JPS583039B2 - Fukugoumetsukihou - Google Patents

Fukugoumetsukihou

Info

Publication number
JPS583039B2
JPS583039B2 JP50081101A JP8110175A JPS583039B2 JP S583039 B2 JPS583039 B2 JP S583039B2 JP 50081101 A JP50081101 A JP 50081101A JP 8110175 A JP8110175 A JP 8110175A JP S583039 B2 JPS583039 B2 JP S583039B2
Authority
JP
Japan
Prior art keywords
plating
composite
bath
limited
baths
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP50081101A
Other languages
Japanese (ja)
Other versions
JPS524433A (en
Inventor
森英明
中山俊一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP50081101A priority Critical patent/JPS583039B2/en
Publication of JPS524433A publication Critical patent/JPS524433A/en
Publication of JPS583039B2 publication Critical patent/JPS583039B2/en
Expired legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)
  • Contacts (AREA)

Description

【発明の詳細な説明】 本発明は電気接点を形成するための複合メッキ法に関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a composite plating method for forming electrical contacts.

従来、電着過程においてメッキ浴中に,各種の金属また
は非金属粒子を分散させ、メッキ層中にそれらの粒子を
共析させ,メッキ物の特性を種々改良する方法は,たと
えば特公昭36−3806号公報によって公知である。
Conventionally, a method of dispersing various metal or non-metal particles in a plating bath in the electrodeposition process and eutectoiding these particles into the plating layer to improve various properties of the plated product is described, for example, in Japanese Patent Publication No. 1973- It is known from the publication No. 3806.

しかし、たとえばリレー等に用いられる電気接点に好都
合な特性を有する複合メッキ法は未だ提案されていない
However, a composite plating method that has favorable characteristics for electrical contacts used in relays and the like has not yet been proposed.

これは電気接点に要求せられる特性要因が複雑多岐に亘
り、必ずしも表面硬度,潤滑性等の単純な特性に層別で
きないことにもよるものと思われる。
This is probably because the characteristic factors required of electrical contacts are complex and diverse, and cannot necessarily be classified into simple characteristics such as surface hardness and lubricity.

このことは、電気接点用の複合メッキの改良を図るには
実際に接点を作り、これを実用テストに供して数10万
回のオン−オフ試験を行う必要を生ぜしめ、この方面の
改良研究を困難にしていたのである。
This means that in order to improve composite plating for electrical contacts, it is necessary to actually make contacts, put them to practical tests, and conduct hundreds of thousands of on-off tests, leading to improvement research in this area. This made it difficult.

本発明は以上のような事情に基づきなされたもので,貴
金属または貴金属を含む合金をマトリックスとし、複合
剤として特定の金属粒子を用いて複合メッキを完成する
点に特徴を有する。
The present invention was developed based on the above-mentioned circumstances, and is characterized in that composite plating is completed using a noble metal or an alloy containing a noble metal as a matrix and specific metal particles as a composite agent.

以下本発明を詳しく説明する。The present invention will be explained in detail below.

本発明においてマトリックスとして用いられるものは、
金、銀,パラジウムなどの貴金属または貴金属の合金、
または,たとえばバラジウム−ニッケルなどの貴金属と
他の金属の合金である。
What is used as the matrix in the present invention is:
Precious metals or alloys of precious metals such as gold, silver, palladium, etc.
or alloys of noble metals and other metals, such as, for example, palladium-nickel.

電気接点として用いられるためには、空気中で高温に曝
されても酸化されないことが必要条件となるのでマトリ
ックスとしては貴金属が用いられるのである。
In order to be used as an electrical contact, a noble metal is used as the matrix because it must not be oxidized even when exposed to high temperatures in the air.

また本発明の複合剤はレニウムの金属粒子が用いられる
Further, in the composite agent of the present invention, metal particles of rhenium are used.

これら金属粒子の粒径については限定する趣旨ではない
が,10μ以下のものが好ましい。
Although the particle size of these metal particles is not intended to be limited, it is preferably 10 μm or less.

本発明において複合メッキを実施するには、さきの貴金
属のイオンを含むメッキ浴中に、複合剤としての金属粒
子を分散させ、実用上使用される条件下で複合メッキを
行う。
To perform composite plating in the present invention, metal particles as a composite agent are dispersed in a plating bath containing ions of the noble metal, and composite plating is performed under conditions used in practical use.

貴金属メッキ浴としては,限定するものではないが、た
とえばシアン化金カリウム−リン酸塩浴,塩化金−塩酸
浴、シアン化銀浴、硝酸銀浴、塩化パラジウム浴、ジア
ミノジニトロパラジウム浴などが用いられる。
Examples of noble metal plating baths include, but are not limited to, gold potassium cyanide-phosphate baths, gold chloride-hydrochloric acid baths, silver cyanide baths, silver nitrate baths, palladium chloride baths, diaminodinitropalladium baths, and the like. .

またメッキ浴としては酸性浴、アルカリ性浴、中性浴等
がマトリックス,複合剤の選択と併せて選択採用される
Further, as the plating bath, an acid bath, an alkaline bath, a neutral bath, etc. are selected in conjunction with the selection of the matrix and composite agent.

以上のメッキ浴に複合剤を分散させてメッキを行う場合
,複合剤の分散を均一にするために浴の攪拌を行ったり
、活面活性剤を用いることも許される。
When performing plating by dispersing a composite agent in the above plating bath, it is also permissible to stir the bath or use an active surfactant in order to uniformly disperse the composite agent.

浴の攪拌は機械的攪拌、空気攪拌、液循環方式、超音波
攪拌等の方法が適宜採用される。
For stirring the bath, methods such as mechanical stirring, air stirring, liquid circulation method, ultrasonic stirring, etc. are appropriately adopted.

活面活性剤としては限定するものではないが、アルキル
リン酸エステル、ポリオキシエチレンソルビタン脂肪酸
エステル等のエステル型、またはポリプロピレングリコ
ール、ポリエチレングリコールエステル、ポリオキシエ
チレン高級アルコールエーテル等のエーテル型、あるい
はカチオン系のものが用いられる。
Examples of surfactants include, but are not limited to, ester types such as alkyl phosphate esters and polyoxyethylene sorbitan fatty acid esters, ether types such as polypropylene glycol, polyethylene glycol esters, and polyoxyethylene higher alcohol ethers, and cationic surfactants. type is used.

なお,複合剤の添加量は限定する趣旨ではないが、メッ
キ浴に対して5〜100g/lが好ましく活面活性剤の
量についても限定するものではないが0.1〜0.5重
量%が好ましい。
Although the amount of the composite agent added is not intended to be limited, it is preferably 5 to 100 g/l relative to the plating bath, and the amount of the surfactant is also not limited, but it is 0.1 to 0.5% by weight. is preferred.

以上の複合メッキ浴を用いてメッキを行う場合の条件に
ついても限定するものではないが、浴温は15〜30℃
、電流密度は0.1〜2.0A/dm2が好ましい。
The conditions for plating using the above composite plating bath are not limited, but the bath temperature is 15 to 30°C.
, the current density is preferably 0.1 to 2.0 A/dm2.

マトリックス中に共折せしめる複合剤の量についても限
定するものではないが、0.2〜10重量%が好ましい
The amount of the composite agent co-folded into the matrix is also not limited, but is preferably 0.2 to 10% by weight.

また電気接点形成用としてのメッキ厚さについても限定
はしないが、1〜15μが好ましい。
The thickness of plating for forming electrical contacts is also not limited, but is preferably 1 to 15 .mu.m.

以上のようにして形成された複合メッキ面を有する電気
接点は従来の貴金属メッキ接点に比べて長寿命を有する
ものである。
The electrical contact having a composite plated surface formed as described above has a longer lifespan than conventional noble metal plated contacts.

実施例 1 マトリックスとして金、複合剤としてレニウム粉末(粒
径5μ以下)を用いて複合メッキ接点を得た。
Example 1 A composite plated contact was obtained using gold as a matrix and rhenium powder (particle size of 5 μm or less) as a composite agent.

メッキ液はオートロネツクスN(商標,日本エレクトロ
プレーテイングエンジニヤース社、)酸性タイプ)を用
い、レニウム粉末を20g/l用いた。
The plating solution used was Autoronex N (trademark, Japan Electroplating Engineers Co., Ltd., acidic type), and 20 g/l of rhenium powder was used.

浴温は25℃、電流密度は0. 5A/dm2攪拌は空
気攪拌、メッキ厚みは10μ、レニウム共析量は4重量
%であった。
The bath temperature was 25°C, and the current density was 0. Stirring was performed at 5 A/dm2 using air, plating thickness was 10 μm, and rhenium eutectoid amount was 4% by weight.

以上のメッキにより得られた接点を用いて組立てたリレ
ーを、20V、1Aの条注でオン−オフテストしたとこ
ろ100万回の開閉寿命のリレーが得られた。
When a relay assembled using the contacts obtained by the above plating was subjected to an on-off test at 20 V and 1 A, a relay with a lifespan of 1 million openings and closings was obtained.

比較例 1 実施例1において、レニウムを共析させない同厚みメッ
キの接点を得て、リレーのオン−オフテストを行ったと
ころ12万回の開閉寿命であった。
Comparative Example 1 In Example 1, a contact plated with the same thickness without eutectoid rhenium was obtained, and when a relay on-off test was performed, it had a life of 120,000 opening/closing operations.

Claims (1)

【特許請求の範囲】[Claims] 1 貴金属または貴金属合金メッキ浴中に,レニウムの
金属粒子を分散させて複合メッキすることを特徴とする
電気接点用複合メッキ法。
1. A composite plating method for electrical contacts characterized by dispersing rhenium metal particles in a precious metal or precious metal alloy plating bath and performing composite plating.
JP50081101A 1975-06-30 1975-06-30 Fukugoumetsukihou Expired JPS583039B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50081101A JPS583039B2 (en) 1975-06-30 1975-06-30 Fukugoumetsukihou

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50081101A JPS583039B2 (en) 1975-06-30 1975-06-30 Fukugoumetsukihou

Publications (2)

Publication Number Publication Date
JPS524433A JPS524433A (en) 1977-01-13
JPS583039B2 true JPS583039B2 (en) 1983-01-19

Family

ID=13736984

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50081101A Expired JPS583039B2 (en) 1975-06-30 1975-06-30 Fukugoumetsukihou

Country Status (1)

Country Link
JP (1) JPS583039B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0586858B2 (en) * 1984-08-16 1993-12-14 Matsushita Electronics Corp

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55111144A (en) * 1979-02-20 1980-08-27 Nec Corp Manufacturing method of semiconductor device
JPS56158445A (en) * 1980-05-13 1981-12-07 Nec Corp Semiconductor device
JPS57188700A (en) * 1981-05-14 1982-11-19 Omron Tateisi Electronics Co Production of electrical contact
JPS5743439A (en) * 1981-07-06 1982-03-11 Hitachi Ltd Selective oxidation isolation type semiconductor device
CN102947473B (en) * 2010-03-12 2016-07-20 克斯塔里克公司 Have cated object and coating process
CN102443829B (en) * 2011-12-08 2014-07-16 天津大学 Surface plating of Ag-Ni electric contact and preparation process thereof
JPWO2015190365A1 (en) * 2014-06-13 2017-04-20 日本バルカー工業株式会社 Braid and gland packing
CN104264197A (en) * 2014-10-22 2015-01-07 华文蔚 Neodymium-nickel-tungsten alloy electroplating solution and preparation method thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49127827A (en) * 1973-04-13 1974-12-06
JPS49127828A (en) * 1973-04-12 1974-12-06

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49127828A (en) * 1973-04-12 1974-12-06
JPS49127827A (en) * 1973-04-13 1974-12-06

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0586858B2 (en) * 1984-08-16 1993-12-14 Matsushita Electronics Corp

Also Published As

Publication number Publication date
JPS524433A (en) 1977-01-13

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