JPS58189639A - Processor for photosensitive material - Google Patents

Processor for photosensitive material

Info

Publication number
JPS58189639A
JPS58189639A JP7233882A JP7233882A JPS58189639A JP S58189639 A JPS58189639 A JP S58189639A JP 7233882 A JP7233882 A JP 7233882A JP 7233882 A JP7233882 A JP 7233882A JP S58189639 A JPS58189639 A JP S58189639A
Authority
JP
Japan
Prior art keywords
processing tank
processing
discharge
liquid
discharge pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7233882A
Other languages
Japanese (ja)
Other versions
JPH027449B2 (en
Inventor
Masami Otani
正美 大谷
Yoshihiro Masuda
増田 好広
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP7233882A priority Critical patent/JPS58189639A/en
Publication of JPS58189639A publication Critical patent/JPS58189639A/en
Publication of JPH027449B2 publication Critical patent/JPH027449B2/ja
Granted legal-status Critical Current

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  • Photographic Processing Devices Using Wet Methods (AREA)

Abstract

PURPOSE:To prevent a film from loating while no foregin matter contacts the film surface, by providing a discharging device which discharges a processing liquid from one terminal to the other terminal of a processing tank, and providing an overflow pipe at the other terminal. CONSTITUTION:A reduction tank 1 at a top-surface opening consists of a bottom plate 2 curved in a flume shape and end plates 3, and numbers of projecting lines 4 curved arcuately along the bottom plate 2 are provided on the internal surface of the bottom plate 2. The major part of reduction liquid 10 discharged out of a discharge pipe 5 upward by a circulating pump passes through the split flow hole 8 of a separating plate 7 to strike a deflecting plate 9, where it changes in direction inward to flow down as shown by an arrow, forming a surface flow. Part of the reduction liquid 10 changes in direction by striking the separating plate 7 to flow inward at an extremely slow speed and also returns to the circulating pump through the overflow pipe 6 for circulation.

Description

【発明の詳細な説明】 一般に、写真感材(以下フィルムという)は、現像、定
着、減力、水洗処理中に膜面が異物に触れると、損傷]
7、あるいは仕上りにむらが生ずる。
[Detailed Description of the Invention] In general, photographic materials (hereinafter referred to as films) are damaged when the film surface comes into contact with foreign matter during development, fixing, reduction, or washing with water]
7. Or the finish is uneven.

そのため、自動現像機等において、現像等の処理中は、
膜面が処理液以外には触れないように、処理槽が皿状の
際には、膜面を上方に向けて搬送する。
Therefore, during processing such as development in automatic processing machines, etc.,
When the processing tank is dish-shaped, the film is transported with the film surface facing upward so that the film surface does not touch anything other than the processing liquid.

しかし、循環する処理液により、フィルムが液面まで浮
き上ってしまい、やはりむらが生ずることがある。
However, the circulating treatment liquid may cause the film to rise to the surface of the liquid, resulting in unevenness.

本発明は、フィルムの浮上を防止した皿形処理装置に関
するもので、以下添付の図面に基いて具体的に説明する
The present invention relates to a dish-shaped processing device that prevents film from floating, and will be specifically described below with reference to the accompanying drawings.

第1図〜第ろ図は、第1実施例を減力槽について用いた
ものを示すもので、上面開口する減力槽(1)は、樋状
に湾曲する底板(2)と端板(5)(5)とよりなり、
底板(2)の内面には、底板(2)に沿って弧状に湾曲
する多数の突条(4)が付設されている。
Figures 1 to 5 show the use of the first embodiment for a force reduction tank. The force reduction tank (1), which is open at the top, has a bottom plate (2) curved in the shape of a gutter and an end plate (2). 5) From (5),
The inner surface of the bottom plate (2) is provided with a large number of protrusions (4) that curve in an arc along the bottom plate (2).

底板(2)の一端部(第1図右端)の下面中央には、上
端が減力槽(1)内の下部に位置する吐出管(5)が貫
設され、同じく他端部の下面中央には、上端が減力槽(
1)内の上部に位置するオーバーフロー2ミイプ(6)
が貫設されている。
A discharge pipe (5) whose upper end is located at the lower part of the reduction tank (1) is installed through the center of the lower surface of one end (right end in Figure 1) of the bottom plate (2), and similarly located at the center of the lower surface of the other end. The upper end is a reduction tank (
1) Overflow 2 miip located at the top of the (6)
is installed through it.

一力の端板(ろ)の内面中央部には、水平をなし、かつ
pll骨管5)の−上方を覆う分液板(力が突設され、
分液板(7)における吐出管(5)の直り部には、分流
孔(8)が穿設されている。徒だ、この端板(乙)の内
面上部にkl、水+をなし、底板(2)の両側部に達す
るとともに、分液&(力の一ヒ方を覆い、かつ上記オー
バーフτ」−バイブ(6)のに端とほぼ等高をなす偏向
板(9)が固設されている。
At the center of the inner surface of the end plate (filter) of the force, there is a liquid separation plate (force) that is horizontal and that covers the upper side of the PLL bone canal 5).
A flow dividing hole (8) is bored in the straight portion of the discharge pipe (5) in the liquid dividing plate (7). It's a waste, KL and water + are formed on the upper inner surface of this end plate (B), reaching both sides of the bottom plate (2), and covering one side of the liquid & (force), and the above-mentioned overflow τ''-vibrator. A deflection plate (9) is fixed to (6) at almost the same height as the end.

図示を省略した循環ポンプにより、吐出管(5)より1
ニカに向けて吐出された減力液(10)の大部分は、分
液板(ハの分流孔(8)を通過して、偏向板(9)に当
って内すへ屈曲し、矢印方向に流下して表面流を形成す
る。減力i (10)の一部は、分液板(ハに当って屈
曲12、微速で内方へ向って流れるとともに、オーバー
フロー・ξイゾ(6)を経て循環ポンプに戻って循環−
むる。
1 from the discharge pipe (5) by a circulation pump (not shown).
Most of the reducing liquid (10) discharged toward the liquid filter passes through the flow dividing hole (8) in the liquid dividing plate (C), hits the deflection plate (9), bends inward, and moves in the direction of the arrow. A part of the reduced force i (10) hits the liquid separation plate (c) at the bend 12, flows inward at a slow speed, and flows through the overflow ξ iso (6). After that, it returns to the circulation pump for circulation.
Muru.

この表面流が、第1図想像線で示すように、膜面を14
方に向けて、減力槽(1)の−側から他側へ向かい、L
記突条(4)に沿って搬送される写真フィルム(11)
を下方に押し付け、液面への浮上を防止する。
This surface flow spreads over the membrane surface at 14
From the - side of the reducing tank (1) to the other side,
Photographic film (11) conveyed along recording strip (4)
to prevent it from floating to the liquid surface.

上述のように本装置は、その構成が極めて簡単であるに
もかかわらず、膜面が異物に触れることなく、フィルム
(11)の浮上を防止しうるので、一連の現像処理にお
いて、減力以外にも、現像、定着あるいは水洗に使用し
て効果的である。
As mentioned above, although this device has an extremely simple configuration, it can prevent the film (11) from floating without causing the film surface to come into contact with foreign matter. It is also effective when used for developing, fixing, or washing with water.

第4図および第5図乃至第7図は、それぞれ本発明の第
2、第6実施例を示すもので、前実施例と同様の部材に
は、同一符号を付して、その説明を省略する。
FIG. 4 and FIGS. 5 to 7 show the second and sixth embodiments of the present invention, respectively, and the same members as those in the previous embodiment are designated by the same reference numerals, and their explanations are omitted. do.

第4図に示す第2実施例においては、第1実施例におけ
る分液板(ハと偏向板(9)を省略し7、上向吐出管(
5)に代えて、横向吐出管(21)を、端板(ロ)の中
央上部における減力液(10)の液面より若干下方に貫
設しである。
In the second embodiment shown in FIG.
In place of 5), a horizontal discharge pipe (21) is installed slightly below the level of the reducing fluid (10) at the upper center of the end plate (b).

このようにしても、減力槽(1)内の減力液(10)の
流速は、上方程遠くなり、前実施例と同様の作用と効果
を得ることができる。
Even in this case, the flow velocity of the force-reducing liquid (10) in the force-reducing tank (1) becomes farther upward, and the same operation and effect as in the previous embodiment can be obtained.

第5,6図に示す第6実施例においては、第1実施例に
おける分液板(ハと偏向板(9)を省略し、f=。
In the sixth embodiment shown in FIGS. 5 and 6, the liquid separation plate (c and deflection plate (9) in the first embodiment are omitted, and f=.

向吐出前(5)と同様に底板(2)に貫設した、上端面
閉塞する吐出管(51)の内側面に、第6図に示すよ、
うに、−ト向三角形の吐出孔(52)が、その上縁を減
力液(10)の液面の若干下方として切設されている。
As shown in FIG. 6, on the inner surface of the discharge pipe (51) whose upper end is closed, which is installed through the bottom plate (2) in the same way as before discharge (5),
A triangular discharge hole (52) facing downward is cut with its upper edge slightly below the level of the reducing fluid (10).

このようにすると、吐出孔(52)より吐出する減力液
(10)の液量は、下方程少いので、第1実施例と同様
の作用と効果を得ることができる。
In this way, the amount of the force-reducing liquid (10) discharged from the discharge hole (52) decreases as it goes downward, so that the same operation and effect as in the first embodiment can be obtained.

捷だ、本実施例においては、第7図に示すように、(l
出前(51)に代えて、吐出孔(52)に相当する個所
に、1・一方程開口面積の小さい複数の吐出孔(5ろ)
を穿設し7た吐出管(ろ4)を使用してもよい。
In this example, as shown in FIG.
In place of the delivery hole (51), a plurality of discharge holes (5 holes) with an opening area as small as 1/1 are installed at the location corresponding to the discharge hole (52).
A discharge pipe (filter 4) may be used.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明の第1実施例を示す平面図、第2図は
、第1図におけるA−A線縦断正面図、第3図は、第1
図におけるB−B線縦断側面図、第4図は、本発明の第
2実施例を示す要部中央縦断止面図、 第5図は、本発明の第6実施例を示す要部中央縦断止面
図、 第6図は、同じく吐出管を内方より見た側面図、第7図
は、同じく吐出管の他の例を示す側面図である。 (1)減力槽  (2)底板   (ろ)端板(4)突
条   (5)吐出管  (6)オー・−フローパイプ
(7)分液板  (8)分流孔  (9)偏向板(10
)減力液  (11)フィルム (21)、(う1)吐
出管(ろ2)、(ろ5)吐出孔(54)吐出、管筒1図 第6図     第7図
1 is a plan view showing a first embodiment of the present invention, FIG. 2 is a longitudinal sectional front view taken along line A-A in FIG. 1, and FIG.
4 is a vertical cross-sectional side view taken along the line B-B in the figure, FIG. 4 is a top view of the central part of the main part showing the second embodiment of the present invention, and FIG. 5 is a longitudinal cross-sectional view of the main part showing the sixth embodiment of the present invention. FIG. 6 is a side view of the discharge pipe seen from the inside, and FIG. 7 is a side view of another example of the discharge pipe. (1) Reduction tank (2) Bottom plate (filter) End plate (4) Projection (5) Discharge pipe (6) O-flow pipe (7) Separation plate (8) Diversion hole (9) Deflection plate ( 10
) Reducing liquid (11) Film (21), (U1) Discharge pipe (Filter 2), (Filter 5) Discharge hole (54) Discharge, Tube tube 1 Figure 6 Figure 7

Claims (6)

【特許請求の範囲】[Claims] (1)感材処理槽の一端に、処理槽内の処理液の液面付
近において、処理槽の一端から他端方向へ向って処理液
を吐出する吐出装置を設けるとともに、同じく他端に、
上端が処理槽の向上部に位置するオーバーフローパイプ
を設けたことを特徴とする写真感材処理装置。
(1) At one end of the sensitive material processing tank, a discharge device is provided that discharges the processing liquid from one end of the processing tank toward the other end near the liquid level of the processing solution in the processing tank, and also at the other end,
A photographic material processing apparatus characterized by being provided with an overflow pipe whose upper end is located in an upper part of a processing tank.
(2)吐出装置が、感材処理槽の底部に貫設された吐出
管と、該吐出管の開口部の上方において、処理液面付近
に、処理槽の一端から他端方向へ向かって突設された概
ね水平の偏向板とよりなることを特徴とする特許請求の
範囲第(1)項に記載の装置。
(2) A discharge device is provided with a discharge pipe extending through the bottom of the sensitive material processing tank, and above the opening of the discharge pipe, protruding near the processing liquid level from one end of the processing tank toward the other end. Device according to claim 1, characterized in that it comprises a generally horizontal deflection plate provided.
(3)吐出管の上端開口部と偏向板との間に、前記開口
部の直上において分流孔が突設された水平の分液板を配
設したことを特徴とする特許請求の範囲第(2)項に記
載の装置。
(3) A horizontal liquid dividing plate having a flow dividing hole protruding directly above the opening is disposed between the upper end opening of the discharge pipe and the deflection plate. The device described in section 2).
(4)吐出装置が、処理液の液面付近において、処理槽
の一端に設けられ、開口部が処理槽の他端方向を同く概
ね水平の吐出管であることを特徴とする特a′F請求の
範囲第(1)項に記載の装置。
(4) A feature a' characterized in that the discharge device is provided at one end of the processing tank near the liquid level of the processing liquid, and the opening is a generally horizontal discharge pipe that extends toward the other end of the processing tank. F. The device according to claim (1).
(5)  吐出装置が、処理槽の一端付近において、そ
の底壁に貫設され、上端が閉塞されるとともに、処理槽
内の処理液の液面付近において、処理槽の他端す向を向
く吐出孔が側面に突設されている吐出管であることを特
徴とする特許請求の範囲第(1)項に6シ:載の装置。
(5) A discharge device is installed through the bottom wall of the processing tank near one end, the upper end is closed, and the discharge device faces toward the other end of the processing tank near the liquid level of the processing liquid in the processing tank. 6. The device according to claim 1, wherein the discharge hole is a discharge pipe that projects from a side surface.
(6)吐出孔が、E縁を処理液面付近とする逆三角形を
なしていることを特徴とする特許請求の範囲第(5)項
に記載の装置。 (力 吐出孔が、最上位のものを処理液面付近とし、か
つ」一方のものから下方のものに向かって漸次小寸をな
す複数のものからなることを特徴とする特許請求の範囲
第(6)項に記載の装置。
(6) The apparatus according to claim (5), wherein the discharge hole has an inverted triangular shape with the E edge near the processing liquid level. Claim No. 1, characterized in that the discharge holes are made up of a plurality of holes, with the uppermost one near the processing liquid level, and whose size gradually decreases from one to the lower one ( The device described in section 6).
JP7233882A 1982-04-28 1982-04-28 Processor for photosensitive material Granted JPS58189639A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7233882A JPS58189639A (en) 1982-04-28 1982-04-28 Processor for photosensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7233882A JPS58189639A (en) 1982-04-28 1982-04-28 Processor for photosensitive material

Publications (2)

Publication Number Publication Date
JPS58189639A true JPS58189639A (en) 1983-11-05
JPH027449B2 JPH027449B2 (en) 1990-02-19

Family

ID=13486402

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7233882A Granted JPS58189639A (en) 1982-04-28 1982-04-28 Processor for photosensitive material

Country Status (1)

Country Link
JP (1) JPS58189639A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5242060A (en) * 1975-09-29 1977-04-01 Hitachi Ltd Transistor invertor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5242060A (en) * 1975-09-29 1977-04-01 Hitachi Ltd Transistor invertor

Also Published As

Publication number Publication date
JPH027449B2 (en) 1990-02-19

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