JPS57500931A - - Google Patents

Info

Publication number
JPS57500931A
JPS57500931A JP56503490A JP50349081A JPS57500931A JP S57500931 A JPS57500931 A JP S57500931A JP 56503490 A JP56503490 A JP 56503490A JP 50349081 A JP50349081 A JP 50349081A JP S57500931 A JPS57500931 A JP S57500931A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56503490A
Other languages
Japanese (ja)
Other versions
JPS6036468B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS57500931A publication Critical patent/JPS57500931A/ja
Publication of JPS6036468B2 publication Critical patent/JPS6036468B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • ing And Chemical Polishing (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
JP56503490A 1980-06-25 1981-03-02 真空ア−クプラズマ装置 Expired JPS6036468B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SU802933851A SU1040631A1 (ru) 1980-06-25 1980-06-25 Вакуумно-дуговое устройство
SU2933851/18 1980-06-25

Publications (2)

Publication Number Publication Date
JPS57500931A true JPS57500931A (enEXAMPLES) 1982-05-27
JPS6036468B2 JPS6036468B2 (ja) 1985-08-20

Family

ID=20899404

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56503490A Expired JPS6036468B2 (ja) 1980-06-25 1981-03-02 真空ア−クプラズマ装置

Country Status (12)

Country Link
US (1) US4551221A (enEXAMPLES)
JP (1) JPS6036468B2 (enEXAMPLES)
BR (1) BR8103781A (enEXAMPLES)
CA (1) CA1170315A (enEXAMPLES)
CH (1) CH655632B (enEXAMPLES)
DE (1) DE3152131C2 (enEXAMPLES)
FR (1) FR2485863B1 (enEXAMPLES)
GB (1) GB2092419B (enEXAMPLES)
IT (1) IT1171327B (enEXAMPLES)
SE (1) SE427003B (enEXAMPLES)
SU (1) SU1040631A1 (enEXAMPLES)
WO (1) WO1982000075A1 (enEXAMPLES)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013533382A (ja) * 2010-06-22 2013-08-22 エリコン・トレーディング・アクチェンゲゼルシャフト，トリュープバッハ 定義された電界を有するａｒｃ蒸着ソース

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE34806E (en) * 1980-11-25 1994-12-13 Celestech, Inc. Magnetoplasmadynamic processor, applications thereof and methods
CH657242A5 (de) * 1982-03-22 1986-08-15 Axenov Ivan I Lichtbogen-plasmaquelle und lichtbogenanlage mit einer solchen lichtbogen-plasmaquelle zur plasmabehandlung der oberflaeche von werkstuecken.
AT376460B (de) * 1982-09-17 1984-11-26 Kljuchko Gennady V Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen
US5096558A (en) * 1984-04-12 1992-03-17 Plasco Dr. Ehrich Plasma - Coating Gmbh Method and apparatus for evaporating material in vacuum
CH664768A5 (de) * 1985-06-20 1988-03-31 Balzers Hochvakuum Verfahren zur beschichtung von substraten in einer vakuumkammer.
US4620913A (en) * 1985-11-15 1986-11-04 Multi-Arc Vacuum Systems, Inc. Electric arc vapor deposition method and apparatus
US4873605A (en) * 1986-03-03 1989-10-10 Innovex, Inc. Magnetic treatment of ferromagnetic materials
US4816291A (en) * 1987-08-19 1989-03-28 The Regents Of The University Of California Process for making diamond, doped diamond, diamond-cubic boron nitride composite films
US5601652A (en) * 1989-08-03 1997-02-11 United Technologies Corporation Apparatus for applying ceramic coatings
DE4006456C1 (en) * 1990-03-01 1991-05-29 Balzers Ag, Balzers, Li Appts. for vaporising material in vacuum - has electron beam gun or laser guided by electromagnet to form cloud or pre-melted spot on the target surface
JPH0817171B2 (ja) * 1990-12-31 1996-02-21 株式会社半導体エネルギー研究所 プラズマ発生装置およびそれを用いたエッチング方法
US5126030A (en) * 1990-12-10 1992-06-30 Kabushiki Kaisha Kobe Seiko Sho Apparatus and method of cathodic arc deposition
CA2065581C (en) 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
US5306408A (en) * 1992-06-29 1994-04-26 Ism Technologies, Inc. Method and apparatus for direct ARC plasma deposition of ceramic coatings
US5282944A (en) * 1992-07-30 1994-02-01 The United States Of America As Represented By The United States Department Of Energy Ion source based on the cathodic arc
US5480527A (en) * 1994-04-25 1996-01-02 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
US5670415A (en) * 1994-05-24 1997-09-23 Depositech, Inc. Method and apparatus for vacuum deposition of highly ionized media in an electromagnetic controlled environment
US5518597A (en) * 1995-03-28 1996-05-21 Minnesota Mining And Manufacturing Company Cathodic arc coating apparatus and method
US6144544A (en) * 1996-10-01 2000-11-07 Milov; Vladimir N. Apparatus and method for material treatment using a magnetic field
US6103074A (en) * 1998-02-14 2000-08-15 Phygen, Inc. Cathode arc vapor deposition method and apparatus
RU2178243C2 (ru) * 1999-12-28 2002-01-10 Российский Федеральный Ядерный Центр-Всероссийский Научно-исследовательский Институт Экспериментальной Физики Устройство для получения плазмы на основе скользящего разряда
US6495002B1 (en) 2000-04-07 2002-12-17 Hy-Tech Research Corporation Method and apparatus for depositing ceramic films by vacuum arc deposition
US7381311B2 (en) * 2003-10-21 2008-06-03 The United States Of America As Represented By The Secretary Of The Air Force Filtered cathodic-arc plasma source
US8157976B2 (en) * 2007-04-26 2012-04-17 Veeco Instruments, Inc. Apparatus for cathodic vacuum-arc coating deposition
CN101956161A (zh) * 2010-08-27 2011-01-26 苏州五方光电科技有限公司 离子镀膜装置
US9153422B2 (en) 2011-08-02 2015-10-06 Envaerospace, Inc. Arc PVD plasma source and method of deposition of nanoimplanted coatings
EP2607517A1 (en) * 2011-12-22 2013-06-26 Oerlikon Trading AG, Trübbach Low temperature arc ion plating coating
KR101440316B1 (ko) * 2014-04-30 2014-09-18 주식회사 유니벡 박막 코팅을 위한 진공 챔버 내부 아크 스팟 생성장치
WO2020165990A1 (ja) * 2019-02-14 2020-08-20 株式会社日立ハイテクノロジーズ 半導体製造装置
CN110277298A (zh) * 2019-07-26 2019-09-24 江苏鲁汶仪器有限公司 一种射频旋转接头及设置有射频旋转接头的离子刻蚀系统
UA127223C2 (uk) * 2020-09-25 2023-06-14 Національний Науковий Центр "Харківський Фізико-Технічний Інститут" Спосіб створення вакуумно-дугової катодної плазми

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2972695A (en) * 1957-05-24 1961-02-21 Vickers Electrical Co Ltd Stabilisation of low pressure d.c. arc discharges
SU307666A1 (ru) * 1968-09-09 1979-01-08 Sablev L P Электродуговой испаритель металлов
US3836451A (en) * 1968-12-26 1974-09-17 A Snaper Arc deposition apparatus
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
SU349325A1 (ru) * 1970-10-19 1978-03-30 Л. П. Саблев, Ю. И. Долотов, Л. И. Гетьман, В. Н. Горбунов, Е. Г. Гольдинер, К. Т. Киршфельд , В. В. Усов Электродуговой испаритель металлов
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
US3783231A (en) * 1972-03-22 1974-01-01 V Gorbunov Apparatus for vacuum-evaporation of metals under the action of an electric arc
SU563826A1 (ru) * 1975-06-04 1978-03-05 Предприятие П/Я В-8851 Устройство дл нанесени тонких пленок
JPS54110988A (en) * 1978-01-31 1979-08-30 Nii Chiefunorogii Afutomobirin Coating vacuum evaporation apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013533382A (ja) * 2010-06-22 2013-08-22 エリコン・トレーディング・アクチェンゲゼルシャフト，トリュープバッハ 定義された電界を有するａｒｃ蒸着ソース

Also Published As

Publication number Publication date
IT1171327B (it) 1987-06-10
JPS6036468B2 (ja) 1985-08-20
CA1170315A (en) 1984-07-03
IT8148744A0 (it) 1981-06-24
US4551221A (en) 1985-11-05
FR2485863A1 (fr) 1981-12-31
WO1982000075A1 (en) 1982-01-07
SE427003B (sv) 1983-02-21
GB2092419B (en) 1983-12-14
DE3152131A1 (en) 1982-08-26
BR8103781A (pt) 1982-03-09
GB2092419A (en) 1982-08-11
SU1040631A1 (ru) 1983-09-07
CH655632B (enEXAMPLES) 1986-04-30
DE3152131C2 (de) 1986-09-04
SE8200941L (sv) 1982-02-16
FR2485863B1 (fr) 1986-12-12

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