically sealed between an edge portion of the opening of the shape and the ceiling outside the insertion hole, and an air supply / exhaust through hole formed in the lid member; A transport plate disposed on the stage, and a substrate disposed on the transport plate, wherein the insertion hole is closed by the stage and carried out between the lid member and the stage. The space is airtight between the lid member and the ceiling When it is removed, it is separated from the atmosphere, and the carry-in / out space is evacuated from the air supply / discharge port which is an opening provided in the carry-in / out space of the air supply / discharge through hole. A vacuum apparatus to which a pressure-boosting gas is supplied, wherein a rectangular or square first flow straightening plate is disposed between the stage and the air supply and discharge port, and the object to be transferred is the first flow straightening plate And the stage, the lid member has four wall surfaces arranged in a square cylindrical shape, and the first straightening vane contacts two wall surfaces parallel to one another among the four wall surfaces, A second straightening plate spaced apart from the other parallel two wall surfaces and being rectangular or square in the portion of the first straightening plate spaced apart from the two wall surfaces, the second straightening plate is spaced apart And the second current plate is disposed in front of the second current plate. The surface facing the wall surface, a vacuum device through hole through which the boost gas passes through is provided between the rear surface.
The present invention is a vacuum device in which a recess is formed on the surface of the transfer plate facing the first straightening vane.
In the present invention, in the through hole, an upper through hole disposed at a height between the surface of the substrate disposed on the transfer plate and a surface facing downward of the first rectifying plate, and The vacuum device may include a lower through hole disposed at a height between the height of the back surface of the object to be transferred disposed on the stage and the height of the surface of the stage.
In the present invention, a surface side gap is formed between the substrate and the first current plate, and a back surface side gap is formed between the back surface of the transfer plate and the surface of the stage, It is a vacuum device in which the value of the product of the volume of the gap and the area of the upper through hole and the value of the product of the volume of the back surface side gap and the area of the lower through hole are equal.
In the present invention, the distance between the second straightening vane and the wall facing the second straightening vane is greater than the width in the vertical direction of the upper through hole, and the lower through hole Is a vacuum device that is larger than the vertical width of the
In the present invention, in the through hole, an upper through hole disposed at a height between the surface of the substrate disposed on the transfer plate and a surface facing downward of the first rectifying plate, and A through hole on the stage, which is a gap provided between the stage and the lower end of the second current plate, is included, and the through hole on the stage is closer to the rear surface of the carrier plate disposed on the stage It is a vacuum device placed at a low height.
In the present invention, a surface side gap is formed between the substrate and the first current plate, and a back surface side gap is formed between the back surface of the transfer plate and the surface of the stage, It is a vacuum device in which the value of the product of the volume of the gap and the area of the upper through hole, and the value of the product of the volume of the back surface side gap and the area of the on-stage through hole are equal.
The present invention is a vacuum device provided with a lifting device that raises and lowers the first flow straightening plate and the second flow straightening plate with respect to the lid member.
In the present invention, the distance between the second straightening vane and the wall surface facing the second straightening vane is greater than the width in the vertical direction of the upper through hole, and the penetration on the stage is achieved. It is a vacuum device that is larger than the vertical width of the hole.
The present invention is a vacuum apparatus provided with a plurality of the air supply and exhaust ports.
The present invention is the vacuum device in which a mesh-like flow straightening member is provided at the air supply and discharge port.
The present invention is a vacuum apparatus in which the substrate is vacuum processed inside the vacuum chamber.

Even if the vacuum atmosphere is changed to the atmospheric pressure atmosphere in a short time, the substrate is not broken or lifted up.

A view seen from the direction showing the cross section of the second straightening vane of the vacuum device in which the second straightening vane is provided on the short side of the first straightening vane The view from the direction perpendicular to FIG. 1 with the first straightening vane of the vacuum device in contact with the wall surface (the second straightening vane is omitted) Diagram for explaining the state when the stage of the vacuum device is stopped at the exchange position (a): A front view of the second straightening vane provided with a seal member at its lower end (b) A cross-sectional view in the direction perpendicular to the front view (c): A second on the lower end with a through hole on the stage Front view of current plate (d) Cross-sectional view in the direction perpendicular to the front view An exploded view showing the relative positions of the first and second baffles, the object to be transported, and the stage The figure which shows the state which the 1st straightening vane of the vacuum apparatus with which the 2nd straightening vane was provided in the long side of the 1st straightening vane contacted the wall surface (the 2nd straightening vane is omitted) A view from the direction showing the cross section of the second straightening vane of the vacuum device Prior art substrate loading and unloading chamber

1 to 3 show a vacuum apparatus 3a according to a first example of the present invention in which a second rectifying plate 6 is provided on the short side of a rectangular first rectifying plate 5 described later, and FIGS. It is the vacuum apparatus 3b of the 2nd example of this invention by which the 2nd flow straightening plate 6 was provided in the long side of the flow straightening plate 5 of 1 one. 1 and 2 are cross-sectional views when the vacuum device 3a of the first example is cut in different directions, and similarly, in FIGS. 6 and 7, the vacuum device 3b of the second example is cut in different directions. FIG. In description of the vacuum apparatus 3a of a 1st example, and the vacuum apparatus 3b of a 2nd example, the same name and the same code | symbol are attached | subjected and demonstrated to the member which has the same objective and function.

The

vacuum apparatuses

3 a and 3 b of the first and second examples respectively have a substrate loading and unloading chamber 2 and a vacuum processing chamber 4.
The vacuum processing chamber 4 has a vacuum chamber 14 and a stage 15 disposed inside the vacuum chamber 14, and a ceiling of the vacuum chamber 14 is provided with an insertion hole formed of a through hole.
FIG. 3 shows a state in which the stage 15 is stopped at the exchange position inside the vacuum chamber 14 as described later, and the reference numeral 11 in the same figure is an insertion hole.

The substrate loading / unloading chamber 2 has a lid member 16. The lid member 16 is in the shape of a container facing downward, and the lid member 16 is provided on the insertion hole 11 with the edge portion 18 of the container opening 39 in contact with the vacuum chamber 14. ing.

In the state of FIGS. 1 to 3, 6 and 7, the space between the edge portion 18 of the lid member 16 and the ceiling of the vacuum chamber 14 is airtight and is formed between the lid member 16 and the stage 15 Air is prevented from entering the transfer space 8.

Assuming that the position of the stage 15 when the insertion hole 11 is closed by the stage 15 is referred to as a closed position, the stage 15 is stopped at the closed position in FIGS. The hole 11 is closed by the stage 15 to separate the internal space of the vacuum chamber 14 from the transfer space 8 and maintain the internal space of the vacuum chamber 14 in a vacuum atmosphere even if the transfer space 8 is in the air atmosphere. It can be done.

On the stage 15, a plurality of support members 28 composed of protrusions or protrusions are provided, and the object 10 to be conveyed is placed on the support member 28 so as to be separated from the support member 28.

The object to be transported 10 has a transport plate 12 and one or more substrates 7 disposed on the transport plate 12. The back surface of the transfer plate 12 and the surface of the stage 15 are separated, and a back surface side gap 26 which is a space between the back surface of the transfer plate 12 and the surface of the stage 15 is formed on the back surface side of the transfer plate 12 ing.

The wall of the lid member 16 is provided with an air supply and exhaust through hole 21 which is a through hole. The air supply / exhaust through hole 21 is connected to a pipe 22 disposed outside the vacuum chamber 14, and the vacuum evacuation device 24 and the gas supply device 25 disposed outside the vacuum chamber 14 are carried out by the pipe 22 respectively. It is connected to the space 8.

An air supply and exhaust port 9 which is one end of the air supply and exhaust through hole 21 is provided on the surface of the lid member 16 exposed to the carry in and out space 8, and gas supply and exhaust are performed from the air supply and exhaust port 9.

The

vacuum devices

3a and 3b are provided with a control device 19, and the vacuum evacuation device 24, the gas supply device 25, and a lift device 37 described later are connected to the control device 19 and controlled by the control device 19. There is. The evacuation unit 24, the gas supply unit 25, and the lifting unit 37 operate as described below according to the operation of the control unit 19.

When the transfer space 8 of the substrate transfer in / out chamber 2 which has been made into a vacuum atmosphere is changed to the atmospheric pressure atmosphere, pressurized gas such as air or nitrogen gas is supplied from the gas supply device 25 to the air supply / discharge through hole 21.

The supplied pressurized gas passes through the air supply / discharge through hole 21 and is blown out from the air supply / discharge port 9 to the carry-in / out space 8, and the carry-in / out space 8 is pressurized. At this time, the evacuation of the transfer space 8 by the evacuation device 24 is stopped.

On the other hand, when the transfer space 8 is changed from the atmospheric pressure atmosphere to the vacuum atmosphere, the vacuum exhaust device 24 evacuates the gas such as air filled in the transfer space 8 from the air supply and discharge port 9. At this time, the pressure supply gas is not supplied from the gas supply device 25.

The air supply and exhaust port 9 is directed in the direction in which the stage 15 is positioned, the first current plate 5 is disposed between the air supply and exhaust port 9 and the transport plate 12, and the substrate 7 disposed on the transport plate 12 is The first current plate 5 is arranged to face the first current plate 5 at a distance. In this example, the first flow control plate 5 is suspended from the cover member 16 by a suspension member 33 whose one end is fixed to the cover member 16 and the other end is fixed to the first flow control plate 5.

When the pressurizing gas is introduced from the air supply and exhaust port 9, the pressurizing gas is blown to the first straightening vane 5. A through hole is not formed in the first straightening vane 5, and the pressurizing gas does not penetrate the first straightening vane 5.

The first straightening vane 5 and the conveyance plate 12 are square or rectangular quadrilateral thin plates, and the conveyance plate 12 is smaller than the first straightening vane 5 and disposed inside the four sides of the first straightening vane 5 It is done. Here, the first straightening vane 5 and the conveyance plate 12 are disposed horizontally, and among the six faces of the first straightening vane 5, four faces other than the front and back faces are formed in a linear elongated shape.

The lid member 16 has four flat wall surfaces, and the wall surfaces are vertically disposed to form a square cylinder. The first straightening vane 5 has two sets of parallel planes, where two planes parallel to one another among the elongated four faces of the first straightening vane 5 are one set of parallel planes.

Of the two sets of parallel surfaces, one set of parallel surfaces is disposed parallel to the wall surface of lid member 16 and is in contact with the wall surface, and the other set of parallel surfaces is elongated at the first end The two parallel surfaces are in contact with the two wall surfaces in contact with each other, and the other two wall surfaces are disposed facing in parallel, spaced apart from each other.

A slidable rubber member is provided on any one of a pair of parallel surfaces in contact with the wall surface of the lid member 16 or a wall surface of the lid member 16 in contact with the pair of parallel surfaces; The parallel surfaces of the set and the wall surface of the lid member 16 may be in contact via the rubber member.

FIG. 5 is a drawing showing the relative positions between the first straightening vane 5 of the vacuum device 3a of FIGS. 1 and 2, the object 10 to be conveyed, and the stage 15. Of the two sets of parallel surfaces, the parallel surface of the set having the long side is in surface contact with the wall surface of the lid member 16 and the parallel surface of the set having the short side is disposed facing away from the other wall surface. The baffles 6 are attached respectively. Like the vacuum device 3b of the second example, the parallel surfaces of the set having the short sides are in surface contact with the wall surface of the lid member 16, and the parallel surfaces of the set having the long sides are spaced apart in parallel to the two wall surfaces. Then, the second straightening vane 6 can be attached.

The second straightening vane 6 is a square or rectangular quadrilateral thin plate, and among the six faces of the second straightening vane 6, the area of the two faces is large and the other four faces are formed in a linear elongated shape . The second straightening plate 6 has two wide side faces vertically and is formed on two side faces respectively facing the wall surface of the lid member 16 so as to face each other. It is arranged to be spaced apart from 12.

Of the elongated four sides of the second straightening vane 6, the two sides are vertical and are in contact with the same wall together with the two sides of the first straightening vane 5, and the other elongated two sides are horizontal One of the surfaces is mounted in contact with the first current plate 5, and the other surface faces the stage 15 at a distance.

In this case, a thin plate mounting plate is vertically fixed to the second straightening vane 6 at the upper end of the thin plate second straightening vane 6, and the mounting plate is placed on the second straightening vane 6, The second current plate 6 is prevented from falling from the first current plate 5.

Of the two wide side surfaces of the second straightening vane 6 of one sheet, one side surface is disposed to be separated from one wall surface of the lid member 16 and the other side surface is disposed to be separated from the transport object 10 The two ends of the two side surfaces are in contact with the wall surface of the lid member 16, and a buffer space 17 is formed between the second current plate 6 and the wall surface of the lid member 16 facing the second current plate 6.
The upper end of the second straightening vane 6 is in close contact with the first straightening vane 5 so that no gap is formed between the first straightening vane 5 and the second straightening vane 6.

A lifting device 20 is provided on the lid member 16, and the upper end of the hanging member 33 is airtightly drawn out of the lid member 16 and attached to the lifting device 20. When the lifting device 20 operates, the suspension member 33 moves upward or downward, and the first current plate 5 and the second current plate 6 move together with the first current plate 5 as the suspension member 33 moves. A set of parallel surfaces move up and down while in contact with the wall surface of the wall member 16.

FIG. 4 (a) shows the side face of the second straightening vane 6 facing away from and facing the wall surface of the lid member 16, and FIG. 4 (b) is a vertical cross-sectional view of the side face FIG. 2 is a cross-sectional view of one straightening vane 5, a processing target 10, and a stage 15.

Referring to FIG. 6A, the second straightening vane 6 is provided with an upper through hole 13 and a lower through hole 23 penetrating the second straightening vane 6 in the thickness direction, respectively. Of the side surfaces of the second straightening vane 6, the opening of the upper through hole 13 and the opening of the lower through hole 23 are respectively provided on the side facing the transport plate 12 and the side facing the lid member 16 It is formed.

The upper through holes 13 are provided at a position higher than the higher side of the surface of the substrate 7 or the edge portion of the transfer plate 12 disposed in the transfer plate 12 and lower than the back surface of the first current plate 5. Also, the lower through hole 23 is provided at a position lower than the back surface of the carrier plate 12 and higher than the surface of the stage 15.

The object to be transported 10 and the first current plate 5 are separated, and thus the surface of the substrate 7 and the surface of the transfer plate 12 exposed around the substrate 7 are separated from the first current plate 5 .
A seal member 29 is disposed between the lower end of the second current plate 6 and the surface of the stage 15.

The sealing member 29 is in contact with both the lower end of the second straightening vane 6 and the surface of the stage 15 and is pressed by the lower end of the second straightening vane 6 to lower the lower end of the second straightening vane 6 and the surface of the stage 15 Of the second straightening vane 6 and the surface of the stage 15 so as not to pass gas. The seal member 29 can use a rubber-like deformation member such as an O-ring, for example.

Assuming that a space formed between the substrate 7 disposed on the transport plate 12 and the first current plate 5 is referred to as a front side gap 27, the buffer space 17 and the front side gap 27 are connected by the upper through holes 13. The buffer space 17 and the back side gap 26 described above are connected by the lower through hole 23.

The sealing member 29 can be disposed on the bottom of the groove 30 formed on the surface of the stage 15 so as not to move. In this case, if the width of the opening of the groove 30 is made about the width of the sealing member 29 and the width of the bottom of the groove 30 is made larger than the width of the opening of the groove 30, the sealing member 29 is outside the groove 30. There is no risk of popping into

FIGS. 4C and 4D show an example in which the sealing member 29 is not provided. In this example, the lower end of the second straightening vane 6 is separated from the surface of the stage 15, and the second straightening The on-stage through hole 31 is formed between the plate 6 and the stage 15, and the lower through hole 23 is not formed. Therefore, the buffer space 17 and the above-mentioned back surface side gap 26 are connected by the on-stage through hole 31. The on-stage through hole 31 is the same as the lower through hole 23 in that it is formed at a position lower than the back surface of the transfer plate 12 and higher than the surface of the stage 15.

Next, the flow of gas will be described.
When the transfer in / out space 8 is changed from the vacuum atmosphere to the atmospheric pressure atmosphere, the evacuation of the transfer in / out space 8 is stopped, and then the pressure raising gas is blown out from the supply / discharge port 9 to the transfer in / out space 8. The blown-up pressure-boosting gas is blown to the first current plate 5. That is, the pressurizing gas collides with the first straightening vane 5, and the colliding boosting gas is bent in the traveling direction, advances along the first straightening vane 5, collides with the wall surface of the lid member 16 and advances The direction is bent and flows into the buffer space 17. The pressurizing gas flowing into the buffer space 17 travels along the second current plate 6 in the direction in which the surface of the stage 15 is located.

When traveling along the second flow straightening plate 6, the pressurizing gas passes through the upper through hole 13 and flows from the buffer space 17 into the surface side gap 27, and the lower through hole 23 or the upper stage through hole 31 It passes through and flows from the buffer space 17 into the back surface side gap 26.

The transport plate 12 is provided with a plate opening 38 (FIG. 5) and the substrate 7 is arranged above the plate opening 38. Accordingly, the back surface of the substrate 7 is exposed to the back surface side gap 26 at the bottom surface of the plate opening 38, and the pressurizing gas flowing into the back surface side gap 26 collides with the back surface of the substrate 7 through the plate opening 38.

The first flow straightening plate 5 prevents collision between the substrate 7 and the pressure-boosting gas, thereby preventing breakage or floating of the substrate 7. If the flow rate of the pressurizing gas that collides with the back surface of the substrate 7 is not high and the swirling pressure gas is formed in the back surface side gap 26, the substrate 7 floats up from the transport plate 12 and drops. In some cases, the substrate 7 may be damaged.

In order to prevent the floating of the substrate 7, when introducing the pressurizing gas into the loading and unloading space 8, the boosting speed of the front-side gap 27 and the boosting speed of the back-side gap 26 are made to coincide with each other. When evacuating 8, it is preferable to match the pressure reduction speed of the front surface side gap 27 with the pressure reduction speed of the back surface side gap 26.

In that case, the product of the volume value of the front side gap 27 and the area value of the upper through hole 13, the volume value of the back side gap 26, the area value of the lower through hole 23, or the on-stage through hole 31 It is preferable to make the product value with the area value equal.

When the loading / unloading space 8 changes from a vacuum atmosphere to an atmospheric pressure atmosphere, the lid member 16 is opened, and the object 10 to be transported moves on the support member 28 and is carried out of the lid member 16.

The above is the case where the loading and unloading space 8 is changed from the vacuum atmosphere to the atmosphere, but the evacuation device 24 evacuates the loading and unloading space 8 for the atmosphere and the loading and unloading space 8 is changed to the vacuum atmosphere. Also, the air filling the front side gap 27 passes through the upper through hole 13 and moves to the buffer space 17 to be evacuated and the air filling the back side gap 26 passes the lower through hole 23 or the stage It passes through the upper through hole 31 and moves to the buffer space 17 and is evacuated.

The stage 15 is connected to the lifting device 37 by a lifting rod 36. When the lifting rod 36 is lowered by the lifting device 37, the stage 15 is lowered together with the lifting rod 36, and the stage 15 is inserted into the insertion hole 11 It separates from the circumference and closure of the insertion hole 11 is released.

The internal space of the lid member 16 and the internal space of the vacuum chamber 14 are connected by the insertion hole 11 in the state where the closure is released. However, since the edge portion 18 of the container opening 39 of the lid member 16 is in contact with the vacuum chamber 14 to be airtight, the inside of the vacuum chamber 14 maintains a vacuum atmosphere.

The stage 15 of FIG. 3 is stationary at a replacement position, which is a predetermined position inside the vacuum chamber 14, and the transport object 10 on the stage 15 stationary at the replacement position is vacuumed from above the stage 15 by the transport device. The inside of the vacuum chamber 14 is moved by the inside of the vacuum chamber 14 by the vacuum processing device provided in the vacuum chamber 14. When the vacuum processing apparatus is a sputtering target, thin film formation by sputtering is vacuum processing, but vacuum processing is not limited to thin film formation, and includes, for example, processing such as etching, ashing, or ion implantation.

In the above example, the second straightening vane 6 is provided on either the short side or the long side of the first straightening vane 5, but both the short side and the long side of the same first straightening vane 5 are provided. There can be provided a total of four second baffles 6. In that case, buffer spaces 17 are respectively formed between the second straightening vanes 6 and the wall surface of the lid member 16.

When the buffer space 17 is enlarged, the time for boosting and de-pressurizing the space surrounded by the first and

second rectifying plates

5 and 6 is increased. The flow of the inflowing pressurizing gas becomes uniform, and wafer breakage and the like are prevented.

In the above example, the number of the air supply and exhaust port 9 was one, but a plurality of air supply and exhaust ports 9 are provided in one air supply and exhaust through hole 21, and the pressure boosting gas is transferred from the plurality of air supply and exhaust ports 9. It was confirmed that the introduction of V.8 reduced the occurrence of wafer breakage without increasing the volume of the buffer space 17. It is considered that this is because the flow of the pressurizing gas in the loading and unloading space 8 has become uniform.

In addition, it has been confirmed that the occurrence of wafer breakage is reduced even if the volume of the buffer space 17 is not increased if the mesh-like flow straightening member is disposed between the air supply and exhaust port 9 and the first flow straightening plate 5. This is also considered to be because the flow of the pressurizing gas is uniform.

The width of the on-stage through hole 31 and the width of the upper through hole 13 and the width of the lower through hole 23 (where the width of the through hole is the distance of the holes in the height direction) Make the size smaller than the distance between the 16 walls. For example, when the distance between the second current plate 6 and the wall surface of the lid member 16 is 5 mm, the width of the on-stage through hole 31, the width of the upper through hole 13, and the width of the lower through hole 23 are respectively Make the size 0.5 mm or more and less than 5 mm. And it is preferable to set the magnitude | size of width according to the volume value of the space enclosed by the 1st, 2nd

flow regulating plates

5 and 6. FIG.

Rather than forming the lower through hole 23 in the second straightening plate 6, using the gap between the lower end of the second straightening plate 6 and the surface of the stage 15 as the on-stage through hole 31 is more dimensional control Is easy.

In the above example, the front side gap 27 is formed between the substrate 7 disposed on the transport plate 12 and the first current plate 5, and the back surface between the back surface of the transport plate 12 and the front surface of the stage 15. The side gap 26 is formed, and the volume of the front side gap 27 and the area of the upper through hole 13 (the upper through hole 13 are set to make the pressure change rate on the front side and the back side of the object 10 to be the same. When a plurality of holes are provided, the product of the sum of the areas of the upper through holes 13, the volume of the back surface side gap 26, and the area of the lower through holes 23 (a plurality of lower through holes 23 are provided) If it is equal to the product of the area of each lower through hole 23 and the product of the area of through hole 31 on the stage, the surface side gap 27 when introducing the pressure gas is equalized. The pressure change rate of the back surface side gap 26 becomes equal, and the surface at the time of vacuum exhaustion The pressure change rates of the side gap 27 and the back surface side gap 26 become equal, and the substrate 7 is prevented from floating and the like.

In addition, when the first and second

current plates

5 and 6 are raised by the lifting device 20, the width in the vertical direction of the on-stage through hole 31 is increased, and decreased when it is lowered.

At a height such that the product value of the volume value of the front side gap 27 and the area value of the upper through hole 13 and the product value of the volume value of the back side gap 26 and the area value of the on-stage through hole 31 are equal. When introducing the pressure raising gas into the loading / unloading space 8 from the state where the first and

second rectifying plates

5 and 6 are arranged, the first and

second rectifying plates

5 and 6 are lowered to be a stage By reducing the width of the upper through holes 31 in the vertical direction to reduce the area of the through holes 31 on the stage, the pressure raising speed of the front side gap 27 is made larger than that of the back side gap 26. In order to prevent floating and to evacuate the loading / unloading space 8, raise the first and

second straightening vanes

5 and 6 to widen the width in the vertical direction of the on-stage through hole 31 and on the stage By increasing the area of the through hole 31, the pressure reduction speed of the back surface side gap 26 rather than the front surface side gap 27 It may prevent floating of the substrate 7 on the carrier plate 12 by increasing.

If a depression is formed in the surface portion of the transfer plate 12 exposed to the surface of the transfer object 10, an eddy that becomes stagnant on the surface is generated to prevent or reduce the occurrence of a crack on the substrate 7 It is confirmed that it contributes.

3a, 3b ··· Vacuum device 5 ··· First rectifying plate 6 ··· Second rectifying plate 7 · · · Substrate 8 ··· Loading and unloading space 9 ··· Air supply and exhaust port 10 ··· Transport object 11 ··· Insertion hole 12: Transport plate 13: Upper through hole 14: Vacuum tank 15: Stage 16: Lid member 20: Lifting device 23: Lower through hole 31: Upper stage through hole

Claims

With a vacuum chamber,
An insertion hole provided on a ceiling of the vacuum chamber;
It is made movable between a closed position where the insertion hole is closed and a replacement position in the vacuum chamber below the closed position, and the object to be conveyed is disposed with a gap on the surface directed upward. Stage,
A lid member in the shape of a container facing downward with respect to the stage, the space between the edge portion of the opening of the container shape and the ceiling outside the insertion hole being airtight;
An air supply and exhaust through hole formed in the lid member;
Have
The transfer target includes a transfer plate disposed on the stage, and a substrate disposed on the transfer plate,
A loading / unloading space between the lid member and the stage, which is formed by closing the insertion hole with the stage, is separated from the atmosphere when the space between the lid member and the ceiling is airtight.
The transfer space is evacuated from an air supply / discharge port which is an opening provided in the transfer space of the air supply / discharge through hole, and a vacuum is supplied to the transfer space from the air supply / discharge port. A device,
A rectangular or square first flow straightener is disposed between the stage and the inlet and outlet,
The transport object is disposed between the first current plate and the stage,
The lid member has four wall surfaces arranged in a square cylindrical shape,
The first straightening vane is in contact with two parallel wall surfaces among the four wall surfaces, and is disposed apart from the other parallel two wall surfaces,
A second straightening plate, which is rectangular or square, is disposed in a portion of the first straightening vane spaced apart from the two wall faces, facing the two wall faces where the second straightening vanes are spaced apart,
The second straightening vane is provided with a through hole which passes between the surface facing the wall surface and the back surface thereof and through which the pressurizing gas passes.
The vacuum apparatus according to claim 1, wherein a recess is formed on a surface of the transfer plate facing the first straightening vane.
An upper through hole disposed at a height between the surface of the substrate disposed on the transfer plate and a surface facing downward of the first straightening vane, in the through hole, and disposed on the stage The vacuum according to any one of claims 1 or 2, further comprising a lower through hole disposed at a height between the height of the back surface of the transported object and the height of the surface of the stage. apparatus.
A surface side gap is formed between the substrate and the first current plate, and a back surface side gap is formed between the back surface of the transfer plate and the surface of the stage,
The vacuum according to claim 3, wherein the value of the product of the volume of the surface side gap and the area of the upper through hole, and the value of the product of the volume of the back side gap and the area of the lower through hole are equal. apparatus.
The distance between the second straightening vane and the wall surface facing the second straightening vane is made greater than the width in the vertical direction of the upper through hole, and in the vertical direction of the lower through hole 4. The vacuum apparatus of claim 3, wherein the vacuum is greater than the width.
An upper through hole disposed at a height between a surface of the substrate disposed on the transfer plate and a surface facing downward of the first straightening vane, the through hole, the stage, and the first through hole And a through hole on the stage, which is a gap provided between the lower end of the second current plate and
The vacuum apparatus according to any one of claims 1 and 2, wherein the through hole on the stage is disposed at a height lower than a back surface of the transfer plate disposed on the stage.
A surface side gap is formed between the substrate and the first current plate, and a back surface side gap is formed between the back surface of the transfer plate and the surface of the stage,
The vacuum according to claim 6, wherein the value of the product of the volume of the surface side gap and the area of the upper through hole, and the value of the product of the volume of the back side gap and the area of the on-stage through hole are equal. apparatus.
8. The vacuum apparatus according to claim 7, further comprising an elevating device for raising and lowering the first straightening vane and the second straightening vane relative to the lid member.
The distance between the second straightening vane and the wall surface facing the second straightening vane is made greater than the width in the vertical direction of the upper through hole, and the vertical direction of the through hole on the stage The vacuum apparatus according to claim 6, wherein the width is larger than the width of.
The vacuum apparatus according to claim 1, wherein a plurality of the air supply and exhaust ports are provided.
The vacuum device according to claim 1, wherein a mesh-like flow straightening member is provided at the air supply and discharge port.
The vacuum apparatus according to claim 1, wherein the substrate is vacuum processed inside the vacuum chamber.