JPS5743422A - Resist coating apparatus - Google Patents

Resist coating apparatus

Info

Publication number
JPS5743422A
JPS5743422A JP11928280A JP11928280A JPS5743422A JP S5743422 A JPS5743422 A JP S5743422A JP 11928280 A JP11928280 A JP 11928280A JP 11928280 A JP11928280 A JP 11928280A JP S5743422 A JPS5743422 A JP S5743422A
Authority
JP
Japan
Prior art keywords
resist
chamber
solvent
coating
vacuum chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11928280A
Other languages
Japanese (ja)
Inventor
Kazuo Noda
Yoji Chokai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP11928280A priority Critical patent/JPS5743422A/en
Publication of JPS5743422A publication Critical patent/JPS5743422A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)

Abstract

PURPOSE:To form a uniform resist layer by filling resist volatility suppressing solvent in a chamber in the state of preventing the volatilization of the solvent in the resist and coating the resist on the surface of a semiconductor wafer. CONSTITUTION:A chamber 10 is composed of a cylindrical chamber body 11 and a cover 12 so provided as to block the upper opening of the body. A vacuum chuck 13 is rotatably provided at the inner center of the body 11. The vacuum chuck 13 is maintained in reduced pressure state, and a semiconductor wafer 14 is attracted fixedly to the end. An annular solvent storage tank 15 is provided along the peripheral surface of the upper inner wall surface of the body 11. Accordingly, the interior of the chamber 10 is filled always with the resist volatility suppressing solvent 18 of predetermined density, thereby enabling the coating of the resist on the surface of the wafer 14.
JP11928280A 1980-08-29 1980-08-29 Resist coating apparatus Pending JPS5743422A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11928280A JPS5743422A (en) 1980-08-29 1980-08-29 Resist coating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11928280A JPS5743422A (en) 1980-08-29 1980-08-29 Resist coating apparatus

Publications (1)

Publication Number Publication Date
JPS5743422A true JPS5743422A (en) 1982-03-11

Family

ID=14757521

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11928280A Pending JPS5743422A (en) 1980-08-29 1980-08-29 Resist coating apparatus

Country Status (1)

Country Link
JP (1) JPS5743422A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61272139A (en) * 1985-05-28 1986-12-02 凸版印刷株式会社 Heat-insulating film and heat-insulating panel
US5658615A (en) * 1993-03-25 1997-08-19 Tokyo Electron Limited Method of forming coating film and apparatus therefor
US6503003B2 (en) * 1996-02-01 2003-01-07 Tokyo Electron Limited Film forming method and film forming apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61272139A (en) * 1985-05-28 1986-12-02 凸版印刷株式会社 Heat-insulating film and heat-insulating panel
US5658615A (en) * 1993-03-25 1997-08-19 Tokyo Electron Limited Method of forming coating film and apparatus therefor
US6503003B2 (en) * 1996-02-01 2003-01-07 Tokyo Electron Limited Film forming method and film forming apparatus

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