CA1048196A - Photopolymerizable systems containing cyclic amides as gelation inhibitor - Google Patents

Photopolymerizable systems containing cyclic amides as gelation inhibitor

Info

Publication number
CA1048196A
CA1048196A CA219,036A CA219036A CA1048196A CA 1048196 A CA1048196 A CA 1048196A CA 219036 A CA219036 A CA 219036A CA 1048196 A CA1048196 A CA 1048196A
Authority
CA
Canada
Prior art keywords
composition
mixture
polymerizable material
catalyst precursor
polymerizable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA219,036A
Other languages
English (en)
French (fr)
Other versions
CA219036S (en
Inventor
Sheldon I. Schlesinger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Primerica Inc
Original Assignee
American Can Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Can Co filed Critical American Can Co
Application granted granted Critical
Publication of CA1048196A publication Critical patent/CA1048196A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S528/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S528/931Physical treatment of natural rubber or natural rubber containing material or chemical treatment of non-rubber portion thereof, e.g. extraction of rubber from milk weed
    • Y10S528/934Latex
    • Y10S528/935Preserving or stabilizing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Epoxy Resins (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Paints Or Removers (AREA)
  • Polyethers (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
CA219,036A 1974-03-01 1975-01-30 Photopolymerizable systems containing cyclic amides as gelation inhibitor Expired CA1048196A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/447,209 US3951769A (en) 1974-03-01 1974-03-01 Epoxide photopolymerizable compositions containing cyclic amides as gelation inhibitor and methods of polymerizing

Publications (1)

Publication Number Publication Date
CA1048196A true CA1048196A (en) 1979-02-06

Family

ID=23775430

Family Applications (1)

Application Number Title Priority Date Filing Date
CA219,036A Expired CA1048196A (en) 1974-03-01 1975-01-30 Photopolymerizable systems containing cyclic amides as gelation inhibitor

Country Status (7)

Country Link
US (1) US3951769A (en:Method)
JP (1) JPS5817215B2 (en:Method)
CA (1) CA1048196A (en:Method)
CH (1) CH606185A5 (en:Method)
DE (1) DE2439547A1 (en:Method)
FR (1) FR2262679B1 (en:Method)
GB (1) GB1452675A (en:Method)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5337120B2 (en:Method) * 1974-12-20 1978-10-06
JPS59174620A (ja) * 1983-03-23 1984-10-03 Nippon Oil & Fats Co Ltd 顔料分散用熱硬化性樹脂
JPH064694B2 (ja) * 1983-04-28 1994-01-19 三井東圧化学株式会社 紫外線硬化組成物
US4574132A (en) * 1984-11-09 1986-03-04 The United States Of America As Represented By The Secretary Of The Army General purpose expandable adhesive
JPS61133514A (ja) * 1984-11-30 1986-06-20 三菱電機株式会社 絶縁導体の製造方法
JPH036213A (ja) * 1989-06-01 1991-01-11 Matsushita Electric Ind Co Ltd 紫外線硬化型樹脂
US6187965B1 (en) 1998-11-06 2001-02-13 International Business Machines Corporation Process for recovering high boiling solvents from a photolithographic waste stream comprising at least 10 percent by weight of monomeric units
US5994597A (en) * 1998-11-06 1999-11-30 International Business Machines Corporation Process for recovering high boiling solvents from a photolithographic waste stream comprising less than 10 percent by weight monomeric units
US20040266913A1 (en) * 2001-09-13 2004-12-30 Hiroaki Yamaguchi Cationic polymerizable adhesive composition and anisotropically electroconductive adhesive composition
JP2004323642A (ja) * 2003-04-23 2004-11-18 Riso Kagaku Corp カチオン重合性組成物及びインク
CA2607416A1 (en) * 2005-04-22 2006-10-26 Sun Chemical B.V. An ink jet ink
WO2025018368A1 (ja) * 2023-07-18 2025-01-23 株式会社レゾナック 接着剤組成物、回路接続用接着剤フィルム、接続構造体及び接続構造体の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2826501A (en) * 1956-12-20 1958-03-11 Litho Chemical And Supply Co I Lithographic coating solution and lithographic plates coated therewith
US3708296A (en) * 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
US3679419A (en) * 1969-05-20 1972-07-25 Azoplate Corp Light-sensitive diazo condensate containing reproduction material
US3660097A (en) * 1969-11-28 1972-05-02 Polychrome Corp Diazo-polyurethane light-sensitive compositions
US3709861A (en) * 1970-12-14 1973-01-09 Shell Oil Co Process for light-induced curing of epoxy resins in presence of cyclopentadienylmanganese tricarbonyl compounds
US3790382A (en) * 1971-04-16 1974-02-05 Minnesota Mining & Mfg Fluorinated polyamide-diazo resin coating composition
US3817850A (en) * 1971-05-18 1974-06-18 American Can Co Photopolymerizable epoxy systems containing substituted acyclic amides or substituted ureas as gelation inhibitors
US3817845A (en) * 1971-05-18 1974-06-18 American Can Co Photopolymerizable epoxy systems containing sulfoxide gelation inhibitors
US3721617A (en) * 1971-05-18 1973-03-20 American Can Co Photopolymerizable epoxy systems containing cyclic amide gelation inhibitors
US3711390A (en) * 1971-05-18 1973-01-16 J Feinberg Photopolymerizable epoxy systems containing substituted cyclic amides or substituted ureas as gelation inhibitors

Also Published As

Publication number Publication date
US3951769A (en) 1976-04-20
JPS5817215B2 (ja) 1983-04-05
FR2262679A1 (en:Method) 1975-09-26
GB1452675A (en) 1976-10-13
JPS50119898A (en:Method) 1975-09-19
DE2439547A1 (de) 1975-09-04
FR2262679B1 (en:Method) 1978-04-28
CH606185A5 (en:Method) 1978-10-31
AU7169474A (en) 1976-01-29

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