JPS5825045A - 静電形電子レンズ - Google Patents

静電形電子レンズ

Info

Publication number
JPS5825045A
JPS5825045A JP56123977A JP12397781A JPS5825045A JP S5825045 A JPS5825045 A JP S5825045A JP 56123977 A JP56123977 A JP 56123977A JP 12397781 A JP12397781 A JP 12397781A JP S5825045 A JPS5825045 A JP S5825045A
Authority
JP
Japan
Prior art keywords
electrode
lens
electrostatic
image
center
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56123977A
Other languages
English (en)
Japanese (ja)
Other versions
JPS636974B2 (cg-RX-API-DMAC7.html
Inventor
Kazue Yoshida
吉田 和衛
Akira Kikuchi
章 菊池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP56123977A priority Critical patent/JPS5825045A/ja
Publication of JPS5825045A publication Critical patent/JPS5825045A/ja
Publication of JPS636974B2 publication Critical patent/JPS636974B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10Lenses
    • H01J37/12Lenses electrostatic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP56123977A 1981-08-07 1981-08-07 静電形電子レンズ Granted JPS5825045A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56123977A JPS5825045A (ja) 1981-08-07 1981-08-07 静電形電子レンズ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56123977A JPS5825045A (ja) 1981-08-07 1981-08-07 静電形電子レンズ

Publications (2)

Publication Number Publication Date
JPS5825045A true JPS5825045A (ja) 1983-02-15
JPS636974B2 JPS636974B2 (cg-RX-API-DMAC7.html) 1988-02-15

Family

ID=14873985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56123977A Granted JPS5825045A (ja) 1981-08-07 1981-08-07 静電形電子レンズ

Country Status (1)

Country Link
JP (1) JPS5825045A (cg-RX-API-DMAC7.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61183472A (ja) * 1985-02-09 1986-08-16 Shinko Electric Ind Co Ltd リードフレームの部分めっき装置
JPS6331536A (ja) * 1986-07-25 1988-02-10 Natl Res Inst For Metals プラズマ気相反応による微粒子製造装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61183472A (ja) * 1985-02-09 1986-08-16 Shinko Electric Ind Co Ltd リードフレームの部分めっき装置
JPS6331536A (ja) * 1986-07-25 1988-02-10 Natl Res Inst For Metals プラズマ気相反応による微粒子製造装置

Also Published As

Publication number Publication date
JPS636974B2 (cg-RX-API-DMAC7.html) 1988-02-15

Similar Documents

Publication Publication Date Title
US4963748A (en) Composite multipurpose multipole electrostatic optical structure and a synthesis method for minimizing aberrations
US7834326B2 (en) Aberration corrector and charged particle beam apparatus using the same
US9349565B2 (en) Multipole lens, aberration corrector, and electron microscope
JP2001222969A (ja) エネルギーフィルタを含む集束イオンビームカラム
JPS5871545A (ja) 可変成形ビ−ム電子光学系
Ramberg Variation of the axial aberrations of electron lenses with lens strength
JPS60105229A (ja) 荷電ビ−ム露光装置
US8723134B2 (en) Electrostatic corrector
US8785880B2 (en) Chromatic aberration corrector and electron microscope
JPH0447944B2 (cg-RX-API-DMAC7.html)
JPS5825045A (ja) 静電形電子レンズ
JPH01319236A (ja) 電界放射電子銃
Munro et al. Simulation software for designing electron and ion beam equipment
US6069363A (en) Magnetic-electrostatic symmetric doublet projection lens
US4710672A (en) Picture display device
Tsuno Simulation of a Wien filter as beam separator in a low energy electron microscope
JPH11260312A (ja) オメガ型エネルギーフィルタ
Tsuno Optical design of electron microscope lenses and energy filters
JPS5825046A (ja) 静電形電子レンズ
JPS5826438A (ja) 静電形電子レンズ
US7002160B1 (en) Sextuplet quadrupole lens system for charged particle accelerators
JP3844253B2 (ja) 粒子ビーム色収差補償コラム
JP2021068529A (ja) 荷電粒子ビーム装置、複合荷電粒子ビーム装置、及び荷電粒子ビーム装置の制御方法
JP2021068530A (ja) 集束イオンビーム装置、及び集束イオンビーム装置の制御方法
Moses Aberration correction for high-voltage electron microscopy