JPS5747875A - Resist composition - Google Patents
Resist compositionInfo
- Publication number
- JPS5747875A JPS5747875A JP12190380A JP12190380A JPS5747875A JP S5747875 A JPS5747875 A JP S5747875A JP 12190380 A JP12190380 A JP 12190380A JP 12190380 A JP12190380 A JP 12190380A JP S5747875 A JPS5747875 A JP S5747875A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- naphthylamine
- benzotriazole
- tertiary
- hydroxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 abstract 2
- BJFLSHMHTPAZHO-UHFFFAOYSA-N benzotriazole Chemical compound [CH]1C=CC=C2N=NN=C21 BJFLSHMHTPAZHO-UHFFFAOYSA-N 0.000 abstract 2
- 239000012964 benzotriazole Substances 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 abstract 2
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 abstract 1
- KEQFTVQCIQJIQW-UHFFFAOYSA-N N-Phenyl-2-naphthylamine Chemical compound C=1C=C2C=CC=CC2=CC=1NC1=CC=CC=C1 KEQFTVQCIQJIQW-UHFFFAOYSA-N 0.000 abstract 1
- -1 amine compound Chemical class 0.000 abstract 1
- 238000001312 dry etching Methods 0.000 abstract 1
- 229920001971 elastomer Polymers 0.000 abstract 1
- FSWDLYNGJBGFJH-UHFFFAOYSA-N n,n'-di-2-butyl-1,4-phenylenediamine Chemical compound CCC(C)NC1=CC=C(NC(C)CC)C=C1 FSWDLYNGJBGFJH-UHFFFAOYSA-N 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 abstract 1
- 239000004926 polymethyl methacrylate Substances 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
Landscapes
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12190380A JPS5747875A (en) | 1980-09-02 | 1980-09-02 | Resist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12190380A JPS5747875A (en) | 1980-09-02 | 1980-09-02 | Resist composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5747875A true JPS5747875A (en) | 1982-03-18 |
| JPS6362593B2 JPS6362593B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-12-02 |
Family
ID=14822754
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12190380A Granted JPS5747875A (en) | 1980-09-02 | 1980-09-02 | Resist composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5747875A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58182633A (ja) * | 1982-04-19 | 1983-10-25 | Tokyo Ohka Kogyo Co Ltd | ポジ型画像の形成方法 |
| JPS61130947A (ja) * | 1984-11-30 | 1986-06-18 | Japan Synthetic Rubber Co Ltd | ポジ型レジスト組成物 |
| JPS61219951A (ja) * | 1985-03-27 | 1986-09-30 | Japan Synthetic Rubber Co Ltd | ポジ型感放射線性組成物 |
| JPS63237053A (ja) * | 1987-03-26 | 1988-10-03 | Japan Synthetic Rubber Co Ltd | 集積回路作製用ポジ型感放射線性樹脂組成物 |
| US4968582A (en) * | 1988-06-28 | 1990-11-06 | Mcnc And University Of Nc At Charlotte | Photoresists resistant to oxygen plasmas |
| US5114827A (en) * | 1988-06-28 | 1992-05-19 | Microelectronics Center Of N.C. | Photoresists resistant to oxygen plasmas |
| US7537974B2 (en) | 2005-02-03 | 2009-05-26 | Samsung Electronics Co., Ltd. | Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same |
-
1980
- 1980-09-02 JP JP12190380A patent/JPS5747875A/ja active Granted
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58182633A (ja) * | 1982-04-19 | 1983-10-25 | Tokyo Ohka Kogyo Co Ltd | ポジ型画像の形成方法 |
| JPS61130947A (ja) * | 1984-11-30 | 1986-06-18 | Japan Synthetic Rubber Co Ltd | ポジ型レジスト組成物 |
| JPS61219951A (ja) * | 1985-03-27 | 1986-09-30 | Japan Synthetic Rubber Co Ltd | ポジ型感放射線性組成物 |
| JPS63237053A (ja) * | 1987-03-26 | 1988-10-03 | Japan Synthetic Rubber Co Ltd | 集積回路作製用ポジ型感放射線性樹脂組成物 |
| US4968582A (en) * | 1988-06-28 | 1990-11-06 | Mcnc And University Of Nc At Charlotte | Photoresists resistant to oxygen plasmas |
| US5114827A (en) * | 1988-06-28 | 1992-05-19 | Microelectronics Center Of N.C. | Photoresists resistant to oxygen plasmas |
| US7537974B2 (en) | 2005-02-03 | 2009-05-26 | Samsung Electronics Co., Ltd. | Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6362593B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-12-02 |
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