JPS58125673A - Diffusion joining method - Google Patents

Diffusion joining method

Info

Publication number
JPS58125673A
JPS58125673A JP377082A JP377082A JPS58125673A JP S58125673 A JPS58125673 A JP S58125673A JP 377082 A JP377082 A JP 377082A JP 377082 A JP377082 A JP 377082A JP S58125673 A JPS58125673 A JP S58125673A
Authority
JP
Japan
Prior art keywords
metal
iron
ceramic
diffusion bonding
bonding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP377082A
Other languages
Japanese (ja)
Other versions
JPS6140624B2 (en
Inventor
健司 山根
荒川 芳樹
正昭 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinmaywa Industries Ltd
Original Assignee
Shin Meiva Industry Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Meiva Industry Ltd filed Critical Shin Meiva Industry Ltd
Priority to JP377082A priority Critical patent/JPS58125673A/en
Publication of JPS58125673A publication Critical patent/JPS58125673A/en
Publication of JPS6140624B2 publication Critical patent/JPS6140624B2/ja
Granted legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 この発明はセラミックス特にシリコン系セラミA3 ノクスと鉄系金属どの拡散接合方法に関する。[Detailed description of the invention] This invention applies to ceramics, especially silicon-based ceramic A3. Concerning diffusion bonding methods for Nox and ferrous metals.

シリコン系セラミックスは特に近時開発され、そのすぐ
れた性質は注目を浴びている。しかしながらこのような
セラミックスを実用に供するには、少量のセラミックス
です1せるため台となる金属と接合して使用することが
多い。ところが特にシリコン系セラミックスと金属との
接合は種々困難な問題点がある○ すなわち従来からセラミックスと金属との接合法として
、メタライジング法、高融点法1、および有機または無
機接着剤を用いる方法などあるが、前二者に、i5・い
ては接合に手間を要し、充分な接合強度が得らJtない
などの欠点があり、捷だ後者においては血1水性、気密
性に劣り、接合部の寿命が短い等の欠点がある。
Silicon-based ceramics have been developed particularly recently, and their excellent properties are attracting attention. However, in order to put such ceramics into practical use, only a small amount of ceramic is required.1 In order to reduce the thickness, it is often used by bonding it to a metal base. However, there are various difficulties in bonding silicon-based ceramics and metals. In other words, conventional methods for bonding ceramics and metals include metallization, high melting point method 1, and methods using organic or inorganic adhesives. However, the former two have drawbacks, such as the fact that it takes time to join and does not provide sufficient joint strength, while the latter has the disadvantages of being water-based, having poor airtightness, and making the joint difficult. There are disadvantages such as short lifespan.

一方近時発達しつつある拡散接合方法は、一般には有効
な接合方法として知られているが、接合対象がセラミッ
クスと金属との場合は、種々困難な問題があり、今迄に
実用になったものはない。
On the other hand, the recently developed diffusion bonding method is generally known as an effective bonding method, but there are various difficulties when bonding objects are ceramics and metals, so it has not been put into practical use until now. There's nothing.

そこでこの発明の発jJJ者は、特にシリコン系のセラ
ミックスと鉄系金属との拡散接合に1j];戦して前述
問題点を)1/F決せんとし、神々努力を車J)だ結果
、この発明方法を完成するに一′トりたものToある0
、すなわち、シリコン系のセラミックス中のシリコン(
Si)成分と高温中においで共晶反応をおこし、さらに
後述する第2金属とも共晶反応を」、・こしうる金属(
すなわち第1金属)どして、銀(A、gつ、アルミニウ
ム(h、g、金(An )、ベリリウム(Be)、など
を選択し、゛また、これら第1金属お」:び台となる鉄
系金属と共晶反応を」・・こしつる、かつその熱膨張係
数がセラミックスのそれと台となる鉄系金属のそれとの
中間の値、ないしは前記鉄系金属の値と同じ値を有する
金属(すなわち第2金属)として銅(Cu )、チタン
(TI)、ニッケル(N1)、ベリリウム(Be)、セ
リウム(Ce)、ゲルマニウム(Ge)、アンチモン(
Sb)、)リウム(Th)、ジルコニウム(Zr)など
を選択した。
Therefore, the inventor of this invention tried to resolve the above-mentioned problems by specifically working on diffusion bonding between silicon-based ceramics and iron-based metals, and as a result, made a divine effort. To complete this invention method, there are 0
, that is, silicon in silicon-based ceramics (
A eutectic reaction occurs with the Si) component at high temperatures, and a eutectic reaction with a second metal (described later).
In other words, silver (A, g), aluminum (h, g, gold (An), beryllium (Be), etc. are selected as the first metal), and A metal that undergoes a eutectic reaction with an iron-based metal, and whose coefficient of thermal expansion is between that of the ceramic and that of the iron-based metal, or the same value as that of the iron-based metal. (i.e. second metal) such as copper (Cu), titanium (TI), nickel (N1), beryllium (Be), cerium (Ce), germanium (Ge), antimony (
Sb),) lium (Th), zirconium (Zr), etc. were selected.

そしてSiCと鉄系金属との間にSiCに接して第1金
属を、捷だ鉄系金属に接して第2金属をそれぞれインサ
ート材としてそう人し拡散接合を行なう5 ものである。そしてこれら第1金属および第2金属は前
述し7仁金属単体のみでなく、これらの金属を主成分と
する合金であってもよいものである。
Diffusion bonding is then performed between the SiC and the ferrous metal by using a first metal in contact with the SiC and a second metal in contact with the ferrous metal as insert materials. The first metal and the second metal may be not only the single metals mentioned above, but also alloys containing these metals as main components.

いずれにしても、発明者は接合材の一方はシリコン系セ
ラミックスのうち、耐摩耗性にすぐれ実用度の高いシリ
コンカーバイド(SiC)に主眼をおいて、また他方は
鉄系金属のうちステンレス鋼(SUS304)を選択し
て種々拡散接合をこころみた。
In any case, the inventor focused on silicon carbide (SiC), which has excellent wear resistance and is highly practical among silicon-based ceramics, as one of the bonding materials, and stainless steel (stainless steel), which is an iron-based metal, on the other hand. We selected SUS304) and tried various diffusion bonding methods.

そして前記第1金属のうちAgおよびAυ;特に充分な
接合性能を有し、経済的でもあり、もつとも望外しいも
のであった。1だ前記第2金属のうち、前記第1金属と
してAgに対してはTiおよびCuが、棟たAtに対し
ては′1゛lおよびNiがそれぞれ第2金属としてもっ
とも望〜ましいものであった。
Of the first metals, Ag and Aυ have particularly good bonding performance and are economical, which is undesirable. Among the second metals, Ti and Cu are most preferable for Ag as the first metal, and 1 and Ni are the most preferable second metals for At. Ta.

またこれらの場合、第1金属としてのAgおよびAtは
、10ガいし100 pmの箔、もしくはSiC接合面
」−あるいは第2金属側の接合面上への蒸着、スパッタ
等によるメッキされたものでもよい。第2金稿の厚みは
、拡散接合時の加熱冷却によって墓 6 生じるSiCやステンレス鋼の熱応力差を吸収するよう
充分な値が選ばれるべきであり、例えば01ないし2■
が望甘しい。
In these cases, Ag and At as the first metal may be a 10-gauge 100 pm foil, or a material plated by vapor deposition, sputtering, etc. on the SiC bonding surface, or on the bonding surface on the second metal side. good. The thickness of the second metal plate should be selected to be a sufficient value to absorb the difference in thermal stress between SiC and stainless steel caused by heating and cooling during diffusion bonding, for example, 01 to 2.
is too hopeful.

この発明の実施例に使用した接合部および第2金属の熱
膨張係数の一例は表1のとおりである。
Table 1 shows examples of the thermal expansion coefficients of the joints and the second metal used in the examples of this invention.

−また実施例テストピースの仕様は表2のとおりである
- Also, the specifications of the example test pieces are as shown in Table 2.

表1   接合材及び第2金属の熱膨張係数(×101
0c) 表2    接合材の仕様 盃 7 以下この発明の実施例を詳述する。
Table 1 Coefficient of thermal expansion of bonding material and second metal (×101
0c) Table 2 Specifications of bonding material Cup 7 Examples of the present invention will be described in detail below.

実施例1(インサート材拐Ag−Ti)表2に示した仕
様の接合拐、およびインサート材をアセトン中で10分
間超音波洗浄した。インサート拐として、厚さ50μm
のA、g箔を第1金属1トシ厚さ1mのT1シートを第
2金属2とし、表2に示した接合材3および4の間にそ
う人しく図面参照)、約10−5Torrの真空中で、
接合温度8500Cおよび900LJC1接合圧力約2
゜5 kg/−で、名60分間拡故接合した。この結果
各温度のものにおいて、良好な接合が得られた。このと
きの剪断強度に、6々いり、 10 kq / mAで
あり、SiC側で剥離′thたはSiCが破損した。
Example 1 (Ag-Ti insert material) The bonded material having the specifications shown in Table 2 and the insert material were ultrasonically cleaned in acetone for 10 minutes. Thickness: 50μm as insert
A, g foil is used as the first metal 1, T1 sheet with a thickness of 1 m is used as the second metal 2, and a vacuum of about 10-5 Torr is placed between the bonding materials 3 and 4 shown in Table 2 (refer to the drawing). Inside,
Bonding temperature 8500C and 900LJC1 bonding pressure approx. 2
Expansion bonding was carried out at 5 kg/- for 60 minutes. As a result, good bonding was obtained at each temperature. The shear strength at this time was 10 kq/mA, and the SiC side was peeled off or the SiC was damaged.

実施例2(インサート材Ag−Cu) 実施例1と同様に接合制およびインサート材を前処理し
た。インサート材として、厚さ50μmのAg箔を第1
金属lとし、厚さ0.8 mmのCuシートを第2金属
2とし、実施例1と同様に重ね合せて、同様の条件で拡
散接合した。この結果各温度のものにおいて、良好な接
合が得られた。このときの剪断強度し1.0.5斥いし
2 kq/ maであり、SiCイ[111で剥離した
Example 2 (Insert material Ag-Cu) The bonding material and insert material were pretreated in the same manner as in Example 1. As the insert material, Ag foil with a thickness of 50 μm was used as the first
The metal 1 was used as the second metal 2, and a Cu sheet with a thickness of 0.8 mm was used as the second metal 2. They were stacked on top of each other in the same manner as in Example 1, and diffusion bonded under the same conditions. As a result, good bonding was obtained at each temperature. The shear strength at this time was 1.0.5 kq/ma, and it was peeled off with SiC I[111].

実施例3(インサー)・4シAt−Tl)実施例1と同
様に接合拐およびインツー−1・利゛を前処理した。イ
ンサートuとして厚さ601unのAt箔を第1金属と
し、厚さ】晒σ)T1シー)・を第2金属として、実施
例1と同様に重ね合せて、約1O−5Torrの真空中
で、接合温度650°Cおよび700°C1接合圧力約
2.5 kg / フ+ufで各60分間拡基ダ接合し
lこ1、この結朱各温度のものに」・・いて良af−な
」度合がイ(Iられ飽、このときの剪断強度は4ないし
7に7/−であり、SiC11111て剥離した0、実
施例4(インサート材へt−N1) 実施例1と同様に接合材およびインフ−1・旧を前処理
した。インサート桐として厚さ60μmのAt箔を第1
金属とし、厚さ1間のNiシー1・を第2金属として、
実施例1と同様に11ね合せて、約1O−5Torrの
真空中で、接合温度700°Cおよび75   ゛0°
C1接合圧力約” ky/ mAで各60分間拡散接合
した。この結果各温度のものによ、・いて良好な接9 合が14ノられた。とのときの剪断強度は0.3々いし
2に7/−であり、SiC側で剥離した。
Example 3 (Inser)/4 At-Tl) In the same manner as in Example 1, the bond removal and In2-1/R were pretreated. As the insert u, an At foil with a thickness of 601 nm was used as the first metal, and an At foil with a thickness of 601 nm was used as the second metal. The bonding temperature was 650°C and 700°C, and the bonding pressure was approximately 2.5 kg/f+uf for 60 minutes each. The shear strength at this time was 4 to 7/-, and the peeled SiC11111 was 0, Example 4 (t-N1 to the insert material). -1. The old was pretreated. At foil with a thickness of 60 μm was used as the insert paulownia for the first
as a metal, and a Ni sheet with a thickness of 1 as the second metal,
11 were assembled in the same manner as in Example 1, and the bonding temperature was 700°C and 75°C in a vacuum of about 1O-5Torr.
Diffusion bonding was carried out for 60 minutes each at a C1 bonding pressure of approximately 1000 ky/mA.As a result, 14 good bonds were made at each temperature.The shear strength was 0.3 It was 2 to 7/-, and peeled off on the SiC side.

前述実施例以外に、例えばSiCはカーボン基材にコー
ティングしたものを用いても同様の結果が得られた。ま
た鉄系としてステンレス鋼以外に、他の鉄系の金属であ
っても同様結果が得られる。
In addition to the above examples, similar results were obtained by using, for example, SiC coated on a carbon base material. In addition to stainless steel, similar results can be obtained with other iron-based metals.

また前述実施例の第1金属および第2金属は、もっとも
効果のある組合せを選択したものであるが、これらの他
、初めに例示したAg+ At、 Au、 Beなどの
第1金属、およびCu、Tis NL Bet Ce、
 Ge、Sb、 Th、 Zrなどの第2金属の種々組
合せによっても、一応の結果は得られた。
In addition, the first metal and the second metal in the above-mentioned embodiment were selected from the most effective combination, but in addition to these, the first metal such as Ag+ At, Au, Be, etc., and Cu, Tis NL Bet Ce,
Some results were also obtained with various combinations of second metals such as Ge, Sb, Th, and Zr.

寸たさらにシリコン系セラミックスとしてs SiCの
ほか、シリコンナイトライド(5i3N4)を使用して
実施しても、はぼ同等の結果が得られた。
Even when silicon nitride (5i3N4) was used as the silicon-based ceramic in addition to sSiC, almost the same results were obtained.

前述の実施例に対し−で、インサート材を使用しないか
、使用しても一柚類だけの場合は、いずれも接合しなか
った。これらの結果を対照例として表3に示す。
In contrast to the above-mentioned example, in cases where no insert material was used or only one yuzu was used, no bonding was performed. These results are shown in Table 3 as a control example.

扁 10 表3     対  照  例 但し:接合拐及びインサート拐はアセ[・ン中10分間
超音波洗浄、接合界しく]気;約l0−5Torrの真
空中、接合圧力及び時間;約2−5に7/−160分間
、P;接合界ifn SiC1tlll剥離、D ;S
ICが破壊。
10 Table 3 Comparison Example: However, bonding and insert removal were carried out in a vacuum of about 10-5 Torr, bonding pressure and time: about 2-5 minutes. 7/-160 minutes, P; junction boundary ifn SiC1tllll peeling, D; S
IC is destroyed.

以上の説明によって明らかになったように、この発明方
法によるときは、シリコン系セラミ7ノクスと、鉄系金
属とを確実強固に拡散4す合しうる、特有かっ血著な効
果を奏するものである。
As has been made clear from the above explanation, the method of this invention has a unique and remarkable effect of being able to reliably and firmly diffuse and combine the silicon-based ceramic 7NOx and the iron-based metal. be.

【図面の簡単な説明】[Brief explanation of the drawing]

扁11 図面はこの発明方法によって接合した実施例の側面図で
ある。 1・・・第1金属、2・・第2金属、3・・・シリコン
系セラミックス、4・・・鉄系金属。 出願人 新明和工業株式会社 代理人 弁上 正 (ほか1名) 図面の浄書(内容に変更なし) 手  続  補  正  IL)(方民)昭和57年4
月30日 昭和st7年    鋳杆願第5770号2、をDバの
名称 $宜り旧ト告お太 3、補正をする考 事件との関係      J↑”TR’f  出願人住
所  兵庫県西宮市小曽根町1丁目5番25号名称 (
235)新明和工業株式会社 〒663 居所  兵庫県西宮市田近野町6番107号新明和工業
株式会社開発センター内 ’rEr−(0798)51−7734(代)手  続
  補  正  書 2、 益pノ」の名称 紘似#8力蹟 3、補正をする者 事件との関係        竹管出願人住所  兵庫
県西宮市小曽根町1丁目5番25号蚕チー6=6=3= 一居所−・−一兵庫県西宮市田近野IIt]−641責
H−ト噺朋和工業株式会社開発七を沈=丙= =fE L= (=0798 ) 5−1=7”?=F
4’(?ゴ阻名;=井−−”k−qさ 5、補正命令の日付  1冷 6、補正により増加する発明のq 7、補正の対象 屋 2 (1)明、I+lll書の発明の詳細な説明の欄(2)
  明細1書の図面の簡単な説明の欄(3)図面 8、補正の内容 (1)  明細1第10頁下から第6行と同第5行との
間に、次の記載を挿入する。 [またさらに前述実施例のうち、実施例1によるザンプ
ルの接合個所の、金属顕微鏡写真を第2図に、この第2
図の写真における符号1ないし9の各位置における点分
析結果を表4に示す。また前述実施例のうち、実施例3
によるザンプルの接合個所の、金属顕微鏡写真を第3図
に、この第3図の写真における符号1ないし6の各位置
における点分析結果を表5に示す。これらの分析に使用
した装置は■日立製作所製El)MAX−560形(エ
ネルギー分散形)によった。壕だこれらによると、接合
個所に拡散がみとめられる。 扁 4 (2)  明細書箱11頁i1; 1行1−図面は・」
とあるのを1第1図は・・・」と補正する。 (3)  明細省第11頁第2行「側面図である。」の
次に「!f、た第2図および第3図はこの発明実施例1
および実施例3の接合個所の金属顕微鏡写真である。」
の記載を追加する。 (4)  お手数ながら、すでに提出した図面の別添万
屋 5 に赤書したように、「第1図jの3字を追記いただくよ
うお願い申し上げ捷す。
Flat 11 The drawing is a side view of an embodiment joined by the method of this invention. 1...First metal, 2...Second metal, 3...Silicon-based ceramics, 4...Iron-based metal. Applicant ShinMaywa Industries Co., Ltd. Agent Tadashi Bengami (and 1 other person) Engraving of drawings (no changes in content) Procedures Amendment IL) (Homin) April 1980
July 30th, Showa st 7th year, Foundry Application No. 5770 2, the name of the D-ba, the old Tokoku Ota 3, relationship with the case to be amended J↑”TR'f Applicant Address: Nishinomiya City, Hyogo Prefecture Ozone-cho 1-5-25 Name (
235) ShinMaywa Industries Co., Ltd. Address: 6-107 Takkino-cho, Nishinomiya City, Hyogo Prefecture, 663 ShinMaywa Industries Co., Ltd. Development Center (0798) 51-7734 (Main) Procedures Amendment 2, Benefit P Name of ``No'' Hironi #8 Rikkei 3, Relationship with the person making the amendment Bamboo tube applicant address 1-5-25 Kozone-cho, Nishinomiya City, Hyogo Prefecture Seriku Chi 6=6=3= Residence -・- 1 Hyogo Prefecture Nishinomiya City Takonno IIt] -641 Responsibility H-To Banashi Howa Kogyo Co., Ltd. Development Seven = Hei = = fE L = (=0798) 5-1 = 7"? = F
4'(?Gobe name;=I--"k-qsa 5, date of amendment order 1 cold 6, q of invention increased by amendment 7, subject of amendment 2 (1) Ming, invention of I+llll book Detailed explanation column (2)
Column for brief explanation of drawings in Specification 1 (3) Drawing 8, contents of amendment (1) The following statement is inserted between the 6th line and the 5th line from the bottom of page 10 of Specification 1. [Furthermore, among the above-mentioned Examples, FIG.
Table 4 shows the point analysis results at each position of numerals 1 to 9 in the photograph of the figure. Also, among the aforementioned examples, Example 3
FIG. 3 shows a metallurgical microscopic photograph of the bonded portion of the sample according to the method, and Table 5 shows the point analysis results at each position of numerals 1 to 6 in the photograph of FIG. The apparatus used for these analyzes was MAX-560 model (energy dispersion type) manufactured by Hitachi, Ltd. According to the trenches, diffusion has been observed at the joints. 4 (2) Specification box 11 page i1; 1st line 1 - The drawing is...
1. Figure 1 is corrected to ``...''. (3) Ministry of Specification, page 11, line 2, “This is a side view.” Next to “!f,” Figures 2 and 3 are Embodiment 1 of this invention.
3 is a metallurgical micrograph of a joint location in Example 3. ”
Add the following description. (4) We apologize for the inconvenience, but as written in red in Attachment 5 of the drawings that we have already submitted, we would like to ask you to add the 3 letters in Figure 1 j.

Claims (7)

【特許請求の範囲】[Claims] (1)  シリコン系セラミックスと鉄系金属を拡散接
合する方法であって、セラミックス側と鉄系金属側とに
接する少なくとも2種のインサート月を使用し、前記セ
ラミックス側に接するインサート材はこのセラミックス
中のSi成分と共晶反応しうる第1金属を主成分とする
金属であり、前記鉄系金属側に接するインサート材は鉄
および前記第1金属と共晶反応しうる、かつその熱膨張
係数が前記セラミックスと鉄系金頴のそれとの中間の値
ないし鉄系金属と同じ値を有する第2金属を主成分とす
る金属であることを特徴とする、前記拡散接合方法。
(1) A method of diffusion bonding silicon-based ceramics and iron-based metals, in which at least two types of inserts are used that are in contact with the ceramic side and the iron-based metal side, and the insert material that is in contact with the ceramic side is The insert material in contact with the iron-based metal side is a metal whose main component is a first metal that can undergo a eutectic reaction with the Si component of The diffusion bonding method is characterized in that the second metal is a metal whose main component is a second metal having a value intermediate between that of the ceramic and that of the iron-based metal or the same value as the iron-based metal.
(2)  前記第1金属は薄膜であり、前記第2金属は
薄板とした、特許請求の範囲第1項記載の拡散接合方法
(2) The diffusion bonding method according to claim 1, wherein the first metal is a thin film and the second metal is a thin plate.
(3) 前記セラミ、ノクスばSiCであ5iMtl記
鉄糸金扁 2 属はステンレス鋼である、特許請求の範囲第1項記載の
拡散接合方法。
(3) The diffusion bonding method according to claim 1, wherein the ceramic is SiC and the iron thread is stainless steel.
(4)  前記セラミックスは5iCfあり、前h1シ
鉄糸金属はステンレス鋼であって、さらに前記第1金稙
はAg、前記第2.金属はT1である、特許請求の範囲
第1項記載の拡散接合方法、。
(4) The ceramic has 5iCf, the first iron thread metal is stainless steel, the first metal is Ag, and the second metal is stainless steel. The diffusion bonding method according to claim 1, wherein the metal is T1.
(5)  前記セラミックスはSiCであり、前記鉄系
金属はステンレス鋼であって、さらに+iiJ記第1全
第1金属i ?J′lJ記第2金属はCuである、特i
f’l・請求の範囲第1項記載の拡散接合方法。
(5) The ceramic is SiC, the iron-based metal is stainless steel, and furthermore, +iiJ, first total first metal i? J′lJ The second metal is Cu, especially i
f'l. Diffusion bonding method according to claim 1.
(6)前記セラミックスはSiCであり、611記鉄系
金属はステンレス鋼であって、さらに6jl記第1金属
はAt、前記第2金属はTiである、特許請求の範囲第
1項記載の拡散接合方法。
(6) The diffusion method according to claim 1, wherein the ceramic is SiC, the iron-based metal is stainless steel, the first metal is At, and the second metal is Ti. Joining method.
(7)  Nil記セラミックスはSiCであり、前記
鉄系金属はステンレス鋼であって、さらにnij記第1
金属はAt、前記第2金属はNiである、特許請求の範
囲第1項記載の拡散接合方法。
(7) Nil Ceramics is SiC, the iron-based metal is stainless steel, and Nij No. 1
2. The diffusion bonding method according to claim 1, wherein the metal is At and the second metal is Ni.
JP377082A 1982-01-12 1982-01-12 Diffusion joining method Granted JPS58125673A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP377082A JPS58125673A (en) 1982-01-12 1982-01-12 Diffusion joining method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP377082A JPS58125673A (en) 1982-01-12 1982-01-12 Diffusion joining method

Publications (2)

Publication Number Publication Date
JPS58125673A true JPS58125673A (en) 1983-07-26
JPS6140624B2 JPS6140624B2 (en) 1986-09-10

Family

ID=11566403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP377082A Granted JPS58125673A (en) 1982-01-12 1982-01-12 Diffusion joining method

Country Status (1)

Country Link
JP (1) JPS58125673A (en)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58176189A (en) * 1982-04-09 1983-10-15 日本特殊陶業株式会社 Metallization of silicon nitride and carbide sintered body surface
JPS59232693A (en) * 1983-06-17 1984-12-27 Ngk Spark Plug Co Ltd Clad brazing filler metal for joining ceramics and metal or the like and composite body composed of ceramics and metal or the like using said brazing filler metal
JPS60108376A (en) * 1983-11-14 1985-06-13 株式会社東芝 Bonded body of nitride ceramic and metal
JPS60145972A (en) * 1983-12-29 1985-08-01 株式会社東芝 Ceramic-metal bonded body
JPS60231472A (en) * 1984-04-26 1985-11-18 住友電気工業株式会社 Ceramic and metal bonded body and bonding method
JPS6178205U (en) * 1984-10-29 1986-05-26
US4624403A (en) * 1983-12-14 1986-11-25 Hitachi, Ltd. Method for bonding ceramics to metals
JPS61275512A (en) * 1985-05-30 1986-12-05 Nippon Kokan Kk <Nkk> Engine component and manufacture thereof
JPS6286833A (en) * 1985-10-14 1987-04-21 Hitachi Ltd Ceramic package for placing semiconductor substrate and manufacturing thereof
US5054682A (en) * 1988-09-08 1991-10-08 Cmb Foodcan Plc Method of bonding a tool material to a holder and tools made by the method
JPH0517247A (en) * 1991-07-02 1993-01-26 Ngk Insulators Ltd Method for joining ceramic to metal member
CN100434224C (en) * 2005-06-09 2008-11-19 山东大学 Diffusion and connection method for ceramic and steel by adding active intermediate alloy
WO2011070627A1 (en) * 2009-12-11 2011-06-16 パイオニア株式会社 Method for bonding semiconductor substrates and mems device
WO2011070626A1 (en) * 2009-12-11 2011-06-16 パイオニア株式会社 Method for bonding semiconductor substrates and mems device
WO2011070625A1 (en) * 2009-12-11 2011-06-16 パイオニア株式会社 Method for bonding semiconductor substrates and mems device
JP2019185905A (en) * 2018-04-04 2019-10-24 日本特殊陶業株式会社 Ceramic member and manufacturing method of buffer member

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56163091A (en) * 1980-05-21 1981-12-15 Hitachi Ltd Welding repair method of low-alloy cast steel turbine casing at site

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56163091A (en) * 1980-05-21 1981-12-15 Hitachi Ltd Welding repair method of low-alloy cast steel turbine casing at site

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6261558B2 (en) * 1982-04-09 1987-12-22 Ngk Spark Plug Co
JPS58176189A (en) * 1982-04-09 1983-10-15 日本特殊陶業株式会社 Metallization of silicon nitride and carbide sintered body surface
JPS59232693A (en) * 1983-06-17 1984-12-27 Ngk Spark Plug Co Ltd Clad brazing filler metal for joining ceramics and metal or the like and composite body composed of ceramics and metal or the like using said brazing filler metal
JPS60108376A (en) * 1983-11-14 1985-06-13 株式会社東芝 Bonded body of nitride ceramic and metal
JPH0357070B2 (en) * 1983-11-14 1991-08-30
US4624403A (en) * 1983-12-14 1986-11-25 Hitachi, Ltd. Method for bonding ceramics to metals
JPH0460947B2 (en) * 1983-12-29 1992-09-29 Tokyo Shibaura Electric Co
JPS60145972A (en) * 1983-12-29 1985-08-01 株式会社東芝 Ceramic-metal bonded body
JPS60231472A (en) * 1984-04-26 1985-11-18 住友電気工業株式会社 Ceramic and metal bonded body and bonding method
JPH0360793B2 (en) * 1984-04-26 1991-09-17 Sumitomo Denki Kogyo Kk
JPS6178205U (en) * 1984-10-29 1986-05-26
JPS61275512A (en) * 1985-05-30 1986-12-05 Nippon Kokan Kk <Nkk> Engine component and manufacture thereof
JPS6286833A (en) * 1985-10-14 1987-04-21 Hitachi Ltd Ceramic package for placing semiconductor substrate and manufacturing thereof
US5054682A (en) * 1988-09-08 1991-10-08 Cmb Foodcan Plc Method of bonding a tool material to a holder and tools made by the method
JPH0517247A (en) * 1991-07-02 1993-01-26 Ngk Insulators Ltd Method for joining ceramic to metal member
CN100434224C (en) * 2005-06-09 2008-11-19 山东大学 Diffusion and connection method for ceramic and steel by adding active intermediate alloy
WO2011070627A1 (en) * 2009-12-11 2011-06-16 パイオニア株式会社 Method for bonding semiconductor substrates and mems device
WO2011070626A1 (en) * 2009-12-11 2011-06-16 パイオニア株式会社 Method for bonding semiconductor substrates and mems device
WO2011070625A1 (en) * 2009-12-11 2011-06-16 パイオニア株式会社 Method for bonding semiconductor substrates and mems device
JP5021098B2 (en) * 2009-12-11 2012-09-05 パイオニア株式会社 Semiconductor substrate bonding method and MEMS device
US8592285B2 (en) 2009-12-11 2013-11-26 Pioneer Corporation Method of bonding semiconductor substrate and MEMS device
JP5367842B2 (en) * 2009-12-11 2013-12-11 パイオニア株式会社 Semiconductor substrate bonding method and MEMS device
JP5367841B2 (en) * 2009-12-11 2013-12-11 パイオニア株式会社 Semiconductor substrate bonding method and MEMS device
JP2019185905A (en) * 2018-04-04 2019-10-24 日本特殊陶業株式会社 Ceramic member and manufacturing method of buffer member

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