JPS58171031A - パタ−ン形成材料 - Google Patents

パタ−ン形成材料

Info

Publication number
JPS58171031A
JPS58171031A JP5460182A JP5460182A JPS58171031A JP S58171031 A JPS58171031 A JP S58171031A JP 5460182 A JP5460182 A JP 5460182A JP 5460182 A JP5460182 A JP 5460182A JP S58171031 A JPS58171031 A JP S58171031A
Authority
JP
Japan
Prior art keywords
pattern forming
forming material
pattern
resist
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5460182A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0339302B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Kazuo Toda
和男 戸田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5460182A priority Critical patent/JPS58171031A/ja
Publication of JPS58171031A publication Critical patent/JPS58171031A/ja
Publication of JPH0339302B2 publication Critical patent/JPH0339302B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP5460182A 1982-03-31 1982-03-31 パタ−ン形成材料 Granted JPS58171031A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5460182A JPS58171031A (ja) 1982-03-31 1982-03-31 パタ−ン形成材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5460182A JPS58171031A (ja) 1982-03-31 1982-03-31 パタ−ン形成材料

Publications (2)

Publication Number Publication Date
JPS58171031A true JPS58171031A (ja) 1983-10-07
JPH0339302B2 JPH0339302B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-06-13

Family

ID=12975244

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5460182A Granted JPS58171031A (ja) 1982-03-31 1982-03-31 パタ−ン形成材料

Country Status (1)

Country Link
JP (1) JPS58171031A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6324244A (ja) * 1986-05-02 1988-02-01 ヘキスト・セラニーズ・コーポレイシヨン フォトレジスト及び該フォトレジストを有する物品の製法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6324244A (ja) * 1986-05-02 1988-02-01 ヘキスト・セラニーズ・コーポレイシヨン フォトレジスト及び該フォトレジストを有する物品の製法

Also Published As

Publication number Publication date
JPH0339302B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-06-13

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