JPS5753050A - Focussing device for electron microscope - Google Patents
Focussing device for electron microscopeInfo
- Publication number
- JPS5753050A JPS5753050A JP12791880A JP12791880A JPS5753050A JP S5753050 A JPS5753050 A JP S5753050A JP 12791880 A JP12791880 A JP 12791880A JP 12791880 A JP12791880 A JP 12791880A JP S5753050 A JPS5753050 A JP S5753050A
- Authority
- JP
- Japan
- Prior art keywords
- image surface
- insufficient
- focal point
- electron beams
- focussing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/21—Means for adjusting the focus
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Abstract
PURPOSE:To easily obtain a desired insufficient or excessive focal point image and prevent dirt of an objective diaphragm by deflecting an electron beam by means of a deflection coil which is provided between an objective lens and an observed image surface and performing focussing using the insufficient or excessive focal point image. CONSTITUTION:When an electron beam emitted from the observation point 4 on a sample surface 1 is focussed on an image surface 15 near an image surface 9 that is separated from an obserbed image surface 3 by length DELTAfi, the passages of electron beams 7' and 8' are obtained from irradiated electron beams 7 and 8 by alternately varying an irradiated electron beam 6 passing on the axis of a lens 2 by an angle alpha. Then electron beams 7'' and 8'' are obtained by exciting a deflection coil 12 which is provided between the lens 2 and the observed image surface 3 and deflecting the electron beams 7' and 8' on an axis by an angl alpha and the angle beta which is assigned depending upon the insufficient focal point. A focussing image surface is moved from 15 to 9 and made coincide at the point 5 on the observed image surface 3. When samples are observed at the insufficient or excessive focal point, focussing is facilitated. The angle alpha can be reduced and dirt of an objective diaphragm be preveted.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12791880A JPS5753050A (en) | 1980-09-17 | 1980-09-17 | Focussing device for electron microscope |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12791880A JPS5753050A (en) | 1980-09-17 | 1980-09-17 | Focussing device for electron microscope |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5753050A true JPS5753050A (en) | 1982-03-29 |
JPS6153824B2 JPS6153824B2 (en) | 1986-11-19 |
Family
ID=14971852
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12791880A Granted JPS5753050A (en) | 1980-09-17 | 1980-09-17 | Focussing device for electron microscope |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5753050A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63237767A (en) * | 1987-03-25 | 1988-10-04 | Kanebo Ltd | Sealed container-packed beverage |
-
1980
- 1980-09-17 JP JP12791880A patent/JPS5753050A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63237767A (en) * | 1987-03-25 | 1988-10-04 | Kanebo Ltd | Sealed container-packed beverage |
Also Published As
Publication number | Publication date |
---|---|
JPS6153824B2 (en) | 1986-11-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA2084408A1 (en) | Illumination system and method for a high definition light microscope | |
GB1426359A (en) | Microbeam probe apparatus | |
KR950019946A (en) | Electron Beam System for Writing Patterns on Wafers | |
EP0406413A4 (en) | Scanning type tunnel microscope | |
US4479060A (en) | Apparatus for irradiation with charged particle beams | |
JPS5727551A (en) | Electron microscope | |
JPS5753050A (en) | Focussing device for electron microscope | |
JPS626300B2 (en) | ||
US4097739A (en) | Beam deflection and focusing system for a scanning corpuscular-beam microscope | |
JPS57130354A (en) | Electronic optical bodytube | |
JP4962749B2 (en) | Light particle handling equipment | |
DE3878939D1 (en) | METHOD FOR ELECTRON BEAM GUIDANCE WITH ENERGY SELECTION AND ELECTRON SPECTROMETER. | |
JPS5760648A (en) | Electron microscope | |
JPS5533716A (en) | Electron microscope focusing lens system | |
JPS5497358A (en) | Scanning electron microscope | |
US4121100A (en) | Electron microscope | |
JPS5532304A (en) | Electron microscope with optical microscope | |
JPH0537398Y2 (en) | ||
JPS55144577A (en) | Energy analyzer for electron ray | |
JPS62140346A (en) | Scanning electron microscope | |
JPH0431728Y2 (en) | ||
JP2886168B2 (en) | Electron beam equipment | |
JPS63225459A (en) | Laser ion source device | |
JPS5652859A (en) | Scanning type electron microscope | |
JPS5757460A (en) | Electron microscope |