JPS5814939A - 真空処理装置 - Google Patents

真空処理装置

Info

Publication number
JPS5814939A
JPS5814939A JP11078481A JP11078481A JPS5814939A JP S5814939 A JPS5814939 A JP S5814939A JP 11078481 A JP11078481 A JP 11078481A JP 11078481 A JP11078481 A JP 11078481A JP S5814939 A JPS5814939 A JP S5814939A
Authority
JP
Japan
Prior art keywords
gear
turntable
vacuum
vacuum processing
shaft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11078481A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6236735B2 (enrdf_load_stackoverflow
Inventor
Yoshihiro Sugiyama
杉山　好弘
Takashi Akimoto
隆 秋元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP11078481A priority Critical patent/JPS5814939A/ja
Publication of JPS5814939A publication Critical patent/JPS5814939A/ja
Publication of JPS6236735B2 publication Critical patent/JPS6236735B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP11078481A 1981-07-17 1981-07-17 真空処理装置 Granted JPS5814939A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11078481A JPS5814939A (ja) 1981-07-17 1981-07-17 真空処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11078481A JPS5814939A (ja) 1981-07-17 1981-07-17 真空処理装置

Publications (2)

Publication Number Publication Date
JPS5814939A true JPS5814939A (ja) 1983-01-28
JPS6236735B2 JPS6236735B2 (enrdf_load_stackoverflow) 1987-08-08

Family

ID=14544529

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11078481A Granted JPS5814939A (ja) 1981-07-17 1981-07-17 真空処理装置

Country Status (1)

Country Link
JP (1) JPS5814939A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60139608U (ja) * 1984-02-29 1985-09-14 日野自動車株式会社 トラクタのシヨツクアブソ−バ
JPS61119684A (ja) * 1984-11-14 1986-06-06 Ulvac Corp スパツタエツチング装置
JP2015185757A (ja) * 2014-03-25 2015-10-22 株式会社日立国際電気 基板処理装置及び半導体装置の製造方法
CN112095069A (zh) * 2020-09-09 2020-12-18 安徽鼎恒实业集团有限公司 等离子喷涂式再制造轨道机车轮对轮柄的装备

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60139608U (ja) * 1984-02-29 1985-09-14 日野自動車株式会社 トラクタのシヨツクアブソ−バ
JPS61119684A (ja) * 1984-11-14 1986-06-06 Ulvac Corp スパツタエツチング装置
JP2015185757A (ja) * 2014-03-25 2015-10-22 株式会社日立国際電気 基板処理装置及び半導体装置の製造方法
CN112095069A (zh) * 2020-09-09 2020-12-18 安徽鼎恒实业集团有限公司 等离子喷涂式再制造轨道机车轮对轮柄的装备

Also Published As

Publication number Publication date
JPS6236735B2 (enrdf_load_stackoverflow) 1987-08-08

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