JPS58127379A - 絶縁ゲ−ト形トランジスタ - Google Patents
絶縁ゲ−ト形トランジスタInfo
- Publication number
- JPS58127379A JPS58127379A JP57009746A JP974682A JPS58127379A JP S58127379 A JPS58127379 A JP S58127379A JP 57009746 A JP57009746 A JP 57009746A JP 974682 A JP974682 A JP 974682A JP S58127379 A JPS58127379 A JP S58127379A
- Authority
- JP
- Japan
- Prior art keywords
- active layer
- cathode
- gate
- anode
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
- H10D12/211—Gated diodes
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57009746A JPS58127379A (ja) | 1982-01-25 | 1982-01-25 | 絶縁ゲ−ト形トランジスタ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57009746A JPS58127379A (ja) | 1982-01-25 | 1982-01-25 | 絶縁ゲ−ト形トランジスタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58127379A true JPS58127379A (ja) | 1983-07-29 |
| JPH0475669B2 JPH0475669B2 (enExample) | 1992-12-01 |
Family
ID=11728865
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57009746A Granted JPS58127379A (ja) | 1982-01-25 | 1982-01-25 | 絶縁ゲ−ト形トランジスタ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58127379A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02278771A (ja) * | 1989-04-20 | 1990-11-15 | Matsushita Electron Corp | 薄膜トランジスタ |
| US5442215A (en) * | 1993-03-31 | 1995-08-15 | Goldstar Co., Ltd. | Thin film transistor having an asymmetrical lightly doped drain structure |
| US5477065A (en) * | 1990-07-02 | 1995-12-19 | Kabushiki Kaisha Toshiba | Lateral thin film thyristor with bevel |
-
1982
- 1982-01-25 JP JP57009746A patent/JPS58127379A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02278771A (ja) * | 1989-04-20 | 1990-11-15 | Matsushita Electron Corp | 薄膜トランジスタ |
| US5477065A (en) * | 1990-07-02 | 1995-12-19 | Kabushiki Kaisha Toshiba | Lateral thin film thyristor with bevel |
| US5442215A (en) * | 1993-03-31 | 1995-08-15 | Goldstar Co., Ltd. | Thin film transistor having an asymmetrical lightly doped drain structure |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0475669B2 (enExample) | 1992-12-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100189691B1 (ko) | 터널 주입형 반도체장치 및 그 제조방법 | |
| CA1081368A (en) | Field effect transistor with a short channel length | |
| US5834793A (en) | Semiconductor devices | |
| US3339128A (en) | Insulated offset gate field effect transistor | |
| US3514676A (en) | Insulated gate complementary field effect transistors gate structure | |
| JPH07105496B2 (ja) | 絶縁ゲート型バイポーラトランジスタ | |
| US6774463B1 (en) | Superconductor gate semiconductor channel field effect transistor | |
| JPS623989B2 (enExample) | ||
| KR100218849B1 (ko) | 고체촬상소자의제조방법 | |
| GB1562735A (en) | Semiconductor device | |
| JPS6050960A (ja) | 半導体装置 | |
| JPS6119164A (ja) | 相補型集積回路とその製造方法 | |
| JPS58127379A (ja) | 絶縁ゲ−ト形トランジスタ | |
| US3979766A (en) | Semiconductor device | |
| US4851888A (en) | Conductivity modulation type vertical MOS-FET | |
| JP2848288B2 (ja) | 誘導性負荷に電源供給、再循環および減磁を行なうための半導体素子 | |
| US4060827A (en) | Semiconductor device and a method of making the same | |
| Fossum et al. | Measurement of hole leakage and impact ionization currents in bistable metal—tunnel-oxide—semiconductor junctions | |
| JP3234677B2 (ja) | ラテラル型フォトトライアック | |
| JPS6359262B2 (enExample) | ||
| JPS631758B2 (enExample) | ||
| TW525302B (en) | Vertical type semiconductor variable resistor device and its manufacturing method | |
| JPH04251977A (ja) | 超伝導体ゲートを備えた電界効果トランジスタ | |
| JPH07183498A (ja) | 半導体装置 | |
| JPS60124863A (ja) | Mos集積回路装置 |