JPS5826733B2 - Ensocaldehydono Seizouhouhou - Google Patents

Ensocaldehydono Seizouhouhou

Info

Publication number
JPS5826733B2
JPS5826733B2 JP7960575A JP7960575A JPS5826733B2 JP S5826733 B2 JPS5826733 B2 JP S5826733B2 JP 7960575 A JP7960575 A JP 7960575A JP 7960575 A JP7960575 A JP 7960575A JP S5826733 B2 JPS5826733 B2 JP S5826733B2
Authority
JP
Japan
Prior art keywords
reaction
cyclopentanol
chlorovaleraldehyde
hypochlorous acid
hypochlorite
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7960575A
Other languages
Japanese (ja)
Other versions
JPS523014A (en
Inventor
文雄 古崎
隆夫 真木
嘉一 村尾
一幸 峰田
良明 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Original Assignee
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp
Priority to JP7960575A priority Critical patent/JPS5826733B2/en
Publication of JPS523014A publication Critical patent/JPS523014A/en
Publication of JPS5826733B2 publication Critical patent/JPS5826733B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/27Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation
    • C07C45/30Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation with halogen containing compounds, e.g. hypohalogenation

Description

【発明の詳細な説明】 本発明は5−クロロバレルアルデヒドの製造法に関する
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing 5-chlorovaleraldehyde.

さらに詳しくは、本発明はシクロペンタノールを次亜塩
素酸および/または次亜塩素酸塩と反応させて、5−ク
ロロバレルアルデヒドを製造する方法に関する。
More specifically, the present invention relates to a method for producing 5-chlorovaleraldehyde by reacting cyclopentanol with hypochlorous acid and/or hypochlorite.

5−クロロバレルアルデヒドは医薬、有機化合物の中間
原料として有用な化合物である。
5-chlorovaleraldehyde is a compound useful as an intermediate raw material for pharmaceuticals and organic compounds.

5−クロロバレルアルデヒドの台底に関しては従来、δ
−バレロラクトンと塩化チオニルを塩化亜鉛の存在下で
反応させることにより得られる5−クロロバレリルクロ
ライドのローゼンムント還元するいは5−クロロバレリ
ルクロライドをN−メチルアニリンと反応させて相当す
るN−メチルアニリドとしたのち、リチウムアルミニウ
ムハイドライドと反応させる方法(Y 、Ban −T
−O1shi、Chem、Pharm−Bull、
11.446 (1963))が知られているが、これ
らの方法はいずれも高価な原料を用い、かつ工程が長く
、また生成する5−クロロバレルアルデヒドの収率が低
いという欠点を有する。
Conventionally, regarding the base of 5-chlorovaleraldehyde, δ
- Rosenmund reduction of 5-chlorovaleryl chloride obtained by reacting valerolactone and thionyl chloride in the presence of zinc chloride, or by reacting 5-chlorovaleryl chloride with N-methylaniline to obtain the corresponding N -Methylanilide and then reacting with lithium aluminum hydride (Y, Ban-T
-O1shi, Chem, Pharm-Bull,
11.446 (1963)), but all of these methods have the drawbacks of using expensive raw materials, long steps, and low yields of 5-chlorovaleraldehyde.

また、シクロペンタノールと塩素をタングステン光の照
射下、酢酸−酢酸ナトリウム緩衝溶液中、15℃で反応
させる方法(N、C−Deno et al 。
In addition, a method in which cyclopentanol and chlorine are reacted at 15° C. in an acetic acid-sodium acetate buffer solution under irradiation with tungsten light (N, C-Deno et al.

J−Org、Cbem−39,520(1974))が
知られている。
J-Org, Cbem-39, 520 (1974)).

この方法は優れたものではあるが、副生ずる塩化水素の
中和反応が併発するため発熱が大きくまた、塩素および
副生塩化水素が存在するので、反応装置の材質選択上に
問題がある。
Although this method is excellent, it generates a large amount of heat due to the simultaneous neutralization reaction of by-product hydrogen chloride, and since chlorine and by-product hydrogen chloride are present, there are problems in the selection of materials for the reactor.

本発明者らは、これらの欠点を克服するために、5−ク
ロロバレルアルデヒドの製造方法を鋭意検討した結果、
シクロペンタノールと次亜塩素酸および/または次亜塩
素酸塩を温和な条件下で反応させると、5−クロロバレ
ルアルデヒドが生成することを見出し、本発明を完成し
たものである。
In order to overcome these drawbacks, the present inventors have conducted intensive studies on the production method of 5-chlorovaleraldehyde, and have found that
The present invention was completed based on the discovery that 5-chlorovaleraldehyde is produced when cyclopentanol and hypochlorous acid and/or hypochlorite are reacted under mild conditions.

本発明方法は遊離塩素を使用せずにシクロペンタノール
の酸化および塩素化を行うことを特徴とするものである
The process of the invention is characterized in that cyclopentanol is oxidized and chlorinated without the use of free chlorine.

本発明方法によれば、大きな中和熱の原因となる塩化水
素が実質上副生しないので、反応熱を容易に除去するこ
とができる。
According to the method of the present invention, hydrogen chloride, which causes large neutralization heat, is not substantially produced as a by-product, so that the reaction heat can be easily removed.

また、塩素および塩化水素による反応器の材質の腐蝕が
抑制されるため、工業的製造を考えた場合、本発明方法
のもつ有利さははかりしれない。
Furthermore, since corrosion of the material of the reactor due to chlorine and hydrogen chloride is suppressed, the advantages of the method of the present invention are immeasurable when considering industrial production.

本反応は通常光照射下で行われるが、光が存在しなくと
も5−クロロバレルアルデヒドは生成スる。
This reaction is usually carried out under light irradiation, but 5-chlorovaleraldehyde is produced even in the absence of light.

反応温度は一50〜200℃、好ましくは0〜100℃
の範囲から選ばれる。
The reaction temperature is -50~200℃, preferably 0~100℃
selected from the range.

反応はシクロペンタノールに次亜塩素酸および/または
次亜塩素酸塩を接触させることにより進行する。
The reaction proceeds by bringing cyclopentanol into contact with hypochlorous acid and/or hypochlorite.

本反応は通常水の存在下行われる。This reaction is usually carried out in the presence of water.

液性が酸性、中性または塩基性いずれであっても5−ク
ロロバレルアルデヒドの生成は認められるが、該アルデ
ヒドの収率は特に反応を弱酸性から弱塩基性、より好ま
しくはpH4から10の範囲で行ったときに最高となる
The production of 5-chlorovaleraldehyde is observed regardless of whether the liquid is acidic, neutral, or basic; however, the yield of this aldehyde is particularly low when the reaction is conducted at a pH between weakly acidic and weakly basic, more preferably between pH 4 and 10. It is best when done within a range.

このためには反応を適当な緩衝溶液、例えば酢酸塩系、
酸性リン酸塩系の存在下で行うか、あるいは反応中、酸
もしくは塩基を添加してpHを先に示した範囲に保つこ
とが好ましい。
For this purpose, the reaction may be carried out in a suitable buffer solution, such as an acetate system.
It is preferred to carry out in the presence of an acidic phosphate system or to add an acid or base during the reaction to maintain the pH in the range indicated above.

なお反応を有機媒体の存在下で行ってもよく、有機媒体
としては原料のシクロペンタノールそれ自体を用いるこ
ともできるが、次亜塩素酸および/または次亜塩素酸塩
に対して不活性な有機溶媒たとえば四塩化炭素等のハロ
ゲン化炭化水素:ヘキサン、ベンゼン等の炭化水素類;
ニトロベンゼン等も用いることができる。
The reaction may be carried out in the presence of an organic medium, and the raw material cyclopentanol itself may be used as the organic medium, but cyclopentanol itself, which is inert to hypochlorous acid and/or hypochlorite, may be used as the organic medium. Organic solvents such as halogenated hydrocarbons such as carbon tetrachloride; hydrocarbons such as hexane and benzene;
Nitrobenzene and the like can also be used.

もちろん、これらの有機媒体と水性媒体を併用してもさ
しつかえない。
Of course, these organic media and aqueous media may be used in combination.

本反応に用い得る次亜塩素酸塩としては、アルカリ金属
またはアルカリ土類金属塩などがあげられる。
Examples of the hypochlorite that can be used in this reaction include alkali metal or alkaline earth metal salts.

これらの次亜塩素酸塩はシクロペンタノールの反応に先
立って、通常アルカリ金属またはアルカリ土類金属の水
酸化物の水溶液に塩素ガスを吹込むことにより調製され
る。
These hypochlorites are usually prepared by bubbling chlorine gas into an aqueous solution of an alkali metal or alkaline earth metal hydroxide prior to the reaction with cyclopentanol.

次亜塩素酸および/または次亜塩素酸塩とシクロペンタ
ノールのモル比は通常1:1であるが、次亜塩素酸また
はその塩はシクロペンタノールに対し、化学当量よりや
\過剰に用いても良く、あるいは当量以下の次亜塩素酸
またはその塩を用い、未反応シクロペンタノールを回収
する方法を採用することもできる。
The molar ratio of hypochlorous acid and/or hypochlorite to cyclopentanol is usually 1:1, but hypochlorous acid or its salt is used in slightly excess chemical equivalent to cyclopentanol. Alternatively, a method of recovering unreacted cyclopentanol using less than an equivalent amount of hypochlorous acid or its salt can also be adopted.

反応時間は、反応形式によっても変化する。Reaction time also varies depending on the reaction format.

次亜塩素酸またはその塩の水溶液を適当な速度で加える
場合には、所要量の次亜塩素酸またはその塩の水溶液を
加え終った時点を反応の終点として良いが、次亜塩素酸
またはその塩の水溶液の供給を終ったあと、さらに反応
を続けても良い。
When adding an aqueous solution of hypochlorous acid or its salt at an appropriate rate, the end point of the reaction may be the point at which the required amount of the aqueous solution of hypochlorous acid or its salt has been added; After finishing supplying the aqueous salt solution, the reaction may be continued further.

反応圧は特に制限されないが、通常、常圧である。The reaction pressure is not particularly limited, but is usually normal pressure.

大気圧以下または大気圧以上で本反応を実施してもよい
This reaction may be carried out at below atmospheric pressure or above atmospheric pressure.

反応は過剰のシクロペンタノール中に次亜塩素酸もしく
は次亜塩素酸塩を添加して行うのが一般的であるが、所
定量のシクロペンタノールと次亜塩素酸を連続的に混合
して反応させてもよい。
The reaction is generally carried out by adding hypochlorous acid or hypochlorite to excess cyclopentanol, but it is also possible to perform the reaction by continuously mixing a predetermined amount of cyclopentanol and hypochlorous acid. It may be reacted.

次に実施例により本発明を具体的に説明するが、本発明
はその要旨を超えないかぎり以下の実施例に限定される
ものではない。
EXAMPLES Next, the present invention will be specifically explained with reference to Examples, but the present invention is not limited to the following Examples unless it exceeds the gist thereof.

実施例 1 温度計、pH測定装置、滴下ロート、攪拌装置および冷
却器を備えた500rfL15つロガラスフラスコにシ
クロペンタノール10.3 ft (0,12mol)
:ならびに酢酸20.4 ft (0,34mol)お
よび無水酢酸ナトリウム49.2 ft (0,6mo
l )を含む酢酸酢酸ナトリウム水溶液200m1を加
え、系内を窒素で置換し、フラスコをウォーターバスに
つけて15℃に保ち、反応混合物を攪拌しつつ、該フラ
スコを30crfLの距離から200Wのタングステン
灯で照射し、5%次亜塩素酸す) IJウム水溶液15
0m1(0,099mol)を30分で滴下しさらに3
0分同温度で攪拌を続けた。
Example 1 10.3 ft (0.12 mol) of cyclopentanol was added to a 500 rfL 15 large glass flask equipped with a thermometer, pH measuring device, dropping funnel, stirrer and condenser.
: and 20.4 ft (0.34 mol) of acetic acid and 49.2 ft (0.6 mol) of anhydrous sodium acetate.
Add 200 ml of an aqueous solution of sodium acetate containing 30 ml of sodium acetate, purify the system with nitrogen, put the flask in a water bath and keep it at 15°C, and while stirring the reaction mixture, heat the flask with a 200 W tungsten lamp from a distance of 30 crfL. Irradiated with 5% hypochlorous acid) IJium aqueous solution 15
Drop 0ml (0,099mol) in 30 minutes and add 3
Stirring was continued at the same temperature for 0 minutes.

溶液のpHは反応開始前5.3であり、反応終了時5.
4であった。
The pH of the solution was 5.3 before the reaction started, and 5.3 at the end of the reaction.
It was 4.

反応生成物をガスクロマトグラフィーで分析すると、シ
クロペンタノールの転換率73.4%、5−クロロバレ
ルアルデヒドの転換シクロペンタノールに対する選択率
は、61.7%であった。
When the reaction product was analyzed by gas chromatography, the conversion rate of cyclopentanol was 73.4%, and the selectivity of 5-chlorovaleraldehyde to converted cyclopentanol was 61.7%.

実施例 2 次亜塩素酸ナトリウムの代りに5%次亜塩素酸を用いた
ほかは、実施例1と同様にして反応を行った。
Example 2 A reaction was carried out in the same manner as in Example 1, except that 5% hypochlorous acid was used instead of sodium hypochlorite.

シクロペンタノールの転換率は84.0%、5−クロロ
バレルアルデヒドの転換シクロペンタノールに対する選
択率は60.5%であった。
The conversion rate of cyclopentanol was 84.0%, and the selectivity of 5-chlorovaleraldehyde to converted cyclopentanol was 60.5%.

実施例 3 実施例1と同様の装置にシクロペンタノール10.3
? (0,12mol)、5%次亜塩素酸ナトリウム1
50rIll(0,099mol)、および水1007
711を加え、実施例1と同様にして光照射下に反応液
を攪拌しつつ、1規定塩酸を添加してpnを6.8にし
、15℃で1時間反応を行った。
Example 3 Cyclopentanol 10.3 was added to the same apparatus as in Example 1.
? (0.12 mol), 5% sodium hypochlorite 1
50rIll (0,099mol), and water 1007
711 was added, and while stirring the reaction solution under light irradiation in the same manner as in Example 1, 1N hydrochloric acid was added to adjust the pn to 6.8, and the reaction was carried out at 15° C. for 1 hour.

シクロペンタノールの転換率は65.0%、5−クロロ
バレルアルデヒドの転換シクロペンタノールに対する選
択率は46.7%であった。
The conversion rate of cyclopentanol was 65.0%, and the selectivity of 5-chlorovaleraldehyde to converted cyclopentanol was 46.7%.

Claims (1)

【特許請求の範囲】[Claims] 1 シクロペンタノールと次亜塩素酸および/または次
亜塩素酸塩を反応させることを特徴とする5−クロロバ
レルアルデヒドの製造方法。
1. A method for producing 5-chlorovaleraldehyde, which comprises reacting cyclopentanol with hypochlorous acid and/or hypochlorite.
JP7960575A 1975-06-26 1975-06-26 Ensocaldehydono Seizouhouhou Expired JPS5826733B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7960575A JPS5826733B2 (en) 1975-06-26 1975-06-26 Ensocaldehydono Seizouhouhou

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7960575A JPS5826733B2 (en) 1975-06-26 1975-06-26 Ensocaldehydono Seizouhouhou

Publications (2)

Publication Number Publication Date
JPS523014A JPS523014A (en) 1977-01-11
JPS5826733B2 true JPS5826733B2 (en) 1983-06-04

Family

ID=13694635

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7960575A Expired JPS5826733B2 (en) 1975-06-26 1975-06-26 Ensocaldehydono Seizouhouhou

Country Status (1)

Country Link
JP (1) JPS5826733B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59172165A (en) * 1983-03-18 1984-09-28 Hitachi Maxell Ltd Method and device for producing magnetic recording medium
JPS63259832A (en) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium
JPS63259833A (en) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium
JPH01285023A (en) * 1988-05-10 1989-11-16 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4005932A1 (en) * 1990-02-25 1991-08-29 Bayer Ag Cycloalkanone(s) prepn., useful as plant protectant intermediates

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59172165A (en) * 1983-03-18 1984-09-28 Hitachi Maxell Ltd Method and device for producing magnetic recording medium
JPS63259832A (en) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium
JPS63259833A (en) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium
JPH01285023A (en) * 1988-05-10 1989-11-16 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium

Also Published As

Publication number Publication date
JPS523014A (en) 1977-01-11

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