JPS58190079A - 微動機構 - Google Patents
微動機構Info
- Publication number
- JPS58190079A JPS58190079A JP57072422A JP7242282A JPS58190079A JP S58190079 A JPS58190079 A JP S58190079A JP 57072422 A JP57072422 A JP 57072422A JP 7242282 A JP7242282 A JP 7242282A JP S58190079 A JPS58190079 A JP S58190079A
- Authority
- JP
- Japan
- Prior art keywords
- members
- fine movement
- movement mechanism
- drive
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000007246 mechanism Effects 0.000 title claims abstract description 21
- 230000008602 contraction Effects 0.000 claims abstract description 9
- 230000009471 action Effects 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 4
- 239000000470 constituent Substances 0.000 claims description 2
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 claims description 2
- 229910052451 lead zirconate titanate Inorganic materials 0.000 claims description 2
- 239000000696 magnetic material Substances 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010410 layer Substances 0.000 claims 1
- 239000002344 surface layer Substances 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 230000000694 effects Effects 0.000 description 5
- 239000002245 particle Substances 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000013518 transcription Methods 0.000 description 2
- 230000035897 transcription Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
- Turning (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57072422A JPS58190079A (ja) | 1982-04-28 | 1982-04-28 | 微動機構 |
| US06/429,230 US4455501A (en) | 1982-02-09 | 1982-09-30 | Precision rotation mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57072422A JPS58190079A (ja) | 1982-04-28 | 1982-04-28 | 微動機構 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58190079A true JPS58190079A (ja) | 1983-11-05 |
| JPH041512B2 JPH041512B2 (enrdf_load_stackoverflow) | 1992-01-13 |
Family
ID=13488829
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57072422A Granted JPS58190079A (ja) | 1982-02-09 | 1982-04-28 | 微動機構 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58190079A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60144936A (ja) * | 1983-12-30 | 1985-07-31 | Shimadzu Corp | 微動回転駆動装置 |
| JPS6182433A (ja) * | 1984-09-29 | 1986-04-26 | Toshiba Corp | 微動機構 |
-
1982
- 1982-04-28 JP JP57072422A patent/JPS58190079A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60144936A (ja) * | 1983-12-30 | 1985-07-31 | Shimadzu Corp | 微動回転駆動装置 |
| JPS6182433A (ja) * | 1984-09-29 | 1986-04-26 | Toshiba Corp | 微動機構 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH041512B2 (enrdf_load_stackoverflow) | 1992-01-13 |
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