JPS58199736A - Manufacture of quartz glass - Google Patents
Manufacture of quartz glassInfo
- Publication number
- JPS58199736A JPS58199736A JP8376082A JP8376082A JPS58199736A JP S58199736 A JPS58199736 A JP S58199736A JP 8376082 A JP8376082 A JP 8376082A JP 8376082 A JP8376082 A JP 8376082A JP S58199736 A JPS58199736 A JP S58199736A
- Authority
- JP
- Japan
- Prior art keywords
- container
- quartz glass
- gel
- glass
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Silicon Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は石英ガラスの製造法に係わり、更に詳しくはア
ルキルシリケートを加水分解して作ったシリカゲルの乾
燥時、溶媒の蒸発、除去を容器の周辺から行ない、しか
る後、焼成し石英ガラスとする石英ガラスの製造法に関
する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing quartz glass, and more specifically, during drying of silica gel made by hydrolyzing alkyl silicate, the solvent is evaporated and removed from the periphery of the container, and then, This invention relates to a method for producing quartz glass by firing it into quartz glass.
石英ガラスはその耐薬品性、耐熱性等の優れた性質を有
するガラスである。Silica glass is a glass with excellent properties such as chemical resistance and heat resistance.
このような優れた性質を有するため、石英ガラスは光学
用機器、理化学用器具、化学工業の材料として多種多様
な形状で使用されている。そして、又、その需要は年々
増加の傾向にある。Because of these excellent properties, quartz glass is used in a wide variety of shapes as a material for optical equipment, physical and chemical instruments, and the chemical industry. Moreover, the demand is increasing year by year.
しかし、従来の溶融法と呼ばれる石英ガラスの製造法で
は、天然水晶、又は高純度の硅挙を原料とし、水洗1選
別、弗酸処理、ばい焼、粉砕等の複雑な処理工程を経、
最後に2000℃位の高温で溶融と、非常に長い工程を
経るため高価となる欠点がある。又、高温で処理するた
め、消費されるエネルギーは実大となる。However, in the conventional manufacturing method of quartz glass called the fusion method, natural quartz or high-purity silica is used as a raw material, and it undergoes complicated processing steps such as washing with water, sorting, hydrofluoric acid treatment, roasting, and pulverization.
Finally, it requires a very long process of melting at a high temperature of about 2000°C, which has the disadvantage of being expensive. Furthermore, since the process is carried out at high temperatures, the amount of energy consumed is actually large.
これに対し、最近、複雑な工程を経ることなく、100
0℃位の低温で石英ガラスができるゾル−ゲル法が注目
されている。このゾル−ゲル法はケイ酸エチルを加水分
解して得たケイ酸ゲルを乾燥固化、焼成してガラスを得
る方法である。On the other hand, recently, 100
The sol-gel method, which produces silica glass at a low temperature of about 0°C, is attracting attention. This sol-gel method is a method in which glass is obtained by drying, solidifying, and firing a silicic acid gel obtained by hydrolyzing ethyl silicate.
このゾル−ゲル法は従来の溶融法に比べて、原料精製や
均質化等が容易であるなど、高品質のガラスを得る上で
多くの利点を有する。This sol-gel method has many advantages over conventional melting methods in obtaining high-quality glass, such as easier raw material purification and homogenization.
しかし、このゾル−ゲル法では大きなガラスが得られな
い欠点がある。この得られない理由の一つとして次の理
由が考えられる。However, this sol-gel method has the disadvantage that large glasses cannot be obtained. One of the reasons why this cannot be obtained is as follows.
従来のゾル−ゲル法では乾燥ゲルを作るとき、容器をア
ルミホイルでふたをし、ピンホール等の穴をあけ蒸発量
を制御していた。In the conventional sol-gel method, when making a dry gel, the container was covered with aluminum foil and holes such as pinholes were made to control the amount of evaporation.
しかし、この方法ではアルミホイルが触媒の塩酸におか
され、穴の径が変わり、良い結果が得られなかった。又
、容器に対して穴の数がすくなく、穴の面積がせまいた
め、容器全体にわたる蒸発量の均一な制御ができなく、
局所的な乾燥がおこ′す、われたり、そったりした。However, this method did not produce good results because the aluminum foil was exposed to the hydrochloric acid catalyst, which changed the diameter of the holes. In addition, since the number of holes and the area of the holes are small relative to the container, it is not possible to uniformly control the amount of evaporation throughout the container.
Localized dryness may occur, causing cracking or flaking.
本発明の目的はこのような欠点を改良する手段を提供す
ることにある。The object of the present invention is to provide means for improving these drawbacks.
第1図は従来の容器とふたの関係をあられす図であり、
1はシャーレ等の容器、2はアルミホイル、3はピンホ
ールをあられす。Figure 1 shows the relationship between a conventional container and a lid.
1 is a container such as a petri dish, 2 is aluminum foil, and 3 is a pinhole.
図よりわかるように、こりようなピンホールで蒸発量を
制御した場合、穴のまわりの蒸発量が多くなり、局所的
な乾燥が起こり、そりや、割れが発生する。As can be seen from the figure, if the amount of evaporation is controlled using a large pinhole, the amount of evaporation around the hole will increase, causing local drying and causing warping and cracking.
これに対する本発明の製造法を第2図を参照しつつ説明
する。図において、4はシャーレ等の容器を、5はガラ
ス、アクリル等の平板のフタを、6はスペーサを示す。The manufacturing method of the present invention for this purpose will be explained with reference to FIG. In the figure, 4 indicates a container such as a petri dish, 5 indicates a flat lid made of glass, acrylic, etc., and 6 indicates a spacer.
図に示す容器の中にケイ酸エチルの加水分解物を注入し
、図のように装置を組み立て、クリップ等で固定して乾
燥器にいれ一定の温度で適当な時間放置して乾燥ゲルを
得、しかる後、焼成することにより石英ガラスを得る。Pour the hydrolyzate of ethyl silicate into the container shown in the figure, assemble the device as shown, fix it with clips, etc., and put it in a dryer and leave it at a constant temperature for an appropriate time to obtain a dry gel. , and then fired to obtain quartz glass.
図よりわかるように本発明の製造法で用いられる装置に
よれば、溶媒の蒸発量を点状ではなく、線状にまわりか
ら効率よく除去できる。このため部分的な乾燥がなくな
り、そりとかわれの現象がでにくいことが予想できる。As can be seen from the figure, according to the apparatus used in the production method of the present invention, the amount of evaporated solvent can be efficiently removed from the surroundings in a linear manner rather than in a dotted manner. For this reason, it can be expected that local drying will be eliminated and the phenomena of warping and cracking will be less likely to occur.
以下実施例により本発明の態様を更に詳しく説明する。Embodiments of the present invention will be explained in more detail with reference to Examples below.
実施例1
エチルシリケー)44.71.エタノール6 s L、
α1N塩酸40 m lをフラスコにとり、3時間攪拌
混合し、エチルシリケートの加水分解を行なった。Example 1 Ethyl silica) 44.71. Ethanol 6 s L,
40 ml of α1N hydrochloric acid was placed in a flask and stirred and mixed for 3 hours to hydrolyze ethyl silicate.
加水分解後、この混合物を内径5(1mのシャーレにと
った。続いてシャーレのふちに10μ惰のシリコーンゴ
ムを4個配置し、その上にガラス板でふたをし、60℃
の恒温槽に乾燥するまで放置し、乾燥ゲルとした。得ら
れた乾燥ゲルは直径35wasであった。更にこの乾燥
ゲルを昇温速度13℃、、’hr1ooo℃まで昇濃し
石英ガラスとした。After hydrolysis, this mixture was placed in a Petri dish with an inner diameter of 5 (1 m). Next, four pieces of 10μ silicone rubber were placed on the edge of the Petri dish, a glass plate was placed on top of the lid, and the mixture was heated at 60°C.
The mixture was left in a constant temperature bath until dry to form a dry gel. The resulting dry gel had a diameter of 35 was. Further, this dried gel was heated to a temperature of 13° C. and concentrated to 100° C. to form quartz glass.
尚石英ガラスの確認は比重、赤外lIl@収スペクトル
、硬度t xmtm折等の分析手段を用いて行なった。The presence of quartz glass was confirmed using analytical means such as specific gravity, infrared IR spectrum, and hardness txmtm spectroscopy.
以上述べたように本発明の石英ガラスの゛製造法を用い
れば石英ガラスが簡単に、安く製造できるものである。As described above, quartz glass can be manufactured easily and inexpensively by using the quartz glass manufacturing method of the present invention.
そのため従来、高価なため使用できなかった分野にも用
いられるようになり、その耐熱性、耐薬品性等の偉力を
発揮するものである。Therefore, it has come to be used in fields where it could not be used in the past due to its high price, and it exhibits great properties such as heat resistance and chemical resistance.
第1図はゾル−ゲル法により石英ガラスを製造する場合
の、乾燥ゲルの従来の製造装置を示す。
図において、1はシャーレ、2はアルミホイル。
3はピンホールを表わす。
第2図は本発明の製造法で用いる装置図であり、4はシ
ャーレ、5はふた、6はスペーサを表わすO
以 上
出願人 株式会社諏訪精工舎
代理人 弁理士 最上 務
←
第211FIG. 1 shows a conventional apparatus for producing dry gel when producing quartz glass by the sol-gel method. In the figure, 1 is a petri dish and 2 is aluminum foil. 3 represents a pinhole. Figure 2 is a diagram of the apparatus used in the manufacturing method of the present invention, where 4 represents a petri dish, 5 represents a lid, and 6 represents a spacer.
Claims (1)
成することにより石英ガラスとする石英ガラス製造法に
おいて、シリカゲルの乾燥時、容器の周辺から溶媒の除
去、乾燥を行なうことを特徴とする石英ガラスの製造法
。A method for producing quartz glass in which silica glass is produced by hydrolyzing alkyl silicate and drying and firing silica gel, which method comprises removing the solvent from the periphery of the container and drying the silica gel when drying the silica gel. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8376082A JPS58199736A (en) | 1982-05-18 | 1982-05-18 | Manufacture of quartz glass |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8376082A JPS58199736A (en) | 1982-05-18 | 1982-05-18 | Manufacture of quartz glass |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58199736A true JPS58199736A (en) | 1983-11-21 |
JPH025693B2 JPH025693B2 (en) | 1990-02-05 |
Family
ID=13811518
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8376082A Granted JPS58199736A (en) | 1982-05-18 | 1982-05-18 | Manufacture of quartz glass |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58199736A (en) |
-
1982
- 1982-05-18 JP JP8376082A patent/JPS58199736A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH025693B2 (en) | 1990-02-05 |
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