JPS5768027A - Vacuum parts for electron beam exposure device - Google Patents

Vacuum parts for electron beam exposure device

Info

Publication number
JPS5768027A
JPS5768027A JP14394080A JP14394080A JPS5768027A JP S5768027 A JPS5768027 A JP S5768027A JP 14394080 A JP14394080 A JP 14394080A JP 14394080 A JP14394080 A JP 14394080A JP S5768027 A JPS5768027 A JP S5768027A
Authority
JP
Japan
Prior art keywords
vacuum
parts
exposure device
layer
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14394080A
Other languages
Japanese (ja)
Other versions
JPH0319691B2 (en
Inventor
Mamoru Nakasuji
Kanji Wada
Shunichi Sano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP14394080A priority Critical patent/JPS5768027A/en
Publication of JPS5768027A publication Critical patent/JPS5768027A/en
Publication of JPH0319691B2 publication Critical patent/JPH0319691B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To shorten the period of time required for overhaul and cleaning of an electron beam exposure device by coating a primary layer with Ti or Cr on the surface of vacuum parts forming a vacuum wall of the exposure device or of vacuum parts contained in the device and then coating Au or Pt layer thereon by sputtering. CONSTITUTION:Following surface treatment shown below is carried out on the surface of vacuum parts body 1 formed of copper, stainless steel, iron, insulator, etc. in the vacuum parts contained in the vacuum atmosphere in an electron beam exposure device or in the vacuum part forming the vacuum wall of the device. That is, when the surface is sufficiently cleaned, Ti or Cr layer 2 is formed in a thickness of approx. 500Angstrom , is coated by sputtering, and an Au or Pt layer is similarly coated by sputtering thereon in a thickness of approx. 5,000Angstrom . Thereafter, the parts thus completely treated are rapidly associated in the device, and the device is evacuated in vacuum. In this manner, it is not almost contaminated even for long time use, and can be less overhauled and cleaned, thereby improving the operating efficiency of the device.
JP14394080A 1980-10-15 1980-10-15 Vacuum parts for electron beam exposure device Granted JPS5768027A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14394080A JPS5768027A (en) 1980-10-15 1980-10-15 Vacuum parts for electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14394080A JPS5768027A (en) 1980-10-15 1980-10-15 Vacuum parts for electron beam exposure device

Publications (2)

Publication Number Publication Date
JPS5768027A true JPS5768027A (en) 1982-04-26
JPH0319691B2 JPH0319691B2 (en) 1991-03-15

Family

ID=15350595

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14394080A Granted JPS5768027A (en) 1980-10-15 1980-10-15 Vacuum parts for electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5768027A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4526644A (en) * 1983-04-05 1985-07-02 Canon Kabushiki Kaisha Treatment device utilizing plasma

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5478983A (en) * 1977-12-06 1979-06-23 Fujitsu Ltd Manufacture for electron beam adjusting tool

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5478983A (en) * 1977-12-06 1979-06-23 Fujitsu Ltd Manufacture for electron beam adjusting tool

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4526644A (en) * 1983-04-05 1985-07-02 Canon Kabushiki Kaisha Treatment device utilizing plasma

Also Published As

Publication number Publication date
JPH0319691B2 (en) 1991-03-15

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