JPS5768059A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5768059A JPS5768059A JP14486180A JP14486180A JPS5768059A JP S5768059 A JPS5768059 A JP S5768059A JP 14486180 A JP14486180 A JP 14486180A JP 14486180 A JP14486180 A JP 14486180A JP S5768059 A JPS5768059 A JP S5768059A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- ray
- saving
- film
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3157—Partial encapsulation or coating
- H01L23/3171—Partial encapsulation or coating the coating being directly applied to the semiconductor body, e.g. passivation layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3157—Partial encapsulation or coating
- H01L23/3192—Multilayer coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/552—Protection against radiation, e.g. light or electromagnetic waves
- H01L23/556—Protection against radiation, e.g. light or electromagnetic waves against alpha rays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12044—OLED
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
Abstract
PURPOSE: To facilitate the inspection and the characteristics evaluation of a circuit element formed on a semiconductor substrate by covering the circuit element and the connecting wire layer with an organic resin film of thickness in the prescribed range, thereby saving the quantity of used mterial and forming α ray preventive layer.
CONSTITUTION: A plurality of memory cells made of gate films 4, 5 polysilicon layers 6, 7 and an N type diffused region 2 are formed, for example, on a P type Si substrate, 1 aluminum wires 9a, 9b are formed via a PSG film 8, and the surface is, for example, covered and protected with a nitrided film 10, thereby forming a memory circuit. For the purpose of preventing software error due to α-ray, a polyimide resin layer 15, for example, formed on the surface of the device. The thickness of the layer 15 is set based on the software error occuring probability by considering the energy of the α-ray existing in natural fiel and its distribution to 5W 15μm. Thus, it is formed thinner resin layer than the conventional one (which has more than 40μm thick), thereby saving the quantity of material and facilitating the pattern visual inspection through the layer 15 and the reading of the mark for detecting the measuring position.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14486180A JPS5768059A (en) | 1980-10-15 | 1980-10-15 | Semiconductor device |
DE19813141000 DE3141000A1 (en) | 1980-10-15 | 1981-10-15 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14486180A JPS5768059A (en) | 1980-10-15 | 1980-10-15 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5768059A true JPS5768059A (en) | 1982-04-26 |
Family
ID=15372098
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14486180A Pending JPS5768059A (en) | 1980-10-15 | 1980-10-15 | Semiconductor device |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS5768059A (en) |
DE (1) | DE3141000A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61501537A (en) * | 1984-03-22 | 1986-07-24 | モステック・コ−ポレイション | nitride bonding layer |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59191353A (en) * | 1983-04-15 | 1984-10-30 | Hitachi Ltd | Electronic device having multilayer interconnection structure |
US5449950A (en) * | 1984-04-16 | 1995-09-12 | Canon Kabushiki Kaisha | Photosensor with organic and inorganic insulation layers |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5568659A (en) * | 1978-11-20 | 1980-05-23 | Hitachi Ltd | Semiconductor device and manufacturing method thereof |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS525586Y1 (en) * | 1969-03-28 | 1977-02-04 |
-
1980
- 1980-10-15 JP JP14486180A patent/JPS5768059A/en active Pending
-
1981
- 1981-10-15 DE DE19813141000 patent/DE3141000A1/en not_active Withdrawn
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5568659A (en) * | 1978-11-20 | 1980-05-23 | Hitachi Ltd | Semiconductor device and manufacturing method thereof |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61501537A (en) * | 1984-03-22 | 1986-07-24 | モステック・コ−ポレイション | nitride bonding layer |
Also Published As
Publication number | Publication date |
---|---|
DE3141000A1 (en) | 1982-06-03 |
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