JPS5763526A - Photosensitive material - Google Patents

Photosensitive material

Info

Publication number
JPS5763526A
JPS5763526A JP13826780A JP13826780A JPS5763526A JP S5763526 A JPS5763526 A JP S5763526A JP 13826780 A JP13826780 A JP 13826780A JP 13826780 A JP13826780 A JP 13826780A JP S5763526 A JPS5763526 A JP S5763526A
Authority
JP
Japan
Prior art keywords
alkyl
photosensitive material
naphthoquinone
methylene
alkoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13826780A
Other languages
English (en)
Inventor
Shuhei Shiraishi
Giichi Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP13826780A priority Critical patent/JPS5763526A/ja
Publication of JPS5763526A publication Critical patent/JPS5763526A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
JP13826780A 1980-10-04 1980-10-04 Photosensitive material Pending JPS5763526A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13826780A JPS5763526A (en) 1980-10-04 1980-10-04 Photosensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13826780A JPS5763526A (en) 1980-10-04 1980-10-04 Photosensitive material

Publications (1)

Publication Number Publication Date
JPS5763526A true JPS5763526A (en) 1982-04-17

Family

ID=15217927

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13826780A Pending JPS5763526A (en) 1980-10-04 1980-10-04 Photosensitive material

Country Status (1)

Country Link
JP (1) JPS5763526A (ja)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01189644A (ja) * 1988-01-26 1989-07-28 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH01309052A (ja) * 1988-06-07 1989-12-13 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH0348251A (ja) * 1989-04-19 1991-03-01 Nippon Zeon Co Ltd ポジ型レジスト組成物
JPH041652A (ja) * 1990-04-18 1992-01-07 Nippon Zeon Co Ltd ポジ型レジスト組成物
JPH041653A (ja) * 1990-04-18 1992-01-07 Nippon Zeon Co Ltd ポジ型レジスト組成物
JPH0460548A (ja) * 1990-06-29 1992-02-26 Fuji Photo Film Co Ltd パターン形成用組成物及び微細パターン形成方法
US5173389A (en) * 1989-04-26 1992-12-22 Fuji Photo Film Co., Ltd. Positive-working photoresist composition
EP0684521A1 (en) 1994-05-25 1995-11-29 Fuji Photo Film Co., Ltd. Positive working photosensitive compositions
EP0710886A1 (en) 1994-10-31 1996-05-08 Fuji Photo Film Co., Ltd. Positive photoresist composition
JPH09311441A (ja) * 1995-10-14 1997-12-02 Kunhoseokyuiiwahaku Jushikuhesa ポジティブ型フォトレジスト組成物
WO2000073852A1 (fr) * 1999-06-01 2000-12-07 Toray Industries, Inc. Composition de precurseur de polyimide photosensible de type positif

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01189644A (ja) * 1988-01-26 1989-07-28 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH01309052A (ja) * 1988-06-07 1989-12-13 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH0348251A (ja) * 1989-04-19 1991-03-01 Nippon Zeon Co Ltd ポジ型レジスト組成物
US5173389A (en) * 1989-04-26 1992-12-22 Fuji Photo Film Co., Ltd. Positive-working photoresist composition
JPH041652A (ja) * 1990-04-18 1992-01-07 Nippon Zeon Co Ltd ポジ型レジスト組成物
JPH041653A (ja) * 1990-04-18 1992-01-07 Nippon Zeon Co Ltd ポジ型レジスト組成物
JPH0460548A (ja) * 1990-06-29 1992-02-26 Fuji Photo Film Co Ltd パターン形成用組成物及び微細パターン形成方法
EP0684521A1 (en) 1994-05-25 1995-11-29 Fuji Photo Film Co., Ltd. Positive working photosensitive compositions
EP0710886A1 (en) 1994-10-31 1996-05-08 Fuji Photo Film Co., Ltd. Positive photoresist composition
JPH09311441A (ja) * 1995-10-14 1997-12-02 Kunhoseokyuiiwahaku Jushikuhesa ポジティブ型フォトレジスト組成物
WO2000073852A1 (fr) * 1999-06-01 2000-12-07 Toray Industries, Inc. Composition de precurseur de polyimide photosensible de type positif
KR100721477B1 (ko) * 1999-06-01 2007-05-23 도레이 가부시끼가이샤 포지티브형 감광성 폴리이미드 전구체 조성물

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