JPS58224200A - Stripping method of rhodium - Google Patents

Stripping method of rhodium

Info

Publication number
JPS58224200A
JPS58224200A JP10872982A JP10872982A JPS58224200A JP S58224200 A JPS58224200 A JP S58224200A JP 10872982 A JP10872982 A JP 10872982A JP 10872982 A JP10872982 A JP 10872982A JP S58224200 A JPS58224200 A JP S58224200A
Authority
JP
Japan
Prior art keywords
rhodium
article
sulfuric acid
electrolysis
bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10872982A
Other languages
Japanese (ja)
Other versions
JPS6159400B2 (en
Inventor
Mitsuaki Atobe
光朗 跡部
Kimio Gomi
五味 公穂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Tenryu Industries Co Ltd
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Tenryu Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK, Tenryu Industries Co Ltd filed Critical Seiko Epson Corp
Priority to JP10872982A priority Critical patent/JPS58224200A/en
Publication of JPS58224200A publication Critical patent/JPS58224200A/en
Publication of JPS6159400B2 publication Critical patent/JPS6159400B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To remove thoroughly an Rh coated surface and to make easy the reconditioning and mending of product by immersing article having the Rh surface in a sulfuric acid bath of a specified concn., and subjecting the same to AC electrolysis then washing the deposits stuck on the surface. CONSTITUTION:Article formed with an Rh film by plating, sputtering, vacuum deposition or the like are immersed in a bath of 50-100V% concn. of sulfuric acid and are subjected to AC electrolysis. The black material (oxide of the base metal) adsorbed on the object surface after conduction of electricity for a specified time is washed away ultrasonically, brushing, rubbing or the like, and electricity is conducted again. The operation is repeated until the Rh coating is removed thoroughly from the article surface. The Rh film is stripped easily by the above-mentioned method without damaging the base metal. The method adaptable is to all Rh plated products such as watches, cigarette lighters, decorative products, etc.

Description

【発明の詳細な説明】 本発明はメッキ、スパッタ真空蒸着等によって得られた
ロジウム表面を有する物品のロジウム剥離方法に関する
ものであり、特に50〜100係硫酸浴を用いて1〜1
100OH交流電解(50ヌは60 Hgで十分)によ
って強制的に剥離することを特夛とするものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for removing rhodium from an article having a rhodium surface obtained by plating, sputtering vacuum evaporation, etc., and particularly relates to a rhodium removal method using a 50-100% sulfuric acid bath.
It is specially designed to be forcibly removed by 100OH alternating current electrolysis (60 Hg is sufficient for 50 mm).

本発明の目的と干るところはロジウム表面を有する製品
のロジウム被覆面を完全に、1#去し、製品の再生、手
直しを可*!l′にする方法を掃併するものである。
The purpose and main point of the present invention is to completely remove the rhodium-coated surface of products with rhodium surfaces, allowing the products to be recycled and reworked*! This method eliminates all methods for setting l'.

従来ロジウムメッキ、2バッタ真空蒸着等によって得ら
れたロジウム被膜を剥離する方法は一般には不可能であ
った。それはメッキきれfc場合、化学的に安定(化学
的不活性)でかたさもHr800〜1000と非常に高
く、耐摩耗性に秀れ、特にロジウム自身は通常の酸やア
ルカリVCは侵されない(300℃で発煙硫酸、ヨウ素
、次亜鉛素酸ナトリウム等には侵されるが工業的剥離方
法には成り得ない)からである。又、濃塩酸による交流
腐食、硫酸20チによる交流腐食がロジウム腐食上t、
て知られているメッキ被膜を腐食する能力はない。
Conventional methods for peeling off rhodium coatings obtained by rhodium plating, two-batter vacuum evaporation, etc. have generally been impossible. When it is fully plated, it is chemically stable (chemically inert), has a very high hardness of Hr800-1000, and has excellent wear resistance.Rhodium itself is not attacked by ordinary acids or alkalis (VC at 300℃). (Although it is attacked by fuming sulfuric acid, iodine, sodium subzinc oxide, etc., it cannot be used as an industrial stripping method.) In addition, AC corrosion caused by concentrated hydrochloric acid and AC corrosion caused by 20% sulfuric acid cause corrosion of rhodium.
It does not have the ability to corrode the known plating coatings.

本発明はかかる欠点を除去したもので、本発明によねロ
ジウム被膜の剥離が可能となった。この結果、ロジウム
表面を有する製品のロジウム被覆面を完全に除去14製
品の再生、手口しか可能となつ 六。
The present invention eliminates this drawback, and the present invention makes it possible to peel off the rhodium coating. As a result, it is now possible to completely remove the rhodium-coated surface of products with a rhodium surface and recycle the products.6.

本発gfiによる電解剥離浴は硝酸濃度が50〜100
チで、望ましくは70〜90チぐらいがよい。50俤以
下の場合剥離速度が著しく遅く実用的でない。
The electrolytic stripping bath using this developed GFI has a nitric acid concentration of 50 to 100.
It is preferably about 70 to 90 inches. If it is less than 50 yen, the peeling speed is extremely slow and is not practical.

電解方法は1〜1000 R17の交流(50又け60
Hgで十分)を用い、20又以上ヌF120 k/dm
”以上が望ましい。ロジウム被膜の厚さにより、当然剥
離時間けかわってくるが、一般のロジウムメッキの場合
は、10分間通電した後、物品表面に吸着した黒色物(
下地金属の酸化物)を超音波、ハケコヌリ#ニより洗い
落し、再び通電する。物品表面よりロジウム皺覆が完全
に除去されるまで繰り返す方法がよい。
The electrolysis method is 1 to 1000 R17 AC (50 strata and 60
(Hg is sufficient), 20 or more F120 k/dm
"The above is desirable. The peeling time naturally depends on the thickness of the rhodium coating, but in the case of general rhodium plating, after 10 minutes of electricity, the black material adsorbed to the surface of the item (
Wash off the oxides of the underlying metal using ultrasonic waves and a brush brush #2, and then turn on the power again. It is best to repeat the method until the rhodium wrinkle coating is completely removed from the surface of the article.

以下実施例によって峠、明する。The pass will be explained below through examples.

実施例1 黄銅からなる時計用ケース(表面積27α2)ニ所定の
方法によりxi + Pd −ni + Rhメッキを
施した物品を硫酸700 c6/lから成る剥離液に浸
漬し両iK白金製治具を用いてケースをつるした。超音
波を用いて、交流25 A/dm’で10分間通電し、
表面に吸着した黒色物を超音波洗浄で洗い落して再びセ
ットした。この1稈を3回繰り返したところロジウムメ
ッキが完全に剥離づれた。物品けNi+ yi L p
dメッキで保護これているのでまつ念〈時計ケース地は
肌荒れしなかった。
Example 1 A watch case made of brass (surface area 27α2) plated with xi + Pd - ni + Rh by a predetermined method was immersed in a stripping solution consisting of 700 c6/l of sulfuric acid, and both iK platinum jigs were removed. I used it to hang the case. Using ultrasonic waves, energize at AC 25 A/dm' for 10 minutes,
The black substance adsorbed on the surface was washed off by ultrasonic cleaning and the device was set again. When this one culm was repeated three times, the rhodium plating was completely peeled off. Goods Ni+ yi L p
Since it is protected by D plating, the watch case material did not get rough.

実施例2 洋白からなる時計用ケース(表面積11Crn2)VC
所定の方法によりNi + Ni −pd + R71
,メッキを施した物品を実施例1と同様の剥離方法を用
いて行ったところ2回繰り返すことによl) Rh、メ
ッキ表面が完全K fII llFされた。時計ケース
地Hまったく肌荒れしなかっ六〇 以十実施例に従−丁説明したが本−h法はロジウム表面
を有する物品のロジウム剥離方法に関する4(7)f、
$す、I!l1Vc50〜100%硝酸、望ましくけ7
0チ偕酸浴を用いて交流電解によって強制的に剥離する
ことを特徴とするものである。
Example 2 Watch case made of nickel silver (surface area 11Crn2) VC
Ni + Ni -pd + R71 by a predetermined method
When the plated article was peeled off using the same peeling method as in Example 1, by repeating the peeling process twice, the plated surface was completely coated with KfIIllF. The watch case material H did not cause any rough skin.This method was explained in accordance with more than 60 examples, but this method relates to a method for removing rhodium from articles having a rhodium surface, 4(7)f,
$S, I! l1Vc50-100% nitric acid, preferably 7
It is characterized by forcibly peeling off by alternating current electrolysis using a 0% dihydric acid bath.

本方法を用いれば物品の表面を覆りてい乙ロジウムを容
易に剥離することかで羨、しかもベースメタルを粗すこ
とがなく製品の再製、手直しが可能となる。
Using this method, the rhodium covering the surface of the product can be easily removed, and the product can be remanufactured or reworked without roughening the base metal.

本方法は時計、ライター、ネックレス等の装飾ロジウム
メッキ製品すべてに適応できるためその工業的価値は大
舞い。
This method can be applied to all decorative rhodium-plated products such as watches, lighters, and necklaces, so its industrial value is enormous.

以  上 出願人 天竜工業株式会社 株式会社 諏訪精工舎 、1′  5− 手続補正書(自発) 1、事件の表示 昭和57年特許願第1Q8729号 2、発明の名称 ロジウム剥離方法 3、補正をする者 事件との関係 出願人 手続補正書(自発) 1. 特許請求の範囲を別紙の如く補正する。that's all Applicant: Tenryu Industries Co., Ltd. Suwa Seikosha Co., Ltd. , 1' 5- Procedural amendment (voluntary) 1.Display of the incident 1981 Patent Application No. 1Q8729 2. Name of the invention Rhodium peeling method 3. Person who makes corrections Relationship to the case: Applicant Procedural amendment (voluntary) 1. The scope of claims is amended as shown in the attached sheet.

2、 明細書・ 1頁下から3行目〜同2行目[特に5
0〜100%硫酸浴を用いて1〜1000Hf交流電解
(50又は60Hfで」とあるを、 「特に50〜100v%硫酸浴を用いて1〜1000H
z交流電解(50又は60H2flに補正する。
2. Specification: 3rd line to 2nd line from the bottom of page 1 [especially 5
1 to 1000 Hf AC electrolysis using a 0 to 100% sulfuric acid bath (at 50 or 60 Hf) is replaced with ``especially 1 to 1000 Hf using a 50 to 100v% sulfuric acid bath.
z AC electrolysis (corrected to 50 or 60H2fl).

五 明ll1l書 2頁9行目 「でかたさもHr800Jとあるを、 「でかださもHv800Jに補正する。5. Book 11, page 2, line 9 ``The size is Hr800J, “The size is also corrected to Hv800J.

4、 明細v$5頁2行目〜同6行目 「50〜100%で、望1しくは70〜90チぐらいが
よい。50%以丁の場合剥離速度が7.4      
著t、<i<sui的−11″・1°7=0゛〜゛°°
4. Details v$5, line 2 to line 6 "50 to 100%, preferably about 70 to 90 inches. If it is more than 50%, the peeling speed is 7.4
Author t, <i<sui-11″・1°7=0゛~゛°°
.

Hfの交流(50又は60HYで十分)」とあるを、 「50〜100v%で、望壕しくは70〜90V%ぐら
いがよい。50V%以下の場合剥離速度が著しく遅く実
用的でない。電解方法は1〜1000Hzの交流(50
又は60Hzで十分)」に補正する。
"Hf alternating current (50 or 60 HY is sufficient)" is replaced by "50 to 100 V%, preferably about 70 to 90 V%. If it is less than 50 V%, the peeling speed is extremely slow and impractical. Electrolytic method is an alternating current of 1 to 1000 Hz (50
or 60Hz is sufficient).

5、 明11書 4頁下から6行目〜同5行目「特に5
0〜100%硫酸、望ましくは70佛硫酸浴を用いて」
とあるを、 「特に50〜100v%硫酸、望ましくは7QV%傾酸
浴を用いて」に補正する。
5. Mei 11, page 4, lines 6 to 5 from the bottom, “Especially 5.
0-100% sulfuric acid, preferably using a 70% sulfuric acid bath.
The statement has been corrected to "particularly using 50-100v% sulfuric acid, preferably a 7QV% diluted acid bath."

以  上 代画人 最 上   務 特許請求の範囲 ロジウム着面を有する物品を硫酸a度列二用V%浴中(
′ζ浸漬し、交流電解を行ない黒い吸着物(下地の金属
の酸化物)が物品の表面&を均一に析出した後、超音波
、/・ケコスリ等によシ洗い流し、物品着面よりロジウ
ム被膜が完全に除去きれるまで前述の工程を繰シ返すこ
と(r−特徴とするロジウム剥離方法。
The above-mentioned artist's top claims claim: An article having a rhodium-plated surface in a sulfuric acid bath (
After immersing the article in AC electrolysis and depositing black adsorbate (oxide of the underlying metal) uniformly on the surface of the article, it is rinsed off using ultrasonic waves, scraping, etc., and the rhodium coating is removed from the surface of the article. The above-mentioned steps are repeated until the rhodium is completely removed.

Claims (1)

【特許請求の範囲】 ロジウム表面を有する物品を硫酸濃度50〜100チ浴
中に浸漬し、交流電解を行ない黒い吸着物(下地の金属
の酸化物)が物品の表面に均一に析出した後、超音波、
ハケコスリ等により洗い流し。 物品表面よりロジウム被膜が完全に除去されるまで前述
の工程を繰り返すことを%徴とするロジウム剥離方法。
[Claims] After immersing an article with a rhodium surface in a sulfuric acid bath with a concentration of 50 to 100% and performing AC electrolysis to uniformly deposit black adsorbate (oxide of the underlying metal) on the surface of the article, ultrasound,
Wash it off with a brush, etc. A rhodium removal method that involves repeating the above steps until the rhodium coating is completely removed from the surface of the article.
JP10872982A 1982-06-24 1982-06-24 Stripping method of rhodium Granted JPS58224200A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10872982A JPS58224200A (en) 1982-06-24 1982-06-24 Stripping method of rhodium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10872982A JPS58224200A (en) 1982-06-24 1982-06-24 Stripping method of rhodium

Publications (2)

Publication Number Publication Date
JPS58224200A true JPS58224200A (en) 1983-12-26
JPS6159400B2 JPS6159400B2 (en) 1986-12-16

Family

ID=14492052

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10872982A Granted JPS58224200A (en) 1982-06-24 1982-06-24 Stripping method of rhodium

Country Status (1)

Country Link
JP (1) JPS58224200A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6357800A (en) * 1986-08-26 1988-03-12 Chem Yamamoto:Kk Method for removing zinc film formed on surface of iron and steel products
JP2004018954A (en) * 2002-06-17 2004-01-22 Takahisa Deguchi Production method for titanium-based metal product, and titanium-based metal product

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6357800A (en) * 1986-08-26 1988-03-12 Chem Yamamoto:Kk Method for removing zinc film formed on surface of iron and steel products
JP2004018954A (en) * 2002-06-17 2004-01-22 Takahisa Deguchi Production method for titanium-based metal product, and titanium-based metal product
JP4570315B2 (en) * 2002-06-17 2010-10-27 埼玉県 Method for producing titanium metal product and titanium metal product

Also Published As

Publication number Publication date
JPS6159400B2 (en) 1986-12-16

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