JPS5828117B2 - netsukiruquinsatsuyohead - Google Patents

netsukiruquinsatsuyohead

Info

Publication number
JPS5828117B2
JPS5828117B2 JP50152594A JP15259475A JPS5828117B2 JP S5828117 B2 JPS5828117 B2 JP S5828117B2 JP 50152594 A JP50152594 A JP 50152594A JP 15259475 A JP15259475 A JP 15259475A JP S5828117 B2 JPS5828117 B2 JP S5828117B2
Authority
JP
Japan
Prior art keywords
film
heat
type
polycrystalline silicon
printing head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP50152594A
Other languages
Japanese (ja)
Other versions
JPS5275229A (en
Inventor
清春 山下
辰行 富岡
孝道 服部
登 由上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP50152594A priority Critical patent/JPS5828117B2/en
Publication of JPS5275229A publication Critical patent/JPS5275229A/en
Publication of JPS5828117B2 publication Critical patent/JPS5828117B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 本発明はプラナ−型の熱記録印刷用ヘッドに関し、シリ
コン基板の感熱性記録材に接触すべき表面に形成された
発熱部をシリコン基板に対して凸部になるように熱伝導
膜を堆積させて構成し、この熱伝導膜を介して、耐摩耗
性の硬質膜を形成することにより印字品質と耐摩耗性の
硬質膜の品質を向上させたものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a planar type thermal recording printing head, in which a heat-generating portion formed on a surface of a silicon substrate that is to be in contact with a heat-sensitive recording material is made to be a convex portion with respect to the silicon substrate. A thermally conductive film is deposited on the substrate, and an abrasion-resistant hard film is formed through this heat-conductive film, thereby improving print quality and the quality of the abrasion-resistant hard film.

プラナ−型の熱記録印刷用ヘッドのひとつに、シリコン
基板の感熱性記録材に接触する面に発熱抵抗体を形成し
たタイプがあり、それを第1図により説明する。
One of the planar type thermal recording printing heads is a type in which a heating resistor is formed on the surface of a silicon substrate that contacts a heat-sensitive recording material, and this will be explained with reference to FIG.

1はN型(又はP型)シリコン基板、2はP型(又はN
型)拡散層よりなる発熱抵抗体、3は熱酸化膜、4はM
oの金属電極、5はスパッタ、CVD法により形成した
5i02膜、6はSiCの耐摩耗性の硬質膜、2Hは発
熱抵抗体2、熱酸化膜3.5i02膜5、耐摩耗性の硬
質膜6等より構成された発熱部、7は感熱性記録材であ
る。
1 is an N type (or P type) silicon substrate, 2 is a P type (or N type)
type) heating resistor consisting of a diffusion layer, 3 is a thermal oxide film, 4 is M
o metal electrode, 5 is a 5i02 film formed by sputtering or CVD, 6 is a wear-resistant hard film of SiC, 2H is a heating resistor 2, a thermal oxide film 3.5i02 film 5, a wear-resistant hard film 6, etc., and 7 is a heat-sensitive recording material.

このヘッドは、図に示すように発熱部2H面が周囲の面
に対して凹状になっているので、感熱性記録材7と発熱
部2H面との接触が十分でなく、印字品質が悪いもので
ある。
As shown in the figure, in this head, the surface of the heat generating part 2H is concave with respect to the surrounding surface, so there is insufficient contact between the heat sensitive recording material 7 and the surface of the heat generating part 2H, resulting in poor printing quality. It is.

また、5i02膜5と耐摩耗性硬質膜6との付着強度は
十分なものではなく、特に印字中は発熱抵抗体2が高温
になるため、耐摩耗性硬質膜6がS i 02膜5より
剥離するといった問題が生じていた。
In addition, the adhesion strength between the 5i02 film 5 and the wear-resistant hard film 6 is not sufficient, and the heat-generating resistor 2 reaches a high temperature especially during printing, so the wear-resistant hard film 6 is stronger than the Si02 film 5. Problems such as peeling occurred.

本発明は以上のような従来の欠点を除去するものである
The present invention eliminates the drawbacks of the prior art as described above.

第2図は本発明の一実施例の部分断面図である。FIG. 2 is a partial cross-sectional view of one embodiment of the present invention.

8はN型(又はP型)シリコン基板、9はN型(又はP
型)シリコン基板8の中に形成されたP+(又はN+)
拡散層よりなる発熱抵抗体、10はシリコン基板8の表
裏貫通する孔、11は熱酸化膜、12は低抵抗多結晶シ
リコン膜、13はMoなどの金属電極、14は電気絶縁
膜、15は高抵抗多結晶シリコン膜、16は耐摩耗性の
硬質膜、9Hは発熱抵抗体9.熱酸化膜11.電気絶縁
膜14.高抵抗多結晶シリコン膜15.耐摩耗性の硬質
膜16等より構成された発熱部、17は感熱性記録材で
ある。
8 is an N type (or P type) silicon substrate, 9 is an N type (or P type)
type) P+ (or N+) formed in the silicon substrate 8
A heating resistor consisting of a diffusion layer, 10 a hole penetrating the front and back surfaces of a silicon substrate 8, 11 a thermal oxide film, 12 a low resistance polycrystalline silicon film, 13 a metal electrode such as Mo, 14 an electrical insulating film, and 15 a High-resistance polycrystalline silicon film, 16 is a wear-resistant hard film, 9H is a heating resistor 9. Thermal oxide film 11. Electrical insulation film 14. High resistance polycrystalline silicon film 15. A heat-generating portion 17 made of a wear-resistant hard film 16 and the like is a heat-sensitive recording material.

以下、本発明の熱記録印刷用ヘッドの構成法を第3図に
よって説明する。
Hereinafter, the construction method of the thermal recording printing head of the present invention will be explained with reference to FIG.

同図aに示すように100〜200μmの厚みのN型(
又はP型)シリコン基板8の一方の面に発熱抵抗体9を
形成するために燐(又はホウ素)を拡散する。
As shown in figure a, N type (100 to 200 μm thick)
Phosphorus (or boron) is diffused on one surface of the silicon substrate 8 to form a heating resistor 9 (or P type).

この場合拡散しない部分については、シリコン酸化膜1
8等で保護しておくのは当然のことである。
In this case, the silicon oxide film 1
It is natural to protect it with 8th grade.

次に同図すに示すように、金の蒸着膜19とフォトレジ
スト20をマスクとして、シリコン基板8に両面貫通す
る孔10を形成する。
Next, as shown in the figure, a hole 10 penetrating both sides of the silicon substrate 8 is formed using the gold vapor deposited film 19 and the photoresist 20 as a mask.

そして、同図Cに示すように、シリコン基板8の全面に
絶縁性のシリコン酸化膜11を形成し、両面からCVD
法により低抵抗多結晶シリコン膜12を形成し、フィル
ムレジストまたはフォトレジストにより孔10とその周
辺部を保護したのち、化学エツチングにより低抵抗多結
晶シリコン膜12のうち保護されていない部分を除去す
る。
Then, as shown in Figure C, an insulating silicon oxide film 11 is formed on the entire surface of the silicon substrate 8, and CVD
After forming a low-resistance polycrystalline silicon film 12 by a method, and protecting the hole 10 and its surrounding area with a film resist or photoresist, the unprotected portion of the low-resistance polycrystalline silicon film 12 is removed by chemical etching. .

次に同図dに示すように、フォトレジストを保護膜とし
てシリコン酸化膜11の一部を除去し、両面に金属電極
13を形成し、発熱抵抗体9と金属電極13と低抵抗多
結晶シリコン膜12を通して両面を連結する。
Next, as shown in FIG. d, a part of the silicon oxide film 11 is removed using a photoresist as a protective film, metal electrodes 13 are formed on both sides, and the heating resistor 9, metal electrode 13 and low resistance polycrystalline silicon are formed. The two sides are connected through membrane 12.

次に同図eに示すようにスパッタリング、CVD法によ
り電気絶縁膜14を形成し、スペッタリング、CVD法
により高抵抗多結晶シリコン膜15を形成する。
Next, as shown in FIG. 5E, an electrical insulating film 14 is formed by sputtering and CVD, and a high-resistance polycrystalline silicon film 15 is formed by sputtering and CVD.

次にフォトレジスト膜を保護膜として、発熱部9Hが周
囲の面よりも凸になるように高抵抗多結晶シリコン膜1
5の一部を化学エツチングし、さらにこれらの上にSi
C等耐摩耗性硬質膜16を形成する。
Next, using a photoresist film as a protection film, the high resistance polycrystalline silicon film 1 is
A part of 5 is chemically etched, and Si is further deposited on top of these.
A wear-resistant hard film 16 such as C is formed.

次に電気メッキ等により金属バンプ(Cuハンダ)21
を形成する。
Next, metal bumps (Cu solder) 21 are formed by electroplating etc.
form.

このようにして作られた熱記録印刷用ヘッドを前もって
所定のパターンにメタライズされたセラミック基板にフ
リップチップ法等でボンディングする。
The thermal recording printing head thus produced is bonded to a ceramic substrate that has been previously metalized in a predetermined pattern by a flip-chip method or the like.

また本発明は、プラナ−型の熱記録印刷用ヘッドだけで
なく、厚膜、薄膜型熱印刷ヘッド、あるいは第4図のよ
うに発熱抵抗体9の上部にのみ多結晶シリコン層15を
残す場合も含まれる。
Further, the present invention is applicable not only to planar type thermal recording printing heads but also to thick film and thin film type thermal printing heads, or when the polycrystalline silicon layer 15 is left only on the top of the heating resistor 9 as shown in FIG. Also included.

本発明は以上のように構成されるため、第2図のような
熱記録印刷用ヘッドは、発熱部の上面が周囲の面よりも
凸になっているため、感熱性記録材と発熱部の上面との
接触状態が良い。
Since the present invention is constructed as described above, in the thermal recording printing head as shown in FIG. Good contact with the top surface.

そのために熱効率が良くなり、印字品質が向上する。This improves thermal efficiency and print quality.

また、耐摩耗性硬質膜の下地が多結晶シリコンであるた
めに、付着力が大きい安定した品質の良い耐摩耗性硬質
膜が得られる。
Furthermore, since the base of the wear-resistant hard film is polycrystalline silicon, a stable and high-quality wear-resistant hard film with strong adhesion can be obtained.

さらに凸部を形成する熱伝導膜として高抵抗多結晶シリ
コン膜を用いることにより熱伝導膜の下地である電気絶
縁膜にピンホール、クラック等の欠陥が生じて電気絶縁
膜の下地である金属電極又は発熱抵抗体と熱伝導膜が接
触しても熱伝導膜として高抵抗多結晶シリコン膜を用い
ることにより電気的な短絡は発生せず熱伝導膜を付加す
ることによる歩留り低下等の問題を生ずることなく、熱
効率が良く、印字品質の優れた熱記録印刷用ヘッドを提
供することができる。
Furthermore, by using a high-resistance polycrystalline silicon film as the heat conductive film that forms the convex portions, defects such as pinholes and cracks may occur in the electrical insulating film that is the base of the heat conductive film, resulting in metal electrodes that are the base of the electrical insulating film. Alternatively, even if the heating resistor and the heat conductive film come into contact, by using a high resistance polycrystalline silicon film as the heat conductive film, an electrical short circuit will not occur, and problems such as a decrease in yield due to the addition of the heat conductive film will occur. Therefore, it is possible to provide a thermal recording printing head with good thermal efficiency and excellent printing quality.

また第4図のような構造の熱記録印刷用ヘッドは発熱部
のみ熱伝導膜を形成することにより、さらに熱効率の良
い、印字品質の優れた熱記録印刷用ヘッドを提供できる
Further, in the thermal recording printing head having the structure as shown in FIG. 4, by forming a heat conductive film only on the heat generating portion, it is possible to provide a thermal recording printing head with even better thermal efficiency and excellent printing quality.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の熱記録印刷用ヘッドを示す要部の断面図
、第2図は本発明の熱記録印刷用ヘッドの一実施例を示
す要部断面図、第3図a ”−eは第2図の熱記録印刷
用ヘッドの製造工程を示す断面図、第4図は本発明の熱
記録印刷用ヘッドの他の実施例を示す要部断面図である
。 8・・・・・・半導体基板、9・・・・・・発熱抵抗体
、4・・・・・・電気絶縁膜、15・・・・・・高抵抗
多結晶シリコン膜、16・・・・・・硬質膜。
FIG. 1 is a sectional view of the main parts of a conventional thermal recording printing head, FIG. 2 is a sectional view of the main parts of an embodiment of the thermal recording printing head of the present invention, and FIGS. FIG. 2 is a sectional view showing the manufacturing process of the thermal recording printing head, and FIG. 4 is a sectional view of the main part showing another embodiment of the thermal recording printing head of the present invention. 8. Semiconductor substrate, 9... Heat generating resistor, 4... Electrical insulating film, 15... High resistance polycrystalline silicon film, 16... Hard film.

Claims (1)

【特許請求の範囲】[Claims] 1 感熱記録材に当接すべき基板の主面に沿って同基板
に発熱抵抗体を有し、少なくとも前記発熱抵抗体上に電
気的絶縁膜を介して高抵抗多結晶シリコン膜からなる熱
伝導膜を形成して同発熱抵抗体上に凸状部分に設けると
ともに、前記熱伝導膜上に耐摩耗性硬質膜を有すること
により凸状の発熱部を備えた熱記録印刷用ヘッド。
1. A heat-generating resistor is provided on the substrate along the main surface of the substrate to be in contact with the heat-sensitive recording material, and a heat-conducting film made of a high-resistance polycrystalline silicon film is provided at least on the heat-generating resistor via an electrical insulating film. A thermal recording printing head comprising a film formed on the heat generating resistor in a convex part and a wear-resistant hard film on the heat conductive film to provide a convex heat generating part.
JP50152594A 1975-12-19 1975-12-19 netsukiruquinsatsuyohead Expired JPS5828117B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50152594A JPS5828117B2 (en) 1975-12-19 1975-12-19 netsukiruquinsatsuyohead

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50152594A JPS5828117B2 (en) 1975-12-19 1975-12-19 netsukiruquinsatsuyohead

Publications (2)

Publication Number Publication Date
JPS5275229A JPS5275229A (en) 1977-06-24
JPS5828117B2 true JPS5828117B2 (en) 1983-06-14

Family

ID=15543838

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50152594A Expired JPS5828117B2 (en) 1975-12-19 1975-12-19 netsukiruquinsatsuyohead

Country Status (1)

Country Link
JP (1) JPS5828117B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5873423A (en) * 1981-10-26 1983-05-02 Nissan Motor Co Ltd Mounting construction of door waist weather strip for automobile

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS555325U (en) * 1978-06-23 1980-01-14

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS555325U (en) * 1978-06-23 1980-01-14

Also Published As

Publication number Publication date
JPS5275229A (en) 1977-06-24

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