JPS5822381A - プラズマエツチング方法およびそのための装置 - Google Patents
プラズマエツチング方法およびそのための装置Info
- Publication number
- JPS5822381A JPS5822381A JP11917781A JP11917781A JPS5822381A JP S5822381 A JPS5822381 A JP S5822381A JP 11917781 A JP11917781 A JP 11917781A JP 11917781 A JP11917781 A JP 11917781A JP S5822381 A JPS5822381 A JP S5822381A
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- parallel
- plasma
- etching
- magnetic field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 16
- 238000001020 plasma etching Methods 0.000 title claims abstract description 13
- 238000005530 etching Methods 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims description 14
- 230000005684 electric field Effects 0.000 claims 3
- 230000001939 inductive effect Effects 0.000 claims 1
- 239000002994 raw material Substances 0.000 claims 1
- 238000012545 processing Methods 0.000 abstract description 4
- 239000011148 porous material Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 11
- 238000001312 dry etching Methods 0.000 description 10
- 150000002500 ions Chemical class 0.000 description 9
- 150000003254 radicals Chemical class 0.000 description 5
- 229910001220 stainless steel Inorganic materials 0.000 description 5
- 239000010935 stainless steel Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- 238000010849 ion bombardment Methods 0.000 description 3
- 238000000992 sputter etching Methods 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 150000005837 radical ions Chemical class 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11917781A JPS5822381A (ja) | 1981-07-31 | 1981-07-31 | プラズマエツチング方法およびそのための装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11917781A JPS5822381A (ja) | 1981-07-31 | 1981-07-31 | プラズマエツチング方法およびそのための装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5822381A true JPS5822381A (ja) | 1983-02-09 |
| JPH0245715B2 JPH0245715B2 (enrdf_load_stackoverflow) | 1990-10-11 |
Family
ID=14754811
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11917781A Granted JPS5822381A (ja) | 1981-07-31 | 1981-07-31 | プラズマエツチング方法およびそのための装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5822381A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3500328A1 (de) | 1985-01-07 | 1986-07-10 | Nihon Shinku Gijutsu K.K., Chigasaki, Kanagawa | Zerstaeubungsaetzvorrichtung |
| JPS63140089A (ja) * | 1986-12-01 | 1988-06-11 | Anelva Corp | アルミニウム合金膜のエツチング方法とその装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5435172A (en) * | 1977-08-24 | 1979-03-15 | Anelva Corp | Chemical reactor using electric discharge |
-
1981
- 1981-07-31 JP JP11917781A patent/JPS5822381A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5435172A (en) * | 1977-08-24 | 1979-03-15 | Anelva Corp | Chemical reactor using electric discharge |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3500328A1 (de) | 1985-01-07 | 1986-07-10 | Nihon Shinku Gijutsu K.K., Chigasaki, Kanagawa | Zerstaeubungsaetzvorrichtung |
| JPS63140089A (ja) * | 1986-12-01 | 1988-06-11 | Anelva Corp | アルミニウム合金膜のエツチング方法とその装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0245715B2 (enrdf_load_stackoverflow) | 1990-10-11 |
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