JPS5761826B2 - - Google Patents
Info
- Publication number
- JPS5761826B2 JPS5761826B2 JP14129279A JP14129279A JPS5761826B2 JP S5761826 B2 JPS5761826 B2 JP S5761826B2 JP 14129279 A JP14129279 A JP 14129279A JP 14129279 A JP14129279 A JP 14129279A JP S5761826 B2 JPS5761826 B2 JP S5761826B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14129279A JPS5665973A (en) | 1979-11-02 | 1979-11-02 | Vapor depositing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14129279A JPS5665973A (en) | 1979-11-02 | 1979-11-02 | Vapor depositing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5665973A JPS5665973A (en) | 1981-06-04 |
JPS5761826B2 true JPS5761826B2 (enrdf_load_stackoverflow) | 1982-12-27 |
Family
ID=15288485
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14129279A Granted JPS5665973A (en) | 1979-11-02 | 1979-11-02 | Vapor depositing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5665973A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02116723U (enrdf_load_stackoverflow) * | 1989-03-07 | 1990-09-19 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57188673A (en) * | 1981-05-14 | 1982-11-19 | Toshiba Corp | Formation of thin film by vacuum |
JPS58112375A (ja) * | 1981-12-25 | 1983-07-04 | Fuji Electric Corp Res & Dev Ltd | 光起電力装置の製造方法 |
JPS58199857A (ja) * | 1982-05-04 | 1983-11-21 | マイクル・ポ−ル・ニアリ− | 化学的方法 |
JPS6050166A (ja) * | 1983-08-26 | 1985-03-19 | Res Dev Corp Of Japan | プラズマ蒸着法及びその装置 |
JPS60162776A (ja) * | 1984-02-01 | 1985-08-24 | Matsushita Electric Ind Co Ltd | プラズマ処理装置 |
JPH062947B2 (ja) * | 1984-12-08 | 1994-01-12 | 株式会社井上ジャパックス研究所 | 炭化珪素薄膜の形成方法 |
JPS61253367A (ja) * | 1985-05-04 | 1986-11-11 | Inoue Japax Res Inc | 気相成長法 |
JPS6277474A (ja) * | 1985-09-30 | 1987-04-09 | Shimadzu Corp | Cvd装置 |
EP4143361A1 (en) * | 2020-06-30 | 2023-03-08 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Method for controlling an evaporation rate of source material, detector for measuring electromagnetic radiation reflected on a source surface and system for thermal evaporation with electromagnetic radiation |
-
1979
- 1979-11-02 JP JP14129279A patent/JPS5665973A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02116723U (enrdf_load_stackoverflow) * | 1989-03-07 | 1990-09-19 |
Also Published As
Publication number | Publication date |
---|---|
JPS5665973A (en) | 1981-06-04 |