JPS579492B2 - - Google Patents
Info
- Publication number
- JPS579492B2 JPS579492B2 JP12037075A JP12037075A JPS579492B2 JP S579492 B2 JPS579492 B2 JP S579492B2 JP 12037075 A JP12037075 A JP 12037075A JP 12037075 A JP12037075 A JP 12037075A JP S579492 B2 JPS579492 B2 JP S579492B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
- H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
- H10P50/282—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
- H10P50/283—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
Landscapes
- Weting (AREA)
- ing And Chemical Polishing (AREA)
- Chemical Treatment Of Metals (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Local Oxidation Of Silicon (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US513908A US3920471A (en) | 1974-10-10 | 1974-10-10 | Prevention of aluminum etching during silox photoshaping |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5164873A JPS5164873A (en) | 1976-06-04 |
| JPS579492B2 true JPS579492B2 (oth) | 1982-02-22 |
Family
ID=24045078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50120370A Granted JPS5164873A (en) | 1974-10-10 | 1975-10-07 | Soshino shorihoho |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3920471A (oth) |
| JP (1) | JPS5164873A (oth) |
| DE (1) | DE2545153C2 (oth) |
| FR (1) | FR2287524A1 (oth) |
| GB (1) | GB1527106A (oth) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2288392A1 (fr) * | 1974-10-18 | 1976-05-14 | Radiotechnique Compelec | Procede de realisation de dispositifs semiconducteurs |
| US5277835A (en) * | 1989-06-26 | 1994-01-11 | Hashimoto Chemical Industries Co., Ltd. | Surface treatment agent for fine surface treatment |
| DE4424145A1 (de) * | 1993-10-14 | 1995-04-20 | Hewlett Packard Co | Fluor-passivierte chromatographische Systeme |
| KR970008354B1 (ko) * | 1994-01-12 | 1997-05-23 | 엘지반도체 주식회사 | 선택적 식각방법 |
| JPH07283166A (ja) * | 1994-02-20 | 1995-10-27 | Semiconductor Energy Lab Co Ltd | コンタクトホールの作製方法 |
| TW371775B (en) * | 1995-04-28 | 1999-10-11 | Siemens Ag | Method for the selective removal of silicon dioxide |
| ATE256770T1 (de) * | 2001-06-20 | 2004-01-15 | Wolf-Dieter Franz | Verfahren zum reinigen und passivieren von leichtmetalllegierungsoberflächen |
| US8772133B2 (en) * | 2012-06-11 | 2014-07-08 | Infineon Technologies Ag | Utilization of a metallization scheme as an etching mask |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1600285A (oth) * | 1968-03-28 | 1970-07-20 | ||
| US3650960A (en) * | 1969-05-06 | 1972-03-21 | Allied Chem | Etching solutions |
| DE1951968A1 (de) * | 1969-10-15 | 1971-04-22 | Philips Patentverwaltung | AEtzloesung zur selektiven Musterzeugung in duennen Siliziumdioxydschichten |
| US3841905A (en) * | 1970-11-19 | 1974-10-15 | Rbp Chem Corp | Method of preparing printed circuit boards with terminal tabs |
| US3867218A (en) * | 1973-04-25 | 1975-02-18 | Philips Corp | Method of etching a pattern in a silicon nitride layer |
-
1974
- 1974-10-10 US US513908A patent/US3920471A/en not_active Expired - Lifetime
-
1975
- 1975-10-07 JP JP50120370A patent/JPS5164873A/ja active Granted
- 1975-10-08 DE DE2545153A patent/DE2545153C2/de not_active Expired
- 1975-10-09 FR FR7530968A patent/FR2287524A1/fr active Granted
- 1975-10-09 GB GB41356/75A patent/GB1527106A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5164873A (en) | 1976-06-04 |
| FR2287524B1 (oth) | 1980-03-28 |
| DE2545153A1 (de) | 1976-04-22 |
| US3920471A (en) | 1975-11-18 |
| DE2545153C2 (de) | 1985-12-12 |
| GB1527106A (en) | 1978-10-04 |
| FR2287524A1 (fr) | 1976-05-07 |