JPS5691431A - Automatic drying device - Google Patents
Automatic drying deviceInfo
- Publication number
- JPS5691431A JPS5691431A JP16852579A JP16852579A JPS5691431A JP S5691431 A JPS5691431 A JP S5691431A JP 16852579 A JP16852579 A JP 16852579A JP 16852579 A JP16852579 A JP 16852579A JP S5691431 A JPS5691431 A JP S5691431A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- rotor
- carrier
- dried
- drying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
Abstract
PURPOSE:To dry wafers automatically and reduce the amount of stock in process by mounting a wafer carrier containing a wafer and a carrier dummy so as to face with each other on a rotor, drying the wafer by high speed rotation and the stopping the rotor with detecting elements. CONSTITUTION:A wafer carrier 12 which contains a wafer 11 to be dried and a carrier dummy 15 of the same centroid position and the same weight as the wafer carrier 12 are mounted on a rotor 14 in a sealed container 10 so that they may face with each other and are fixed with a fixing plate 18. The rotor 14 is rotated at a high speed by a driving motor 20, and water and dust on the wafer are removed by a centrifugal force and the wafer is dried. When the drying is finished, the driving motor 20 is stopped and the stopping position is determined by detecting elements 26 fixed to a position detecting disc 25 inserted over the lower part of a rotating shaft 16. By so doing, wafers can be dried automatically and a processing time can be shortened.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16852579A JPS5691431A (en) | 1979-12-25 | 1979-12-25 | Automatic drying device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16852579A JPS5691431A (en) | 1979-12-25 | 1979-12-25 | Automatic drying device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5691431A true JPS5691431A (en) | 1981-07-24 |
Family
ID=15869631
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16852579A Pending JPS5691431A (en) | 1979-12-25 | 1979-12-25 | Automatic drying device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5691431A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58135644A (en) * | 1982-01-14 | 1983-08-12 | Seiko Epson Corp | Wet processor |
JPS5998643U (en) * | 1982-12-23 | 1984-07-04 | 三菱電機株式会社 | rotary dryer |
JPS59176572A (en) * | 1983-03-26 | 1984-10-05 | 三菱電機株式会社 | Chemical treating device for semiconductor wafer |
FR2591324A1 (en) * | 1985-12-10 | 1987-06-12 | Recif Sa | APPARATUS FOR THE UNITARY DRYING OF SILICON PLATES BY CENTRIFUGATION |
EP0305402B1 (en) * | 1986-05-16 | 1991-02-27 | EASTMAN KODAK COMPANY (a New Jersey corporation) | Spin drying apparatus |
-
1979
- 1979-12-25 JP JP16852579A patent/JPS5691431A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58135644A (en) * | 1982-01-14 | 1983-08-12 | Seiko Epson Corp | Wet processor |
JPS5998643U (en) * | 1982-12-23 | 1984-07-04 | 三菱電機株式会社 | rotary dryer |
JPS59176572A (en) * | 1983-03-26 | 1984-10-05 | 三菱電機株式会社 | Chemical treating device for semiconductor wafer |
FR2591324A1 (en) * | 1985-12-10 | 1987-06-12 | Recif Sa | APPARATUS FOR THE UNITARY DRYING OF SILICON PLATES BY CENTRIFUGATION |
EP0305402B1 (en) * | 1986-05-16 | 1991-02-27 | EASTMAN KODAK COMPANY (a New Jersey corporation) | Spin drying apparatus |
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