JPS5817215B2 - 重合性組成物 - Google Patents

重合性組成物

Info

Publication number
JPS5817215B2
JPS5817215B2 JP49102874A JP10287474A JPS5817215B2 JP S5817215 B2 JPS5817215 B2 JP S5817215B2 JP 49102874 A JP49102874 A JP 49102874A JP 10287474 A JP10287474 A JP 10287474A JP S5817215 B2 JPS5817215 B2 JP S5817215B2
Authority
JP
Japan
Prior art keywords
polymerizable
composition
vinyl
group
substance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49102874A
Other languages
English (en)
Japanese (ja)
Other versions
JPS50119898A (en:Method
Inventor
シエルドン・アーウイン・シュレシンガー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Primerica Inc
Original Assignee
American Can Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Can Co filed Critical American Can Co
Publication of JPS50119898A publication Critical patent/JPS50119898A/ja
Publication of JPS5817215B2 publication Critical patent/JPS5817215B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S528/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S528/931Physical treatment of natural rubber or natural rubber containing material or chemical treatment of non-rubber portion thereof, e.g. extraction of rubber from milk weed
    • Y10S528/934Latex
    • Y10S528/935Preserving or stabilizing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Epoxy Resins (AREA)
  • Polyethers (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Paints Or Removers (AREA)
  • Polymerization Catalysts (AREA)
JP49102874A 1974-03-01 1974-09-06 重合性組成物 Expired JPS5817215B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/447,209 US3951769A (en) 1974-03-01 1974-03-01 Epoxide photopolymerizable compositions containing cyclic amides as gelation inhibitor and methods of polymerizing

Publications (2)

Publication Number Publication Date
JPS50119898A JPS50119898A (en:Method) 1975-09-19
JPS5817215B2 true JPS5817215B2 (ja) 1983-04-05

Family

ID=23775430

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49102874A Expired JPS5817215B2 (ja) 1974-03-01 1974-09-06 重合性組成物

Country Status (7)

Country Link
US (1) US3951769A (en:Method)
JP (1) JPS5817215B2 (en:Method)
CA (1) CA1048196A (en:Method)
CH (1) CH606185A5 (en:Method)
DE (1) DE2439547A1 (en:Method)
FR (1) FR2262679B1 (en:Method)
GB (1) GB1452675A (en:Method)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5337120B2 (en:Method) * 1974-12-20 1978-10-06
JPS59174620A (ja) * 1983-03-23 1984-10-03 Nippon Oil & Fats Co Ltd 顔料分散用熱硬化性樹脂
JPH064694B2 (ja) * 1983-04-28 1994-01-19 三井東圧化学株式会社 紫外線硬化組成物
US4574132A (en) * 1984-11-09 1986-03-04 The United States Of America As Represented By The Secretary Of The Army General purpose expandable adhesive
JPS61133514A (ja) * 1984-11-30 1986-06-20 三菱電機株式会社 絶縁導体の製造方法
JPH036213A (ja) * 1989-06-01 1991-01-11 Matsushita Electric Ind Co Ltd 紫外線硬化型樹脂
US6187965B1 (en) 1998-11-06 2001-02-13 International Business Machines Corporation Process for recovering high boiling solvents from a photolithographic waste stream comprising at least 10 percent by weight of monomeric units
US5994597A (en) * 1998-11-06 1999-11-30 International Business Machines Corporation Process for recovering high boiling solvents from a photolithographic waste stream comprising less than 10 percent by weight monomeric units
US20040266913A1 (en) * 2001-09-13 2004-12-30 Hiroaki Yamaguchi Cationic polymerizable adhesive composition and anisotropically electroconductive adhesive composition
JP2004323642A (ja) * 2003-04-23 2004-11-18 Riso Kagaku Corp カチオン重合性組成物及びインク
CA2607416A1 (en) * 2005-04-22 2006-10-26 Sun Chemical B.V. An ink jet ink
WO2025018368A1 (ja) * 2023-07-18 2025-01-23 株式会社レゾナック 接着剤組成物、回路接続用接着剤フィルム、接続構造体及び接続構造体の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2826501A (en) * 1956-12-20 1958-03-11 Litho Chemical And Supply Co I Lithographic coating solution and lithographic plates coated therewith
US3708296A (en) * 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
US3679419A (en) * 1969-05-20 1972-07-25 Azoplate Corp Light-sensitive diazo condensate containing reproduction material
US3660097A (en) * 1969-11-28 1972-05-02 Polychrome Corp Diazo-polyurethane light-sensitive compositions
US3709861A (en) * 1970-12-14 1973-01-09 Shell Oil Co Process for light-induced curing of epoxy resins in presence of cyclopentadienylmanganese tricarbonyl compounds
US3790382A (en) * 1971-04-16 1974-02-05 Minnesota Mining & Mfg Fluorinated polyamide-diazo resin coating composition
US3817850A (en) * 1971-05-18 1974-06-18 American Can Co Photopolymerizable epoxy systems containing substituted acyclic amides or substituted ureas as gelation inhibitors
US3817845A (en) * 1971-05-18 1974-06-18 American Can Co Photopolymerizable epoxy systems containing sulfoxide gelation inhibitors
US3721617A (en) * 1971-05-18 1973-03-20 American Can Co Photopolymerizable epoxy systems containing cyclic amide gelation inhibitors
US3711390A (en) * 1971-05-18 1973-01-16 J Feinberg Photopolymerizable epoxy systems containing substituted cyclic amides or substituted ureas as gelation inhibitors

Also Published As

Publication number Publication date
US3951769A (en) 1976-04-20
CA1048196A (en) 1979-02-06
FR2262679A1 (en:Method) 1975-09-26
GB1452675A (en) 1976-10-13
JPS50119898A (en:Method) 1975-09-19
DE2439547A1 (de) 1975-09-04
FR2262679B1 (en:Method) 1978-04-28
CH606185A5 (en:Method) 1978-10-31
AU7169474A (en) 1976-01-29

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