JPS5825683B2 - コウカキヨウセイジユウゴウタイノ セイゾウホウホウ - Google Patents
コウカキヨウセイジユウゴウタイノ セイゾウホウホウInfo
- Publication number
- JPS5825683B2 JPS5825683B2 JP50018100A JP1810075A JPS5825683B2 JP S5825683 B2 JPS5825683 B2 JP S5825683B2 JP 50018100 A JP50018100 A JP 50018100A JP 1810075 A JP1810075 A JP 1810075A JP S5825683 B2 JPS5825683 B2 JP S5825683B2
- Authority
- JP
- Japan
- Prior art keywords
- naphthalin
- light
- polymer
- exposed
- methyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920000642 polymer Polymers 0.000 claims description 43
- -1 1-carbonyloxy-IH-naphthalin-2-one group Chemical group 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 6
- 239000000460 chlorine Substances 0.000 claims description 6
- 229910052801 chlorine Inorganic materials 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052794 bromium Inorganic materials 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 229920006395 saturated elastomer Polymers 0.000 claims description 2
- 229930195734 saturated hydrocarbon Natural products 0.000 claims description 2
- 229930195735 unsaturated hydrocarbon Natural products 0.000 claims description 2
- 125000004423 acyloxy group Chemical group 0.000 claims 1
- 238000004581 coalescence Methods 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 42
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 33
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 30
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 25
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 25
- 229910052782 aluminium Inorganic materials 0.000 description 22
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 22
- 238000002211 ultraviolet spectrum Methods 0.000 description 22
- 239000000203 mixture Substances 0.000 description 21
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 16
- 229920001577 copolymer Polymers 0.000 description 16
- 238000002835 absorbance Methods 0.000 description 14
- 229920001897 terpolymer Polymers 0.000 description 14
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 13
- 239000000843 powder Substances 0.000 description 13
- 239000002904 solvent Substances 0.000 description 12
- 238000006116 polymerization reaction Methods 0.000 description 11
- 238000010521 absorption reaction Methods 0.000 description 9
- 230000033458 reproduction Effects 0.000 description 9
- BQXZROBBXIWDIV-UHFFFAOYSA-N (1-methyl-2-oxonaphthalen-1-yl) 2-methylprop-2-enoate Chemical compound C1=CC=C2C(OC(=O)C(=C)C)(C)C(=O)C=CC2=C1 BQXZROBBXIWDIV-UHFFFAOYSA-N 0.000 description 8
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 7
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000003504 photosensitizing agent Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- CLLBIGDDWGNWFK-UHFFFAOYSA-N (1-ethyl-2-oxonaphthalen-1-yl) 2-methylprop-2-enoate Chemical compound C1=CC=C2C(CC)(OC(=O)C(C)=C)C(=O)C=CC2=C1 CLLBIGDDWGNWFK-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 206010034972 Photosensitivity reaction Diseases 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000001273 butane Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 229920001519 homopolymer Polymers 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000036211 photosensitivity Effects 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 239000000057 synthetic resin Substances 0.000 description 3
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- QEYMMOKECZBKAC-UHFFFAOYSA-N 3-chloropropanoic acid Chemical class OC(=O)CCCl QEYMMOKECZBKAC-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 150000001851 cinnamic acid derivatives Chemical class 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- BAEVZTYQZQWKMM-UHFFFAOYSA-N dimethylphosphorylmethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCP(C)(C)=O BAEVZTYQZQWKMM-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 125000005395 methacrylic acid group Chemical group 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229920000193 polymethacrylate Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- UMZAVRWBERXBQD-UHFFFAOYSA-N (2-oxo-1h-naphthalen-1-yl) 2-methylprop-2-enoate Chemical class C1=CC=C2C(OC(=O)C(=C)C)C(=O)C=CC2=C1 UMZAVRWBERXBQD-UHFFFAOYSA-N 0.000 description 1
- DDTXITCCQXMXQU-UHFFFAOYSA-N (3-chloro-1-methyl-2-oxonaphthalen-1-yl) 2-methylprop-2-enoate Chemical compound C1=CC=C2C(OC(=O)C(=C)C)(C)C(=O)C(Cl)=CC2=C1 DDTXITCCQXMXQU-UHFFFAOYSA-N 0.000 description 1
- WOGITNXCNOTRLK-VOTSOKGWSA-N (e)-3-phenylprop-2-enoyl chloride Chemical compound ClC(=O)\C=C\C1=CC=CC=C1 WOGITNXCNOTRLK-VOTSOKGWSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- NRQFPALQJLOYOI-UHFFFAOYSA-N 1-ethyl-1-hydroxynaphthalen-2-one Chemical compound C1=CC=C2C(CC)(O)C(=O)C=CC2=C1 NRQFPALQJLOYOI-UHFFFAOYSA-N 0.000 description 1
- WBOOBKMZKMHPBZ-UHFFFAOYSA-N 1-hydroxy-1,3-dimethylnaphthalen-2-one Chemical compound C1=CC=C2C(C)(O)C(=O)C(C)=CC2=C1 WBOOBKMZKMHPBZ-UHFFFAOYSA-N 0.000 description 1
- ZIXNXAVHHFMWBL-UHFFFAOYSA-N 1-hydroxy-1,4-dimethylnaphthalen-2-one Chemical compound C1=CC=C2C(C)=CC(=O)C(C)(O)C2=C1 ZIXNXAVHHFMWBL-UHFFFAOYSA-N 0.000 description 1
- LIODQNPTLIOUMG-UHFFFAOYSA-N 1-hydroxy-1,7-dimethylnaphthalen-2-one Chemical compound C1=CC(=O)C(C)(O)C2=CC(C)=CC=C21 LIODQNPTLIOUMG-UHFFFAOYSA-N 0.000 description 1
- SFVBPTGRNNCFNK-UHFFFAOYSA-N 1-hydroxy-1-(2-methoxyethyl)naphthalen-2-one Chemical compound C1=CC=C2C(CCOC)(O)C(=O)C=CC2=C1 SFVBPTGRNNCFNK-UHFFFAOYSA-N 0.000 description 1
- VUMVUNBFPQHMII-UHFFFAOYSA-N 1-hydroxy-1h-naphthalen-2-one Chemical class C1=CC=C2C(O)C(=O)C=CC2=C1 VUMVUNBFPQHMII-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000004808 2-ethylhexylester Substances 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- IYELNHXZELFZLX-UHFFFAOYSA-N 3,4-dichloro-1-hydroxy-1-methylnaphthalen-2-one Chemical compound C1=CC=C2C(C)(O)C(=O)C(Cl)=C(Cl)C2=C1 IYELNHXZELFZLX-UHFFFAOYSA-N 0.000 description 1
- IXSQBWLGGNZUQC-UHFFFAOYSA-N 3,6-dichloro-1-hydroxy-1-methylnaphthalen-2-one Chemical compound ClC1=CC=C2C(C)(O)C(=O)C(Cl)=CC2=C1 IXSQBWLGGNZUQC-UHFFFAOYSA-N 0.000 description 1
- RCLNYBYIQJIZCD-UHFFFAOYSA-N 3-chloro-1-hydroxy-1-methylnaphthalen-2-one Chemical compound C1=CC=C2C(C)(O)C(=O)C(Cl)=CC2=C1 RCLNYBYIQJIZCD-UHFFFAOYSA-N 0.000 description 1
- KYSRROVRVQSDBD-UHFFFAOYSA-N 3-dimethylphosphorylpropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCP(C)(C)=O KYSRROVRVQSDBD-UHFFFAOYSA-N 0.000 description 1
- QBKXHYYWHHIEPK-UHFFFAOYSA-N 4-chloro-1-hydroxy-1-methylnaphthalen-2-one Chemical compound C1=CC=C2C(C)(O)C(=O)C=C(Cl)C2=C1 QBKXHYYWHHIEPK-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 101100341529 Oryza sativa subsp. japonica ITPK2 gene Proteins 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- BBOZJSHTHRZCOJ-UHFFFAOYSA-N [1-(2-cyanoethyl)-2-oxonaphthalen-1-yl] 2-methylprop-2-enoate Chemical compound C1=CC=C2C(OC(=O)C(=C)C)(CCC#N)C(=O)C=CC2=C1 BBOZJSHTHRZCOJ-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- ATMLPEJAVWINOF-UHFFFAOYSA-N acrylic acid acrylic acid Chemical compound OC(=O)C=C.OC(=O)C=C ATMLPEJAVWINOF-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- MOCCFFRHOQXLFQ-UHFFFAOYSA-N dimethylphosphanylmethyl 2-methylprop-2-enoate Chemical compound CP(C)COC(=O)C(C)=C MOCCFFRHOQXLFQ-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- WGXGKXTZIQFQFO-CMDGGOBGSA-N ethenyl (e)-3-phenylprop-2-enoate Chemical compound C=COC(=O)\C=C\C1=CC=CC=C1 WGXGKXTZIQFQFO-CMDGGOBGSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- HYNUNCYQSDVTRS-UHFFFAOYSA-N ethyl 3-(1-hydroxy-2-oxonaphthalen-1-yl)propanoate Chemical compound C1=CC=C2C(CCC(=O)OCC)(O)C(=O)C=CC2=C1 HYNUNCYQSDVTRS-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- JZSWYCUMGDLJRL-UHFFFAOYSA-N methyl 3-(1-hydroxy-2-oxonaphthalen-1-yl)propanoate Chemical compound C1=CC=C2C(CCC(=O)OC)(O)C(=O)C=CC2=C1 JZSWYCUMGDLJRL-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- AUONHKJOIZSQGR-UHFFFAOYSA-N oxophosphane Chemical compound P=O AUONHKJOIZSQGR-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 235000018553 tannin Nutrition 0.000 description 1
- 239000001648 tannin Substances 0.000 description 1
- 229920001864 tannin Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000004552 water soluble powder Substances 0.000 description 1
- 238000010626 work up procedure Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2407033A DE2407033C2 (de) | 1974-02-14 | 1974-02-14 | Lichtvernetzbare Polymere und Verfahren zu ihrer Herstellung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50117884A JPS50117884A (en, 2012) | 1975-09-16 |
| JPS5825683B2 true JPS5825683B2 (ja) | 1983-05-28 |
Family
ID=5907367
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50018100A Expired JPS5825683B2 (ja) | 1974-02-14 | 1975-02-14 | コウカキヨウセイジユウゴウタイノ セイゾウホウホウ |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US3985566A (en, 2012) |
| JP (1) | JPS5825683B2 (en, 2012) |
| BE (1) | BE825574A (en, 2012) |
| CA (1) | CA1047197A (en, 2012) |
| DE (1) | DE2407033C2 (en, 2012) |
| FR (1) | FR2261289B1 (en, 2012) |
| GB (1) | GB1448431A (en, 2012) |
| IT (1) | IT1031699B (en, 2012) |
| NL (1) | NL7501749A (en, 2012) |
| SE (1) | SE405977B (en, 2012) |
| ZA (1) | ZA75787B (en, 2012) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60147776U (ja) * | 1984-03-12 | 1985-10-01 | 三菱重工業株式会社 | 防振支持装置 |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0014673B1 (de) * | 1979-01-30 | 1982-12-22 | Ciba-Geigy Ag | Durch Licht vernetzbare Polymere mit seitenständigen, sich vom Indenon ableitenden Gruppen, Herstellung und Verwendung derselben |
| US4323701A (en) * | 1980-01-23 | 1982-04-06 | Ciba-Geigy Corporation | Process for the preparation of indenonecarboxylic acids |
| US5258478A (en) * | 1992-04-27 | 1993-11-02 | Florida State University | Low self-absorbing, intrinsically scintillating polymers |
| DE59304881D1 (de) * | 1992-10-15 | 1997-02-06 | Ciba Geigy Ag | Polymerisierbare photochrome Napthacendione, Polymere dieser Monomeren, Verfahren zu deren Herstellung, und deren Verwendung |
| US5705570A (en) * | 1995-06-07 | 1998-01-06 | International Business Machines Corporation | Ablatively photodecomposable compositions |
| US6232362B1 (en) * | 1999-05-04 | 2001-05-15 | General Electric Company | Self-sensitized epoxysilicones curable by ultraviolet light and method of synthesis therefor |
| US7237893B2 (en) * | 2001-12-28 | 2007-07-03 | Chang Shiao H | Light adjustable lenses capable of post-fabrication power modification via multi-photon processes |
| WO2005015268A2 (en) * | 2003-08-08 | 2005-02-17 | Calhoun Vision | Light adjustable lenses capable of post-fabrication power modification via multi-photon processes |
| TWI501030B (zh) * | 2012-06-12 | 2015-09-21 | Cheil Ind Inc | 光可固化型組成物、包含該組成物之保護層及包含該組成物之封裝裝置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2326736A (en) * | 1940-09-21 | 1943-08-17 | Shell Dev | Polymerizing unsaturated resinophoric compounds by action of ultraviolet light in conjunction with beta substituted naphthalene derivatives |
| US2584773A (en) * | 1949-12-12 | 1952-02-05 | Phillips Petroleum Co | Emulsion polymerization of vinylidene compounds in the presence of hydroperoxides of alkyltetrahydronaphthalenes |
| US2716103A (en) * | 1951-09-13 | 1955-08-23 | Eastman Kodak Co | Preparation of polymer of vinyl benzal acetophenone |
| US3429852A (en) * | 1967-03-30 | 1969-02-25 | Nat Starch Chem Corp | Ethylenically unsaturated derivatives of benzophenone and crosslinkable polymers thereof |
| US3827960A (en) * | 1973-01-12 | 1974-08-06 | Scm Corp | Process for photopolymerization with carbonylated polynuclear sulfonyl chloride sensitizers |
-
1974
- 1974-02-14 DE DE2407033A patent/DE2407033C2/de not_active Expired
-
1975
- 1975-02-07 ZA ZA00750787A patent/ZA75787B/xx unknown
- 1975-02-12 US US05/549,429 patent/US3985566A/en not_active Expired - Lifetime
- 1975-02-12 GB GB593675A patent/GB1448431A/en not_active Expired
- 1975-02-12 IT IT20217/75A patent/IT1031699B/it active
- 1975-02-13 CA CA220,047A patent/CA1047197A/en not_active Expired
- 1975-02-14 JP JP50018100A patent/JPS5825683B2/ja not_active Expired
- 1975-02-14 BE BE153399A patent/BE825574A/xx unknown
- 1975-02-14 NL NL7501749A patent/NL7501749A/xx not_active Application Discontinuation
- 1975-02-14 FR FR7504602A patent/FR2261289B1/fr not_active Expired
- 1975-02-14 SE SE7501652A patent/SE405977B/xx unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60147776U (ja) * | 1984-03-12 | 1985-10-01 | 三菱重工業株式会社 | 防振支持装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS50117884A (en, 2012) | 1975-09-16 |
| NL7501749A (nl) | 1975-08-18 |
| SE405977B (sv) | 1979-01-15 |
| GB1448431A (en) | 1976-09-08 |
| IT1031699B (it) | 1979-05-10 |
| DE2407033A1 (de) | 1975-09-04 |
| ZA75787B (en) | 1976-01-28 |
| CA1047197A (en) | 1979-01-23 |
| SE7501652L (en, 2012) | 1975-08-15 |
| BE825574A (fr) | 1975-08-14 |
| FR2261289A1 (en, 2012) | 1975-09-12 |
| FR2261289B1 (en, 2012) | 1979-06-08 |
| US3985566A (en) | 1976-10-12 |
| DE2407033C2 (de) | 1984-07-05 |
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