JPS58198843A - イオン注入装置 - Google Patents
イオン注入装置Info
- Publication number
- JPS58198843A JPS58198843A JP57081782A JP8178282A JPS58198843A JP S58198843 A JPS58198843 A JP S58198843A JP 57081782 A JP57081782 A JP 57081782A JP 8178282 A JP8178282 A JP 8178282A JP S58198843 A JPS58198843 A JP S58198843A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- ion implantation
- disk
- wafer
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005468 ion implantation Methods 0.000 title claims abstract description 79
- 235000012431 wafers Nutrition 0.000 claims abstract description 83
- 230000007246 mechanism Effects 0.000 claims abstract description 10
- 150000002500 ions Chemical class 0.000 claims description 31
- 238000002347 injection Methods 0.000 claims description 17
- 239000007924 injection Substances 0.000 claims description 17
- 238000010884 ion-beam technique Methods 0.000 abstract description 27
- 238000001816 cooling Methods 0.000 description 12
- 239000000498 cooling water Substances 0.000 description 6
- 239000002826 coolant Substances 0.000 description 5
- 230000001965 increasing effect Effects 0.000 description 5
- 238000002513 implantation Methods 0.000 description 4
- 238000013519 translation Methods 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 241001122767 Theaceae Species 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 241000257465 Echinoidea Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000005465 channeling Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57081782A JPS58198843A (ja) | 1982-05-15 | 1982-05-15 | イオン注入装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57081782A JPS58198843A (ja) | 1982-05-15 | 1982-05-15 | イオン注入装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58198843A true JPS58198843A (ja) | 1983-11-18 |
| JPS6322410B2 JPS6322410B2 (https=) | 1988-05-11 |
Family
ID=13756046
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57081782A Granted JPS58198843A (ja) | 1982-05-15 | 1982-05-15 | イオン注入装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58198843A (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0230048A (ja) * | 1988-05-18 | 1990-01-31 | Varian Assoc Inc | バッチ式イオン注入装置用ディスク走査装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5697954A (en) * | 1980-01-07 | 1981-08-07 | Hitachi Ltd | Ion-implantation device |
-
1982
- 1982-05-15 JP JP57081782A patent/JPS58198843A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5697954A (en) * | 1980-01-07 | 1981-08-07 | Hitachi Ltd | Ion-implantation device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0230048A (ja) * | 1988-05-18 | 1990-01-31 | Varian Assoc Inc | バッチ式イオン注入装置用ディスク走査装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6322410B2 (https=) | 1988-05-11 |
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