JPS58162028A - 多結晶シリコンウエハの製造方法 - Google Patents

多結晶シリコンウエハの製造方法

Info

Publication number
JPS58162028A
JPS58162028A JP57046069A JP4606982A JPS58162028A JP S58162028 A JPS58162028 A JP S58162028A JP 57046069 A JP57046069 A JP 57046069A JP 4606982 A JP4606982 A JP 4606982A JP S58162028 A JPS58162028 A JP S58162028A
Authority
JP
Japan
Prior art keywords
melt
silicon
wafer plate
wafer
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57046069A
Other languages
English (en)
Japanese (ja)
Other versions
JPH046088B2 (enrdf_load_stackoverflow
Inventor
Takashi Yokoyama
敬志 横山
Yasuhiro Maeda
泰宏 前田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoxan Corp
Hokusan Co Ltd
Original Assignee
Hoxan Corp
Hokusan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoxan Corp, Hokusan Co Ltd filed Critical Hoxan Corp
Priority to JP57046069A priority Critical patent/JPS58162028A/ja
Priority to US06/373,039 priority patent/US4561486A/en
Priority to AU83147/82A priority patent/AU562656B2/en
Priority to EP82302246A priority patent/EP0065373B1/en
Priority to DE8282302246T priority patent/DE3277974D1/de
Publication of JPS58162028A publication Critical patent/JPS58162028A/ja
Publication of JPH046088B2 publication Critical patent/JPH046088B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/008Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method using centrifugal force to the charge
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/60Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
    • C30B29/605Products containing multiple oriented crystallites, e.g. columnar crystallites

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP57046069A 1981-04-30 1982-03-23 多結晶シリコンウエハの製造方法 Granted JPS58162028A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP57046069A JPS58162028A (ja) 1982-03-23 1982-03-23 多結晶シリコンウエハの製造方法
US06/373,039 US4561486A (en) 1981-04-30 1982-04-29 Method for fabricating polycrystalline silicon wafer
AU83147/82A AU562656B2 (en) 1981-04-30 1982-04-29 Fabricating polycrystalline silicon wafers
EP82302246A EP0065373B1 (en) 1981-04-30 1982-04-30 Method fabricating a polycrystalline silicon wafer
DE8282302246T DE3277974D1 (en) 1981-04-30 1982-04-30 Method fabricating a polycrystalline silicon wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57046069A JPS58162028A (ja) 1982-03-23 1982-03-23 多結晶シリコンウエハの製造方法

Publications (2)

Publication Number Publication Date
JPS58162028A true JPS58162028A (ja) 1983-09-26
JPH046088B2 JPH046088B2 (enrdf_load_stackoverflow) 1992-02-04

Family

ID=12736705

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57046069A Granted JPS58162028A (ja) 1981-04-30 1982-03-23 多結晶シリコンウエハの製造方法

Country Status (1)

Country Link
JP (1) JPS58162028A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113224205A (zh) * 2021-04-28 2021-08-06 宜兴市昱元能源装备技术开发有限公司 一种硅片的生产设备

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5427720A (en) * 1977-08-03 1979-03-02 Nec Corp Process amplifier of color pickup unit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5427720A (en) * 1977-08-03 1979-03-02 Nec Corp Process amplifier of color pickup unit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113224205A (zh) * 2021-04-28 2021-08-06 宜兴市昱元能源装备技术开发有限公司 一种硅片的生产设备

Also Published As

Publication number Publication date
JPH046088B2 (enrdf_load_stackoverflow) 1992-02-04

Similar Documents

Publication Publication Date Title
US4561486A (en) Method for fabricating polycrystalline silicon wafer
US5431127A (en) Process for producing semiconductor spheres
US4312700A (en) Method for making silicon rods
JP2012001429A (ja) 結晶シリコンインゴットの製造方法
WO1993012272A1 (en) Method of and apparatus for casting crystalline silicon ingot by electron beam melting
JPS6256395A (ja) 珪素棒を製造する方法および装置
US4519764A (en) Apparatus for fabricating polycrystalline silicon wafer
KR101271649B1 (ko) 단결정 실리콘 시드를 이용한 고품질 다결정 실리콘 잉곳의 제조방법
JPS58162028A (ja) 多結晶シリコンウエハの製造方法
JPH11248363A (ja) シリコンインゴット製造用積層ルツボおよびその製造方法
JP2006335582A (ja) 結晶シリコン製造装置とその製造方法
JPS58162029A (ja) 多結晶シリコンウエハの製造方法
JPH0142339Y2 (enrdf_load_stackoverflow)
JP4817329B2 (ja) 球状結晶の製造方法及び製造装置
JPS58162035A (ja) 多結晶シリコンウエハの製造方法
JPH0314766B2 (enrdf_load_stackoverflow)
JPS59181013A (ja) 多結晶シリコンウエハの製造方法
JPS58166716A (ja) 多結晶シリコンウエハの製造方法
JP2000351688A (ja) 結晶シリコン製造用ルツボ及びその製造方法
JPH0314765B2 (enrdf_load_stackoverflow)
JPS5886781A (ja) 多結晶シリコンウエハの製造方法
JP2677859B2 (ja) 混晶型化合物半導体の結晶成長方法
JPH0314767B2 (enrdf_load_stackoverflow)
JPS59182218A (ja) 多結晶シリコンウエハの製造方法
JPH0322907Y2 (enrdf_load_stackoverflow)