JPS58193453U - Backscattered electron detection device in electron beam equipment - Google Patents

Backscattered electron detection device in electron beam equipment

Info

Publication number
JPS58193453U
JPS58193453U JP8736182U JP8736182U JPS58193453U JP S58193453 U JPS58193453 U JP S58193453U JP 8736182 U JP8736182 U JP 8736182U JP 8736182 U JP8736182 U JP 8736182U JP S58193453 U JPS58193453 U JP S58193453U
Authority
JP
Japan
Prior art keywords
electron
sample stage
electron beam
backscattered
detection device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8736182U
Other languages
Japanese (ja)
Other versions
JPH0530278Y2 (en
Inventor
繁 鈴木
Original Assignee
株式会社明石製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社明石製作所 filed Critical 株式会社明石製作所
Priority to JP8736182U priority Critical patent/JPS58193453U/en
Publication of JPS58193453U publication Critical patent/JPS58193453U/en
Application granted granted Critical
Publication of JPH0530278Y2 publication Critical patent/JPH0530278Y2/ja
Granted legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図ａ、　　ｂは従来の反射電子検出装置におりる試
料から発生した反射電子と、反射電子の検出器　　器と
の位置関係を示す説明図、第２図は本考案のミ　　一実
施例を示す断面図、第３図は第２図に示したー　　反射
電子検出装置で使用する反射電子検出器を示ｊ　　した
斜視図、第４図は本考案の他の実施例を示す）　　断面
図、第５図は第４図における試料２と反射室１　　子検
出器４との回動機構部を示した斜視図である。 １・・・−吹型子線、２・・・試料、３・・・反射電子
、４ｆ　　・・・反射電子検出器、５・・・顕微鏡本体
、６・・・試料室、ｔ　　７・・・試料台、８・・・試
料傾斜軸、８ａ・・・試料傾斜軸線、９．　１３．　１
５．　１６・・・ギア、１０・・・操作つまみ、１１・
・・支持具、１２・・・検出器傾斜軸、１４ヒ　　・・
・シャフト、１７−・・対物レンズ。 壬子三 １２″２２゜Figures 1a and b are explanatory diagrams showing the positional relationship between backscattered electrons generated from a sample falling in a conventional backscattered electron detector and a backscattered electron detector, and Figure 2 shows a third embodiment of the present invention. 3 is a perspective view showing a backscattered electron detector used in the backscattered electron detector shown in FIG. 2, and FIG. 4 is a sectional view showing another embodiment of the present invention. , FIG. 5 is a perspective view showing the rotation mechanism of the sample 2, the reflection chamber 1, and the child detector 4 in FIG. 4. DESCRIPTION OF SYMBOLS 1...-Blow mold child beam, 2... Sample, 3... Backscattered electrons, 4f... Backscattered electron detector, 5... Microscope main body, 6... Sample chamber, t7... - Sample stage, 8... Sample tilt axis, 8a... Sample tilt axis, 9. 13. 1
5. 16...Gear, 10...Operation knob, 11.
...Support, 12...Detector tilt axis, 14H...
-Shaft, 17--Objective lens. Miko San 12″22゜

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 傾斜動可能な試料台と、電子銃から発射されｔコー次電
子線の照射により試料台上の試料から全件する反射電子
を検出する反射電子検出器とを備えた電子線装置におい
て、上記反射電子検出器を波該検出器傾斜用の回動手段
に取付けて成り、こＣ回動手段を、反射電子検出器が試
料台の傾斜方向と同一方向に、且つ当該試料台の傾斜角
速度の（コぼ２倍の角速度で回動する様、試料台に作動
連層したことを特徴とする電子線装置における反射１子
検出装置。In an electron beam apparatus equipped with a sample stage that can be tilted and a backscattered electron detector that detects all reflected electrons from a sample on the sample stage by irradiation with a t-order electron beam emitted from an electron gun, The electron detector is attached to a rotating means for tilting the detector, and the rotating means rotates so that the backscattered electron detector is tilted in the same direction as the tilting direction of the sample stage and at the angle of the tilting angular velocity of the sample stage. A single-reflection detection device for an electron beam device, characterized in that it is actuated in conjunction with a sample stage so that it rotates at twice the angular velocity.
JP8736182U 1982-06-14 1982-06-14 Backscattered electron detection device in electron beam equipment Granted JPS58193453U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8736182U JPS58193453U (en) 1982-06-14 1982-06-14 Backscattered electron detection device in electron beam equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8736182U JPS58193453U (en) 1982-06-14 1982-06-14 Backscattered electron detection device in electron beam equipment

Publications (2)

Publication Number Publication Date
JPS58193453U true JPS58193453U (en) 1983-12-22
JPH0530278Y2 JPH0530278Y2 (en) 1993-08-03

Family

ID=30096079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8736182U Granted JPS58193453U (en) 1982-06-14 1982-06-14 Backscattered electron detection device in electron beam equipment

Country Status (1)

Country Link
JP (1) JPS58193453U (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000514238A (en) * 1998-03-03 2000-10-24 エテック システムズ インコーポレイテッド Electron beam microcolumn as a general-purpose scanning electron microscope
JP2007200573A (en) * 2006-01-23 2007-08-09 Hitachi High-Technologies Corp Electron microscope and controlling method of the same
JP2007207536A (en) * 2006-02-01 2007-08-16 Hitachi High-Technologies Corp Test piece base of charged particle beam apparatus
JP2018022592A (en) * 2016-08-02 2018-02-08 新日鐵住金株式会社 Sample table and electron microscope with the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5564260U (en) * 1979-11-01 1980-05-01
JPS5672464U (en) * 1979-11-08 1981-06-15

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5564260U (en) * 1979-11-01 1980-05-01
JPS5672464U (en) * 1979-11-08 1981-06-15

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000514238A (en) * 1998-03-03 2000-10-24 エテック システムズ インコーポレイテッド Electron beam microcolumn as a general-purpose scanning electron microscope
JP2007200573A (en) * 2006-01-23 2007-08-09 Hitachi High-Technologies Corp Electron microscope and controlling method of the same
JP4653666B2 (en) * 2006-01-23 2011-03-16 株式会社日立ハイテクノロジーズ Electron microscope and control method thereof
JP2007207536A (en) * 2006-02-01 2007-08-16 Hitachi High-Technologies Corp Test piece base of charged particle beam apparatus
JP2018022592A (en) * 2016-08-02 2018-02-08 新日鐵住金株式会社 Sample table and electron microscope with the same

Also Published As

Publication number Publication date
JPH0530278Y2 (en) 1993-08-03

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