JPS5764930A - Carrying apparatus for glass substrate - Google Patents
Carrying apparatus for glass substrateInfo
- Publication number
- JPS5764930A JPS5764930A JP55140334A JP14033480A JPS5764930A JP S5764930 A JPS5764930 A JP S5764930A JP 55140334 A JP55140334 A JP 55140334A JP 14033480 A JP14033480 A JP 14033480A JP S5764930 A JPS5764930 A JP S5764930A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- loader part
- pawls
- sucked
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title abstract 9
- 239000011521 glass Substances 0.000 title abstract 2
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Library & Information Science (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55140334A JPS5764930A (en) | 1980-10-07 | 1980-10-07 | Carrying apparatus for glass substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55140334A JPS5764930A (en) | 1980-10-07 | 1980-10-07 | Carrying apparatus for glass substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5764930A true JPS5764930A (en) | 1982-04-20 |
| JPH03783B2 JPH03783B2 (enrdf_load_stackoverflow) | 1991-01-08 |
Family
ID=15266402
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55140334A Granted JPS5764930A (en) | 1980-10-07 | 1980-10-07 | Carrying apparatus for glass substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5764930A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5981074A (ja) * | 1982-10-30 | 1984-05-10 | 住友金属鉱山株式会社 | 板状体自動供給装置 |
| JPS6477140A (en) * | 1987-09-18 | 1989-03-23 | Olympus Optical Co | Wafer taking out/housing device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5032767U (enrdf_load_stackoverflow) * | 1973-07-20 | 1975-04-09 | ||
| JPS5116572A (ja) * | 1974-07-30 | 1976-02-09 | Mitsubishi Heavy Ind Ltd | Ritsutaijidosoko |
| JPS5592683U (enrdf_load_stackoverflow) * | 1978-12-22 | 1980-06-26 |
-
1980
- 1980-10-07 JP JP55140334A patent/JPS5764930A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5032767U (enrdf_load_stackoverflow) * | 1973-07-20 | 1975-04-09 | ||
| JPS5116572A (ja) * | 1974-07-30 | 1976-02-09 | Mitsubishi Heavy Ind Ltd | Ritsutaijidosoko |
| JPS5592683U (enrdf_load_stackoverflow) * | 1978-12-22 | 1980-06-26 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5981074A (ja) * | 1982-10-30 | 1984-05-10 | 住友金属鉱山株式会社 | 板状体自動供給装置 |
| JPS6477140A (en) * | 1987-09-18 | 1989-03-23 | Olympus Optical Co | Wafer taking out/housing device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03783B2 (enrdf_load_stackoverflow) | 1991-01-08 |
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