JPS5914100B2 - Electroless nickel plating method for high nickel chromium alloys - Google Patents

Electroless nickel plating method for high nickel chromium alloys

Info

Publication number
JPS5914100B2
JPS5914100B2 JP10134579A JP10134579A JPS5914100B2 JP S5914100 B2 JPS5914100 B2 JP S5914100B2 JP 10134579 A JP10134579 A JP 10134579A JP 10134579 A JP10134579 A JP 10134579A JP S5914100 B2 JPS5914100 B2 JP S5914100B2
Authority
JP
Japan
Prior art keywords
nickel
nickel plating
plating
electroless
plating method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10134579A
Other languages
Japanese (ja)
Other versions
JPS5625958A (en
Inventor
与司夫 滝沢
一夫 戸田
好正 白石
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP10134579A priority Critical patent/JPS5914100B2/en
Publication of JPS5625958A publication Critical patent/JPS5625958A/en
Publication of JPS5914100B2 publication Critical patent/JPS5914100B2/en
Expired legal-status Critical Current

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  • Chemically Coating (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Description

【発明の詳細な説明】 本発明は高ニッケル、クロム合金、たとえば高級ステン
レス鋼、カーペンタ−、バスアロイ、インコネル600
等への密着性のすぐれた無電解ニッケルメッキを施す方
法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention applies to high nickel, chromium alloys such as high grade stainless steel, carpenter, bath alloy, Inconel 600
The present invention relates to a method for applying electroless nickel plating with excellent adhesion to surfaces such as the like.

一般に高ニッケルクロム合金への直接ニッケルメッキは
通常の電気メッキ法によると密着性が乏5 しく、実用
できない。したがつて密着性を向上させるために行なわ
れている前処理(脱脂、酸洗)→ニッケルストライクメ
ッキ→電気ニッケルメッキの工程が示すように、ニッケ
ルストライクメッキが必要条件であり、さらにその前処
理としての10脱脂、酸洗による表面活性化がメッキの
密着性を改善する重要なポイントとなる。ところで高ニ
ッケル、クロム合金に密着性のよい無電解ニッケルメッ
キを施す必要がある場合、たとえば無電解ニッケルメッ
キで得られるNi−P15合金による硬度を要求する場
合がある。
Generally, direct nickel plating on high nickel chromium alloys is not practical due to poor adhesion when using normal electroplating methods. Therefore, as shown in the process of pretreatment (degreasing, pickling) → nickel strike plating → electrolytic nickel plating, which is performed to improve adhesion, nickel strike plating is a necessary condition, and the pretreatment 10 Degreasing and surface activation by pickling are important points for improving plating adhesion. By the way, when it is necessary to apply electroless nickel plating with good adhesion to a high nickel or chromium alloy, for example, the hardness of Ni-P15 alloy obtained by electroless nickel plating may be required.

本発明の方法はこの場合の要求に応えるものであるが、
従来直接無電解メッキによつては前工程の如何にかかわ
らず密着性のあるニッケルメッキを施すことは困難であ
つた。たとえは、前処理として溶剤脱20脂後、硝フッ
酸による酸洗、活性化を強力に施し、たゞちに無電解メ
ッキを行なつても、密着性のあるニッケルメッキを得る
ことはできない。これは無電解メッキ液中においてニッ
ケルの還元析出に先だつて被処理面の不活性化が進行す
るためと考25えられる。したがつて無電解ニッケルメ
ッキの前工程として上述の電気メッキ工程におけると同
様ニッケルストライクメッキが必要であり、高ニッケル
、クロム被処理面に適切な事前活性化を行なうことで密
着性のあるニッケルストライクメッキ30は可能である
。ところが、つゞいて電気ニッケルメッキの場合には通
常の方法で好結果が得られるが、無電解ニッケルメッキ
で仕上げる場合にはニッケルストライク面と無電解ニッ
ケルメッキ面の密着性が悪く、剥離現象を起す。35本
発明者等はこの密着性を改善するために種々試験検討し
た結果、ストライクニッケル面に対してさらに硝フッ酸
溶液等の強酸で酸処理、活性化を行ない、水洗後たマち
に無電解ニツケルメツキを施すことで、ほマ完全に近い
密着性が得られることを見出した。
Although the method of the present invention meets the needs of this case,
Conventionally, it has been difficult to apply nickel plating with good adhesion using direct electroless plating, regardless of the previous process. For example, even if you remove 20% of the solvent as a pre-treatment, pickle with nitric-hydrofluoric acid, and then perform strong activation, and immediately perform electroless plating, it is not possible to obtain nickel plating with good adhesion. . This is thought to be due to the fact that the surface to be treated is inactivated prior to the reduction and precipitation of nickel in the electroless plating solution25. Therefore, as a pre-process of electroless nickel plating, nickel strike plating is required as in the electroplating process described above, and by performing appropriate pre-activation on the surface to be treated with high nickel and chromium, nickel strike plating with good adhesion can be achieved. Plating 30 is possible. However, in the case of electrolytic nickel plating, good results can be obtained using normal methods, but when finishing with electroless nickel plating, the adhesion between the nickel strike surface and the electroless nickel plated surface is poor, resulting in a peeling phenomenon. cause. 35 As a result of various tests and studies in order to improve this adhesion, the present inventors further acid-treated and activated the strike nickel surface with a strong acid such as nitric-hydrofluoric acid solution, and after washing with water, it was immediately removed. It has been discovered that by applying electrolytic nickel plating, nearly perfect adhesion can be obtained.

また酸処理活性化の代りにニツケルメツキ液中において
陽極とし、比較的低電流密度で電解溶出してもほゾ同様
な効果が得られる。密着性はメツキ仕上げ試料を180
0に2つ折りとし、折り曲げ部剥離亀裂のないことを目
安とした。一連のメツキ工程において、ストライクメツ
キにより析出したニツケル面に対してさらに酸処理、活
性化を行なうことは、これまでに実例もなく文献等にも
紹介されていないことであり、これは本発明の新規な処
理であつて、現状では密着性改善作用の機構について明
らかにされるに至つていないが、酸処理によるストライ
クニツケル表面の溶出作用によつて、ミクロ的には素地
合金の部分的顕出等も考えられ、表面に存在する金属の
電位関係が無電解ニツケルメツキの析出と、密着性に好
結果に作用していると考えられる。このように本発明の
方法は前処理(脱脂、酸濁につマいてストライクニツケ
ルメツキ→酸処理活性化→無電解ニツケルメツキの一連
の処理工程を特徴とする高ニツケル、クロム合金の無電
解ニツケルメツキ法である。ニツケルストライクメツキ
浴は代表的にはNict224O9/T,HctlOO
〜125111′tを含む。
Furthermore, instead of activation by acid treatment, the same effect can be obtained by using the material as an anode in a nickel plating solution and electrolytically dissolving it at a relatively low current density. Adhesion is 180 for the plating finish sample.
The paper was folded in half at the same angle as the paper, and the criterion was that there should be no peeling cracks at the folded part. In a series of plating processes, further acid treatment and activation of the nickel surface precipitated by strike plating has not been demonstrated in practice or introduced in literature, etc., and this is a feature of the present invention. This is a new treatment, and the mechanism of its adhesion improvement effect has not yet been clarified.However, due to the elution of the strike nickel surface caused by the acid treatment, it is possible to partially reveal the base alloy on a microscopic level. It is thought that the potential relationship of the metals present on the surface has a favorable effect on the deposition of electroless nickel plating and the adhesion. As described above, the method of the present invention is an electroless nickel plating method for high nickel and chromium alloys, which is characterized by a series of pretreatment steps (strike nickel plating for degreasing and acid turbidity → acid treatment activation → electroless nickel plating). Nickel strike plating baths are typically Nict224O9/T, HctlOO
~125111't.

本発明の方法において、無電解ニツケルメツキの直前に
なされる活性化処理に使用される酸としてはHct,H
F,およびHNO3とHCtまたはHFの混合物である
In the method of the present invention, the acids used in the activation treatment performed immediately before electroless nickel plating include Hct, H
F, and a mixture of HNO3 and HCt or HF.

その濃度は通常20%以下である。本発明の方法におい
てニツケルストライクメツキ層の活性化のための陽極電
解溶出処理はニツケルメツキ液中で陽極酸化を起さない
で溶出の起る程度の条件で実施する。
Its concentration is usually less than 20%. In the method of the present invention, the anodic electrolysis elution treatment for activating the nickel strike plating layer is carried out in a nickel plating solution under conditions that allow elution to occur without causing anodic oxidation.

本発明の方法に使用される無電解ニツケルメツキ液は代
表的にはNlCt23Of!/t1次亜りん酸ナトリウ
ム309/t1酢酸ナトリウム109/tを含みPH5
に調整されたものであるが、諸種の添加剤を含む市販品
がある。
The electroless nickel plating solution used in the method of the invention is typically NlCt23Of! /t1 Sodium hypophosphite 309/t1 Sodium acetate 109/t Contains PH5
However, there are commercially available products containing various additives.

浴は通常90〜100゜Cに加熱される。次に本発明の
実施例を示す。
The bath is usually heated to 90-100°C. Next, examples of the present invention will be shown.

実施例−1 インコネル600(組成、Ni:76.0%、Cr:1
6.0%、Fe:7.0%)板材(厚さ1TfL0を、
トリクレン蒸気脱脂によつて予備脱脂し、水洗後、Na
sPO4459/T,.Na2CO3ll9/T.Na
OH239/tを含む7『Cの電解液中で2.8A/D
m2(陰極)の電流密度で2分間電解脱脂し、水洗後、
HNO3l5%、HF37Oを含む硝フツ酸混液に55
゜Cで2分間浸して酸処理活性化を行い、ついでNiC
t224Of!/T.HCtlOOcc/tを含むスト
ライクメツキ液中で常温で10A/Dm2O)電流密度
で2分間ストライクメツキを行い、水洗後、再び上記の
酸処理活性化(HNO3l5%,HF3%,55゜C)
を30秒間行い、水洗後直ちに無電解ニツケルメツキを
施した。
Example-1 Inconel 600 (composition, Ni: 76.0%, Cr: 1
6.0%, Fe: 7.0%) plate material (thickness 1TfL0,
Preliminary degreasing by triclene vapor degreasing, washing with water, Na
sPO4459/T,. Na2CO3ll9/T. Na
2.8A/D in 7'C electrolyte containing OH239/t
After electrolytic degreasing for 2 minutes at a current density of m2 (cathode) and washing with water,
55 to a nitric fluoric acid mixture containing 5% HNO3l and HF37O.
After soaking at °C for 2 minutes to activate the acid treatment, the NiC
t224Of! /T. Strike plating was performed for 2 minutes at a current density of 10 A/Dm2O at room temperature in a strike plating solution containing HCtlOOcc/t, and after washing with water, the above acid treatment was activated again (HNO3l 5%, HF 3%, 55°C).
was carried out for 30 seconds, and immediately after washing with water, electroless nickel plating was applied.

無電解ニツケルメツキはカニゼン「ブルーシェーマ一」
を用い、9『Cで10分浸漬した。
Electroless Nickel Metsuki is Kanizen's "Blue Schema No. 1"
It was immersed for 10 minutes at 9'C.

この無電解ニツケルメツキによつて4μのニツケルメツ
キ層が形成された。本実施例により無電解ニツケルメツ
キ仕上げした試料のメツキ密着性を180メ、2つ折り
曲げ試験により調べた、その結果剥離亀裂は存在せず十
分な密着性を有するものであつた。
A 4μ thick nickel plating layer was formed by this electroless nickel plating. The plating adhesion of the sample finished with electroless nickel plating according to this example was examined by a 180-meter double-folding test, and the results showed that there were no peeling cracks and that the sample had sufficient adhesion.

これに対し上記と同じ条件で、たゾしニツケルストライ
クメツキ後の酸処理活性化を省略して得た試料は180
キ折り曲げ試験により折り曲げ部全面の剥離を生じ、ス
トライクニツケル面と無電解メツキ面が容易に剥離し、
密着性は得られなかつた。
On the other hand, the sample obtained under the same conditions as above but omitting the acid treatment activation after nickel strike plating had 180%
The bending test caused peeling of the entire bent part, and the strike nickel surface and electroless plating surface peeled off easily.
Adhesion could not be obtained.

実施例−2 インゴネル600の代りにハステロイG(組成、Fe:
19.570,.Cr:22%、MO:6.5%、Cu
:270,.Nb:2%、Ni:残部)の1闘厚の板材
を用いて同じ条件でたゾし、無電解ニツケルメツキの直
前の活性処理を、陽極電解溶出処理によつて行い、無電
解ニツケルメツキを施し、厚さ4μのメツキ層を得た。
Example-2 Hastelloy G (composition, Fe:
19.570,. Cr: 22%, MO: 6.5%, Cu
:270,. A plate material of 1 thickness (Nb: 2%, Ni: balance) was heated under the same conditions, and the activation treatment immediately before electroless nickel plating was performed by anodic electrolytic elution treatment, and electroless nickel plating was performed. A plating layer with a thickness of 4 μm was obtained.

陽極電解溶出処理は、NlCt,24OみAlHCll
OOCC/tを含む電解液を用い、常温で、0.5A/
Dm2の電流密度で3分間通電して行つた。
Anodic electrolytic elution treatment includes NlCt, 24O and AlHCll.
Using an electrolyte containing OOCC/t, at room temperature, 0.5A/
Electricity was applied for 3 minutes at a current density of Dm2.

Claims (1)

【特許請求の範囲】 1 無電解ニッケルメッキの前工程としてニッケルスト
ライクメッキを施し、これに続いてニッケルストライク
メッキを施した面の活性化処理を行なうことを特徴とす
る高ニッケルクロム合金への無電解ニッケルメッキ法。 2 該活性化処理が強酸による処理であることを特徴と
する特許請求の範囲第1項記載の無電解ニッケルメッキ
法。 3 該強酸が塩酸、フッ化水素酸、または硝酸と塩酸ま
たはフッ化水素酸の混合物である特許請求の範囲第2項
記載の無電解ニッケルメッキ法。 4 該活性処理が陽極電解溶出処理であることを特徴と
する特許請求の範囲第1項記載の無電解ニッケルメッキ
法。
[Claims] 1. An application to a high nickel chromium alloy characterized by applying nickel strike plating as a pre-process of electroless nickel plating, and subsequently performing activation treatment on the nickel strike plated surface. Electrolytic nickel plating method. 2. The electroless nickel plating method according to claim 1, wherein the activation treatment is treatment with a strong acid. 3. The electroless nickel plating method according to claim 2, wherein the strong acid is hydrochloric acid, hydrofluoric acid, or a mixture of nitric acid and hydrochloric acid or hydrofluoric acid. 4. The electroless nickel plating method according to claim 1, wherein the activation treatment is an anodic electrolytic elution treatment.
JP10134579A 1979-08-10 1979-08-10 Electroless nickel plating method for high nickel chromium alloys Expired JPS5914100B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10134579A JPS5914100B2 (en) 1979-08-10 1979-08-10 Electroless nickel plating method for high nickel chromium alloys

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10134579A JPS5914100B2 (en) 1979-08-10 1979-08-10 Electroless nickel plating method for high nickel chromium alloys

Publications (2)

Publication Number Publication Date
JPS5625958A JPS5625958A (en) 1981-03-12
JPS5914100B2 true JPS5914100B2 (en) 1984-04-03

Family

ID=14298240

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10134579A Expired JPS5914100B2 (en) 1979-08-10 1979-08-10 Electroless nickel plating method for high nickel chromium alloys

Country Status (1)

Country Link
JP (1) JPS5914100B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015035945A (en) * 2013-07-12 2015-02-19 ミネベア株式会社 Spindle motor and hard disk device

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH063287B2 (en) * 1986-03-31 1994-01-12 住友金属工業株式会社 Light water reactor steam generator tube
KR100837607B1 (en) 2007-03-09 2008-06-12 주식회사 대경미터기 Electroless nikel plating method of a water metel
CN104279232A (en) * 2013-07-12 2015-01-14 美蓓亚株式会社 Spindle motor and hard disk device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015035945A (en) * 2013-07-12 2015-02-19 ミネベア株式会社 Spindle motor and hard disk device

Also Published As

Publication number Publication date
JPS5625958A (en) 1981-03-12

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