JPS58128670U - Coating device - Google Patents
Coating deviceInfo
- Publication number
- JPS58128670U JPS58128670U JP2300182U JP2300182U JPS58128670U JP S58128670 U JPS58128670 U JP S58128670U JP 2300182 U JP2300182 U JP 2300182U JP 2300182 U JP2300182 U JP 2300182U JP S58128670 U JPS58128670 U JP S58128670U
- Authority
- JP
- Japan
- Prior art keywords
- rotating shaft
- suction
- solvent
- coating device
- suction hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Coating Apparatus (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図ａ、 ｂは従来の塗布装置を示す断面図、第２
図は本考案の実施例を示す断面図である。
１３・・・回転軸、１５・・・真空室ハウジング、１８
・・・溶剤誘導用ガイド、１９・・・溶剤溜め、２０・
・・回転軸の開口、２２・・・回転軸の吸着穴。Figures 1a and 1b are cross-sectional views showing a conventional coating device;
The figure is a sectional view showing an embodiment of the present invention. 13...Rotating shaft, 15...Vacuum chamber housing, 18
...Solvent guiding guide, 19...Solvent reservoir, 20.
... Opening of the rotating shaft, 22... Suction hole of the rotating shaft.
Claims (1)
着穴を通して真空吸引により半導体ウェハーを載置台に
定着させた状態で高速回転させながら、溶剤を塗布する
装置において、前記回転軸内の吸着穴を真空室内に開口
させ、真空室内に溶剤溜めを設け、回転軸の周囲に吸着
穴より流出した溶剤を溶剤溜め内に誘導させるガイドを
設けたことを特徴とする塗布装置。In an apparatus in which a suction hole is provided in a rotating shaft that supports a wafer mounting table, and the semiconductor wafer is fixed to the mounting table by vacuum suction through the suction hole and is rotated at high speed while applying a solvent, the suction in the rotating shaft is A coating device characterized in that a hole is opened in a vacuum chamber, a solvent reservoir is provided in the vacuum chamber, and a guide is provided around a rotating shaft to guide the solvent flowing out from the suction hole into the solvent reservoir.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2300182U JPS58128670U (en) | 1982-02-20 | 1982-02-20 | Coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2300182U JPS58128670U (en) | 1982-02-20 | 1982-02-20 | Coating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58128670U true JPS58128670U (en) | 1983-08-31 |
| JPS6218299Y2 JPS6218299Y2 (en) | 1987-05-11 |
Family
ID=30035059
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2300182U Granted JPS58128670U (en) | 1982-02-20 | 1982-02-20 | Coating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58128670U (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53118466U (en) * | 1977-02-28 | 1978-09-20 |
-
1982
- 1982-02-20 JP JP2300182U patent/JPS58128670U/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53118466U (en) * | 1977-02-28 | 1978-09-20 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6218299Y2 (en) | 1987-05-11 |
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