JPS58119631A - 薄膜生成装置 - Google Patents
薄膜生成装置Info
- Publication number
- JPS58119631A JPS58119631A JP57001042A JP104282A JPS58119631A JP S58119631 A JPS58119631 A JP S58119631A JP 57001042 A JP57001042 A JP 57001042A JP 104282 A JP104282 A JP 104282A JP S58119631 A JPS58119631 A JP S58119631A
- Authority
- JP
- Japan
- Prior art keywords
- jig
- reaction tube
- thin film
- reaction
- flakes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P14/3411—
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- H10P14/24—
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57001042A JPS58119631A (ja) | 1982-01-08 | 1982-01-08 | 薄膜生成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57001042A JPS58119631A (ja) | 1982-01-08 | 1982-01-08 | 薄膜生成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58119631A true JPS58119631A (ja) | 1983-07-16 |
| JPH0136246B2 JPH0136246B2 (cg-RX-API-DMAC10.html) | 1989-07-31 |
Family
ID=11490500
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57001042A Granted JPS58119631A (ja) | 1982-01-08 | 1982-01-08 | 薄膜生成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58119631A (cg-RX-API-DMAC10.html) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63206383A (ja) * | 1987-02-19 | 1988-08-25 | Nec Corp | 気相成長装置 |
| WO2010020446A1 (en) * | 2008-08-19 | 2010-02-25 | Oerlikon Solar Ip Ag, Trübbach | Trap |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0458444U (cg-RX-API-DMAC10.html) * | 1990-09-28 | 1992-05-19 |
-
1982
- 1982-01-08 JP JP57001042A patent/JPS58119631A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63206383A (ja) * | 1987-02-19 | 1988-08-25 | Nec Corp | 気相成長装置 |
| WO2010020446A1 (en) * | 2008-08-19 | 2010-02-25 | Oerlikon Solar Ip Ag, Trübbach | Trap |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0136246B2 (cg-RX-API-DMAC10.html) | 1989-07-31 |
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