JPS5691431A - Automatic drying device - Google Patents

Automatic drying device

Info

Publication number
JPS5691431A
JPS5691431A JP16852579A JP16852579A JPS5691431A JP S5691431 A JPS5691431 A JP S5691431A JP 16852579 A JP16852579 A JP 16852579A JP 16852579 A JP16852579 A JP 16852579A JP S5691431 A JPS5691431 A JP S5691431A
Authority
JP
Japan
Prior art keywords
wafer
rotor
carrier
dried
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16852579A
Other languages
Japanese (ja)
Inventor
Shinichi Miyata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP16852579A priority Critical patent/JPS5691431A/en
Publication of JPS5691431A publication Critical patent/JPS5691431A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying

Abstract

PURPOSE:To dry wafers automatically and reduce the amount of stock in process by mounting a wafer carrier containing a wafer and a carrier dummy so as to face with each other on a rotor, drying the wafer by high speed rotation and the stopping the rotor with detecting elements. CONSTITUTION:A wafer carrier 12 which contains a wafer 11 to be dried and a carrier dummy 15 of the same centroid position and the same weight as the wafer carrier 12 are mounted on a rotor 14 in a sealed container 10 so that they may face with each other and are fixed with a fixing plate 18. The rotor 14 is rotated at a high speed by a driving motor 20, and water and dust on the wafer are removed by a centrifugal force and the wafer is dried. When the drying is finished, the driving motor 20 is stopped and the stopping position is determined by detecting elements 26 fixed to a position detecting disc 25 inserted over the lower part of a rotating shaft 16. By so doing, wafers can be dried automatically and a processing time can be shortened.
JP16852579A 1979-12-25 1979-12-25 Automatic drying device Pending JPS5691431A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16852579A JPS5691431A (en) 1979-12-25 1979-12-25 Automatic drying device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16852579A JPS5691431A (en) 1979-12-25 1979-12-25 Automatic drying device

Publications (1)

Publication Number Publication Date
JPS5691431A true JPS5691431A (en) 1981-07-24

Family

ID=15869631

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16852579A Pending JPS5691431A (en) 1979-12-25 1979-12-25 Automatic drying device

Country Status (1)

Country Link
JP (1) JPS5691431A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58135644A (en) * 1982-01-14 1983-08-12 Seiko Epson Corp Wet processor
JPS5998643U (en) * 1982-12-23 1984-07-04 三菱電機株式会社 rotary dryer
JPS59176572A (en) * 1983-03-26 1984-10-05 三菱電機株式会社 Chemical treating device for semiconductor wafer
FR2591324A1 (en) * 1985-12-10 1987-06-12 Recif Sa APPARATUS FOR THE UNITARY DRYING OF SILICON PLATES BY CENTRIFUGATION
EP0305402B1 (en) * 1986-05-16 1991-02-27 EASTMAN KODAK COMPANY (a New Jersey corporation) Spin drying apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58135644A (en) * 1982-01-14 1983-08-12 Seiko Epson Corp Wet processor
JPS5998643U (en) * 1982-12-23 1984-07-04 三菱電機株式会社 rotary dryer
JPS59176572A (en) * 1983-03-26 1984-10-05 三菱電機株式会社 Chemical treating device for semiconductor wafer
FR2591324A1 (en) * 1985-12-10 1987-06-12 Recif Sa APPARATUS FOR THE UNITARY DRYING OF SILICON PLATES BY CENTRIFUGATION
EP0305402B1 (en) * 1986-05-16 1991-02-27 EASTMAN KODAK COMPANY (a New Jersey corporation) Spin drying apparatus

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