JPS58135644A - Wet processor - Google Patents

Abstract

PURPOSE:To contrive to automate the wet processor containing even drying by a method wherein a device to rotate an accommodating jig containing a matter to be performed with the wet process at about 90 deg., a mechanism to position dividedly the rotating part of a spinner at the prescribed angles, and the accommodating jig holding part of the spinner provided with the shape enabled to insert the accommodating jig from the upper side, are added to the usual wet processor. CONSTITUTION:When the slit 19' on a slit plate 19 is detected according to a light emitting diode 17, a photo transistor 18 and an electronic circuit not shown in the figure, a push bar 15 goes out in the right direction of an arrow mark 16, and is engaged with a notch 14 in a positioning plate 13 to position dividedly a rotating shaft 20 at the prescribed angles. When the wet process is finished, and after the accommodating jig 2 conveyed by a conveying device 3 to the rotating device 10 to be put thereon is rotated at 90 deg. in the clockwise direction of an arrow mark 11, the jig is conveyed again according to the conveying device 3 to the spinner 12 positioned by a rotation, and is equipped from the upper side being guided by a holding part 12'. The spinner 12 is positioned being rotated at 180 deg. to wait for the coming of the next jig 2 being conveyed the same, and when the two accommodating jigs 2 are assembled, the spinner is rotated continuously to attain drying by shaking off.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a wet processing apparatus that automatically wet-processes a workpiece.

When performing wet processing such as processing, cleaning, and resist stripping of IIIK semiconductors, it is desirable to completely automate the process, including drying, in order to eliminate dust and save labor.

Conventional tD fy x y) Treatment 311 [11Rt E
The TIC diagram, Ill 1, shows a storage jig for storing the 1Fi semiconductor wafer to be processed, a 2Fi conductor wafer 1, a hole for removing the 2'Fi chemical solution, a transport device for transporting the 3IF storage jig 2, 4 and 5 arrows indicating the movement direction of the Fi transport device 3; 6 arrows indicating gripping and opening of the storage jig 2; 7 a chemical tank; 8 a spinner for cutting and drying the Fi chemical solution tMA; 9
is an arrow indicating the rotation direction of the spinner 8. In the above configuration, the semiconductor wafers 1 are placed vertically in the storage jig 2 and immersed in the chemical bath 7 one after another by the transport Hm5.
Processed. Next, spinner 8Ki is used to cut off the FA and dry, but since the hole 2' must be in the direction of centrifugal force to remove the chemical solution, the storage jig 2 is rotated 911'IQ1 and the spinner 80 jig KI [installed] I must do it. In the conventional wet shop 11i1i1, the 902 rotation and bonding operations had to be performed by a person. In addition, since it is not permissible to leave the semiconductor wafer 1 immersed in the chemical solution for longer than a specified time due to the quality of the semiconductor, the wet processing equipment for the operator is practically blocked, and only the immersed part of the semiconductor wafer 1 is exposed. Conventional wet processing equipment that is automated has not streamlined human operations. Furthermore, undried semiconductor wafers tend to attract dust, and undried semiconductor wafers tend to attract dust.
Holes are the source of dust and are a major cause of lower semiconductor yields due to people getting close to them. The present invention has been made to eliminate such drawbacks.

-'*Agricultural example of the present invention - Explanation regarding Figs. 2 and 3. w42 figure K k l/' ”CI + 2 * 2
'# 5 e 4 e 5 # 6 m7.9ilt
m15! It's similar to what JK girls do.

10 is the attitude t90 of the storage jig 2 @ rotating part fl1% for rotation, 11 is an arrow indicating the direction of rotation, 12 is a spinner with a rotation positioning mechanism, and 12' is a holder that allows the storage jig 2 to be inserted from above. Department. Figure 3 shows spinner 1.
Force 1.13 indicating the rotational positioning mechanism of 2 is the positioning plate,
Reference numeral 14 indicates six notches provided in the positioning plate 13, 15 indicates the movement direction of the push rod 15 that engages with the notches 14 and fixes the positioning plate 13 in the rotational direction, t7e18f1 noble diode and phototransistor, and 19 indicates the cutout 9. a slit plate 20 having a slit 19' having a positional relationship similar to that of the notch 14;
A positioning plate 13 and a slit plate 19 are fitted around the rotating shaft of the spinner 12. In the above configuration, the slit 19 of the slit plate 19 is connected to the light emitting diode 17, the phototransistor 18, and an electronic circuit (not shown)! When n is detected, the push rod 15 comes out in the right direction of the arrow 16 and engages with the notch 14 of the positioning plate 13, causing the rotation $20.
[--Divide positioning by constant angle fIIc. After wet treatment, it's time to rotate! In consideration 10, the snow is carried by the conveyor 3 and the snow is loaded 1rL7? After rotating the storage jig 2#: 90' in the same FIH direction as indicated by arrow 11, transfer it again to
As described above, the rotationally positioned rt*x pinch-12 is carried, and the n1 holding part 12'1'7 is guided and installed from above.
The spinner 12 is rotated 180° and positioned, and waits for the next storage jig 2 to arrive in the same way. When the two storage jigs 2 are aligned, they are continuously rotated and shaken off to dry. In other words, without any human intervention,
Wet processing including drying can be performed.

FIG. 4 shows another embodiment of the invention. In Figure 4,
1-2e1-2e415*9m11e12 + 12'
is the same as above.

21Fi is a rotating device that can move straight in the direction of arrow 22 and arrow 11 and rotate 90'; and 23 is a conveying device that can convey two storage jigs 2 at the same time. In the above configuration, the two storage jigs 2Fi and transport @fj1 after wet processing are
Transferred to the rotating device 21 by 123Vc n1 arrow 11
Rotate 90' clockwise.

First, one of the storage jig 2 is mounted on the spinner 12 as a tube guide by the holding portion 12' by the conveying device [245], and then the spinner 12t is rotated 1180° and positioned. Next, the rotating device 21 moves in the right direction of the arrow 22, and the other storage jig 2 is transferred to the spinner 12 by the conveying device 25. With the holding portion 12' as a guide, the spinner 12 continuously rotates and shakes it off to dry it. .

@fl processed with one storage jig like this [depending on the
It is possible to efficiently automate wet processing including drying.

As described above, according to the present invention, there is provided a device for rotating a storage jig for storing objects to be wet-processed in a conventional wet processing apparatus, a mechanism for dividing and positioning a rotating portion of a spinner at a fixed angle, and a mechanism for dividing and positioning a rotating portion of a spinner at a fixed angle. From K, the storage jig holding IO can be added at the point where the storage jig can be inserted upward.
It is possible to automate wet processing including drying. Not only does this simply streamline the number of people, but it also contributes to improving the yield of products by keeping people, the source of dust, away from undried areas. Furthermore, as mentioned above, the rotary device is made to perform linear motion in a direction perpendicular to the conveyance direction, and the WIK process is carried out using one storage jig.
For example, wet processing can be automated more efficiently.

[Brief explanation of drawings]

Fig. W41 is a conceptual diagram of a conventional wet processing device, Fig. 2 is a conceptual diagram of an embodiment of the wet processing device according to the present invention, Fig. 3 is a perspective view of a spinner rotation position determining mechanism, and Fig. 4 is a conceptual diagram of a conventional wet processing device. FIG. 3 is a conceptual diagram of another embodiment of the present invention. 1... Semiconductor wafer 2... Storage oil odor 3... Transport device 7... Chemical tank 8... Spinner 10.
... Rotating device 12 ... Spinner with rotation position determining mechanism 13 ... Positioning plate 14 ... Notch
15... Push rod 17... Light emitting diode 18.
...Phototransistor 19...Slit 20
...Rotating shaft 21...Rotating device 25...Transporting device Above Figure 1 23 Procedural procedure (voluntary) Procedural amendment (voluntary) Commissioner of the Japan Patent Office 1, Indication of the case 1988 patent application No. 4658 No. 2, Title of the invention: Wet processing device 3, Person making the correction 6, Subject of correction 1, Specification 2'ji, line 18 to 1-cho, line 19, "Storage jig 2i90"Rotate""Storage jig 2 9
Rotate 0° and correct. 2. On page 3 of the specification, line 1, the term ``the above 90° rotation and installation work'' was replaced with ``the above 90° rotation and installation work''.
0° Rotation and installation work will be corrected to ``. that's all

Claims (1)

[Claims] [11. A device for transporting a storage jig for storing objects to be treated, a chemical tank, and a centrifugal force to shake off the sound of the chemical and dry it! I
In a wet processing apparatus equipped with a spinner (hereinafter referred to as a "spinner"), a rotating part 1 of the storage jig is equipped with an approximately 90° rotation shifter, which divides the rotating part of the spinner into a certain angle. 1. A wet processing apparatus having a mechanism, and further characterized in that the spinner front storage jig holding part has a shape that allows the storage jig to be inserted from above. (2) The wet processing apparatus according to claim 1, wherein the device that rotates the storage jig by 90° in the posture t'' can also move in the direction of the rotation axis.