JPS58194033A - パレスレ−ザ−光による直接製版法及びその装置 - Google Patents

パレスレ−ザ−光による直接製版法及びその装置

Info

Publication number
JPS58194033A
JPS58194033A JP57078016A JP7801682A JPS58194033A JP S58194033 A JPS58194033 A JP S58194033A JP 57078016 A JP57078016 A JP 57078016A JP 7801682 A JP7801682 A JP 7801682A JP S58194033 A JPS58194033 A JP S58194033A
Authority
JP
Japan
Prior art keywords
photosensitive resin
dial
laser light
light
making method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57078016A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0421854B2 (enExample
Inventor
Masataka Murahara
村原正隆
Koichi Toyoda
難波進
Susumu Nanba
豊田浩一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN
Original Assignee
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN filed Critical RIKEN
Priority to JP57078016A priority Critical patent/JPS58194033A/ja
Publication of JPS58194033A publication Critical patent/JPS58194033A/ja
Publication of JPH0421854B2 publication Critical patent/JPH0421854B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP57078016A 1982-05-10 1982-05-10 パレスレ−ザ−光による直接製版法及びその装置 Granted JPS58194033A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57078016A JPS58194033A (ja) 1982-05-10 1982-05-10 パレスレ−ザ−光による直接製版法及びその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57078016A JPS58194033A (ja) 1982-05-10 1982-05-10 パレスレ−ザ−光による直接製版法及びその装置

Publications (2)

Publication Number Publication Date
JPS58194033A true JPS58194033A (ja) 1983-11-11
JPH0421854B2 JPH0421854B2 (enExample) 1992-04-14

Family

ID=13649993

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57078016A Granted JPS58194033A (ja) 1982-05-10 1982-05-10 パレスレ−ザ−光による直接製版法及びその装置

Country Status (1)

Country Link
JP (1) JPS58194033A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05263942A (ja) * 1992-01-21 1993-10-12 Seiji Nagayoshi シールパッキン
JP2001188354A (ja) * 1999-12-28 2001-07-10 Asahi Kasei Corp 感光性樹脂凸版の製造方法、及びその製造装置
JP2008500577A (ja) * 2004-05-25 2008-01-10 マクダーミッド プリンティング ソリューションズ， エルエルシー レリーフ画像印刷版を予備露光させる方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52119126A (en) * 1976-03-31 1977-10-06 Asahi Chemical Ind Microtypewriter

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52119126A (en) * 1976-03-31 1977-10-06 Asahi Chemical Ind Microtypewriter

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05263942A (ja) * 1992-01-21 1993-10-12 Seiji Nagayoshi シールパッキン
JP2001188354A (ja) * 1999-12-28 2001-07-10 Asahi Kasei Corp 感光性樹脂凸版の製造方法、及びその製造装置
JP2008500577A (ja) * 2004-05-25 2008-01-10 マクダーミッド プリンティング ソリューションズ， エルエルシー レリーフ画像印刷版を予備露光させる方法
JP4754559B2 (ja) * 2004-05-25 2011-08-24 マクダーミッド プリンティング ソリューションズ， エルエルシー レリーフ画像印刷版を予備露光させる方法

Also Published As

Publication number Publication date
JPH0421854B2 (enExample) 1992-04-14

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