JPS58133374A - 真空蒸着多層膜形成装置 - Google Patents
真空蒸着多層膜形成装置Info
- Publication number
- JPS58133374A JPS58133374A JP1550282A JP1550282A JPS58133374A JP S58133374 A JPS58133374 A JP S58133374A JP 1550282 A JP1550282 A JP 1550282A JP 1550282 A JP1550282 A JP 1550282A JP S58133374 A JPS58133374 A JP S58133374A
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- screening
- multilayer film
- evaporation source
- base body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007740 vapor deposition Methods 0.000 title description 12
- 238000001704 evaporation Methods 0.000 claims abstract description 65
- 230000008020 evaporation Effects 0.000 claims abstract description 65
- 239000000126 substance Substances 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 claims description 32
- 238000007738 vacuum evaporation Methods 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 12
- 238000000151 deposition Methods 0.000 claims description 9
- 238000004804 winding Methods 0.000 abstract description 6
- 230000003287 optical effect Effects 0.000 abstract description 5
- OMOVVBIIQSXZSZ-UHFFFAOYSA-N [6-(4-acetyloxy-5,9a-dimethyl-2,7-dioxo-4,5a,6,9-tetrahydro-3h-pyrano[3,4-b]oxepin-5-yl)-5-formyloxy-3-(furan-3-yl)-3a-methyl-7-methylidene-1a,2,3,4,5,6-hexahydroindeno[1,7a-b]oxiren-4-yl] 2-hydroxy-3-methylpentanoate Chemical compound CC12C(OC(=O)C(O)C(C)CC)C(OC=O)C(C3(C)C(CC(=O)OC4(C)COC(=O)CC43)OC(C)=O)C(=C)C32OC3CC1C=1C=COC=1 OMOVVBIIQSXZSZ-UHFFFAOYSA-N 0.000 abstract description 3
- 238000012216 screening Methods 0.000 abstract 9
- 238000012546 transfer Methods 0.000 description 11
- 230000008021 deposition Effects 0.000 description 6
- 238000001771 vacuum deposition Methods 0.000 description 3
- 239000000470 constituent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1550282A JPS58133374A (ja) | 1982-02-04 | 1982-02-04 | 真空蒸着多層膜形成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1550282A JPS58133374A (ja) | 1982-02-04 | 1982-02-04 | 真空蒸着多層膜形成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58133374A true JPS58133374A (ja) | 1983-08-09 |
| JPS6134511B2 JPS6134511B2 (enrdf_load_stackoverflow) | 1986-08-08 |
Family
ID=11890574
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1550282A Granted JPS58133374A (ja) | 1982-02-04 | 1982-02-04 | 真空蒸着多層膜形成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58133374A (enrdf_load_stackoverflow) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6318073A (ja) * | 1986-07-09 | 1988-01-25 | Nippon Kokan Kk <Nkk> | 多層被膜の製造方法 |
| JPH02131134A (ja) * | 1988-11-12 | 1990-05-18 | Shinku Yakin Kk | 有機物超微粒子の製造装置 |
| EP1096035A1 (fr) * | 1999-10-26 | 2001-05-02 | Usinor | Tôle d'acier revêtue et procédé et appareil de fabrication de cette tôle |
| JP2007169691A (ja) * | 2005-12-20 | 2007-07-05 | Tokki Corp | 蒸着装置及び多元系蒸発源の蒸着方法 |
| WO2009083546A1 (fr) * | 2007-12-21 | 2009-07-09 | Industrial Plasma Services & Technologies - Ipst Gmbh | Procede et dispositifs de controle d'un flux de vapeur en evaporation sous vide |
| BE1017912A3 (fr) * | 2007-12-21 | 2009-11-03 | Ind Plasma Services & Technolo | Procede et dispositifs de controle d'un flux de vapeur en evaporation sous vide. |
| DE102020121923A1 (de) | 2020-08-21 | 2022-02-24 | Materials Center Leoben Forschung Gmbh | Pvd-verfahren und vorrichtung hierfür |
-
1982
- 1982-02-04 JP JP1550282A patent/JPS58133374A/ja active Granted
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6318073A (ja) * | 1986-07-09 | 1988-01-25 | Nippon Kokan Kk <Nkk> | 多層被膜の製造方法 |
| JPH02131134A (ja) * | 1988-11-12 | 1990-05-18 | Shinku Yakin Kk | 有機物超微粒子の製造装置 |
| EP1096035A1 (fr) * | 1999-10-26 | 2001-05-02 | Usinor | Tôle d'acier revêtue et procédé et appareil de fabrication de cette tôle |
| JP2007169691A (ja) * | 2005-12-20 | 2007-07-05 | Tokki Corp | 蒸着装置及び多元系蒸発源の蒸着方法 |
| WO2009083546A1 (fr) * | 2007-12-21 | 2009-07-09 | Industrial Plasma Services & Technologies - Ipst Gmbh | Procede et dispositifs de controle d'un flux de vapeur en evaporation sous vide |
| BE1017912A3 (fr) * | 2007-12-21 | 2009-11-03 | Ind Plasma Services & Technolo | Procede et dispositifs de controle d'un flux de vapeur en evaporation sous vide. |
| KR20100102129A (ko) * | 2007-12-21 | 2010-09-20 | 아이피에스티 게엠베하 | 진공증착시의 증기의 유동제어방법과 장치 |
| JP2011506776A (ja) * | 2007-12-21 | 2011-03-03 | インダストリアル プラズマ サービシーズ アンド テクノロジーズ − イーペーエステー ゲーエムベーハー | 真空蒸発法における蒸気流を制御するための方法及び装置 |
| US9458533B2 (en) | 2007-12-21 | 2016-10-04 | Advanced Galvanisation Ag | Method and devices for controlling a vapour flow in vacuum evaporation |
| US10323319B2 (en) | 2007-12-21 | 2019-06-18 | Advanced Galvanisation Ag | Method and devices for controlling a vapour flow in vacuum evaporation |
| DE102020121923A1 (de) | 2020-08-21 | 2022-02-24 | Materials Center Leoben Forschung Gmbh | Pvd-verfahren und vorrichtung hierfür |
| WO2022038296A1 (de) * | 2020-08-21 | 2022-02-24 | Voestalpine Stahl Gmbh | Pvd-verfahren und vorrichtung hierfür |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6134511B2 (enrdf_load_stackoverflow) | 1986-08-08 |
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