JPS58138334U - Wafer automatic material feeding mechanism - Google Patents
Wafer automatic material feeding mechanismInfo
- Publication number
- JPS58138334U JPS58138334U JP3469082U JP3469082U JPS58138334U JP S58138334 U JPS58138334 U JP S58138334U JP 3469082 U JP3469082 U JP 3469082U JP 3469082 U JP3469082 U JP 3469082U JP S58138334 U JPS58138334 U JP S58138334U
- Authority
- JP
- Japan
- Prior art keywords
- material feeding
- wafer
- feeding mechanism
- automatic material
- low pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は従来の減圧CVD装置を示す図である。。
第2図は本考案の一実施例である減圧CVD装置のウェ
ハ自動給材機構を説明するための図である。
図において
11は反応管、12は排気口、13はガス導入口、14
はエンドキャップ、15は加熱ヒータ、16はウェハ、
17はウェハホルダ、18はリフト、19.20はカセ
ットキャリア、21はコン −ベアを示す。FIG. 1 is a diagram showing a conventional low pressure CVD apparatus. . FIG. 2 is a diagram for explaining an automatic wafer material feeding mechanism of a low pressure CVD apparatus which is an embodiment of the present invention. In the figure, 11 is a reaction tube, 12 is an exhaust port, 13 is a gas inlet port, and 14
is an end cap, 15 is a heater, 16 is a wafer,
17 is a wafer holder, 18 is a lift, 19.20 is a cassette carrier, and 21 is a conveyor.
Claims (1)
を形成させる減圧CVD装置のウェハ給材機構であって
、予めカセットキャリヤに収容した複数の該ウェハをウ
ェハホルダーに積みかえ、該ホルダーは上下に移動する
リフト機構と、回転′ 機構を備えた前記減圧CVD装
置のエンドキャップに自動的に配設されてなることを特
徴とするウェハ自動給材機構。 ・A wafer supply mechanism for a low pressure CVD apparatus that forms an insulating film such as a silicon film or a silicon nitride film on a wafer, in which a plurality of wafers stored in a cassette carrier in advance are stacked on a wafer holder, and the holder is placed vertically. An automatic wafer material feeding mechanism characterized in that the automatic wafer material feeding mechanism is automatically disposed on the end cap of the low pressure CVD apparatus, which is equipped with a moving lift mechanism and a rotation mechanism.・
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3469082U JPS58138334U (en) | 1982-03-12 | 1982-03-12 | Wafer automatic material feeding mechanism |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3469082U JPS58138334U (en) | 1982-03-12 | 1982-03-12 | Wafer automatic material feeding mechanism |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58138334U true JPS58138334U (en) | 1983-09-17 |
JPH0110927Y2 JPH0110927Y2 (en) | 1989-03-29 |
Family
ID=30046179
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3469082U Granted JPS58138334U (en) | 1982-03-12 | 1982-03-12 | Wafer automatic material feeding mechanism |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58138334U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61150320A (en) * | 1984-12-25 | 1986-07-09 | Fujitsu Ltd | Vertical furnace |
JPS61121734U (en) * | 1985-01-18 | 1986-07-31 |
-
1982
- 1982-03-12 JP JP3469082U patent/JPS58138334U/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61150320A (en) * | 1984-12-25 | 1986-07-09 | Fujitsu Ltd | Vertical furnace |
JPS61121734U (en) * | 1985-01-18 | 1986-07-31 |
Also Published As
Publication number | Publication date |
---|---|
JPH0110927Y2 (en) | 1989-03-29 |
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