JPS58100438A - パタ−ン検査装置 - Google Patents

パタ−ン検査装置

Info

Publication number
JPS58100438A
JPS58100438A JP56198400A JP19840081A JPS58100438A JP S58100438 A JPS58100438 A JP S58100438A JP 56198400 A JP56198400 A JP 56198400A JP 19840081 A JP19840081 A JP 19840081A JP S58100438 A JPS58100438 A JP S58100438A
Authority
JP
Japan
Prior art keywords
optical fiber
sections
optical
pattern
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56198400A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6236638B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Yoshimasa Oshima
良正 大島
Nobuyuki Akiyama
秋山　伸幸
Yasuhiko Hara
靖彦 原
Satoshi Fushimi
智 伏見
Nobuhiko Aoki
信彦 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56198400A priority Critical patent/JPS58100438A/ja
Publication of JPS58100438A publication Critical patent/JPS58100438A/ja
Publication of JPS6236638B2 publication Critical patent/JPS6236638B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP56198400A 1981-12-11 1981-12-11 パタ−ン検査装置 Granted JPS58100438A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56198400A JPS58100438A (ja) 1981-12-11 1981-12-11 パタ−ン検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56198400A JPS58100438A (ja) 1981-12-11 1981-12-11 パタ−ン検査装置

Publications (2)

Publication Number Publication Date
JPS58100438A true JPS58100438A (ja) 1983-06-15
JPS6236638B2 JPS6236638B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-08-07

Family

ID=16390495

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56198400A Granted JPS58100438A (ja) 1981-12-11 1981-12-11 パタ−ン検査装置

Country Status (1)

Country Link
JP (1) JPS58100438A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6015504A (ja) * 1983-07-07 1985-01-26 Mitsubishi Rayon Co Ltd フオトマスク自動検査装置
JPS6093305A (ja) * 1983-10-27 1985-05-25 Fujitsu Ltd マスク検査方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50127574A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1974-03-27 1975-10-07

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50127574A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1974-03-27 1975-10-07

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6015504A (ja) * 1983-07-07 1985-01-26 Mitsubishi Rayon Co Ltd フオトマスク自動検査装置
JPS6093305A (ja) * 1983-10-27 1985-05-25 Fujitsu Ltd マスク検査方法

Also Published As

Publication number Publication date
JPS6236638B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-08-07

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