JPS58101426A - Ｘ線露光装置 - Google Patents

Ｘ線露光装置

Info

Publication number
JPS58101426A
JPS58101426A JP56199826A JP19982681A JPS58101426A JP S58101426 A JPS58101426 A JP S58101426A JP 56199826 A JP56199826 A JP 56199826A JP 19982681 A JP19982681 A JP 19982681A JP S58101426 A JPS58101426 A JP S58101426A
Authority
JP
Japan
Prior art keywords
pattern
ray
contracted
ray flux
reflected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56199826A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0359569B2 (enrdf_load_stackoverflow
Inventor
Junji Matsui
松井　純爾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56199826A priority Critical patent/JPS58101426A/ja
Publication of JPS58101426A publication Critical patent/JPS58101426A/ja
Publication of JPH0359569B2 publication Critical patent/JPH0359569B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP56199826A 1981-12-11 1981-12-11 Ｘ線露光装置 Granted JPS58101426A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56199826A JPS58101426A (ja) 1981-12-11 1981-12-11 Ｘ線露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56199826A JPS58101426A (ja) 1981-12-11 1981-12-11 Ｘ線露光装置

Publications (2)

Publication Number Publication Date
JPS58101426A true JPS58101426A (ja) 1983-06-16
JPH0359569B2 JPH0359569B2 (enrdf_load_stackoverflow) 1991-09-11

Family

ID=16414280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56199826A Granted JPS58101426A (ja) 1981-12-11 1981-12-11 Ｘ線露光装置

Country Status (1)

Country Link
JP (1) JPS58101426A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS629632A (ja) * 1985-07-06 1987-01-17 Agency Of Ind Science & Technol 投影露光装置
JPS62208631A (ja) * 1986-03-07 1987-09-12 Sanyo Electric Co Ltd 縮小型ｘ線リソグラフイ装置
JPH02153520A (ja) * 1988-12-05 1990-06-13 Mitsubishi Electric Corp 露光装置
US5153898A (en) * 1986-07-11 1992-10-06 Canon Kabushiki Kaisha X-ray reduction projection exposure system of reflection type

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS629632A (ja) * 1985-07-06 1987-01-17 Agency Of Ind Science & Technol 投影露光装置
JPS62208631A (ja) * 1986-03-07 1987-09-12 Sanyo Electric Co Ltd 縮小型ｘ線リソグラフイ装置
US5153898A (en) * 1986-07-11 1992-10-06 Canon Kabushiki Kaisha X-ray reduction projection exposure system of reflection type
EP0947882A3 (en) * 1986-07-11 1999-10-13 Canon Kabushiki Kaisha X-ray reduction projection exposure system of reflection type
JPH02153520A (ja) * 1988-12-05 1990-06-13 Mitsubishi Electric Corp 露光装置

Also Published As

Publication number Publication date
JPH0359569B2 (enrdf_load_stackoverflow) 1991-09-11

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