JPS579864A - Method and apparatus for automatically detecting concentration of anion in chemical copper plating solution - Google Patents
Method and apparatus for automatically detecting concentration of anion in chemical copper plating solutionInfo
- Publication number
- JPS579864A JPS579864A JP8145480A JP8145480A JPS579864A JP S579864 A JPS579864 A JP S579864A JP 8145480 A JP8145480 A JP 8145480A JP 8145480 A JP8145480 A JP 8145480A JP S579864 A JPS579864 A JP S579864A
- Authority
- JP
- Japan
- Prior art keywords
- soln
- current
- dialytic
- chemical copper
- ions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Chemically Coating (AREA)
- Control Of Non-Electrical Variables (AREA)
Abstract
PURPOSE: To detect continuously and automatically anions accumulated in a chemical copper soln. to cause deterioration of the soln. by introducing the soln. into the desalting chamber of an electrodialytic tank divided with cation and anion exchange membranes and measuring the dialytic current.
CONSTITUTION: A chemical copper plating soln. is introduced into the desalting chamber 6 of an electrodialytic tank 2 divided with a cation exchange membrane 3 and an anion exchange membrane 4 at a constant rate. The soln. is dialyzed at a constant voltage with an external power source 9, and the dialytic current is measured with an ammeter 10. This dialytic current relates to accumulated ions permeating the membrane 4, and as the amount of anions is increased, the current value rises. On the basis of the relation by comparing the dialytic current to a set value, the concn. of formate ions, sulfate ions and carbonate ions accumulated in the plating soln. can be detected easily.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8145480A JPS579864A (en) | 1980-06-18 | 1980-06-18 | Method and apparatus for automatically detecting concentration of anion in chemical copper plating solution |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8145480A JPS579864A (en) | 1980-06-18 | 1980-06-18 | Method and apparatus for automatically detecting concentration of anion in chemical copper plating solution |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS579864A true JPS579864A (en) | 1982-01-19 |
Family
ID=13746843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8145480A Pending JPS579864A (en) | 1980-06-18 | 1980-06-18 | Method and apparatus for automatically detecting concentration of anion in chemical copper plating solution |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS579864A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0182102A2 (en) * | 1984-10-22 | 1986-05-28 | International Business Machines Corporation | Method of determining the amount of an anionic material |
WO2022195093A1 (en) * | 2021-03-19 | 2022-09-22 | GUGGENBERGER, Leonid | Analysis system for the determination of ions in an ion-containing liquid medium, and an analysis process performed with the analysis system |
-
1980
- 1980-06-18 JP JP8145480A patent/JPS579864A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0182102A2 (en) * | 1984-10-22 | 1986-05-28 | International Business Machines Corporation | Method of determining the amount of an anionic material |
WO2022195093A1 (en) * | 2021-03-19 | 2022-09-22 | GUGGENBERGER, Leonid | Analysis system for the determination of ions in an ion-containing liquid medium, and an analysis process performed with the analysis system |
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