JPS5761826B2 - - Google Patents

Info

Publication number
JPS5761826B2
JPS5761826B2 JP14129279A JP14129279A JPS5761826B2 JP S5761826 B2 JPS5761826 B2 JP S5761826B2 JP 14129279 A JP14129279 A JP 14129279A JP 14129279 A JP14129279 A JP 14129279A JP S5761826 B2 JPS5761826 B2 JP S5761826B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14129279A
Other languages
Japanese (ja)
Other versions
JPS5665973A (en
Inventor
Koichi Kajama
Tomoaki Murakami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Komatsu Ltd
Original Assignee
Komatsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komatsu Ltd filed Critical Komatsu Ltd
Priority to JP14129279A priority Critical patent/JPS5665973A/ja
Publication of JPS5665973A publication Critical patent/JPS5665973A/ja
Publication of JPS5761826B2 publication Critical patent/JPS5761826B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/543Controlling the film thickness or evaporation rate using measurement on the vapor source
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
JP14129279A 1979-11-02 1979-11-02 Vapor depositing method Granted JPS5665973A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14129279A JPS5665973A (en) 1979-11-02 1979-11-02 Vapor depositing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14129279A JPS5665973A (en) 1979-11-02 1979-11-02 Vapor depositing method

Publications (2)

Publication Number Publication Date
JPS5665973A JPS5665973A (en) 1981-06-04
JPS5761826B2 true JPS5761826B2 (enrdf_load_stackoverflow) 1982-12-27

Family

ID=15288485

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14129279A Granted JPS5665973A (en) 1979-11-02 1979-11-02 Vapor depositing method

Country Status (1)

Country Link
JP (1) JPS5665973A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02116723U (enrdf_load_stackoverflow) * 1989-03-07 1990-09-19

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57188673A (en) * 1981-05-14 1982-11-19 Toshiba Corp Formation of thin film by vacuum
JPS58112375A (ja) * 1981-12-25 1983-07-04 Fuji Electric Corp Res & Dev Ltd 光起電力装置の製造方法
JPS58199857A (ja) * 1982-05-04 1983-11-21 マイクル・ポ−ル・ニアリ− 化学的方法
JPS6050166A (ja) * 1983-08-26 1985-03-19 Res Dev Corp Of Japan プラズマ蒸着法及びその装置
JPS60162776A (ja) * 1984-02-01 1985-08-24 Matsushita Electric Ind Co Ltd プラズマ処理装置
JPH062947B2 (ja) * 1984-12-08 1994-01-12 株式会社井上ジャパックス研究所 炭化珪素薄膜の形成方法
JPS61253367A (ja) * 1985-05-04 1986-11-11 Inoue Japax Res Inc 気相成長法
JPS6277474A (ja) * 1985-09-30 1987-04-09 Shimadzu Corp Cvd装置
EP4143361A1 (en) * 2020-06-30 2023-03-08 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Method for controlling an evaporation rate of source material, detector for measuring electromagnetic radiation reflected on a source surface and system for thermal evaporation with electromagnetic radiation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02116723U (enrdf_load_stackoverflow) * 1989-03-07 1990-09-19

Also Published As

Publication number Publication date
JPS5665973A (en) 1981-06-04

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