JPS57500381A - - Google Patents

Info

Publication number
JPS57500381A
JPS57500381A JP56501399A JP50139981A JPS57500381A JP S57500381 A JPS57500381 A JP S57500381A JP 56501399 A JP56501399 A JP 56501399A JP 50139981 A JP50139981 A JP 50139981A JP S57500381 A JPS57500381 A JP S57500381A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56501399A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS57500381A publication Critical patent/JPS57500381A/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00Feed or outlet devices; Feed or outlet control devices
    • B01J4/008Feed or outlet control devices
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413Reactant delivery systems
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D11/00Control of flow ratio
    • G05D11/02Controlling ratio of two or more flows of fluid or fluent material
    • G05D11/13Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
    • G05D11/131Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components
    • G05D11/132Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components by controlling the flow of the individual components
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/80Feeding the burner or the burner-heated deposition site
    • C03B2207/85Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/86Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid by bubbling a gas through the liquid
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/80Feeding the burner or the burner-heated deposition site
    • C03B2207/85Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/87Controlling the temperature
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00Gas and liquid contact apparatus
    • Y10S261/65Vaporizers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Chemical Vapour Deposition (AREA)
JP56501399A 1980-04-04 1981-03-20 Pending JPS57500381A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/137,148 US4276243A (en) 1978-12-08 1980-04-04 Vapor delivery control system and method

Publications (1)

Publication Number Publication Date
JPS57500381A true JPS57500381A (ja) 1982-03-04

Family

ID=22476017

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56501399A Pending JPS57500381A (ja) 1980-04-04 1981-03-20

Country Status (6)

Country Link
US (1) US4276243A (ja)
EP (1) EP0048742A4 (ja)
JP (1) JPS57500381A (ja)
CA (1) CA1152183A (ja)
GB (1) GB2073453B (ja)
WO (1) WO1981002848A1 (ja)

Families Citing this family (96)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4393013A (en) * 1970-05-20 1983-07-12 J. C. Schumacher Company Vapor mass flow control system
US4349358A (en) * 1981-03-26 1982-09-14 Union Carbide Corporation Method of mixing a gas and a vaporizable liquid
NL8102105A (nl) * 1981-04-29 1982-11-16 Philips Nv Inrichting en werkwijze voor het verzadigen van een gas met de damp van een vloeistof.
US4477273A (en) * 1982-06-15 1984-10-16 At&T Technologies, Inc. Method of and apparatus for straightening and configuring a preform tube from which lightguide fiber is drawn
DE3236441C2 (de) * 1982-10-01 1985-09-19 Uhde Gmbh, 4600 Dortmund Verfahren zum Befeuchten eines Gasstromes, insbesondere für Methanol- und/oder Ammoniakanlagen
JPS60111417A (ja) * 1983-11-22 1985-06-17 Mitsubishi Electric Corp 液体のバブリングによる気化装置
JPS60122735A (ja) * 1983-12-02 1985-07-01 Sumitomo Electric Ind Ltd 原料ガス供給装置
AU563417B2 (en) * 1984-02-07 1987-07-09 Nippon Telegraph & Telephone Public Corporation Optical fibre manufacture
US4634559A (en) * 1984-02-29 1987-01-06 Aluminum Company Of America Fluid flow control process
US4540531A (en) * 1984-05-04 1985-09-10 Ashland Oil, Inc. Vapor generator and its use in generating vapors in a pressurized gas
JPS60244333A (ja) * 1984-05-21 1985-12-04 Sumitomo Electric Ind Ltd 原料液補給装置
FI73315C (fi) * 1984-06-15 1987-09-10 Nokia Oy Ab Kalibreringssystem foer kalibrering av massastroemreglerare.
US4582480A (en) * 1984-08-02 1986-04-15 At&T Technologies, Inc. Methods of and apparatus for vapor delivery control in optical preform manufacture
US4601740A (en) * 1984-12-18 1986-07-22 At&T Technologies, Inc. Methods of and apparatus for at least partially closing an end portion of an optical preform tube
US4759882A (en) * 1985-01-31 1988-07-26 Mocon Modern Controls, Inc. Gas humidification process
US4632789A (en) * 1985-01-31 1986-12-30 Reid Philip L Gas humidification apparatus
US4859375A (en) * 1986-12-29 1989-08-22 Air Products And Chemicals, Inc. Chemical refill system
ES2041253T3 (es) * 1986-11-07 1993-11-16 American Telephone And Telegraph Company Metodo y aparato para ajustar la configuracion de sustratos opticos.
DE3708967A1 (de) * 1987-03-19 1988-10-06 Merck Patent Gmbh Vorrichtung zur erzeugung eines gasgemisches nach dem saettigungsverfahren
KR0156237B1 (ko) * 1988-06-03 1998-12-01 고다까 토시오 처리액 공급 장치
US5078092A (en) * 1989-12-22 1992-01-07 Corning Incorporated Flash vaporizer system for use in manufacturing optical waveguide fiber
US5832177A (en) * 1990-10-05 1998-11-03 Fujitsu Limited Method for controlling apparatus for supplying steam for ashing process
JP3217800B2 (ja) * 1991-01-29 2001-10-15 長岡香料株式会社 香気の捕集装置および捕集方法
EP0548990B1 (en) * 1991-12-26 1997-03-12 Canon Kabushiki Kaisha Chemical vapor deposition method for forming a deposited film with the use of a liquid raw material and apparatus suitable for practising said method
JPH06291040A (ja) * 1992-03-03 1994-10-18 Rintetsuku:Kk 液体気化供給方法と液体気化供給器
JP2703694B2 (ja) * 1992-05-28 1998-01-26 信越半導体株式会社 ガス供給装置
JP2000252269A (ja) * 1992-09-21 2000-09-14 Mitsubishi Electric Corp 液体気化装置及び液体気化方法
US5537508A (en) * 1993-03-22 1996-07-16 Applied Materials, Inc. Method and dry vapor generator channel assembly for conveying a liquid from a liquid source to a liquid vaporizer with minimal liquid stagnation
US5451258A (en) * 1994-05-11 1995-09-19 Materials Research Corporation Apparatus and method for improved delivery of vaporized reactant gases to a reaction chamber
JP2996101B2 (ja) * 1994-08-05 1999-12-27 信越半導体株式会社 液体原料ガスの供給方法および装置
US5551309A (en) * 1995-01-17 1996-09-03 Olin Corporation Computer-controlled chemical dispensing with alternative operating modes
SE505095C2 (sv) * 1995-10-02 1997-06-23 Engstrom Medical Ab Anordning för förgasning av vätska och dosering av sålunda åstadkommen gas
SE9504580L (sv) * 1995-12-21 1997-06-22 Siemens Elema Ab Förfarande vid förgasning av en narkosvätska och en förgasare
US6195504B1 (en) 1996-11-20 2001-02-27 Ebara Corporation Liquid feed vaporization system and gas injection device
US10130787B2 (en) 1997-06-17 2018-11-20 Fisher & Paykel Healthcare Limited Humidity controller
US20040221844A1 (en) * 1997-06-17 2004-11-11 Hunt Peter John Humidity controller
CA2621113C (en) * 1997-06-17 2011-10-11 Fisher & Paykel Healthcare Limited Respiratory humidification system
US5966499A (en) * 1997-07-28 1999-10-12 Mks Instruments, Inc. System for delivering a substantially constant vapor flow to a chemical process reactor
JPH1172426A (ja) * 1997-08-29 1999-03-16 Kett Electric Lab 試料を加熱により気化させる加熱装置
US5971368A (en) 1997-10-29 1999-10-26 Fsi International, Inc. System to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in the liquid until utilized
KR100524204B1 (ko) * 1998-01-07 2006-01-27 동경 엘렉트론 주식회사 가스 처리장치
US6161398A (en) * 1998-04-09 2000-12-19 Lucent Technologies, Inc. Methods of and systems for vapor delivery control in optical preform manufacture
WO1999053117A2 (en) * 1998-04-14 1999-10-21 Cvd Systems, Inc. Film deposition system
US6136725A (en) * 1998-04-14 2000-10-24 Cvd Systems, Inc. Method for chemical vapor deposition of a material on a substrate
US6296711B1 (en) 1998-04-14 2001-10-02 Cvd Systems, Inc. Film processing system
DE19822492A1 (de) * 1998-05-19 1999-08-26 Basf Ag Versorgungssystem für die Zuführung eines Fluids zu einem Behälter
DE69833341T2 (de) * 1998-05-28 2006-08-24 Ulvac, Inc. Verfahren zur Dampfphasenabscheidung eines organischen Stoffs
EP0962260B1 (en) * 1998-05-28 2005-01-05 Ulvac, Inc. Material evaporation system
US6275649B1 (en) 1998-06-01 2001-08-14 Nihon Shinku Gijutsu Kabushiki Kaisha Evaporation apparatus
US6235641B1 (en) 1998-10-30 2001-05-22 Fsi International Inc. Method and system to control the concentration of dissolved gas in a liquid
US6406551B1 (en) 1999-05-14 2002-06-18 Fsi International, Inc. Method for treating a substrate with heat sensitive agents
US6274506B1 (en) 1999-05-14 2001-08-14 Fsi International, Inc. Apparatus and method for dispensing processing fluid toward a substrate surface
GB9929279D0 (en) * 1999-12-11 2000-02-02 Epichem Ltd An improved method of and apparatus for the delivery of precursors in the vapour phase to a plurality of epitaxial reactor sites
US6473564B1 (en) * 2000-01-07 2002-10-29 Nihon Shinku Gijutsu Kabushiki Kaisha Method of manufacturing thin organic film
US6322057B1 (en) * 2000-05-22 2001-11-27 United Microelectronics Corp. Auxiliary gasline-heating unit in chemical vapor deposition
US6443435B1 (en) * 2000-10-23 2002-09-03 Applied Materials, Inc. Vaporization of precursors at point of use
US7458374B2 (en) 2002-05-13 2008-12-02 Alexza Pharmaceuticals, Inc. Method and apparatus for vaporizing a compound
US20030051728A1 (en) 2001-06-05 2003-03-20 Lloyd Peter M. Method and device for delivering a physiologically active compound
US20070122353A1 (en) 2001-05-24 2007-05-31 Hale Ron L Drug condensation aerosols and kits
US7645442B2 (en) 2001-05-24 2010-01-12 Alexza Pharmaceuticals, Inc. Rapid-heating drug delivery article and method of use
US7585493B2 (en) 2001-05-24 2009-09-08 Alexza Pharmaceuticals, Inc. Thin-film drug delivery article and method of use
US6718126B2 (en) * 2001-09-14 2004-04-06 Applied Materials, Inc. Apparatus and method for vaporizing solid precursor for CVD or atomic layer deposition
US6701066B2 (en) * 2001-10-11 2004-03-02 Micron Technology, Inc. Delivery of solid chemical precursors
US20030123080A1 (en) * 2001-12-27 2003-07-03 Toshiba Tec Kabushiki Kaisha Image forming device and method for controling the same
US7186385B2 (en) * 2002-07-17 2007-03-06 Applied Materials, Inc. Apparatus for providing gas to a processing chamber
KR100474565B1 (ko) * 2002-08-30 2005-03-10 삼성전자주식회사 소스 가스 공급 방법 및 장치
US7011299B2 (en) * 2002-09-16 2006-03-14 Matheson Tri-Gas, Inc. Liquid vapor delivery system and method of maintaining a constant level of fluid therein
US7913688B2 (en) 2002-11-27 2011-03-29 Alexza Pharmaceuticals, Inc. Inhalation device for producing a drug aerosol
CA2526475A1 (en) 2003-05-21 2004-12-02 Alexza Pharmaceuticals, Inc. Optically ignited or electrically ignited self-contained heating unit and drug-supply unit employing same
US20050095859A1 (en) * 2003-11-03 2005-05-05 Applied Materials, Inc. Precursor delivery system with rate control
US7540286B2 (en) 2004-06-03 2009-06-02 Alexza Pharmaceuticals, Inc. Multiple dose condensation aerosol devices and methods of forming condensation aerosols
TW200602591A (en) * 2004-07-08 2006-01-16 hong-yang Chen Gas supply device by gasifying burnable liquid
US20060113687A1 (en) * 2004-11-29 2006-06-01 Mark Castellano Remote control HVAC air freshener
JP2006183117A (ja) * 2004-12-28 2006-07-13 Showa Shell Sekiyu Kk MOCVD(有機金属化学蒸着)法によるZnO系透明導電膜の製造方法
US7836882B1 (en) * 2005-01-07 2010-11-23 Vetland Medical Sales And Services Llc Electronic anesthesia delivery apparatus
US7547005B2 (en) * 2006-02-16 2009-06-16 Advanced Energy Industries, Inc. System and method for delivering vapor
US7775508B2 (en) * 2006-10-31 2010-08-17 Applied Materials, Inc. Ampoule for liquid draw and vapor draw with a continuous level sensor
US7578208B2 (en) * 2006-12-15 2009-08-25 Mocon, Inc. System and method for generating a gas sample of known and adjustable relative humidity
WO2008080170A1 (en) * 2006-12-22 2008-07-03 Alexza Pharmaceuticals, Inc. Mixed drug aerosol compositiions
US7833353B2 (en) * 2007-01-24 2010-11-16 Asm Japan K.K. Liquid material vaporization apparatus for semiconductor processing apparatus
ES2594867T3 (es) 2007-03-09 2016-12-23 Alexza Pharmaceuticals, Inc. Unidad de calentamiento para usar en un dispositivo de administración de fármaco
DE102007024266A1 (de) * 2007-05-23 2008-11-27 Centrotherm Thermal Solutions Gmbh + Co.Kg Verfahren zur Steuerung der Prozessgaskonzentration
US8002247B2 (en) * 2008-08-22 2011-08-23 Air Products And Chemicals, Inc. Cross purge valve and container assembly
US8146896B2 (en) 2008-10-31 2012-04-03 Applied Materials, Inc. Chemical precursor ampoule for vapor deposition processes
US8012876B2 (en) * 2008-12-02 2011-09-06 Asm International N.V. Delivery of vapor precursor from solid source
JP5690498B2 (ja) * 2009-03-27 2015-03-25 ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. 基体上に膜を堆積する方法および気化前駆体化合物を送達する装置
KR101084275B1 (ko) * 2009-09-22 2011-11-16 삼성모바일디스플레이주식회사 소스 가스 공급 유닛, 이를 구비하는 증착 장치 및 방법
US8728239B2 (en) * 2011-07-29 2014-05-20 Asm America, Inc. Methods and apparatus for a gas panel with constant gas flow
DE102013103603A1 (de) * 2013-04-10 2014-10-16 Osram Opto Semiconductors Gmbh Verfahren zum Versorgen eines Prozesses mit einem angereicherten Trägergas
CN107106794A (zh) * 2014-11-20 2017-08-29 寇格尼塔有限责任公司 吸入器使用的测量、辅助和校正方法及装置
US10363497B2 (en) * 2016-02-18 2019-07-30 Rasirc, Inc. Devices, systems, and methods for controlled delivery of process gases
JP7137921B2 (ja) * 2017-11-07 2022-09-15 株式会社堀場エステック 気化システム及び気化システム用プログラム
DE102018118771B4 (de) 2018-08-02 2022-07-07 Leoni Kabel Gmbh Verfahren und Vorrichtung zum reproduzierbaren Erzeugen einer Preform für die Glasfaserherstellung
DE102019115928B4 (de) 2019-06-12 2023-07-27 J-Fiber Gmbh Quarzfaser mit Wasserstoff-Barriereschicht und Verfahren zu deren Herstellung
DE102020100058A1 (de) 2020-01-03 2021-07-08 Leoni Kabel Gmbh Faseroptische Temperaturmessung mit Quantendot-Nanokomposit
US20230399741A1 (en) * 2020-11-19 2023-12-14 Lam Research Corporation Sublimation control using downstream pressure sensing

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3178159A (en) * 1960-05-23 1965-04-13 Humidaire Corp Method of and apparatus for humidifying air
US3323784A (en) * 1964-11-05 1967-06-06 Peter A Fazio Humidifier with throw-away reservoir
US3528418A (en) * 1967-07-03 1970-09-15 Air Shields Anesthetic vaporizing apparatus
US3583685A (en) * 1968-09-26 1971-06-08 Ibm Method and apparatus for controlling quantity of a vapor in a gas
US3771260A (en) * 1970-01-29 1973-11-13 Black Sivalls & Bryson Inc Method of vaporizing and combining a liquefied cryogenic fluid stream with a gas stream
US3650151A (en) * 1970-11-18 1972-03-21 Tylan Corp Fluid flow measuring system
US4091056A (en) * 1972-06-28 1978-05-23 Veikko Hamalainen Method of vaporizing liquids
US3938384A (en) * 1972-10-13 1976-02-17 Tylan Corporation Mass flow meter with reduced attitude sensitivity
US3937063A (en) * 1973-06-14 1976-02-10 Kethley Lancelot I Vapor pressure metering apparatus and method
US3939858A (en) * 1974-09-13 1976-02-24 Tylan Corporation Assembly and method of obtaining a controlled gas mixture
US4110419A (en) * 1975-04-18 1978-08-29 Respiratory Care, Inc. High-volume disposable and semi-disposable cartridge humidifier with self-contained cartridge sterilizing means, and related method

Also Published As

Publication number Publication date
US4276243A (en) 1981-06-30
GB2073453B (en) 1983-08-24
WO1981002848A1 (en) 1981-10-15
GB2073453A (en) 1981-10-14
EP0048742A1 (en) 1982-04-07
EP0048742A4 (en) 1982-08-05
CA1152183A (en) 1983-08-16

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